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    Method for reticle inspection using aerial imaging
    2.
    发明授权
    Method for reticle inspection using aerial imaging 有权
    使用空中成像进行掩模版检查的方法

    公开(公告)号：US06268093B1

    公开(公告)日：2001-07-31

    申请号：US09417518

    申请日：1999-10-13

    申请人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

    发明人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

    IPC分类号： G03F900

    CPC分类号： G03F7/701 ,  G03F1/84 ,  G03F7/70125 ,  G03F7/70616 ,  G03F7/70633

    摘要： A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.

    摘要翻译： 可以使用用于检查掩模版的掩模版检查系统作为进入的检查工具，以及作为周期性和预曝光检查工具。 面具店可以将其用作与客户兼容的检测工具，也可以作为可打印的错误检测工具。 本发明系统检测出两种缺陷：（1）打印图像中的线宽错误; （2）表面缺陷。 在模具区域上检测线宽错误。 通过在与曝光条件（即波长，数值孔径，西格玛和照明孔径类型）相同的光学条件下获取掩模版的图像，并且通过比较多个管芯以发现线宽中的误差来执行检测。 在掩模版上遍历表面缺陷。 通过获取掩模版的透射和暗场反射图像并使用组合信息来检测颗粒和其它表面缺陷来执行表面缺陷的检测。

    Apparatus and method for automatic optical inspection
    6.
    发明授权
    Apparatus and method for automatic optical inspection 有权
    自动光学检测装置及方法

    公开(公告)号：US07394531B2

    公开(公告)日：2008-07-01

    申请号：US11554280

    申请日：2006-10-30

    申请人： Ehud Tirosh ,  Boaz Kenan

    发明人： Ehud Tirosh ,  Boaz Kenan

    IPC分类号： G01N21/00

    CPC分类号： G01N21/8903

    摘要： An automated optical inspection system, comprising at least one camera having a field of view; and at least one image scanning module comprising a plurality of objective modules arranged to have fields of view covering a portion of an article during inspection, and an image selection mirror mechanism, such as a pentaprism movable to sequentially select and transfer images of the fields of view from the objective modules to the at least one camera, and a beam splitter operative to simultaneously direct illumination from at least one illumination source to a portion of the article and to direct an image of the portion of the article to at least one camera, wherein the beam splitter is operative to pivot about at least one axis, thereby to create motion of the image of the article within the field of view of the camera. The objective modules may be arranged in a pair of back-to-back arcs each served by and partially encircling its own optical head. The image selection mirror mechanism may be rotated by a rotating shaft having a driving end, the mechanism being disposed between the shaft's driving end, and the article.

    摘要翻译： 一种自动光学检查系统，包括至少一个具有视场的照相机; 以及至少一个图像扫描模块，包括多个目标模块，所述多个目标模块布置成在检查期间具有覆盖物品的一部分的视场;以及图像选择镜机构，例如五棱镜，其可移动以顺序地选择和传送 从目标模块到至少一个相机的视图，以及分束器，其可操作以同时将来自至少一个照明源的照明引导到制品的一部分并将该部分的图像引导至至少一个照相机， 其中所述分束器可操作以围绕至少一个轴线枢转，由此在所述照相机的视场内产生所述物品的图像的运动。 目标模块可以布置成一对背对背弧，每个弧由每个由其自身的光学头部供能并部分地环绕。 图像选择镜机构可以通过具有驱动端的旋转轴旋转，该机构设置在轴的驱动端与制品之间。

    Method and apparatus for reticle inspection using aerial imaging
    7.
    发明授权
    Method and apparatus for reticle inspection using aerial imaging 有权
    使用航空成像进行掩模版检查的方法和装置

    公开(公告)号：US07133548B2

    公开(公告)日：2006-11-07

    申请号：US09851779

    申请日：2001-05-08

    申请人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

    发明人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

    IPC分类号： G06K9/00

    CPC分类号： G03F7/701 ,  G03F1/84 ,  G03F7/70125 ,  G03F7/70616 ,  G03F7/70633

    摘要： A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.

    摘要翻译： 可以使用用于检查掩模版的掩模版检查系统作为进入的检查工具，以及作为周期性和预曝光检查工具。 面具店可以将其用作与客户兼容的检测工具，并可作为可打印的错误检测工具。 本发明系统检测出两种缺陷：（1）打印图像中的线宽错误; （2）表面缺陷。 在模具区域上检测线宽错误。 通过在与曝光条件（即波长，数值孔径，西格玛和照明孔径类型）相同的光学条件下获取掩模版的图像，并且通过比较多个管芯以发现线宽中的误差来执行检测。 在掩模版上遍历表面缺陷。 通过获取掩模版的透射和暗场反射图像并使用组合信息来检测颗粒和其它表面缺陷来执行表面缺陷的检测。