公开(公告)号：US6016766A

公开(公告)日：2000-01-25

申请号：US998945

申请日：1997-12-29

申请人： David R. Pirkle ,  John Daugherty ,  Michael Giarratano ,  C. Robert Koemtzopoulos ,  Felix Kozakevich

发明人： David R. Pirkle ,  John Daugherty ,  Michael Giarratano ,  C. Robert Koemtzopoulos ,  Felix Kozakevich

IPC分类号： C23C16/511 ,  H01J37/32 ,  C23C16/00

CPC分类号： H01J37/32192 ,  C23C16/511 ,  H01J37/32678

摘要： Ionizable gas supplied to an electron cyclotron resonance vacuum plasma processor chamber for semiconductor wafers is excited to a plasma state by microwave energy coupled to the chamber. The level of microwave power reflected from the chamber controls the level of microwave power derived from a source driving the ionizable gas in the chamber.

摘要翻译： 提供给用于半导体晶片的电子回旋共振真空等离子体处理器室的可离子化气体通过耦合到腔室的微波能量被激发到等离子体状态。 从腔室反射的微波功率的水平控制来自驱动腔室中的可电离气体的源的源的微波功率的水平。

公开(公告)号：US09623449B2

公开(公告)日：2017-04-18

申请号：US13442223

申请日：2012-04-09

申请人： Armen Avoyan ,  Hong Shih ,  Cliff LaCroix ,  John Daugherty

发明人： Armen Avoyan ,  Hong Shih ,  Cliff LaCroix ,  John Daugherty

IPC分类号： B08B3/02

CPC分类号： B08B3/024 ,  B08B3/022

摘要： A dielectric window cleaning apparatus may be used for cleaning a dielectric window of a plasma processing device. The dielectric window cleaning apparatus may comprise a window support base, a fluid containing enclosure, a window rotating mechanism, a spray arm, and multiple fluid spraying nozzles. The fluid containing enclosure may include at least one overflow containment sidewall and may be located at least partially under and at least partially around a portion of the window support base. The window rotating mechanism may be operatively connected to the window support base and may rotate the window support base. The spray arm may be in fluid communication with a fluid source and may include a fluid flow channel. The multiple fluid spraying nozzles may each expel fluid from the fluid flow channel in a window cleansing spray.

公开(公告)号：US08585844B2

公开(公告)日：2013-11-19

申请号：US13324287

申请日：2011-12-13

申请人： Hong Shih ,  Duane Outka ,  Shenjian Liu ,  John Daugherty

发明人： Hong Shih ,  Duane Outka ,  Shenjian Liu ,  John Daugherty

IPC分类号： B32B17/00

CPC分类号： H01J9/24 ,  H01J37/32467 ,  H01J37/32495 ,  Y10T29/4973

摘要： A method of installing a component of a plasma processing chamber by replacing a used component with a component made by forming a dual-layer green body and co-sintering the dual-layer green body so as to form a three-layer component. The three layer component comprises an outer layer of yttria, an intermediate layer of YAG, and a second outer layer of alumina. The component is installed such that the outer layer of yttria is exposed to the plasma environment when the chamber is in operation.

摘要翻译： 通过用通过形成双层生坯制成的部件代替使用的部件并共同烧结双层生坯以形成三层部件来安装等离子体处理室的部件的方法。 三层组件包括氧化钇的外层，YAG的中间层和氧化铝的第二外层。 安装该部件使得当腔室运行时，氧化钇的外层暴露于等离子体环境中。

公开(公告)号：US20130160948A1

公开(公告)日：2013-06-27

申请号：US13370765

申请日：2012-02-10

申请人： Hong Shih ,  Lin Xu ,  Rajinder Dhindsa ,  John Daugherty ,  Yan Fang ,  Siwen Li

发明人： Hong Shih ,  Lin Xu ,  Rajinder Dhindsa ,  John Daugherty ,  Yan Fang ,  Siwen Li

IPC分类号： B05C5/02 ,  C23C16/50

CPC分类号： C23C16/50 ,  C23C16/06 ,  C23C16/56

摘要： In one embodiment, a plasma processing device may include a plasma processing chamber, a plasma region, an energy source, and a corrosion resistant component. The plasma processing chamber can be maintained at a vacuum pressure and can confine a plasma processing gas. The energy source can transmit energy into the plasma processing chamber and transform at least a portion of the plasma processing gas into plasma within the plasma region. The corrosion resistant component can be located within the plasma processing chamber. The corrosion resistant component can be exposed to the plasma processing gas and is not coincident with the plasma region. The corrosion resistant component may include an inner layer of stainless steel that is coated with an outer layer of Tantalum (Ta).

摘要翻译： 在一个实施例中，等离子体处理装置可以包括等离子体处理室，等离子体区域，能量源和耐腐蚀部件。 等离子体处理室可以保持在真空压力并且可以限制等离子体处理气体。 能量源可以将能量传输到等离子体处理室中，并将至少一部分等离子体处理气体转化成等离子体区域内的等离子体。 耐腐蚀组分可位于等离子体处理室内。 耐腐蚀成分可暴露于等离子体处理气体中，与等离子体区域不一致。 耐腐蚀部件可以包括涂覆有钽（Ta）的外层的不锈钢内层。

公开(公告)号：US20130104938A1

公开(公告)日：2013-05-02

申请号：US13483597

申请日：2012-05-30

申请人： Armen Avoyan ,  Cliff La Croix ,  Hong Shih ,  John Daugherty

发明人： Armen Avoyan ,  Cliff La Croix ,  Hong Shih ,  John Daugherty

IPC分类号： B08B9/00

CPC分类号： H01J37/3288 ,  B08B3/04 ,  B08B3/08 ,  B08B9/0323 ,  B08B9/0328 ,  C23C16/4407 ,  H01J37/3244 ,  H01J37/32889

摘要： In one embodiment, a method for cleaning a showerhead electrode my include sealing a showerhead electrode within a cleaning assembly such that a first cleaning volume is formed on a first side of the showerhead electrode and a second cleaning volume is formed on a second side of the showerhead electrode. An acidic solution can be loaded into the first cleaning volume on the first side of the showerhead electrode. The first cleaning volume on the first side of the showerhead electrode can be pressurized such that at least a portion of the acidic solution flows through one or more of the plurality of gas passages of the showerhead electrode. An amount of purified water can be propelled through the second cleaning volume on the second side of the showerhead electrode, and into contact with the second side of the showerhead electrode.

摘要翻译： 在一个实施例中，一种用于清洁喷头电极的方法包括将喷头电极密封在清洁组件内，使得在喷头电极的第一侧上形成第一清洁体积，并且在第二侧面上形成第二清洁体积 喷头电极 酸性溶液可以装载到喷头电极的第一侧上的第一清洁体积中。 可以对喷头电极的第一侧上的第一清洁体积进行加压，使得至少一部分酸性溶液流过喷头电极的多个气体通道中的一个或多个。 净化水的量可以通过喷头电极第二侧上的第二清洁体积推进，并与喷头电极的第二侧接触。

公开(公告)号：US20130100278A1

公开(公告)日：2013-04-25

申请号：US13276837

申请日：2011-10-19

申请人： Josh Cormier ,  Fangli Hao ,  Hong Shih ,  Tuochuan Huang ,  John Daugherty ,  Allan Ronne ,  Fred Dennis Egley

发明人： Josh Cormier ,  Fangli Hao ,  Hong Shih ,  Tuochuan Huang ,  John Daugherty ,  Allan Ronne ,  Fred Dennis Egley

IPC分类号： H04N7/18

CPC分类号： G01N17/02 ,  C25D11/04 ,  G01N21/272 ,  G06T2200/28

摘要： An automated hydrogen bubble detection apparatus includes a horizontal support surface on which a test coupon can be supported, a transparent tube having an open top and an open bottom and operable to contain a test solution when positioned on a test coupon, a camera arranged to view a test solution in the transparent tube, and a controller in communication with the camera and effective to operate the camera such that at least one video segment is recorded by the camera and analyzed to detect first bubble and continuous bubble generation. A method of evaluating corrosion resistance of coatings on aluminum and steel in acidic solution is also included.

摘要翻译： 自动化氢气泡检测装置包括水平支撑表面，在该水平支撑表面上可以支撑试样，具有开口顶部和开口底部的透明管，并且可操作地在测试试样上放置测试溶液时，可以将相机布置成观察 在透明管中的测试解决方案，以及与相机通信并且有效地操作相机的控制器，使得至少一个视频段由相机记录并分析以检测第一个气泡和连续的气泡产生。 也包括评估铝和钢在酸性溶液中的涂层耐腐蚀性的方法。

公开(公告)号：US08022718B2

公开(公告)日：2011-09-20

申请号：US12392498

申请日：2009-02-25

申请人： Armen Avoyan ,  Hong Shih ,  John Daugherty

发明人： Armen Avoyan ,  Hong Shih ,  John Daugherty

IPC分类号： G01R31/20

CPC分类号： H01L21/6833 ,  H01L21/67069 ,  H01L21/67253

摘要： A method of inspecting an electrostatic chuck (ESC) is provided. The ESC has a dielectric support surface for a semiconductor wafer. The dielectric support surface is scanned with a Kelvin probe to obtain a surface potential map. The surface potential map is compared with a reference Kelvin probe surface potential map to determine if the ESC passes inspection.

摘要翻译： 提供了一种检查静电卡盘（ESC）的方法。 ESC具有用于半导体晶片的电介质支撑表面。 用开尔文探针扫描电介质支撑表面以获得表面电位图。 将表面电位图与参考开尔文探针表面电位图进行比较，以确定ESC是否通过检查。

公开(公告)号：USD268771S

公开(公告)日：1983-04-26

申请号：US169006

申请日：1980-07-15

申请人： John Daugherty

设计人： John Daugherty

公开(公告)号：US20120144640A1

公开(公告)日：2012-06-14

申请号：US13324287

申请日：2011-12-13

申请人： Hong Shih ,  Duane Outka ,  Shenjian Liu ,  John Daugherty

发明人： Hong Shih ,  Duane Outka ,  Shenjian Liu ,  John Daugherty

IPC分类号： B23P6/00

CPC分类号： H01J9/24 ,  H01J37/32467 ,  H01J37/32495 ,  Y10T29/4973

摘要： A method of installing a component of a plasma processing chamber by replacing a used component with a component made by forming a dual-layer green body and co-sintering the dual-layer green body so as to form a three-layer component. The three layer component comprises an outer layer of yttria, an intermediate layer of YAG, and a second outer layer of alumina. The component is installed such that the outer layer of yttria is exposed to the plasma environment when the chamber is in operation.

摘要翻译： 通过用通过形成双层生坯制成的部件代替使用的部件并共同烧结双层生坯以形成三层部件来安装等离子体处理室的部件的方法。 三层组件包括氧化钇的外层，YAG的中间层和氧化铝的第二外层。 安装该部件使得当腔室运行时，氧化钇的外层暴露于等离子体环境中。

公开(公告)号：US07578945B2

公开(公告)日：2009-08-25

申请号：US11582730

申请日：2006-10-17

申请人： Vahid Vahedi ,  John Daugherty ,  Harmeet Singh ,  Anthony Chen

发明人： Vahid Vahedi ,  John Daugherty ,  Harmeet Singh ,  Anthony Chen

IPC分类号： B44C1/22 ,  H01L21/00

CPC分类号： H01L21/32136 ,  C03C15/00 ,  C03C23/006 ,  H01J37/32623 ,  H01J37/32642

摘要： In a plasma processing system, a method of tuning of a set of plasma processing steps is disclosed. The method includes striking a first plasma comprising neutrals and ions in a plasma reactor of the plasma processing system. The method also includes etching in a first etching step a set of layers on a substrate; positioning a movable uniformity ring around the substrate, wherein a bottom surface of the uniformity ring is about the same height as a top surface of the substrate; and striking a second plasma consisting essentially of neutrals in the plasma reactor of the plasma processing system. The method further includes etching in a second etching step the set of layers on the substrate; and wherein the etching in the first step and the etching in the second step are substantially uniform.

摘要翻译： 在等离子体处理系统中，公开了一组等离子体处理步骤的调谐方法。 该方法包括在等离子体处理系统的等离子体反应器中击打包含中性粒子和离子的第一等离子体。 该方法还包括在第一蚀刻步骤中蚀刻在衬底上的一组层; 将可移动均匀环定位在基底周围，其中均匀环的底表面与基底的顶表面大致相同的高度; 并且在等离子体处理系统的等离子体反应器中击打基本上由中性体组成的第二等离子体。 该方法还包括在第二蚀刻步骤中蚀刻在衬底上的一组层; 并且其中第一步骤中的蚀刻和第二步骤中的蚀刻基本上是均匀的。