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23 条记录 (耗时 0.017 秒)

    Polishing apparatus
    1.
    发明授权
    Polishing apparatus 有权

    公开(公告)号：US11839948B2

    公开(公告)日：2023-12-12

    申请号：US16692092

    申请日：2019-11-22

    申请人： EBARA CORPORATION

    发明人： Takashi Yamazaki ,  Itsuki Kobata ,  Ryuichi Kosuge ,  Tadakazu Sone

    IPC分类号： B24B57/02 ,  B24B37/34 ,  B24B37/005 ,  B24B37/10

    CPC分类号： B24B57/02 ,  B24B37/005 ,  B24B37/10 ,  B24B37/34

    摘要： A polishing apparatus capable of increasing an added value is disclosed. The polishing apparatus includes a polishing table configured to support a polishing pad, a top ring configured to press a substrate against the polishing pad, and a liquid supply mechanism configured to supply a liquid onto the polishing pad. The liquid supply mechanism includes a nozzle arm configured to be movable in a radial direction of the polishing table, and a liquid ejection nozzle attached to the nozzle arm. The liquid ejection nozzle is a fan-shaped nozzle having a liquid throttle surface having a tapered shape.

    POLISHING APPARATUS AND WEAR DETECTION METHOD
    4.
    发明申请
    POLISHING APPARATUS AND WEAR DETECTION METHOD 有权
    抛光装置和磨损检测方法

    公开(公告)号：US20140295737A1

    公开(公告)日：2014-10-02

    申请号：US14228424

    申请日：2014-03-28

    申请人： Ebara Corporation

    发明人： Ryuichi Kosuge ,  Tadakazu Sone

    IPC分类号： B24B37/005 ,  B24B49/00 ,  B24B53/017

    CPC分类号： H01L22/26 ,  B24B37/005 ,  B24B49/00 ,  B24B53/017 ,  H01L21/30625 ,  H01L21/67075

    摘要： There is provided a polishing apparatus capable of detecting uneven wear occurring on a polishing pad and detecting an appropriate replacement timing of the polishing pad. The polishing apparatus detects, every predetermined time, a value of rotation speed or a value of rotation torque of a table drive shaft for rotationally driving a polishing table or a dresser drive shaft for driving a dresser, or a value of swing torque of a dresser swing shaft for driving the dresser; calculates a change quantity thereof based on the value of the detected rotation speed, the value of the detected rotation torque, or the value of the detected swing torque; determines whether or not the change quantity exceeds a predetermined value; and notifies a user of a warning when a determination is made that the change quantity exceeds the predetermined value.

    摘要翻译： 提供了一种能够检测在抛光垫上发生的不均匀磨损并检测抛光垫的适当替换定时的抛光装置。 抛光装置每隔预定时间检测用于旋转驱动抛光台或用于驱动修整器的修整器驱动轴的转台驱动轴的转速值或转矩值，或修整器的摆动扭矩值 用于驱动梳妆台的摆动轴; 基于检测到的转速的值，检测到的旋转转矩的值或检测到的摆动转矩的值来计算其变化量; 确定变化量是否超过预定值; 并且当确定变化量超过预定值时，通知用户警告。

    Substrate processing apparatus and substrate presence or absence checking method and program
    6.
    发明授权
    Substrate processing apparatus and substrate presence or absence checking method and program 有权

    公开(公告)号：US10157762B2

    公开(公告)日：2018-12-18

    申请号：US15475860

    申请日：2017-03-31

    申请人： EBARA CORPORATION

    发明人： Tomohiro Tanaka ,  Kenichiro Saito ,  Koichi Takeda ,  Masumi Nishijima ,  Ryuichi Kosuge

    IPC分类号： H01L21/67 ,  H01L21/687

    摘要： A substrate processing apparatus includes transport mechanisms 121a to 127a, a sensor 40 for detecting whether a wafer W is held by the transport mechanisms 121a to 127a, a sensor controller 82 for controlling the sensor 40, a position information acquiring part 81 for acquiring position information of the substrate W in the transport passage, a detection result acquiring part 83 for acquiring a detection result from the sensor 40, and a determination processor 84 for determining whether the detection result of the sensor and the position information are consistent with each other. When it is determined that the detection result of the sensor 40 is inconsistent with the position information, the sensor controller 82 makes the sensor 40 retry to detect whether the substrate W is held.

    Polishing apparatus and wear detection method
    8.
    发明授权
    Polishing apparatus and wear detection method 有权

    公开(公告)号：US09530704B2

    公开(公告)日：2016-12-27

    申请号：US14836518

    申请日：2015-08-26

    申请人： Ebara Corporation

    发明人： Ryuichi Kosuge ,  Tadakazu Sone

    IPC分类号： B24B37/00 ,  H01L21/66 ,  B24B37/005 ,  B24B53/017 ,  B24B49/00 ,  H01L21/306 ,  H01L21/67

    CPC分类号： H01L22/26 ,  B24B37/005 ,  B24B49/00 ,  B24B53/017 ,  H01L21/30625 ,  H01L21/67075

    摘要： There is provided a polishing apparatus capable of detecting uneven wear occurring on a polishing pad and detecting an appropriate replacement timing of the polishing pad. The polishing apparatus detects, every predetermined time, a value of rotation speed or a value of rotation torque of a table drive shaft for rotationally driving a polishing table or a dresser drive shaft for driving a dresser, or a value of swing torque of a dresser swing shaft for driving the dresser; calculates a change quantity thereof based on the value of the detected rotation speed, the value of the detected rotation torque, or the value of the detected swing torque; determines whether or not the change quantity exceeds a predetermined value; and notifies a user of a warning when a determination is made that the change quantity exceeds the predetermined value.

    Polishing apparatus
    9.
    发明授权
    Polishing apparatus 有权
    抛光设备

    公开(公告)号：US09522453B2

    公开(公告)日：2016-12-20

    申请号：US14792062

    申请日：2015-07-06

    申请人： EBARA CORPORATION

    发明人： Hideo Aizawa ,  Masao Umemoto ,  Tadakazu Sone ,  Ryuichi Kosuge

    IPC分类号： B24B37/015 ,  B24B37/10 ,  B24B37/04

    CPC分类号： B24B37/015 ,  B24B37/04 ,  B24B37/107

    摘要： A polishing apparatus which can continue stable operation of the apparatus without generating torsional vibration in a rotary joint and without generating an abnormal sound at an engagement part between a cooling water pipe and a polishing table is disclosed. The polishing apparatus includes a rotary joint fixed to a rotating part of the polishing table or a rotating part of the top ring to supply a fluid into the polishing table or the top ring and discharge the fluid from the polishing table or the top ring, and a rotation-prevention mechanism which connects the rotary joint with an apparatus frame to prevent the rotary joint from being rotated. The rotation-prevention mechanism includes a link mechanism having at least one spherical plain bearing.

    摘要翻译： 公开了一种可以在不在旋转接头中产生扭转振动并且在冷却水管和抛光台之间的接合部分处不产生异常声音的情况下继续稳定操作设备的抛光装置。 抛光装置包括固定到抛光台的旋转部分或顶环的旋转部分的旋转接头，以将流体供应到抛光台或顶环中并从抛光台或顶环排出流体，以及 旋转防止机构，其将旋转接头与装置框架连接以防止旋转接头旋转。 旋转防止机构包括具有至少一个球面滑动轴承的连杆机构。

    POLISHING APPARATUS AND WEAR DETECTION METHOD
    10.
    发明申请
    POLISHING APPARATUS AND WEAR DETECTION METHOD 审中-公开
    抛光装置和磨损检测方法

    公开(公告)号：US20150364391A1

    公开(公告)日：2015-12-17

    申请号：US14836518

    申请日：2015-08-26

    申请人： Ebara Corporation

    发明人： Ryuichi Kosuge ,  Tadakazu Sone

    IPC分类号： H01L21/66 ,  H01L21/67 ,  B24B49/00 ,  H01L21/306 ,  B24B53/017 ,  B24B37/005

    CPC分类号： H01L22/26 ,  B24B37/005 ,  B24B49/00 ,  B24B53/017 ,  H01L21/30625 ,  H01L21/67075

    摘要： There is provided a polishing apparatus capable of detecting uneven wear occurring on a polishing pad and detecting an appropriate replacement timing of the polishing pad. The polishing apparatus detects, every predetermined time, a value of rotation speed or a value of rotation torque of a table drive shaft for rotationally driving a polishing table or a dresser drive shaft for driving a dresser, or a value of swing torque of a dresser swing shaft for driving the dresser; calculates a change quantity thereof based on the value of the detected rotation speed, the value of the detected rotation torque, or the value of the detected swing torque; determines whether or not the change quantity exceeds a predetermined value; and notifies a user of a warning when a determination is made that the change quantity exceeds the predetermined value.

    摘要翻译： 提供了一种能够检测在抛光垫上发生的不均匀磨损并检测抛光垫的适当替换定时的抛光装置。 抛光装置每隔预定时间检测用于旋转驱动抛光台或用于驱动修整器的修整器驱动轴的转台驱动轴的转速值或转矩值，或修整器的摆动扭矩值 用于驱动梳妆台的摆动轴; 基于检测到的转速的值，检测到的旋转转矩的值或检测到的摆动转矩的值来计算其变化量; 确定变化量是否超过预定值; 并且当确定变化量超过预定值时，通知用户警告。