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    PATTERN CHARACTERISTIC-DETECTION APPARATUS FOR PHOTOMASK AND PATTERN CHARACTERISTIC-DETECTION METHOD FOR PHOTOMASK
    1.
    发明申请
    PATTERN CHARACTERISTIC-DETECTION APPARATUS FOR PHOTOMASK AND PATTERN CHARACTERISTIC-DETECTION METHOD FOR PHOTOMASK 有权
    用于光电子的图案特征检测装置和图案特征检测方法

    公开(公告)号：US20110058729A1

    公开(公告)日：2011-03-10

    申请号：US12857906

    申请日：2010-08-17

    申请人： Hiromu Inoue ,  Hiroyuki Ikeda ,  Eiji Sawa

    发明人： Hiromu Inoue ,  Hiroyuki Ikeda ,  Eiji Sawa

    IPC分类号： G06K9/00

    CPC分类号： G01N21/956 ,  G03F1/84 ,  G03F7/70525 ,  G03F7/70625 ,  G03F7/7065

    摘要： According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.

    摘要翻译： 根据一个实施例，用于光掩模的图案特性检测装置包括检测数据创建部分，参考数据创建部分，提取部分，第一区域设置部分，检测部分和收集部分。 检测数据创建部分被配置为基于形成在光掩模上的图案的光学图像来创建检测数据。 参考数据创建部分被配置为创建该图案的参考数据。 提取部分被提取用于图案特征检测的图案和提取的图案的位置信息。 第一区域设定部被配置为设定要检测图案特性的区域，并且被配置为提取目标图案。 检测部被配置为检测该区域内的目标图案的图案特性。 此外，收集部分被配置为收集检测到的图案特征。

    Size checking method and apparatus
    2.
    发明授权
    Size checking method and apparatus 有权
    尺寸检查方法和装置

    公开(公告)号：US06965687B2

    公开(公告)日：2005-11-15

    申请号：US09883945

    申请日：2001-06-20

    申请人： Eiji Sawa ,  Hiromu Inoue

    发明人： Eiji Sawa ,  Hiromu Inoue

    IPC分类号： G01B11/02 ,  G01B11/24 ,  G06T5/00 ,  G06T7/00 ,  G06T7/60 ,  G06K9/00

    CPC分类号： G01B11/028 ,  G01B11/2433 ,  G06T7/0006 ,  G06T7/12 ,  G06T7/168 ,  G06T7/62 ,  G06T2207/30148

    摘要： A pair of edges that are located at ends as viewed in the widthwise direction of a design pattern are recognized. On the basis of the edge direction in which the paired edges are recognized, edge points on the design pattern are detected as sub-pixels. The widthwise dimension of the design pattern is calculated on the basis of the edge points. In addition, the widthwise dimension of a circuit pattern is calculated at the same position as the widthwise dimension of the design pattern. On the basis of the calculated widthwise dimensions, the semiconductor wafer circuit pattern is checked.

    摘要翻译： 识别位于设计图案的宽度方向上观察的端部处的一对边缘。 基于识别成对边缘的边缘方向，设计图案上的边缘点被检测为子像素。 基于边缘点计算设计图案的宽度尺寸。 此外，在与设计图案的宽度尺寸相同的位置处计算电路图案的宽度尺寸。 基于计算出的宽度方向尺寸，检查半导体晶片电路图案。

    Pattern characteristic-detection apparatus for photomask and pattern characteristic-detection method for photomask
    3.
    发明授权
    Pattern characteristic-detection apparatus for photomask and pattern characteristic-detection method for photomask 有权

    公开(公告)号：US09841385B2

    公开(公告)日：2017-12-12

    申请号：US12857906

    申请日：2010-08-17

    申请人： Hiromu Inoue ,  Hiroyuki Ikeda ,  Eiji Sawa

    发明人： Hiromu Inoue ,  Hiroyuki Ikeda ,  Eiji Sawa

    IPC分类号： G03F1/84 ,  G01N21/956 ,  G03F7/20

    CPC分类号： G01N21/956 ,  G03F1/84 ,  G03F7/70525 ,  G03F7/70625 ,  G03F7/7065

    摘要： According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.

    Size checking method and apparatus
    5.
    发明授权
    Size checking method and apparatus 有权
    尺寸检查方法和装置

    公开(公告)号：US07466854B2

    公开(公告)日：2008-12-16

    申请号：US11197501

    申请日：2005-08-05

    申请人： Eiji Sawa ,  Hiromu Inoue

    发明人： Eiji Sawa ,  Hiromu Inoue

    IPC分类号： G06K9/00 ,  G06K9/48 ,  G06K9/68 ,  H04N7/18 ,  G06F15/00

    CPC分类号： G06T7/0006 ,  G01B11/028 ,  G01B11/2433 ,  G06K9/4638 ,  G06T2207/30148

    摘要： A pair of edges that are located at ends as viewed in the widthwise direction of a design pattern are recognized. On the basis of the edge direction in which the paired edges are recognized, edge points on the design pattern are detected as sub-pixels. The widthwise dimension of the design pattern is calculated on the basis of the edge points. In addition, the widthwise dimension of a circuit pattern is calculated at the same position as the widthwise dimension of the design pattern. On the basis of the calculated widthwise dimensions, the semiconductor wafer circuit pattern is checked.

    摘要翻译： 识别位于设计图案的宽度方向上观察的端部处的一对边缘。 基于识别成对边缘的边缘方向，设计图案上的边缘点被检测为子像素。 基于边缘点计算设计图案的宽度尺寸。 此外，在与设计图案的宽度尺寸相同的位置处计算电路图案的宽度尺寸。 基于计算出的宽度方向尺寸，检查半导体晶片电路图案。

    Method and apparatus for inspecting patterns
    8.
    发明授权
    Method and apparatus for inspecting patterns 有权
    检查模式的方法和装置

    公开(公告)号：US06888958B1

    公开(公告)日：2005-05-03

    申请号：US09538398

    申请日：2000-03-29

    申请人： Eiji Sawa ,  Hiromu Inoue ,  Satoshi Imi

    发明人： Eiji Sawa ,  Hiromu Inoue ,  Satoshi Imi

    IPC分类号： G06K9/00 ,  G06K9/36 ,  G06K9/62 ,  G06T7/00

    CPC分类号： G06T7/001 ,  G06T7/32

    摘要： The difference data between the real patter data Sij, and a 5×5 window with a noticed pixel in the center and the design pattern data Rij obtained by the design pattern data of the window being shifted in a plurality of directions with respect to the design pattern data Rij is found by a shift direction operation section, and the design pattern data in the direction in which the total of the pixels is minimum is selected from the difference data by a selection section, the difference between the central pixels Sij, Qij of the selected design pattern data and the central pixels Sij, Qij of the windows of the real pattern data is found by a difference operation section, and the difference and a threshold are compared in a defect judgement section, and thereby the pattern inspection of the object is carried out.

    摘要翻译： 实际图形数据Sij和中心处的注意像素的5×5窗口与通过相对于设计图案数据在多个方向上偏移的窗口的设计图案数据获得的设计图案数据Rij之间的差分数据 通过移位方向操作部分找到Rij，并且通过选择部分从差分数据中选择像素总数最小的方向上的设计图案数据，所选择的中心像素Sij，Qij之间的差异 设计图案数据和实际图案数据的窗口的中心像素Sij，Qij由差异运算部分找到，并且在缺陷判断部分比较差异和阈值，从而携带对象的图案检查 出来

    FOCUSING DEVICE, FOCUSING METHOD AND A PATTERN INSPECTING APPARATUS
    9.
    发明申请
    FOCUSING DEVICE, FOCUSING METHOD AND A PATTERN INSPECTING APPARATUS 失效
    聚焦装置，聚焦方法和图案检查装置

    公开(公告)号：US20070200051A1

    公开(公告)日：2007-08-30

    申请号：US11679411

    申请日：2007-02-27

    申请人： Hiromu Inoue ,  Tomohide Watanabe ,  Satoshi Endo ,  Masami Ikeda

    发明人： Hiromu Inoue ,  Tomohide Watanabe ,  Satoshi Endo ,  Masami Ikeda

    IPC分类号： G02B27/40

    CPC分类号： G03F7/70641

    摘要： A focusing device comprises a first imaging optical system, a second imaging optical system which splits the optical image in the direction of an AF sensor and further splits the optical image so that a front focus image in which the point that is in focus is in front of the optical image on the inspecting sensor and a back focus image in which the point that is in focus is behind the optical image on the inspecting sensor are formed on the AF sensor, a focus detecting circuit which detects an optimum focus position on the basis of a high-frequency component of a front sensor image in a front focus position and a high-frequency component of a back sensor image in a back focus position, and a focus control circuit which controls the focusing of the first imaging optical system on the basis of the focus position.

    摘要翻译： 聚焦装置包括第一成像光学系统，第二成像光学系统，其在AF传感器的方向上分割光学图像，并进一步分割光学图像，使得其中焦点点在前面的前焦点图像 在AF传感器上形成检查传感器上的光学图像的背焦点图像和焦点上的焦点位于检测传感器上的光学图像之后的焦点检测电路，该焦点检测电路基于检测传感器的最佳聚焦位置 在前焦点位置处的前传感器图像的高频分量和后聚焦位置中的背传感器图像的高频分量的焦点控制电路，以及控制第一成像光学系统的聚焦在 基础的焦点位置。