公开(公告)号：US20060119815A1

公开(公告)日：2006-06-08

申请号：US11005231

申请日：2004-12-07

申请人： Dominicus Jacobus Franken ,  Arno Bleeker ,  Wilhelmus Box ,  Martinus Hendricus Hoeks ,  Henricus Tegenbosch ,  Kars Troost ,  Lambertus Kessels

发明人： Dominicus Jacobus Franken ,  Arno Bleeker ,  Wilhelmus Box ,  Martinus Hendricus Hoeks ,  Henricus Tegenbosch ,  Kars Troost ,  Lambertus Kessels

IPC分类号： G03B27/42

CPC分类号： G03F7/70875 ,  G03F7/70291

摘要： A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.

摘要翻译： 使用系统和方法来补偿单独可控元件阵列的热输出。 这可以通过在不使用阵列投影光束来控制阵列的温度时将控制信号输入到阵列来完成。 可以提供加热元件以保持阵列的温度。 可以提供热储存器以保持阵列的温度或者可以提供冷却元件以在使用期间降低阵列的温度。

公开(公告)号：US20060187428A1

公开(公告)日：2006-08-24

申请号：US11061754

申请日：2005-02-18

申请人： Arno Bleeker ,  Dominicus Adrianus Franken ,  Martinus Hendricus Hoeks ,  Lambertus Kessels ,  Tobrjorn Sandstrom

发明人： Arno Bleeker ,  Dominicus Adrianus Franken ,  Martinus Hendricus Hoeks ,  Lambertus Kessels ,  Tobrjorn Sandstrom

IPC分类号： G03B27/42

CPC分类号： G03F7/70291 ,  G03F7/70833 ,  G03F7/70875

摘要： A lithographic apparatus provided with an array of individually controllable elements that is detachably mounted to mounting points on a support frame of the lithographic apparatus.

摘要翻译： 一种光刻设备，其设置有独立可控元件的阵列，其可拆卸地安装到光刻设备的支撑框架上的安装点。

公开(公告)号：US20060209313A1

公开(公告)日：2006-09-21

申请号：US11084866

申请日：2005-03-21

申请人： Theodorus Van Den Akker ,  Martinus Hendricus Hoeks ,  Pieter De Jager ,  Lambertus Kessels ,  Marco Martinus Van Hassel ,  Frank Morselt

发明人： Theodorus Van Den Akker ,  Martinus Hendricus Hoeks ,  Pieter De Jager ,  Lambertus Kessels ,  Marco Martinus Van Hassel ,  Frank Morselt

IPC分类号： G06F3/12

CPC分类号： G03F7/70291 ,  G03F7/70508

摘要： A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method comprises generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.

摘要翻译： 用于对被配置为赋予光束的图案的独立可控元件的阵列的编程的方法和装置。 例如，该方法可适用于光刻设备。 该方法包括产生表示第一图案的第一数据，产生表示第二图案的第二数据，将第一数据写入第一缓冲器，以及从第一缓冲器读取第一数据以对独立可控元件阵列进行编程以显示第一图案 同时将第二数据并行地写入第二缓冲器。

公开(公告)号：US20060285094A1

公开(公告)日：2006-12-21

申请号：US11152849

申请日：2005-06-15

申请人： Martinus Reijnen ,  Andrej Makarovic ,  Lambertus Kessels ,  Stoyan Nihtianov ,  Petrus Wilhelmus Kemper ,  Kamen Chilov

发明人： Martinus Reijnen ,  Andrej Makarovic ,  Lambertus Kessels ,  Stoyan Nihtianov ,  Petrus Wilhelmus Kemper ,  Kamen Chilov

IPC分类号： G03B27/42

CPC分类号： G03F7/70291

摘要： The present invention comprises a lithographic apparatus and device manufacturing method method that uses a patterning device that increase a number of individually controllable elements that are programmed simultaneously to increase an update rate of an array of individually controllable elements. A number of required high speed analog inputs to the array is reduced. The complexity of the array is reduced and the maximum update speed of the array is increased. Furthermore, the number of elements within an array can be readily expanded. The patterning device can be divided into a plurality of groups of cells and the lithographic apparatus can comprise a plurality of supply channels. Each supply channel can be arranged to provide a voltage signal to each cell in a respective group of cells. This can reduce the number of required inputs to the patterning device for individually addressing each cell.

摘要翻译： 本发明包括光刻设备和器件制造方法，其使用图案化装置，其增加同时编程的单独可控元件的数量，以增加单独可控元件阵列的更新速率。 降低了阵列所需的高速模拟输入的数量。 减少阵列的复杂性，并增加阵列的最大更新速度。 此外，阵列中的元素的数量可以容易地扩展。 图案形成装置可以分成多组单元，并且光刻设备可以包括多个供应通道。 每个供应通道可以被布置成向相应的单元组中的每个单元提供电压信号。 这可以减少用于单独寻址每个单元的图案形成装置的所需输入的数量。

公开(公告)号：US20070045572A1

公开(公告)日：2007-03-01

申请号：US11214055

申请日：2005-08-30

申请人： Lambertus Kessels ,  Patricius Tinnemans ,  Remco Van Engelen

发明人： Lambertus Kessels ,  Patricius Tinnemans ,  Remco Van Engelen

IPC分类号： G21K5/10

CPC分类号： G03F7/70291 ,  G03F7/70508

摘要： A lithographic apparatus comprises an array of individually controllable elements that modulate a beam of radiation, a compressed-pattern memory that stores a compressed representation of a requested dose pattern to be formed on a substrate by the modulated beam, and a dictionary decompressor that at least partially decompress the compressed representation. The dictionary decompressor comprises an external dictionary memory, a first dictionary decoder that at least partially decompress at least a part of the compressed representation by extracting, from the external dictionary memory, portions of pattern data corresponding to references to the external dictionary memory contained in the compressed representation, and a second dictionary decoder having an internal dictionary memory, the second dictionary decoder that at least partially decompress at least a part of the compressed representation by extracting, from the internal dictionary memory, portions of pattern data corresponding to references to the internal dictionary memory contained in compressed representation.

摘要翻译： 光刻设备包括调制辐射束的单独可控元件的阵列，压缩图案存储器，其通过调制束存储要在衬底上形成的所请求的剂量图案的压缩表示;以及字典解压缩器，至少 部分解压缩压缩表示。 字典解压缩器包括外部字典存储器，第一字典解码器，其通过从外部字典存储器提取与包含在外部字典存储器中的外部字典存储器的引用相对应的模式数据的至少部分来解压缩压缩表示的至少一部分 压缩表示和具有内部字典存储器的第二字典解码器，所述第二字典解码器通过从内部字典存储器提取对应于对内部的引用的图案数据的部分来至少部分地解压缩压缩表示的至少一部分 包含在压缩表示中的字典存储器。

公开(公告)号：US20060269116A1

公开(公告)日：2006-11-30

申请号：US11140559

申请日：2005-05-31

申请人： Andrej Makarovic ,  Willem Venema ,  Lambertus Kessels ,  Marcel Bontekoe

发明人： Andrej Makarovic ,  Willem Venema ,  Lambertus Kessels ,  Marcel Bontekoe

IPC分类号： G06K9/00

CPC分类号： G03F7/70291 ,  G03F7/70508 ,  G03F7/70558

摘要： A lithographic apparatus comprises an array of individually controllable elements and a data processing pipeline. The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation. The storage device stores the intermediate representation. The online rasterizer accesses the stored intermediate representation and produces therefrom a stream of bitmap data to be used to generate the sequence of control data substantially in real time.

公开(公告)号：US20060139980A1

公开(公告)日：2006-06-29

申请号：US11020643

申请日：2004-12-27

申请人： Marcel Bontekoe ,  Patricius Tinnemans ,  Lambertus Kessels ,  Marco Cornelis Van Hassel ,  Wouter Mulckhuyse

发明人： Marcel Bontekoe ,  Patricius Tinnemans ,  Lambertus Kessels ,  Marco Cornelis Van Hassel ,  Wouter Mulckhuyse

IPC分类号： G11C19/08

CPC分类号： G03F7/70291 ,  G03F7/70283 ,  G03F7/70508

摘要： A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.

摘要翻译： 一种光刻设备，包括投影系统，该投影系统被配置为将辐射束投影为辐射子束阵列和被配置成调制辐射子束的独立可控元件的阵列，以在衬底上形成所请求的剂量图案。 所要求的剂量模式随着时间的推移从局部暴露的阵列中建立起来，其中至少相邻的局部曝光在基本上不同的时间成像，并且其中每个局部曝光由辐射的子束之一产生。 光刻设备还包括光栅化器装置，其被设置为将定义所请求的剂量图案的数据转换成在图案内的相应的点序列处表示所请求的剂量的数据序列，以及数据操纵装置，被配置为接收数据序列， 构成适于控制单独可控元件阵列的控制信号。