公开(公告)号：US20090093107A1

公开(公告)日：2009-04-09

申请号：US12332568

申请日：2008-12-11

申请人： Da-Hee LEE ,  Jung-Dae PARK ,  Hun-Jung YI ,  Tae-Hyo CHOI

发明人： Da-Hee LEE ,  Jung-Dae PARK ,  Hun-Jung YI ,  Tae-Hyo CHOI

IPC分类号： H01L21/306 ,  C11D7/06

CPC分类号： C11D3/0073 ,  C11D7/10 ,  C11D7/3209 ,  C11D11/0047 ,  H01L21/02071

摘要： In a cleaning composition, a method of cleaning a semiconductor substrate and a method of manufacturing a semiconductor device, the cleaning composition includes about 0.5 to about 5% by weight of an organic ammonium hydroxide compound, about 0.1 to about 3% by weight of a fluoride compound, about 0.1 to about 3% by weight of a buffering agent, about 0.5 to about 5% by weight of an etching accelerant, and a remainder of water.

摘要翻译： 在清洁组合物中，清洁半导体衬底的方法和制造半导体器件的方法，所述清洁组合物包括约0.5至约5重量％的有机氢氧化铵化合物，约0.1至约3重量％的 氟化物化合物，约0.1至约3重量％的缓冲剂，约0.5至约5重量％的蚀刻促进剂，剩余的水。

公开(公告)号：US20100158778A1

公开(公告)日：2010-06-24

申请号：US12619144

申请日：2009-11-16

申请人： Hun-Jung YI ,  Seung-Ki Cha ,  Chang-su Lim

发明人： Hun-Jung YI ,  Seung-Ki Cha ,  Chang-su Lim

IPC分类号： B01D53/56 ,  B01D50/00

CPC分类号： B01D53/56 ,  B01D46/0032 ,  B01D46/10 ,  B01D47/05 ,  B01D50/006 ,  B01D53/32 ,  B01D2257/404 ,  B01D2259/818 ,  Y10S423/01

摘要： An air purifying apparatus includes an air flow generating device for generating a flow of air, a nozzle spraying water to the air flowing through the air flow generating device, a plasma module performing a plasma reaction on the air containing the water sprayed from the nozzle, and oxidizing NOx in the air and converting it into NO3, an eliminator eliminating the NO3 converted in the plasma module and the water contained in the air and passing pure air through the eliminator and out of the air purifying apparatus and a water tank storing the water received from the eliminator, thereby heightening the removal efficiency of NOx from the air.

摘要翻译： 空气净化装置包括用于产生空气流的空气流产生装置，向流过空气流产生装置的空气喷射水的喷嘴，对包含从喷嘴喷射的水的空气进行等离子体反应的等离子体模块， 并且将空气中的NOx氧化并将其转化为NO 3，除去在等离子体组件中转化的NO 3和空气中所含的水的消除器，并将纯净空气通过除气器排出空气净化装置，以及储存水的水箱 从消除器接收，从而提高NOx从空气中的去除效率。

公开(公告)号：US20080149827A1

公开(公告)日：2008-06-26

申请号：US11963662

申请日：2007-12-21

申请人： Jae-Seok LEE ,  Heung-Bin LIM ,  Won-Kyung RYU ,  Seung-Ki CHAE ,  Yang-Koo LEE ,  Hun-Jung YI

发明人： Jae-Seok LEE ,  Heung-Bin LIM ,  Won-Kyung RYU ,  Seung-Ki CHAE ,  Yang-Koo LEE ,  Hun-Jung YI

IPC分类号： H01J49/26 ,  G01N21/00

CPC分类号： G01N21/94 ,  G01N21/718 ,  G01N21/9501 ,  H01L21/6838 ,  H01L21/68728 ,  H01L21/68785

摘要： Provided is an apparatus and method for analyzing contaminants on a wafer. The apparatus includes: a wafer holder for supporting a wafer on which contaminants to be analyzed are located, a laser ablation device for irradiating a laser to the wafer to extract a discrete specimen from the wafer, an analysis cell for collecting a discrete specimen from the surface of the wafer by irradiating the laser, and an analysis device connected to the analysis cell for analyzing contaminants from the collected discrete specimen.

摘要翻译： 提供了一种用于分析晶片上的污染物的装置和方法。 该装置包括：晶片保持器，用于支撑要分析的污染物所在的晶片;激光烧蚀装置，用于将激光照射到晶片以从晶片提取离散的样本;分析单元，用于从 通过照射激光的晶片的表面，以及连接到分析单元的分析装置，用于分析来自收集的离散样本的污染物。

公开(公告)号：US20090120459A1

公开(公告)日：2009-05-14

申请号：US12351298

申请日：2009-01-09

申请人： Hun-Jung YI ,  Sang-Oh Park

发明人： Hun-Jung YI ,  Sang-Oh Park

IPC分类号： C23G1/00

CPC分类号： B08B3/02 ,  B08B3/048

摘要： An apparatus for cleaning semiconductor substrates includes a chamber having a cleaning room and a drying room disposed over the cleaning room. The cleaning room and the drying room are separated or placed in communication with one another by a separation plate. An exhaust path is formed at a central portion of the separation plate. As de-ionized water (DI water) filling the cleaning room is drained during a dry process, the inside of the drying room is decompressed, and a drying fluid in the drying room flows from the drying room to the cleaning room along the exhaust path.

摘要翻译： 用于清洁半导体衬底的设备包括具有清洁室和设置在清洁室上方的干燥室的室。 清洁室和干燥室通过分隔板彼此分离或放置成彼此连通。 排气路径形成在分离板的中心部分。 由于在干燥过程中排出填充清洁室的去离子水（去离子水），干燥室内部被减压，干燥室内的干燥液沿着排气通路从干燥室流向清洗室 。

公开(公告)号：US20070157414A1

公开(公告)日：2007-07-12

申请号：US11566624

申请日：2006-12-04

申请人： Hun-Jung YI ,  Seung-Ki CHAE

发明人： Hun-Jung YI ,  Seung-Ki CHAE

IPC分类号： A47L5/38

CPC分类号： G03F7/2022 ,  G03F7/70925 ,  H01L21/67028 ,  H01L21/67225

摘要： Disclosed is an embodiment of an apparatus and method for manufacturing semiconductor devices. A photolithography process may be carried out after cleaning the backside of a wafer by means of an apparatus that includes an illumination module for conducting an optical illumination operation of photolithography to the front side of the wafer, and a cleaning module for conducting a cleaning operation on the wafer backside. Providing the capability of removing particles from the wafer backside and eliminating defocusing effects due to wafer chucking errors, these and other embodiments improve reliability of the photolithography process, as well as productivity and yields for the semiconductor devices.

摘要翻译： 公开了用于制造半导体器件的装置和方法的实施例。 可以通过包括用于将光刻的光学照明操作进行到晶片前侧进行照明的照明模块的装置清洁晶片的背面之后进行光刻工艺，以及用于进行清洁操作的清洁模块 晶圆背面。 提供从晶片背面去除颗粒的能力并消除由于晶片夹紧误差引起的散焦效应，这些和其它实施例提高了光刻工艺的可靠性，以及半导体器件的生产率和产量。

公开(公告)号：US20070181160A1

公开(公告)日：2007-08-09

申请号：US11671978

申请日：2007-02-06

申请人： Hun-Jung YI ,  Yong-Kyun KO

发明人： Hun-Jung YI ,  Yong-Kyun KO

IPC分类号： B08B9/20 ,  B08B3/00

CPC分类号： H01L21/67326 ,  B08B3/048 ,  H01L21/67313

摘要： Provided are a supporter and a substrate cleaning apparatus including the supporter, and a method for cleaning substrates. In the apparatus, a guide plate is provided close to an outer surface of an outermost substrate among substrates arranged in a cleaning process. The guide plate is shaped such that cleaning liquid injected toward a lower edge of the outermost substrate flows to an upper edge of the outermost substrate in a substantially vertical direction.

摘要翻译： 提供了一种支撑体和包括该支撑体的基板清洁装置，以及一种用于清洁基板的方法。 在该装置中，在布置在清洁过程中的基板之间，靠近最外侧基板的外表面设置有引导板。 引导板成形为使得朝向最外侧基板的下边缘注入的清洗液体沿大致垂直的方向流到最外侧基板的上边缘。

公开(公告)号：US20070017117A1

公开(公告)日：2007-01-25

申请号：US11458194

申请日：2006-07-18

申请人： Hun-Jung YI ,  Sang-Oh PARK

发明人： Hun-Jung YI ,  Sang-Oh PARK

IPC分类号： F26B3/00 ,  F26B5/04

CPC分类号： H01L21/67034

摘要： An apparatus for drying a substrate is provided. In one embodiment, the apparatus includes a drying room in which a support member for supporting a plurality of wafers is disposed. The apparatus further includes a drying gas-supply element for supplying a drying gas to the substrates supported by the support member. The drying gas-supply element includes nozzles located within the drying room and arranged in a plurality of groups, and supply pipes for supplying a drying gas to the nozzles. Nozzles belonging to a first group are formed such that the density of the openings in a spray port is higher in a front region than in other regions, and nozzles belonging to a second group are formed such that density of openings in a spray port is higher in a rear region than in other regions. Different supply pipes can be connected to nozzles belonging to different groups, and a flow control valve can be installed in each of the supply pipes.

摘要翻译： 提供了一种干燥基板的设备。 在一个实施例中，该设备包括一个干燥室，其中设置有用于支撑多个晶片的支撑构件。 该装置还包括用于将干燥气体供给到由支撑构件支撑的基板的干燥气体供应元件。 干燥气体供给元件包括位于干燥室内的喷嘴，并且设置成多组，并且向喷嘴供给干燥气体供给管。 形成属于第一组的喷嘴，使得喷嘴中的开口的密度在前区域比在其它区域高，并且形成属于第二组的喷嘴，使得喷嘴中的开口密度更高 在后方区域比其他地区。 可以将不同的供给管连接到属于不同组的喷嘴，并且可以在每个供应管中安装流量控制阀。