Process For Production of Halosilanes From Silicon-Containing Ternary Intermetallic Compounds

    公开(公告)号:US20170275308A1

    公开(公告)日:2017-09-28

    申请号:US15503462

    申请日:2015-11-06

    IPC分类号: C07F7/16 C01B33/107

    摘要: A process for preparing a reaction product including a halosilane includes: contacting an unsaturated hydrocarbyl halide and a ternary intermetallic compound at a temperature of 300° C. to 700° C. to form the reaction product. The ternary intermetallic compound includes copper, silicon and a transition metal. The halosilane in the reaction product has formula R1mR2n—HoSiX(4-m-n-o)> where each R1 is independently a saturated monovalent hydrocarbyl group, each R2 is independently an unsaturated monovalent hydrocarbyl group; each X is independently a halogen atom; subscript m is 1, 2, or 3; subscript n is 0, 1, or 2; subscript o is 0, 1, or 2; and a quantity (m+n+o) is 1, 2, or 3. At least a portion of the unsaturated hydrocarbyl groups in the unsaturated by drocarbyl halide are converted to saturated hydrocarbyl groups (R1) in the halosilane.

    Method for Preparing an Organofunctional Compound
    2.
    发明申请
    Method for Preparing an Organofunctional Compound 审中-公开
    制备有机官能化合物的方法

    公开(公告)号:US20150045571A1

    公开(公告)日:2015-02-12

    申请号:US14381995

    申请日:2013-02-15

    IPC分类号: C07F7/30

    CPC分类号: C07F7/30

    摘要: Claimed is a method for making an organofunctional compound of formula RbMcXd comprising the following steps: (i) contacting a transition metal catalyst with a mixture including hydrogen gas and a halide of formula MXa to form a M-containing transition metal catalyst; (ii) contacting the M-containing transition metal catalyst with an organohalide to form the organofunctional compound of formula R McXd. In the above formulae, M is an element selected from antimony, arsenic, bismuth, boron, cadmium, gallium, germanium, indium, lead, mercury, phosphorus, selenium, sulfur, tellurium, and tin. X is a halogen atom or a hydrogen atom. Subscripts have values matching the valences. R is a monovalent organic group. Examples of species of the organofunctional compound prepared according to the method described above include dimethyldichlorogermane (i.e., (CH3)2GeCl2), dimethyldibromogermane, dimethyldiiodogermane, dimethyldifluorogermane, diethyldichlorogermane, diethyldibromogermane, diethyldiiodogermane, dicyclohexyldichlorogermane, and dicyclohexyldibromogermane. The process may also produce other organofunctional compounds, such as those having the formulae ReHGeX3−e, RGeX3, and/or R3GeX, where R and X are as defined above and subscript e is 1 or 2. The method may also produce hydrohalogermanium compounds (i.e., hydrohalogermanes), such as those having the formula HGeX3, where X is as defined above.

    摘要翻译: 要求的是制备式RbMcXd的有机官能化合物的方法,包括以下步骤:(i)使过渡金属催化剂与包含氢气和式MXa的卤化物的混合物接触以形成含M的过渡金属催化剂; (ii)使含M的过渡金属催化剂与有机卤化物接触以形成式R McXD的有机官能化合物。 在上式中,M是选自锑,砷,铋,硼,镉,镓,锗,铟,铅,汞,磷,硒,硫,碲和锡的元素。 X是卤素原子或氢原子。 下标具有符合价值的值。 R是一价有机基团。 根据上述方法制备的有机官能化合物的实例包括二甲基二氯锗烷(即(CH 3)2GeCl 2),二甲基二溴锗烷,二甲基二碘锗烷,二甲基二氟锗烷,二乙基二氯锗烷,二乙基二溴锗烷,二乙基二碘锗烷,二环己基二氯锗烷和二环己基二溴锗烷。 该方法还可以产生其它有机官能化合物,例如具有式ReHGeX3-e,RGeX3和/或R3GeX的其它有机官能化合物,其中R和X如上所定义,下标e为1或2.该方法还可以生产氢卤化合物 即氢卤代烷烃),例如具有式HGeX 3的那些,其中X如上所定义。

    Method for preparing a trihalosilane
    3.
    发明申请
    Method for preparing a trihalosilane 审中-公开
    三卤硅烷的制备方法

    公开(公告)号:US20140335007A1

    公开(公告)日:2014-11-13

    申请号:US14120293

    申请日:2014-05-14

    IPC分类号: C01B33/107 B01J23/89

    摘要: A method of preparing a trihalosilane comprising the separate and consecutive steps of (i) contacting a copper catalyst with hydrogen gas and a silicon tetrahalide at a temperature of from 500 to 1400° C. to form a silicon-containing copper catalyst comprising at least 0.1% (w/w) of silicon, wherein the copper catalyst comprises a metal selected from copper and a mixture comprising copper and at least one element selected from gold, magnesium, and platinum; and (ii) contacting the silicon-containing copper catalyst with a hydrogen halide at a temperature of from 100 to 600° C. to form a trihalosilane.

    摘要翻译: 一种制备三卤代硅烷的方法,其包括以下分离和连续的步骤:(i)在500-1400℃的温度下使铜催化剂与氢气和四卤化硅接触以形成含硅铜催化剂,其包含至少0.1 (w / w)的硅,其中所述铜催化剂包含选自铜的金属和包含铜和至少一种选自金,镁和铂的元素的混合物; 和(ii)在100-600℃的温度下使含硅铜催化剂与卤化氢接触以形成三卤硅烷。

    Method for Preparing a Diorganodihalosilane
    5.
    发明申请
    Method for Preparing a Diorganodihalosilane 审中-公开
    二恶烷二卤代硅烷的制备方法

    公开(公告)号:US20140256975A1

    公开(公告)日:2014-09-11

    申请号:US14283475

    申请日:2014-05-21

    IPC分类号: C07F7/12

    CPC分类号: C07F7/125 C07F7/122

    摘要: A method of preparing a diorganodihalosilane comprising the separate and consecutive steps of (i) contacting a copper catalyst with a mixture comprising hydrogen gas and a silicon tetrahalide at a temperature of from 500 to 1400° C. to form a silicon-containing copper catalyst comprising at least 0.1% (w/w) of silicon, wherein the copper catalyst is selected from copper and a mixture comprising copper and at least one element selected from gold, magnesium, calcium, cesium, tin, and sulfur; and (ii) contacting the silicon-containing copper catalyst with an organohalide at a temperature of from 100 to 600° C. to form at least one diorganodihalosilane.

    摘要翻译: 一种制备二有机二卤代硅烷的方法,其包括以下步骤:(i)在500-1400℃的温度下使铜催化剂与包含氢气和四卤化硅的混合物接触以形成含硅铜催化剂,所述方法包括 至少0.1%(w / w)的硅,其中所述铜催化剂选自铜和包含铜和至少一种选自金,镁,钙,铯,锡和硫的元素的混合物; 和(ii)在100-600℃的温度下使含硅铜催化剂与有机卤化物接触以形成至少一种二有机二卤硅烷。

    Method of Selectively Forming a Reaction Product in the Presence of a Metal Silicide
    6.
    发明申请
    Method of Selectively Forming a Reaction Product in the Presence of a Metal Silicide 有权
    在金属硅化物存在下选择性形成反应产物的方法

    公开(公告)号:US20130334459A1

    公开(公告)日:2013-12-19

    申请号:US13688813

    申请日:2012-11-29

    IPC分类号: C07F7/08 C07F7/12 C07F7/21

    摘要: A reaction product is formed utilizing a method that includes the step of combining a metal silicide and an aliphatic hydrocarbyl halide at a temperature of from 200° C. to 600° C. The aliphatic hydrocarbyl halide has the formula HaCbXc, wherein a is 0 or more, b is 1 or more, c is one or more, and X is halo. The method allows the reaction product to be formed in a predictable and controlled manner. Moreover, the components used in this method can be easily recycled and/or re-used in other processes.

    摘要翻译: 使用包括在200℃至600℃的温度下组合金属硅化物和脂族烃基卤化物的步骤的方法形成反应产物。脂族烃基卤化物具有式HaCbXc,其中a为0或 更多的是,b为1以上,c为1以上,X为卤素。 该方法允许以可预测和受控的方式形成反应产物。 此外,在该方法中使用的组分可以容易地在其他方法中再循环和/或再次使用。

    Method for preparing a diorganodihalosilane
    7.
    发明授权
    Method for preparing a diorganodihalosilane 有权
    二有机二卤代硅烷的制备方法

    公开(公告)号:US08865927B2

    公开(公告)日:2014-10-21

    申请号:US14343407

    申请日:2012-10-10

    IPC分类号: C07F7/12 C07F7/14 C08G77/04

    摘要: A method of preparing a diorganodihalosilane, the method comprising the following separate and consecutive steps: (a) treating a metal catalyst comprising a metal selected from the groups consisting of i) gold, ii) gold and copper, iii) gold, copper and magnesium, iv) copper, rhodium and gold, v) copper, rhodium, and rhenium, vi) rhenium and palladium, vii) copper, and viii) copper and magnesium with a mixture comprising hydrogen gas and an organotrihalosilane at a temperature from 500 to 1400° C. to form a silicon-containing metal intermediate; and (b) reacting the silicon-containing metal intermediate with an organohalide according to the formula RX, wherein R is C1-C10 hydrocarbyl and X is halo, at a temperature from 100 to 600° C. to form a diorganodihalosilane and a depleted silicon-containing metal intermediate.

    摘要翻译: 一种制备二有机二卤代硅烷的方法,该方法包括以下分别和连续步骤:(a)处理包含选自i)金,ii)金和铜的金属的金属催化剂,iii)金,铜和镁 ,iv)铜,铑和金,v)铜,铑和铼,vi)铼和钯,vii)铜和viii)铜和镁与包含氢气和有机三卤代硅烷的混合物在500至1400℃的温度 ℃以形成含硅金属中间体; 和(b)使含硅金属中间体与根据式RX的有机卤化物反应,其中R为C1-C10烃基,X为卤素,在100-600℃的温度下反应,形成二有机二卤硅烷和贫化硅 含金属中间体。

    Process for production of halosilanes from silicon-containing ternary intermetallic compounds

    公开(公告)号:US09920079B2

    公开(公告)日:2018-03-20

    申请号:US15503462

    申请日:2015-11-06

    IPC分类号: C07F7/00 C07F7/16 C01B33/107

    摘要: A process for preparing a reaction product including a halosilane includes: contacting an unsaturated hydrocarbyl halide and a ternary intermetallic compound at a temperature of 300° C. to 700° C. to form the reaction product. The ternary intermetallic compound includes copper, silicon and a transition metal. The halosilane in the reaction product has formula R1mR2n—HoSiX(4−m−n−o)> where each R1 is independently a saturated monovalent hydrocarbyl group, each R2 is independently an unsaturated monovalent hydrocarbyl group; each X is independently a halogen atom; subscript m is 1, 2, or 3; subscript n is 0, 1, or 2; subscript o is 0, 1, or 2; and a quantity (m+n+o) is 1, 2, or 3. At least a portion of the unsaturated hydrocarbyl groups in the unsaturated hydrocarbyl halide are converted to saturated hydrocarbyl groups (R1) in the halosilane.