公开(公告)号：US08027017B2

公开(公告)日：2011-09-27

申请号：US12321102

申请日：2009-01-15

Applicant: Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

Inventor： Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

IPC: G03B27/52

CPC classification number: B08B1/007 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67028 ,  H01L21/67057

Abstract: The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.

Abstract translation: 本发明构思提供了一种基板处理装置和曝光装置，其中，卡盘构件，包括清除卡盘构件的基板装载表面上的异物的清洁工具的清洁构件和清洁清洁工具的工具清洁构件 在处理室内彼此相邻。 本发明构思还提供了一种使用工具清洁构件清洁清洁工具的方法。 根据上述装置和方法，可以防止由清洁工具污染卡盘构件，并且可以使在曝光过程中由卡盘构件上的颗粒引起的散焦现象最小化。

公开(公告)号：US20110073801A1

公开(公告)日：2011-03-31

申请号：US12926615

申请日：2010-11-30

Applicant: Dong-Won Hwang ,  Kook-Joo Kim ,  Jung-In LA ,  Pil-Kwon Jun ,  Seung-Ki Chae ,  Yang-Koo Lee

Inventor： Dong-Won Hwang ,  Kook-Joo Kim ,  Jung-In LA ,  Pil-Kwon Jun ,  Seung-Ki Chae ,  Yang-Koo Lee

IPC: C09K13/08

CPC classification number: C03C15/00 ,  C09K13/08 ,  H01L21/31133 ,  H01L21/76804 ,  H01L21/76897 ,  H01L27/10855

Abstract: In a composition for etching silicon oxide, and a method of forming a contact hole using the composition, the composition which includes from about 0.01 to about 2 percent by weight of ammonium bifluoride, from about 2 to about 35 percent by weight of an organic acid, from about 0.05 to about 1 percent by weight of an inorganic acid, and a remainder of a low polar organic solvent. The composition may reduce damages to a metal silicide pattern that may be exposed in an etching process performed for forming the contact hole.

公开(公告)号：US20090117499A1

公开(公告)日：2009-05-07

申请号：US12232594

申请日：2008-09-19

Applicant: Se-yeon Kim ,  Yong-kyun Ko ,  Sang-mi Lee ,  Yang-koo Lee ,  Hun-jung Yi ,  Kun-tack Lee

Inventor： Se-yeon Kim ,  Yong-kyun Ko ,  Sang-mi Lee ,  Yang-koo Lee ,  Hun-jung Yi ,  Kun-tack Lee

IPC: G03F7/20 ,  C11D3/20

CPC classification number: G03F7/70925 ,  G03F7/70341

Abstract: A cleaning solution for an immersion photolithography system according to example embodiments may include an ether-based solvent, an alcohol-based solvent, and a semi-aqueous-based solvent. In the immersion photolithography system, a plurality of wafers coated with photoresist films may be exposed pursuant to an immersion photolithography process using an immersion fluid. The area contacted by the immersion fluid during the exposure process may accumulate contaminants. Accordingly, the area contacted by the immersion fluid during the exposure process may be washed with the cleaning solution according to example embodiments so as to reduce or prevent defects in the immersion photolithography system.

Abstract translation: 根据示例性实施方式的用于浸没式光刻系统的清洁溶液可以包括醚类溶剂，醇类溶剂和半水性溶剂。 在浸没式光刻系统中，可以使用浸没流体根据浸没光刻工艺来曝光涂覆有光致抗蚀剂膜的多个晶片。 在曝光过程中浸入液接触的区域可能会积聚污染物。 因此，可以利用根据示例性实施例的清洗溶液洗涤曝光过程中浸入液接触的区域，以便减少或防止浸没光刻系统中的缺陷。

公开(公告)号：US20070000523A1

公开(公告)日：2007-01-04

申请号：US11454829

申请日：2006-06-19

Applicant: Se-Yeon Kim ,  Pil-Kwon Jun ,  Jung-Dae Park ,  Myoung-Ok Han ,  Jea-Wook Kim ,  Seung-Ki Chae ,  Kook-Joo Kim ,  Jae-Seok Lee ,  Yong-Kyun Ko ,  Kwang-Shin Lim ,  Yang-Koo Lee

Inventor： Se-Yeon Kim ,  Pil-Kwon Jun ,  Jung-Dae Park ,  Myoung-Ok Han ,  Jea-Wook Kim ,  Seung-Ki Chae ,  Kook-Joo Kim ,  Jae-Seok Lee ,  Yong-Kyun Ko ,  Kwang-Shin Lim ,  Yang-Koo Lee

IPC: B08B3/04

CPC classification number: H01L21/02071 ,  C11D3/0073 ,  C11D7/10 ,  C11D7/3209 ,  C11D11/0023 ,  H01L27/10885

Abstract: A cleaning composition is disclosed. The cleaning composition comprises about 80 to 99.8999 percent by weight of an ammonium fluoride aqueous solution, about 0.1 to 5 percent by weight of a buffering agent, and about 0.0001 to 15 percent by weight of a corrosion-inhibiting agent. A method of preparing the cleaning composition, a method of cleaning a substrate using the cleaning composition, and a method of manufacturing a semiconductor device using the cleaning composition are also disclosed.

Abstract translation: 公开了一种清洁组合物。 该清洗组合物含有约80-99.8999重量％的氟化铵水溶液，约0.1-5重量％的缓冲剂和约0.0001-15重量％的腐蚀抑制剂。 还公开了一种制备清洁组合物的方法，使用清洁组合物清洁基材的方法，以及使用该清洁组合物制造半导体器件的方法。

公开(公告)号：US08607557B2

公开(公告)日：2013-12-17

申请号：US12796847

申请日：2010-06-09

Applicant: Toshimichi Ikeda ,  Yang Koo Lee

Inventor： Toshimichi Ikeda ,  Yang Koo Lee

IPC: F16D31/02

CPC classification number: E02F9/2242 ,  E02F9/123 ,  F15B11/16 ,  F15B2211/20576 ,  F15B2211/3116 ,  F15B2211/31582 ,  F15B2211/7128

Abstract: A hydraulic circuit for an excavator is provided, which includes at least one first working device control valve having a first traveling control valve and a first boom control valve successively installed along a first center bypass line from a downstream side of a first hydraulic pump, at least one second working device control valve having a second traveling control valve and a second boom control valve successively installed along a second center bypass line from a downstream side of a second hydraulic pump, a third hydraulic pump providing fluid pressure to a swing motor installed on a third center bypass line, a swing control valve installed on a downstream side of the third hydraulic pump and shifted, in accordance with a valve switching signal input from the outside, to supply hydraulic fluid discharged from the third hydraulic pump to the swing motor, and a boom confluence line connected between an output port of the swing control valve and an input port of the boom control value to make the hydraulic fluid discharged from the third hydraulic pump join hydraulic fluid on the input port side of the boom control valve through the third center bypass line when the direction of the boom control valve is changed.

Abstract translation: 提供了一种用于挖掘机的液压回路，其包括至少一个第一工作装置控制阀，该第一工作装置控制阀具有第一行进控制阀和从第一液压泵的下游侧沿着第一中心旁通管连续安装的第一起重臂控制阀， 至少一个第二工作装置控制阀，具有第二行进控制阀和第二起重臂控制阀，第二起重臂控制阀从第二液压泵的下游侧沿着第二中心旁通管连续安装，第三液压泵向安装在 第三中心旁路管路，安装在第三液压泵的下游侧的回转控制阀，根据从外部输入的阀切换信号，将从第三液压泵排出的液压油供给回转马达， 以及连接在回转控制阀的输出端口和起重臂控制阀va的输入端口之间的吊杆汇合线 使得当第三液压泵排出的液压流体在动臂控制阀的方向改变时通过第三中心旁通管路连接在动臂控制阀的输入端口侧的液压流体。

公开(公告)号：US07880138B2

公开(公告)日：2011-02-01

申请号：US11963662

申请日：2007-12-21

Applicant: Jae-Seok Lee ,  Heung-Bin Lim ,  Won-Kyung Ryu ,  Seung-Ki Chae ,  Yang-Koo Lee ,  Hun-Jung Yi

Inventor： Jae-Seok Lee ,  Heung-Bin Lim ,  Won-Kyung Ryu ,  Seung-Ki Chae ,  Yang-Koo Lee ,  Hun-Jung Yi

IPC: H01J49/26 ,  G01N21/00

CPC classification number: G01N21/94 ,  G01N21/718 ,  G01N21/9501 ,  H01L21/6838 ,  H01L21/68728 ,  H01L21/68785

Abstract: Provided is an apparatus and method for analyzing contaminants on a wafer. The apparatus includes: a wafer holder for supporting a wafer on which contaminants to be analyzed are located, a laser ablation device for irradiating a laser to the wafer to extract a discrete specimen from the wafer, an analysis cell for collecting a discrete specimen from the surface of the wafer by irradiating the laser, and an analysis device connected to the analysis cell for analyzing contaminants from the collected discrete specimen.

Abstract translation: 提供了一种用于分析晶片上的污染物的装置和方法。 该装置包括：晶片保持器，用于支撑要分析的污染物所在的晶片;激光烧蚀装置，用于将激光照射到晶片以从晶片提取离散的样本;分析单元，用于从 通过照射激光的晶片的表面，以及连接到分析单元的分析装置，用于分析来自收集的离散样本的污染物。

公开(公告)号：US20100319338A1

公开(公告)日：2010-12-23

申请号：US12796847

申请日：2010-06-09

Applicant: Toshimichi IKEDA ,  Yang Koo LEE

Inventor： Toshimichi IKEDA ,  Yang Koo LEE

IPC: F16D31/02

CPC classification number: E02F9/2242 ,  E02F9/123 ,  F15B11/16 ,  F15B2211/20576 ,  F15B2211/3116 ,  F15B2211/31582 ,  F15B2211/7128

Abstract: A hydraulic circuit for an excavator is provided, which includes at least one first working device control valve having a first traveling control valve and a first boom control valve successively installed along a first center bypass line from a downstream side of a first hydraulic pump, at least one second working device control valve having a second traveling control valve and a second boom control valve successively installed along a second center bypass line from a downstream side of a second hydraulic pump, a third hydraulic pump providing fluid pressure to a swing motor installed on a third center bypass line, a swing control valve installed on a downstream side of the third hydraulic pump and shifted, in accordance with a valve switching signal input from the outside, to supply hydraulic fluid discharged from the third hydraulic pump to the swing motor, and a boom confluence line connected between an output port of the swing control valve and an input port of the boom control value to make the hydraulic fluid discharged from the third hydraulic pump join hydraulic fluid on the input port side of the boom control valve through the third center bypass line when the direction of the boom control valve is changed.

Abstract translation: 提供了一种用于挖掘机的液压回路，其包括至少一个第一工作装置控制阀，该第一工作装置控制阀具有第一行进控制阀和从第一液压泵的下游侧沿着第一中心旁通管连续安装的第一起重臂控制阀， 至少一个第二工作装置控制阀，具有第二行进控制阀和第二起重臂控制阀，第二起重臂控制阀从第二液压泵的下游侧沿着第二中心旁通管连续安装，第三液压泵向安装在 第三中心旁路管路，安装在第三液压泵的下游侧的回转控制阀，根据从外部输入的阀切换信号，将从第三液压泵排出的液压油供给回转马达， 以及连接在回转控制阀的输出端口和起重臂控制阀va的输入端口之间的吊杆汇合线 使得当第三液压泵排出的液压流体在动臂控制阀的方向改变时通过第三中心旁通管路连接在动臂控制阀的输入端口侧的液压流体。

公开(公告)号：US07687448B2

公开(公告)日：2010-03-30

申请号：US12564077

申请日：2009-09-22

Applicant: Jung-Dae Park ,  Pil-Kwon Jun ,  Myoung-Ok Han ,  Se-Yeon Kim ,  Kwang-Shin Lim ,  Tae-Hyo Choi ,  Seung-Ki Chae ,  Yang-Koo Lee

Inventor： Jung-Dae Park ,  Pil-Kwon Jun ,  Myoung-Ok Han ,  Se-Yeon Kim ,  Kwang-Shin Lim ,  Tae-Hyo Choi ,  Seung-Ki Chae ,  Yang-Koo Lee

IPC: C11D7/26 ,  C11D7/32 ,  C11D7/50

CPC classification number: C11D7/5013 ,  C11D7/263 ,  C11D7/266 ,  C11D7/3263 ,  C11D7/3272 ,  C11D7/3281 ,  C11D7/34 ,  C11D11/0047

Abstract: A composition for removing a photoresist includes about 5 to about 20 percent by weight of an alcoholamide compound, about 15 to about 60 percent by weight of a polar aprotic solvent, about 0.1 to about 6 percent by weight of an additive, and pure water. The alcoholamide compound is chemically structured as follows: where R1 is a hydroxyl group or a hydroxyalkyl group, and R2 is a hydrogen atom or a hydroxyalkyl group.

Abstract translation: 用于除去光致抗蚀剂的组合物包括约5至约20重量％的醇酰胺化合物，约15至约60重量％的极性非质子溶剂，约0.1至约6重量％的添加剂和纯水。 醇酰胺化合物的化学结构如下：其中R1是羟基或羟基烷基，R2是氢原子或羟烷基。

公开(公告)号：US20100043420A1

公开(公告)日：2010-02-25

申请号：US12545653

申请日：2009-08-21

Applicant: Toshimichi Ikeda ,  Yang Koo Lee

Inventor： Toshimichi Ikeda ,  Yang Koo Lee

IPC: F15B11/04

CPC classification number: E02F9/2239 ,  E02F9/2282 ,  E02F9/2292 ,  E02F9/2296 ,  F15B11/17 ,  F15B2211/20523 ,  F15B2211/20546 ,  F15B2211/20576 ,  F15B2211/2654 ,  F15B2211/2656 ,  F15B2211/3116 ,  F15B2211/324

Abstract: A hydraulic system for construction equipment is provided, which can increase the driving speed of a corresponding working device by making hydraulic fluid of a hydraulic pump, which is added to the hydraulic system having two hydraulic pumps in the construction equipment, join hydraulic fluid on the working device side, and can intercept the supply of hydraulic fluid from the working device side to a traveling apparatus side when the working device and the traveling apparatus are simultaneously manipulated.

Abstract translation: 提供了一种用于施工设备的液压系统，其可以通过将液压泵的液压油添加到具有在施工设备中的两个液压泵的液压系统中的液压流体连接在液压油上来提高相应工作装置的驱动速度 并且能够在同时操作工作装置和行进装置时截断从工作装置侧向行驶装置侧的液压油的供给。

公开(公告)号：US20090180086A1

公开(公告)日：2009-07-16

申请号：US12321102

申请日：2009-01-15

Applicant: Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

Inventor： Ju-A Ryu ,  Jeong-Heung Kong ,  Yang-Koo Lee ,  Hun-Hwan Ha ,  Yo-Han Ahn ,  Hweon Jin ,  Myung-Ki Lee

IPC: G03B27/52 ,  B08B3/04 ,  B08B3/12 ,  B08B7/00

CPC classification number: B08B1/007 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67028 ,  H01L21/67057

Abstract: The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.

Abstract translation: 本发明构思提供了一种基板处理装置和曝光装置，其中，卡盘构件，包括清除卡盘构件的基板装载表面上的异物的清洁工具的清洁构件和清洁清洁工具的工具清洁构件 在处理室内彼此相邻。 本发明构思还提供了一种使用工具清洁构件清洁清洁工具的方法。 根据上述装置和方法，可以防止由清洁工具污染卡盘构件，并且可以使在曝光过程中由卡盘构件上的颗粒引起的散焦现象最小化。