公开(公告)号：US5701041A

公开(公告)日：1997-12-23

申请号：US316887

申请日：1994-10-03

申请人： Kotaro Akutsu ,  Eiji Osanai ,  Shigeto Kamata

发明人： Kotaro Akutsu ,  Eiji Osanai ,  Shigeto Kamata

IPC分类号： B23Q1/00 ,  B23Q1/26 ,  B23Q1/38 ,  F16C29/02 ,  F16C32/06 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H01L21/687 ,  H02K33/18

CPC分类号： F16C29/025 ,  B23Q1/262 ,  B23Q1/385 ,  F16C32/0614 ,  F16C32/0662 ,  G03F7/70716 ,  Y10T74/20207

摘要： A weight supporting apparatus supports the weight of a structure required to have very high surface precision, without affecting the surface precision of the structure. The weight support apparatus includes a driving unit for moving a driven body in the direction of gravity with respect to a base, and a supporting unit for supporting the weight of the driven body at a position after being driven, wherein the driving unit and supporting unit are so arranged that the drive force of the driving unit and the support force of the supporting unit are on the same axis.

摘要翻译： 重量支撑装置支撑要求具有非常高的表面精度的结构的重量，而不影响结构的表面精度。 重量支撑装置包括：驱动单元，用于相对于基座在重力方向上移动从动体;以及支撑单元，用于将驱动体的重量支撑在驱动后的位置，其中驱动单元和支撑单元 被布置成使得驱动单元的驱动力和支撑单元的支撑力在同一轴线上。

公开(公告)号：US5864389A

公开(公告)日：1999-01-26

申请号：US797083

申请日：1997-02-10

申请人： Eiji Osanai ,  Kotaro Akutsu

发明人： Eiji Osanai ,  Kotaro Akutsu

IPC分类号： H01L21/68 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70716

摘要： A stage apparatus is provided with a table having a reference surface, support means for supporting the table, a first movable body movable in a first direction on the reference surface, first driving means for driving the first movable body, a second movable body movable in a second direction differing from the first direction with the first movable body as the reference, and second driving means for driving the second movable body, and the driving reaction forces of the first driving means and the second driving means are received by a base discrete from the table. Also, provision is made of a supporting mechanism for supporting the second driving means for minute displacement in the second direction relative to the first movable body. By this construction, the influence of a reaction force resulting from the acceleration and deceleration of the stage is made small.

摘要翻译： 舞台装置设置有具有参考面的桌子，用于支撑桌子的支撑装置，在基准表面上可沿第一方向移动的第一可移动体，用于驱动第一可移动体的第一驱动装置， 以与第一可移动体为基准的第一方向不同的第二方向，以及用于驱动第二可移动体的第二驱动装置，并且第一驱动装置和第二驱动装置的驱动反作用力被从 桌子。 此外，还提供了一种用于支撑相对于第一可移动体在第二方向上进行微小位移的第二驱动装置的支撑机构。 通过这种结构，由于台的加速和减速引起的反作用力的影响变小。

公开(公告)号：US06285444B1

公开(公告)日：2001-09-04

申请号：US09314170

申请日：1999-05-19

申请人： Eiji Osanai ,  Kotaro Akutsu

发明人： Eiji Osanai ,  Kotaro Akutsu

IPC分类号： G03B2742

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： A positioning system includes a movable member being movable along a reference plane containing first and second directions, and a position measuring device for measuring positional information related to the movable member, wherein the movable member includes an element having a reflection surface inclined with respect to the reference plane, and wherein the position measuring device includes a measuring system for causing a measurement beam to be reflected by the inclined reflection surface and for detecting positional information related to the movable member with respect to a direction intersecting the reference plane.

摘要翻译： 一种定位系统包括可沿着包含第一和第二方向的参考平面移动的可移动部件，以及用于测量与该可移动部件相关的位置信息的位置测量装置，其中该可移动部件包括具有相对于该第一和第二方向倾斜的反射表面的元件 并且其中所述位置测量装置包括用于使测量光束被所述倾斜反射面反射的测量系统，并且用于检测与所述可移动部件相关于与所述参考平面交叉的方向相关的位置信息。

公开(公告)号：US6028376A

公开(公告)日：2000-02-22

申请号：US61245

申请日：1998-04-17

申请人： Eiji Osanai ,  Kotaro Akutsu ,  Hirohito Ito

发明人： Eiji Osanai ,  Kotaro Akutsu ,  Hirohito Ito

IPC分类号： G03F7/20 ,  H01L21/68 ,  H01L21/00

CPC分类号： G03F7/70766 ,  G03F7/70716 ,  H01L21/682 ,  Y10T74/20201

摘要： A positioning apparatus includes a movable stage, a first linear motor for moving the stage in a predetermined direction, a platform for supporting the first linear motor, and an inertial force application mechanism for applying a force for canceling a force acting on the platform, which is generated when the stage is moved by the first linear motor. The inertial force application mechanism includes amass body, a guide for supporting and guiding the mass body, a second linear motor for moving the mass body, and a controller for controlling the second linear motor. Since the inertial force application mechanism of the positioning apparatus prevents transmission of vibration generated by an increase in an exciting force of the stage, rapid and precise positioning can be performed.

摘要翻译： 定位装置包括可动台，用于沿预定方向移动平台的第一线性马达，用于支撑第一线性马达的平台，以及用于施加用于抵消作用在平台上的力的力的惯性力施加机构， 当舞台被第一线性电动机移动时产生。 惯性力施加机构包括：主体，用于支撑和引导质量体的引导件，用于移动质量体的第二线性马达和用于控制第二线性马达的控制器。 由于定位装置的惯性力施加机构防止由于舞台的激励力的增加而产生的振动的传播，因此能够进行快速且精确的定位。

公开(公告)号：US5939852A

公开(公告)日：1999-08-17

申请号：US919480

申请日：1997-08-28

申请人： Kotaro Akutsu ,  Eiji Osanai ,  Hirohito Ito

发明人： Kotaro Akutsu ,  Eiji Osanai ,  Hirohito Ito

IPC分类号： H01L21/027 ,  B23Q1/62 ,  B23Q5/28 ,  B23Q11/00 ,  G03F7/20 ,  G05B19/23 ,  G05B5/01 ,  G05B19/18

CPC分类号： G03F7/70716 ,  B23Q1/621 ,  B23Q11/0032 ,  B23Q5/28 ,  G03F7/709 ,  G05B19/232 ,  G05B2219/37275 ,  G05B2219/49275 ,  G05B2219/49276

摘要： A stage feeding device has a movable guide which is guided on a reference surface of a platen to be movable in the Y-direction, a Y-linear motor for moving the movable guide in the Y-direction, a movable stage which is supported by the movable guide to be movable in the X-direction, and carries an object, and an X-linear motor for moving the movable stage in the X-direction. The stator of the X-linear motor is supported by a second stationary guide to be movable in only the Y-direction independently of the movable guide, and is moved in the Y-direction by a driving mechanism. The stator of the Y-linear motor and the second stationary guide are fixed to the base, and mount members for removing vibrations are arranged between the base and the platen.

摘要翻译： 台架供给装置具有可在Y方向上可移动的台板的基准面上引导的可动引导件，Y方向上移动可动引导件的Y线性马达，由Y方向支承的可动引导件 所述可动引导件能够沿X方向移动并承载物体;以及X线性电动机，用于沿X方向移动所述可动台。 X线性电动机的定子由第二固定引导件支撑，仅在Y方向上可移动地独立于可动引导件，并且通过驱动机构沿Y方向移动。 Y线性电动机的定子和第二静止导轨固定在基座上，用于去除振动的安装构件设置在基座和压板之间。

公开(公告)号：US5858587A

公开(公告)日：1999-01-12

申请号：US602460

申请日：1996-02-16

申请人： Yukio Yamane ,  Eiji Osanai ,  Kotaro Akutsu

发明人： Yukio Yamane ,  Eiji Osanai ,  Kotaro Akutsu

IPC分类号： G03F9/00 ,  B23Q1/26 ,  B23Q1/38 ,  B23Q1/48 ,  B23Q1/62 ,  F16C32/06 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： H01L21/68 ,  F16C29/025 ,  F16C32/0618 ,  G03F7/707 ,  G03F7/70716

摘要： A positioning system wherein a holding surface for holding a substrate is movable relative to a base in directions of X, Y and Z axes and in rotational directions about the X, Y and Z axes, wherein there are plural guiding devices associated respectively with motions in the directions of X, Y and Z axes and in the rotational directions about the X, Y and Z axes, respectively, and wherein each guiding device comprises a non-contact static bearing device.

摘要翻译： 一种定位系统，其中用于保持基板的保持表面可相对于基座沿着X，Y和Z轴方向以及围绕X，Y和Z轴的旋转方向移动，其中，多个引导装置分别与运动相关联 X，Y，Z轴的方向以及绕X，Y，Z轴的旋转方向，其中各导向装置包括非接触静止轴承装置。

公开(公告)号：US5610686A

公开(公告)日：1997-03-11

申请号：US404312

申请日：1995-03-15

申请人： Eiji Osanai

发明人： Eiji Osanai

IPC分类号： G03F9/00 ,  G03B27/54 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/58

CPC分类号： G03F7/70716 ,  G03F7/70725 ,  G03F7/709

摘要： An exposure apparatus includes an exposure optical system, a stage on which an article to be exposed is to be placed, a moving mechanism for moving the stage relative to the exposure optical system, a first base for supporting the moving mechanism, a main base for supporting the exposure optical system, on which main base the first base is mounted, a first supporting portion being interposed between the first base and the main base, a second base for supporting the main base, a vibration removing device being interposed between the main base and the second base, and a second supporting portion being interposed between the first base and the second base.

摘要翻译： 曝光装置包括曝光光学系统，要放置待曝光物品的台阶，相对于曝光光学系统移动平台的移动机构，支撑移动机构的第一基座， 支撑曝光光学系统，其上安装有第一基座的主基座，设置在第一基座和主基座之间的第一支撑部分，用于支撑主基座的第二基座，位于主基座之间的振动去除装置 和第二基座，以及插入在第一基座和第二基座之间的第二支撑部。

公开(公告)号：US5228358A

公开(公告)日：1993-07-20

申请号：US991711

申请日：1992-12-16

申请人： Shigeo Sakino ,  Eiji Osanai

发明人： Shigeo Sakino ,  Eiji Osanai

IPC分类号： B23Q1/38 ,  B23Q1/62 ,  B23Q5/10 ,  H02K41/03

CPC分类号： F16C32/0674 ,  B23Q1/38 ,  B23Q1/621 ,  B23Q5/10 ,  H02K41/03 ,  B26D2007/0043 ,  Y10S384/902 ,  Y10T74/20207

摘要： A motion guiding device includes a first movable member movable in a first direction, a second movable member movable in a second direction different from the first direction and for guiding motion of the first movable member in the first direction through a gas pressure, a base for supporting the first and second movable members independently of each other, with respect to a vertical direction through cooperation of a gas pressure. In addition, a guide is fixed to the base for guiding motion of the second movable member in the second direction through cooperation of a gas pressure and a magnetic force of a permanent magnet, a first linear motor moves the first movable member in the first direction, relative to the second movable member, and a second linear motor moves the second movable member with the first movable member in the second direction.

摘要翻译： 运动引导装置包括可沿第一方向移动的第一可移动部件，可沿与第一方向不同的第二方向移动的第二可移动部件，并且用于通过气体压力引导第一可动部件沿第一方向的运动， 通过气体压力的协调，相对于垂直方向彼此独立地支撑第一和第二可动构件。 此外，引导件固定到基座，用于通过气体压力和永磁体的磁力的协作来引导第二可动构件沿第二方向的运动，第一线性电动机沿第一方向移动第一可动构件 相对于第二可动构件，第二线性马达使第二可动构件与第一可动构件沿第二方向移动。

公开(公告)号：US5909272A

公开(公告)日：1999-06-01

申请号：US904305

申请日：1997-07-31

申请人： Eiji Osanai ,  Mitsuru Inoue ,  Kazunori Iwamoto ,  Katsumi Asada ,  Hiroshi Ito

发明人： Eiji Osanai ,  Mitsuru Inoue ,  Kazunori Iwamoto ,  Katsumi Asada ,  Hiroshi Ito

IPC分类号： H01L21/68 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70241 ,  G03F7/70358 ,  G03F7/70716

摘要： A stage apparatus has a stationary portion, a movable portion and a linear motor for moving the movable portion in a prescribed direction by applying thrust between the stationary and movable portions. A first supporting member supports the stationary portion with a degree of freedom in the direction of movement, and a second supporting member has an axial supporting member for supporting the stationary portion rigidly in the direction of movement and flexibly in other directions. The second supporting member is isolated from the first supporting member in such a manner that vibration will not be transmitted to the first supporting member. The stage is used to scan a master plate in a scanning-type exposure apparatus, and the first supporting member is joined to a lens barrel table on which a projecting optical system is mounted.

摘要翻译： 舞台装置具有静止部分，可移动部分和直线电动机，用于通过在固定部分和可移动部分之间施加推力来使可动部分沿预定方向移动。 第一支撑构件在移动方向上具有自由度的支撑固定部分，并且第二支撑构件具有轴向支撑构件，用于沿着运动方向刚性地支撑静止部分并且在其它方向上灵活地支撑。 第二支撑构件与第一支撑构件隔离，使得振动不会传递到第一支撑构件。 该台用于在扫描式曝光装置中扫描主板，并且将第一支撑构件接合到其上安装有投影光学系统的透镜镜台。

公开(公告)号：US5717482A

公开(公告)日：1998-02-10

申请号：US807735

申请日：1997-02-27

申请人： Kotarao Akutsu ,  Eiji Osanai

发明人： Kotarao Akutsu ,  Eiji Osanai

IPC分类号： B23Q1/00 ,  B23Q1/44 ,  G03F7/20 ,  G12B5/00 ,  H01L21/027 ,  H01L21/68 ,  H01L21/683 ,  G03B27/42

CPC分类号： G03F7/707 ,  G03F7/70716

摘要： A stage apparatus and method of mounting a substrate on a substrate holding surface of a substrate chuck in which a substrate is mounted in a Z-axis direction. The stage apparatus includes a movable stage, which is movable on an X-Y plane, a substrate stage mounted on the movable stage to be movable at least in a Z-axis direction, a substrate chuck which is arranged on the substrate stage for holding a substrate and a substrate support device, which is brought into contact with the substrate on the chuck and receives the substrate when the substrate stage moves in the Z-axis direction. The substrate support device includes a substrate supporting number arranged on the movable stage and the substrate stage has an opening through which the substrate supporting member can pass. A contact surface of the substrate chuck is located above a substrate contact surface of the substrate supporting member upon movement of the substrate stage. The substrate stage is lowered in the Z-axis direction and the substrate held by the substrate chuck is transferred from the substrate chuck onto the substrate supporting member in the process of moving the substrate stage.

摘要翻译： 将基板安装在基板卡盘的基板保持面上的台架装置和方法，其中基板安装在Z轴方向上。 舞台装置包括可在XY平面上移动的可移动台，至少在Z轴方向上可移动的安装在可移动台上的基座台，布置在基板台上用于保持基板的基板卡盘 以及基板支撑装置，其在基板台沿Z轴方向移动时与卡盘上的基板接触并接收基板。 基板支撑装置包括布置在可移动台上的基板支撑件，并且基板台具有基板支撑构件可以穿过的开口。 基板卡盘的接触面在基板载台移动时位于基板支撑部件的基板接触面的上方。 在基板台移动的过程中，基板台在Z轴方向上下降，由基板卡盘保持的基板从基板卡盘转移到基板支撑部件上。