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公开(公告)号：US11839948B2
公开(公告)日：2023-12-12
申请号：US16692092
申请日：2019-11-22
申请人： EBARA CORPORATION
发明人： Takashi Yamazaki , Itsuki Kobata , Ryuichi Kosuge , Tadakazu Sone
IPC分类号： B24B57/02 , B24B37/34 , B24B37/005 , B24B37/10
CPC分类号： B24B57/02 , B24B37/005 , B24B37/10 , B24B37/34
摘要： A polishing apparatus capable of increasing an added value is disclosed. The polishing apparatus includes a polishing table configured to support a polishing pad, a top ring configured to press a substrate against the polishing pad, and a liquid supply mechanism configured to supply a liquid onto the polishing pad. The liquid supply mechanism includes a nozzle arm configured to be movable in a radial direction of the polishing table, and a liquid ejection nozzle attached to the nozzle arm. The liquid ejection nozzle is a fan-shaped nozzle having a liquid throttle surface having a tapered shape.
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公开(公告)号：US09216442B2
公开(公告)日：2015-12-22
申请号：US13789733
申请日：2013-03-08
申请人： EBARA CORPORATION
发明人： Hideo Aizawa , Tadakazu Sone , Masao Umemoto
CPC分类号： B08B3/14 , B01D19/0057 , B04C2003/006 , B24B57/02
摘要： A gas-liquid separator separates gas-liquid two-phase flow into a gas and a liquid. The gas-liquid separator includes: a container having a bottom and a side portion, the bottom having a liquid discharge outlet and the side portion having a gas discharge outlet; a gas-liquid introduction pipe for introducing a gas-liquid two-phase flow into the container, the gas-liquid introduction pipe extending downward from above the container and having a lower end located in an interior of the container, the gas discharge outlet of the container being located above the lower end of the gas-liquid introduction pipe; and a guide device disposed in the gas-liquid introduction pipe and configured so as to impart a swirling motion to the gas-liquid two-phase flow in the gas-liquid introduction pipe.
摘要翻译： 气液分离器将气液两相流分离成气体和液体。 气液分离器包括：具有底部和侧部的容器，底部具有液体排出口，侧部具有气体排出口; 用于将气液两相流引入容器的气液引入管，气液导入管从容器的上方向下方延伸，下端位于容器的内部，气体排出口 所述容器位于所述气液导入管的下端的上方; 以及引导装置，其设置在所述气液导入管中，并且构成为对所述气液导入管内的气液二相流赋予旋转运动。
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公开(公告)号：US20140295737A1
公开(公告)日：2014-10-02
申请号：US14228424
申请日：2014-03-28
申请人： Ebara Corporation
发明人： Ryuichi Kosuge , Tadakazu Sone
IPC分类号： B24B37/005 , B24B49/00 , B24B53/017
CPC分类号： H01L22/26 , B24B37/005 , B24B49/00 , B24B53/017 , H01L21/30625 , H01L21/67075
摘要： There is provided a polishing apparatus capable of detecting uneven wear occurring on a polishing pad and detecting an appropriate replacement timing of the polishing pad. The polishing apparatus detects, every predetermined time, a value of rotation speed or a value of rotation torque of a table drive shaft for rotationally driving a polishing table or a dresser drive shaft for driving a dresser, or a value of swing torque of a dresser swing shaft for driving the dresser; calculates a change quantity thereof based on the value of the detected rotation speed, the value of the detected rotation torque, or the value of the detected swing torque; determines whether or not the change quantity exceeds a predetermined value; and notifies a user of a warning when a determination is made that the change quantity exceeds the predetermined value.
摘要翻译： 提供了一种能够检测在抛光垫上发生的不均匀磨损并检测抛光垫的适当替换定时的抛光装置。 抛光装置每隔预定时间检测用于旋转驱动抛光台或用于驱动修整器的修整器驱动轴的转台驱动轴的转速值或转矩值，或修整器的摆动扭矩值 用于驱动梳妆台的摆动轴; 基于检测到的转速的值，检测到的旋转转矩的值或检测到的摆动转矩的值来计算其变化量; 确定变化量是否超过预定值; 并且当确定变化量超过预定值时，通知用户警告。
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公开(公告)号：US11980998B2
公开(公告)日：2024-05-14
申请号：US16796903
申请日：2020-02-20
申请人： EBARA CORPORATION
发明人： Itsuki Kobata , Takashi Yamazaki , Ryuichi Kosuge , Tadakazu Sone
CPC分类号： B24B57/02 , B24B37/005 , B24B37/34 , B24B55/02 , B24D13/147 , B24D13/20
摘要： An operation control unit includes a storage device storing a program which includes commands of: obtaining a correlation between a supply position of the polishing liquid in the radial direction of the polishing pad using the liquid injection nozzle and an average polishing rate of the substrate and an distribution of the polishing rate within the substrate; determining a movable range of the liquid injection nozzle according to a predetermined range of an allowable average polishing rate and the correlation between the supply position of the polishing liquid and the average polishing rate; determining an optimal supply position of the polishing liquid from the correlation between the supply position of the polishing liquid and the distribution of the polishing rate within the substrate within the determined movable range of the liquid injection nozzle; and moving the liquid injection nozzle to the determined supply position to polish the substrate.
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公开(公告)号：US10730162B2
公开(公告)日：2020-08-04
申请号：US15638501
申请日：2017-06-30
申请人： Ebara Corporation
发明人： Hiroshi Sotozaki , Kenichiro Saito , Tadakazu Sone
IPC分类号： B32B43/00 , B24B37/30 , H01L21/304 , H01L21/02
摘要： Disclosed is a turntable cloth peeling jig including: a cylindrical winding cylinder including a slit formed on an outer periphery of the cylindrical winding cylinder and extending in an axial direction thereof; a cloth clamping member disposed inside the winding cylinder and configured to clamp an outer peripheral edge of a cloth inserted into the slit; an extension bar attached to one end portion of the winding cylinder so as to extend coaxially therewith; an engaging portion provided at a tip end portion of the extension bar and engaged with a rotation jig configured to rotate the winding cylinder; and a handle provided in the engaging portion and configured to support the winding cylinder when rotating the rotating jig.
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公开(公告)号：US09764446B2
公开(公告)日：2017-09-19
申请号：US14682477
申请日：2015-04-09
申请人： EBARA CORPORATION
发明人： Hideo Aizawa , Tadakazu Sone , Masao Umemoto , Ryuichi Kosuge
CPC分类号： B24B57/02 , B24B37/10 , B24B37/107
摘要： The invention suppresses generation of noises attributable to rotation of a rotary joint. A rotary joint includes a rotating body that rotates on a rotating axis A, a housing disposed so as to surround the rotating body, and at least one bearing disposed between the rotating body and the housing and adapted to support rotation of the rotating body. The rotary joint supplies fluids through fluid connection ports formed in the housing and fluid passages formed inside the rotating body to a polishing table having attached thereto a polishing pad for polishing a substrate or a holding portion that is adapted to hold the substrate while pressing the substrate against the polishing pad. At least one elastic member is interposed at least either between the rotating body and the at least one bearing or between the housing and the at least one bearing.
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公开(公告)号：US09144878B2
公开(公告)日：2015-09-29
申请号：US14228424
申请日：2014-03-28
申请人： Ebara Corporation
发明人： Ryuichi Kosuge , Tadakazu Sone
IPC分类号： B24B49/00 , B24B37/005 , B24B53/017
CPC分类号： H01L22/26 , B24B37/005 , B24B49/00 , B24B53/017 , H01L21/30625 , H01L21/67075
摘要： There is provided a polishing apparatus capable of detecting uneven wear occurring on a polishing pad and detecting an appropriate replacement timing of the polishing pad. The polishing apparatus detects, every predetermined time, a value of rotation speed or a value of rotation torque of a table drive shaft for rotationally driving a polishing table or a dresser drive shaft for driving a dresser, or a value of swing torque of a dresser swing shaft for driving the dresser; calculates a change quantity thereof based on the value of the detected rotation speed, the value of the detected rotation torque, or the value of the detected swing torque; determines whether or not the change quantity exceeds a predetermined value; and notifies a user of a warning when a determination is made that the change quantity exceeds the predetermined value.
摘要翻译： 提供了一种能够检测在抛光垫上发生的不均匀磨损并检测抛光垫的适当替换定时的抛光装置。 抛光装置每隔预定时间检测用于旋转驱动研磨台或用于驱动修整器的修整器驱动轴的转台驱动轴的转速值或转矩值，或修整器的摆动扭矩值 用于驱动梳妆台的摆动轴; 基于检测到的转速的值，检测到的旋转转矩的值或检测到的摆动转矩的值来计算其变化量; 确定变化量是否超过预定值; 并且当确定变化量超过预定值时，通知用户警告。
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公开(公告)号：US11465256B2
公开(公告)日：2022-10-11
申请号：US16533018
申请日：2019-08-06
申请人： EBARA CORPORATION
发明人： Hiroshi Sotozaki , Pohan Chen , Tadakazu Sone
IPC分类号： B24B53/017
摘要： There is provided an apparatus for polishing an object to be polished using a polishing pad having a polishing surface, the apparatus including a polishing table for supporting the polishing pad, the polishing table being configured to be rotatable, a substrate holding unit configured to hold the object to be polished and pressing the object to be polished against the polishing pad, and a polishing-liquid removing unit configured to remove polishing liquid from the polishing surface. The polishing-liquid removing unit includes a rinse unit configured to jet cleaning liquid onto the polishing surface and a sucking unit configured to suck the polishing liquid on the polishing surface onto which the cleaning liquid is jetted. The rinse unit includes a cleaning space surrounded by a sidewall. The sidewall includes an opening section for opening the cleaning space toward a radial direction outer side of the polishing table.
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公开(公告)号：US20200171621A1
公开(公告)日：2020-06-04
申请号：US16692092
申请日：2019-11-22
申请人： EBARA CORPORATION
发明人： Takashi Yamazaki , Itsuki Kobata , Ryuichi Kosuge , Tadakazu Sone
IPC分类号： B24B57/02 , B24B37/34 , B24B37/005 , B24B37/10
摘要： A polishing apparatus capable of increasing an added value is disclosed. The polishing apparatus includes a polishing table configured to support a polishing pad, a top ring configured to press a substrate against the polishing pad, and a liquid supply mechanism configured to supply a liquid onto the polishing pad. The liquid supply mechanism includes a nozzle arm configured to be movable in a radial direction of the polishing table, and a liquid ejection nozzle attached to the nozzle arm. The liquid ejection nozzle is a fan-shaped nozzle having a liquid throttle surface having a tapered shape.
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公开(公告)号：US20180009081A1
公开(公告)日：2018-01-11
申请号：US15638501
申请日：2017-06-30
申请人： Ebara Corporation
发明人： Hiroshi Sotozaki , Kenichiro Saito , Tadakazu Sone
IPC分类号： B24B37/30 , H01L21/02 , H01L21/304
摘要： Disclosed is a turntable cloth peeling jig including: a cylindrical winding cylinder including a slit formed on an outer periphery of the cylindrical winding cylinder and extending in an axial direction thereof; a cloth clamping member disposed inside the winding cylinder and configured to clamp an outer peripheral edge of a cloth inserted into the slit; an extension bar attached to one end portion of the winding cylinder so as to extend coaxially therewith; an engaging portion provided at a tip end portion of the extension bar and engaged with a rotation jig configured to rotate the winding cylinder; and a handle provided in the engaging portion and configured to support the winding cylinder when rotating the rotating jig.
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