-
公开(公告)号：US20140335007A1
公开(公告)日：2014-11-13
申请号：US14120293
申请日：2014-05-14
IPC分类号： C01B33/107 , B01J23/89
CPC分类号： C01B33/1071 , B01J21/18 , B01J23/72 , B01J23/8926 , B01J23/8946 , C01B33/08 , C01B33/10 , C01B33/107
摘要： A method of preparing a trihalosilane comprising the separate and consecutive steps of (i) contacting a copper catalyst with hydrogen gas and a silicon tetrahalide at a temperature of from 500 to 1400° C. to form a silicon-containing copper catalyst comprising at least 0.1% (w/w) of silicon, wherein the copper catalyst comprises a metal selected from copper and a mixture comprising copper and at least one element selected from gold, magnesium, and platinum; and (ii) contacting the silicon-containing copper catalyst with a hydrogen halide at a temperature of from 100 to 600° C. to form a trihalosilane.
摘要翻译： 一种制备三卤代硅烷的方法，其包括以下分离和连续的步骤：（i）在500-1400℃的温度下使铜催化剂与氢气和四卤化硅接触以形成含硅铜催化剂，其包含至少0.1 （w / w）的硅，其中所述铜催化剂包含选自铜的金属和包含铜和至少一种选自金，镁和铂的元素的混合物; 和（ii）在100-600℃的温度下使含硅铜催化剂与卤化氢接触以形成三卤硅烷。
-
2.发明申请Method of Selectively Forming a Reaction Product in the Presence of a Metal Silicide 有权在金属硅化物存在下选择性形成反应产物的方法公开(公告)号：US20130334459A1
公开(公告)日：2013-12-19
申请号：US13688813
申请日：2012-11-29
CPC分类号： C07F7/0803 , C07F7/0805 , C07F7/0827 , C07F7/0896 , C07F7/125 , C07F7/21 , C08G77/60 , C08L83/16
摘要： A reaction product is formed utilizing a method that includes the step of combining a metal silicide and an aliphatic hydrocarbyl halide at a temperature of from 200° C. to 600° C. The aliphatic hydrocarbyl halide has the formula HaCbXc, wherein a is 0 or more, b is 1 or more, c is one or more, and X is halo. The method allows the reaction product to be formed in a predictable and controlled manner. Moreover, the components used in this method can be easily recycled and/or re-used in other processes.
摘要翻译： 使用包括在200℃至600℃的温度下组合金属硅化物和脂族烃基卤化物的步骤的方法形成反应产物。脂族烃基卤化物具有式HaCbXc，其中a为0或 更多的是，b为1以上，c为1以上，X为卤素。 该方法允许以可预测和受控的方式形成反应产物。 此外，在该方法中使用的组分可以容易地在其他方法中再循环和/或再次使用。
-
公开(公告)号：US08865927B2
公开(公告)日：2014-10-21
申请号：US14343407
申请日：2012-10-10
摘要： A method of preparing a diorganodihalosilane, the method comprising the following separate and consecutive steps: (a) treating a metal catalyst comprising a metal selected from the groups consisting of i) gold, ii) gold and copper, iii) gold, copper and magnesium, iv) copper, rhodium and gold, v) copper, rhodium, and rhenium, vi) rhenium and palladium, vii) copper, and viii) copper and magnesium with a mixture comprising hydrogen gas and an organotrihalosilane at a temperature from 500 to 1400° C. to form a silicon-containing metal intermediate; and (b) reacting the silicon-containing metal intermediate with an organohalide according to the formula RX, wherein R is C1-C10 hydrocarbyl and X is halo, at a temperature from 100 to 600° C. to form a diorganodihalosilane and a depleted silicon-containing metal intermediate.
摘要翻译： 一种制备二有机二卤代硅烷的方法，该方法包括以下分别和连续步骤：（a）处理包含选自i）金，ii）金和铜的金属的金属催化剂，iii）金，铜和镁 ，iv）铜，铑和金，v）铜，铑和铼，vi）铼和钯，vii）铜和viii）铜和镁与包含氢气和有机三卤代硅烷的混合物在500至1400℃的温度 ℃以形成含硅金属中间体; 和（b）使含硅金属中间体与根据式RX的有机卤化物反应，其中R为C1-C10烃基，X为卤素，在100-600℃的温度下反应，形成二有机二卤硅烷和贫化硅 含金属中间体。
-
4.发明授权Method of selectively forming a reaction product in the presence of a metal silicide 有权在金属硅化物的存在下选择性地形成反应产物的方法公开(公告)号：US08865850B2
公开(公告)日：2014-10-21
申请号：US13688813
申请日：2012-11-29
CPC分类号： C07F7/0803 , C07F7/0805 , C07F7/0827 , C07F7/0896 , C07F7/125 , C07F7/21 , C08G77/60 , C08L83/16
摘要： A reaction product is formed utilizing a method that includes the step of combining a metal silicide and an aliphatic hydrocarbyl halide at a temperature of from 200° C. to 600° C. The aliphatic hydrocarbyl halide has the formula HaCbXc, wherein a is 0 or more, b is 1 or more, c is one or more, and X is halo. The method allows the reaction product to be formed in a predictable and controlled manner. Moreover, the components used in this method can be easily recycled and/or re-used in other processes.
摘要翻译： 使用包括在200℃至600℃的温度下组合金属硅化物和脂族烃基卤化物的步骤的方法形成反应产物。脂族烃基卤化物具有式HaCbXc，其中a为0或 更多的是，b为1以上，c为1以上，X为卤素。 该方法允许以可预测和受控的方式形成反应产物。 此外，在该方法中使用的组分可以容易地在其他方法中再循环和/或再次使用。
-
公开(公告)号：US10081643B2
公开(公告)日：2018-09-25
申请号：US15508563
申请日：2015-11-06
IPC分类号： C07F7/12 , B01J23/889 , B01J23/86 , B01J23/89 , B01J23/745 , B01J23/75 , B01J23/755 , B01J37/02 , B01J38/42 , C08G77/60 , C01B33/033 , B01J37/18 , B01J21/18 , B01J23/70
CPC分类号： C07F7/126 , B01J21/18 , B01J23/70 , B01J23/745 , B01J23/75 , B01J23/755 , B01J23/868 , B01J23/8892 , B01J23/8926 , B01J23/8946 , B01J23/8986 , B01J37/0201 , B01J37/0205 , B01J37/0236 , B01J37/024 , B01J37/16 , B01J37/18 , B01J38/42 , C01B33/033 , C07F7/12 , C07F7/122 , C08G77/60
摘要： A method for preparing a reaction product including an aryl-functional silane includes sequential steps (1) and (2). Step (1) is contacting, under silicon deposition conditions, (A) an ingredient including (I) a halosilane such as silicon tetrahalide and optionally (II) hydrogen (H2); and (B) a metal combination comprising copper (Cu) and at least one other metal, where the at least one other metal is selected from the group consisting of gold (Au), cobalt (Co), chromium (Cr), iron (Fe), magnesium (Mg), manganese (Mn), nickel (Ni), palladium (Pd), and silver (Ag); thereby forming a silicon alloy catalyst comprising Si, Cu and the at least one other metal. Step (2) is contacting the silicon alloy catalyst and (C) a reactant including an aryl halide under silicon etching conditions.
-
公开(公告)号：US09422316B2
公开(公告)日：2016-08-23
申请号：US14436095
申请日：2013-07-02
摘要： A method comprises separate and consecutive steps (i) and (ii). Step (i) includes contacting a copper catalyst with hydrogen gas and a halogenated silane monomer at a temperature of 500° C. to 1400° C. to form a silicon-containing copper catalyst comprising at least 0.1% (w/w) of silicon. Step (ii) includes contacting the silicon-containing copper catalyst with an organohalide at a temperature of 100° C. to 600° C. to form a reaction product. The organohalide has formula HaCbXc, where X is a halogen atom, subscript a is an integer of 0 or more, subscript b is an integer of 1 or more, and subscript c is an integer of 2 or more. The method produces a reaction product. The reaction product includes a halogenated silahydrocarbylene.
摘要翻译： 一种方法包括单独的和连续的步骤（i）和（ii）。 步骤（i）包括在500℃至1400℃的温度下使铜催化剂与氢气和卤化硅烷单体接触以形成含硅铜催化剂，其包含至少0.1％（w / w）的硅 。 步骤（ii）包括在100℃至600℃的温度下使含硅铜催化剂与有机卤化物接触以形成反应产物。 有机卤化物具有式HaCbXc，其中X为卤素原子，下标a为0以上的整数，下标b为1以上的整数，下标c为2以上的整数。 该方法产生反应产物。 反应产物包括卤代硅氢亚烃基。
-
公开(公告)号：US20150232488A1
公开(公告)日：2015-08-20
申请号：US14436095
申请日：2013-07-02
摘要： A method comprises separate and consecutive steps (i) and (ii). Step (i) includes contacting a copper catalyst with hydrogen gas and a halogenated silane monomer at a temperature of 500° C. to 1400° C. to form a silicon-containing copper catalyst comprising at least 0.1% (w/w) of silicon. Step (ii) includes contacting the silicon-containing copper catalyst with an organohalide at a temperature of 100° C. to 600° C. to form a reaction product. The organohalide has formula HaCbXc, where X is a halogen atom, subscript a is an integer of 0 or more, subscript b is an integer of 1 or more, and subscript c is an integer of 2 or more. The method produces a reaction product. The reaction product includes a halogenated silahydrocarbylene.
摘要翻译： 一种方法包括单独的和连续的步骤（i）和（ii）。 步骤（i）包括在500℃至1400℃的温度下使铜催化剂与氢气和卤化硅烷单体接触以形成含硅铜催化剂，其包含至少0.1％（w / w）的硅 。 步骤（ii）包括在100℃至600℃的温度下使含硅铜催化剂与有机卤化物接触以形成反应产物。 有机卤化物具有式HaCbXc，其中X为卤素原子，下标a为0以上的整数，下标b为1以上的整数，下标c为2以上的整数。 该方法产生反应产物。 反应产物包括卤代硅氢亚烃基。
-
公开(公告)号：US20140243494A1
公开(公告)日：2014-08-28
申请号：US14343407
申请日：2012-10-10
摘要： A method of preparing a diorganodihalosilane, the method comprising the following separate and consecutive steps: (a) treating a metal catalyst comprising a metal selected from the groups consisting of i) gold, ii) gold and copper, iii) gold, copper and magnesium, iv) copper, rhodium and gold, v) copper, rhodium, and rhenium, vi) rhenium and palladium, vii) copper, and viii) copper and magnesium with a mixture comprising hydrogen gas and an organotrihalosilane at a temperature from 500 to 1400° C. to form a silicon-containing metal intermediate; and (b) reacting the silicon-containing metal intermediate with an organohalide according to the formula RX, wherein R is C1-C10 hydrocarbyl and X is halo, at a temperature from 100 to 600° C. to form a diorganodihalosilane and a depleted silicon-containing metal intermediate.
摘要翻译： 一种制备二有机二卤代硅烷的方法，该方法包括以下分别和连续步骤：（a）处理包含选自i）金，ii）金和铜的金属的金属催化剂，iii）金，铜和镁 ，iv）铜，铑和金，v）铜，铑和铼，vi）铼和钯，vii）铜和viii）铜和镁与包含氢气和有机三卤代硅烷的混合物在500至1400℃的温度 ℃以形成含硅金属中间体; 和（b）使含硅金属中间体与根据式RX的有机卤化物反应，其中R为C1-C10烃基，X为卤素，在100-600℃的温度下反应，形成二有机二卤硅烷和贫化硅 含金属中间体。
-
-
-
-
-
-
-
搜索结果
8 条记录 (耗时 0.014 秒)
