公开(公告)号：US5939852A

公开(公告)日：1999-08-17

申请号：US919480

申请日：1997-08-28

申请人： Kotaro Akutsu ,  Eiji Osanai ,  Hirohito Ito

发明人： Kotaro Akutsu ,  Eiji Osanai ,  Hirohito Ito

IPC分类号： H01L21/027 ,  B23Q1/62 ,  B23Q5/28 ,  B23Q11/00 ,  G03F7/20 ,  G05B19/23 ,  G05B5/01 ,  G05B19/18

CPC分类号： G03F7/70716 ,  B23Q1/621 ,  B23Q11/0032 ,  B23Q5/28 ,  G03F7/709 ,  G05B19/232 ,  G05B2219/37275 ,  G05B2219/49275 ,  G05B2219/49276

摘要： A stage feeding device has a movable guide which is guided on a reference surface of a platen to be movable in the Y-direction, a Y-linear motor for moving the movable guide in the Y-direction, a movable stage which is supported by the movable guide to be movable in the X-direction, and carries an object, and an X-linear motor for moving the movable stage in the X-direction. The stator of the X-linear motor is supported by a second stationary guide to be movable in only the Y-direction independently of the movable guide, and is moved in the Y-direction by a driving mechanism. The stator of the Y-linear motor and the second stationary guide are fixed to the base, and mount members for removing vibrations are arranged between the base and the platen.

摘要翻译： 台架供给装置具有可在Y方向上可移动的台板的基准面上引导的可动引导件，Y方向上移动可动引导件的Y线性马达，由Y方向支承的可动引导件 所述可动引导件能够沿X方向移动并承载物体;以及X线性电动机，用于沿X方向移动所述可动台。 X线性电动机的定子由第二固定引导件支撑，仅在Y方向上可移动地独立于可动引导件，并且通过驱动机构沿Y方向移动。 Y线性电动机的定子和第二静止导轨固定在基座上，用于去除振动的安装构件设置在基座和压板之间。

公开(公告)号：US5858587A

公开(公告)日：1999-01-12

申请号：US602460

申请日：1996-02-16

申请人： Yukio Yamane ,  Eiji Osanai ,  Kotaro Akutsu

发明人： Yukio Yamane ,  Eiji Osanai ,  Kotaro Akutsu

IPC分类号： G03F9/00 ,  B23Q1/26 ,  B23Q1/38 ,  B23Q1/48 ,  B23Q1/62 ,  F16C32/06 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： H01L21/68 ,  F16C29/025 ,  F16C32/0618 ,  G03F7/707 ,  G03F7/70716

摘要： A positioning system wherein a holding surface for holding a substrate is movable relative to a base in directions of X, Y and Z axes and in rotational directions about the X, Y and Z axes, wherein there are plural guiding devices associated respectively with motions in the directions of X, Y and Z axes and in the rotational directions about the X, Y and Z axes, respectively, and wherein each guiding device comprises a non-contact static bearing device.

摘要翻译： 一种定位系统，其中用于保持基板的保持表面可相对于基座沿着X，Y和Z轴方向以及围绕X，Y和Z轴的旋转方向移动，其中，多个引导装置分别与运动相关联 X，Y，Z轴的方向以及绕X，Y，Z轴的旋转方向，其中各导向装置包括非接触静止轴承装置。

公开(公告)号：US5864389A

公开(公告)日：1999-01-26

申请号：US797083

申请日：1997-02-10

申请人： Eiji Osanai ,  Kotaro Akutsu

发明人： Eiji Osanai ,  Kotaro Akutsu

IPC分类号： H01L21/68 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70716

摘要： A stage apparatus is provided with a table having a reference surface, support means for supporting the table, a first movable body movable in a first direction on the reference surface, first driving means for driving the first movable body, a second movable body movable in a second direction differing from the first direction with the first movable body as the reference, and second driving means for driving the second movable body, and the driving reaction forces of the first driving means and the second driving means are received by a base discrete from the table. Also, provision is made of a supporting mechanism for supporting the second driving means for minute displacement in the second direction relative to the first movable body. By this construction, the influence of a reaction force resulting from the acceleration and deceleration of the stage is made small.

摘要翻译： 舞台装置设置有具有参考面的桌子，用于支撑桌子的支撑装置，在基准表面上可沿第一方向移动的第一可移动体，用于驱动第一可移动体的第一驱动装置， 以与第一可移动体为基准的第一方向不同的第二方向，以及用于驱动第二可移动体的第二驱动装置，并且第一驱动装置和第二驱动装置的驱动反作用力被从 桌子。 此外，还提供了一种用于支撑相对于第一可移动体在第二方向上进行微小位移的第二驱动装置的支撑机构。 通过这种结构，由于台的加速和减速引起的反作用力的影响变小。

公开(公告)号：US06285444B1

公开(公告)日：2001-09-04

申请号：US09314170

申请日：1999-05-19

申请人： Eiji Osanai ,  Kotaro Akutsu

发明人： Eiji Osanai ,  Kotaro Akutsu

IPC分类号： G03B2742

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： A positioning system includes a movable member being movable along a reference plane containing first and second directions, and a position measuring device for measuring positional information related to the movable member, wherein the movable member includes an element having a reflection surface inclined with respect to the reference plane, and wherein the position measuring device includes a measuring system for causing a measurement beam to be reflected by the inclined reflection surface and for detecting positional information related to the movable member with respect to a direction intersecting the reference plane.

摘要翻译： 一种定位系统包括可沿着包含第一和第二方向的参考平面移动的可移动部件，以及用于测量与该可移动部件相关的位置信息的位置测量装置，其中该可移动部件包括具有相对于该第一和第二方向倾斜的反射表面的元件 并且其中所述位置测量装置包括用于使测量光束被所述倾斜反射面反射的测量系统，并且用于检测与所述可移动部件相关于与所述参考平面交叉的方向相关的位置信息。

公开(公告)号：US6028376A

公开(公告)日：2000-02-22

申请号：US61245

申请日：1998-04-17

申请人： Eiji Osanai ,  Kotaro Akutsu ,  Hirohito Ito

发明人： Eiji Osanai ,  Kotaro Akutsu ,  Hirohito Ito

IPC分类号： G03F7/20 ,  H01L21/68 ,  H01L21/00

CPC分类号： G03F7/70766 ,  G03F7/70716 ,  H01L21/682 ,  Y10T74/20201

摘要： A positioning apparatus includes a movable stage, a first linear motor for moving the stage in a predetermined direction, a platform for supporting the first linear motor, and an inertial force application mechanism for applying a force for canceling a force acting on the platform, which is generated when the stage is moved by the first linear motor. The inertial force application mechanism includes amass body, a guide for supporting and guiding the mass body, a second linear motor for moving the mass body, and a controller for controlling the second linear motor. Since the inertial force application mechanism of the positioning apparatus prevents transmission of vibration generated by an increase in an exciting force of the stage, rapid and precise positioning can be performed.

摘要翻译： 定位装置包括可动台，用于沿预定方向移动平台的第一线性马达，用于支撑第一线性马达的平台，以及用于施加用于抵消作用在平台上的力的力的惯性力施加机构， 当舞台被第一线性电动机移动时产生。 惯性力施加机构包括：主体，用于支撑和引导质量体的引导件，用于移动质量体的第二线性马达和用于控制第二线性马达的控制器。 由于定位装置的惯性力施加机构防止由于舞台的激励力的增加而产生的振动的传播，因此能够进行快速且精确的定位。

公开(公告)号：US5701041A

公开(公告)日：1997-12-23

申请号：US316887

申请日：1994-10-03

申请人： Kotaro Akutsu ,  Eiji Osanai ,  Shigeto Kamata

发明人： Kotaro Akutsu ,  Eiji Osanai ,  Shigeto Kamata

IPC分类号： B23Q1/00 ,  B23Q1/26 ,  B23Q1/38 ,  F16C29/02 ,  F16C32/06 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H01L21/687 ,  H02K33/18

CPC分类号： F16C29/025 ,  B23Q1/262 ,  B23Q1/385 ,  F16C32/0614 ,  F16C32/0662 ,  G03F7/70716 ,  Y10T74/20207

摘要： A weight supporting apparatus supports the weight of a structure required to have very high surface precision, without affecting the surface precision of the structure. The weight support apparatus includes a driving unit for moving a driven body in the direction of gravity with respect to a base, and a supporting unit for supporting the weight of the driven body at a position after being driven, wherein the driving unit and supporting unit are so arranged that the drive force of the driving unit and the support force of the supporting unit are on the same axis.

摘要翻译： 重量支撑装置支撑要求具有非常高的表面精度的结构的重量，而不影响结构的表面精度。 重量支撑装置包括：驱动单元，用于相对于基座在重力方向上移动从动体;以及支撑单元，用于将驱动体的重量支撑在驱动后的位置，其中驱动单元和支撑单元 被布置成使得驱动单元的驱动力和支撑单元的支撑力在同一轴线上。

公开(公告)号：US07207720B2

公开(公告)日：2007-04-24

申请号：US10991526

申请日：2004-11-19

申请人： Choshoku Sai ,  Kotaro Akutsu

发明人： Choshoku Sai ,  Kotaro Akutsu

IPC分类号： F16C32/06

CPC分类号： F16C33/748 ,  F16C29/025 ,  F16C32/0614 ,  F16C2300/62 ,  G03F7/70816 ,  G03F7/70841

摘要： An apparatus includes a static gas bearing provided upon a first object and configured to form a gas layer between the first object and a second object by use of gas supplied thereto, and to support the first object movably relative to the second object, a plurality of exhaust grooves provided upon the first object and configured to surround the static gas bearing, and a plurality of exhaust flowpassages provided through the first object, connecting to a respective one of the plurality of exhaust grooves, and configured to exhaust gas from a respective one of the plurality of exhaust grooves. An outermost exhaust flowpassage of the plurality of exhaust flowpassages connected to an outermost exhaust groove, which is outermost of one of the plurality of exhaust grooves with respect to the static gas bearing, is shorter than an innermost exhaust flowpassage of the plurality of exhaust flowpassages connected to an innermost exhaust groove, which is innermost one of the plurality of exhaust grooves with respect to the static gas bearing, so that a conductance of the outermost exhaust flowpassage is greater than that of the innermost exhaust flowpassage.

摘要翻译： 一种设备包括设置在第一物体上的静态气体轴承，并且被配置为通过使用供应到其中的气体在第一物体和第二物体之间形成气体层，并且相对于第二物体可移动地支撑第一物体， 设置在第一物体上并且被构造成围绕静态气体轴承的排气槽，以及设置在第一物体上的多个排气流动通道，连接到多个排气槽中的相应一个排气槽，并被构造成从 多个排气槽。 连接到多个排气槽中的一个排气沟的最外面的相对于静态气体轴承的最外面的排气槽的多个排气流通的最外面的排气流过比连接的多个排气流通的最内部排气流通短 到相对于静态气体轴承的多个排气槽中最内侧的最内排气槽，使得最外面的排气流通的电导大于最内排气流通的电导。

公开(公告)号：US07057193B2

公开(公告)日：2006-06-06

申请号：US10649645

申请日：2003-08-28

申请人： Kotaro Akutsu

发明人： Kotaro Akutsu

IPC分类号： G21K5/10

CPC分类号： H01J37/3045 ,  H01J2237/20292 ,  H01J2237/3175

摘要： An exposure apparatus which draws a pattern on a substrate with electron beams. The apparatus includes a substrate stage which supports the substrate, a transfer stage which moves the substrate stage, an electromagnetic actuator which moves the substrate stage relative to the transfer stage, a first measurement system which measures a position of the transfer stage, a second measurement system which measures a position of the substrate stage, a controller which controls the electromagnetic actuator on the basis of measurement results obtained by the first and second measurement systems, a deflector which deflects electron beams with which the substrate is irradiated, and a filter which performs filtering for a measurement result obtained by the second measurement system and supplies the filtered measurement result to the deflector.

摘要翻译： 一种用电子束在基板上绘制图案的曝光装置。 该装置包括支撑基板的基板台，移动基板台的转印台，相对于转印台移动基板台的电磁致动器，测量转印台位置的第一测量系统，第二测量 系统，其测量基板台的位置;控制器，其基于由第一和第二测量系统获得的测量结果来控制电磁致动器;偏转器，其偏转基板被照射的电子束;以及滤光器，其执行 对由第二测量系统获得的测量结果进行滤波，并将滤波的测量结果提供给偏转器。

公开(公告)号：US07123350B2

公开(公告)日：2006-10-17

申请号：US10891032

申请日：2004-07-15

申请人： Kotaro Akutsu ,  Mitsuru Inoue

发明人： Kotaro Akutsu ,  Mitsuru Inoue

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/707 ,  G03F7/70708

摘要： A substrate holding device has a substrate holding unit and supporting elements movable to protrude from a substrate-holding surface of the substrate holding unit. The substrate holding unit holds the substrate in a predetermined state with a first holding force after relative positions of the substrate and the substrate holding unit are adjusted while the supporting elements lift the substrate off the substrate-holding surface. Before the relative positions of the substrate and the substrate holding unit are adjusted, the substrate holding device holds the substrate with a second holding force that is smaller than the first holding force and includes a zero holding force. Thus, the substrate holding device is able to align and hold the substrate in a short time.

摘要翻译： 基板保持装置具有基板保持单元和可移动地从基板保持单元的基板保持表面突出的支撑元件。 基板保持单元在基板和基板保持单元的相对位置调整同时支撑元件将基板从基板保持表面提起时，以基板保持力将基板保持在预定状态。 在调整基板和基板保持单元的相对位置之前，基板保持装置以比第一保持力小的第二保持力保持基板，并且包括零保持力。 因此，基板保持装置能够在短时间内对准和保持基板。

公开(公告)号：US20060158650A1

公开(公告)日：2006-07-20

申请号：US11354088

申请日：2006-02-15

申请人： Kotaro Akutsu ,  Keiji Emoto

发明人： Kotaro Akutsu ,  Keiji Emoto

IPC分类号： G01B11/00

CPC分类号： G03F7/70733 ,  G03F7/70725 ,  G03F7/7075 ,  G03F7/70775 ,  G03F7/70991 ,  H01L21/681 ,  H01L21/682

摘要： In order to perform a measurement operation of a pattern and a processing operation in parallel while the positions of two substrate stages are accurately measured and wire/hose units are prevented from becoming tangled, a substrate processing apparatus includes an alignment system for measuring the pattern arrangements of the substrates, a processing system disposed separately from the alignment system and used for processing the substrates, substrate stages which are able to support the substrates and move in an xy plane, and position measurement systems which measure the positions of the substrate stages. Four position measurement systems are arranged for the measurement in the x direction, and three position measurement systems are arranged for the measurement in the y direction. One of the position measurement systems for the measurement in the y direction is disposed at a side opposite to the remaining positioning measurement systems across the substrate stages.