公开(公告)号：US07466854B2

公开(公告)日：2008-12-16

申请号：US11197501

申请日：2005-08-05

申请人： Eiji Sawa ,  Hiromu Inoue

发明人： Eiji Sawa ,  Hiromu Inoue

IPC分类号： G06K9/00 ,  G06K9/48 ,  G06K9/68 ,  H04N7/18 ,  G06F15/00

CPC分类号： G06T7/0006 ,  G01B11/028 ,  G01B11/2433 ,  G06K9/4638 ,  G06T2207/30148

摘要： A pair of edges that are located at ends as viewed in the widthwise direction of a design pattern are recognized. On the basis of the edge direction in which the paired edges are recognized, edge points on the design pattern are detected as sub-pixels. The widthwise dimension of the design pattern is calculated on the basis of the edge points. In addition, the widthwise dimension of a circuit pattern is calculated at the same position as the widthwise dimension of the design pattern. On the basis of the calculated widthwise dimensions, the semiconductor wafer circuit pattern is checked.

摘要翻译： 识别位于设计图案的宽度方向上观察的端部处的一对边缘。 基于识别成对边缘的边缘方向，设计图案上的边缘点被检测为子像素。 基于边缘点计算设计图案的宽度尺寸。 此外，在与设计图案的宽度尺寸相同的位置处计算电路图案的宽度尺寸。 基于计算出的宽度方向尺寸，检查半导体晶片电路图案。

公开(公告)号：US09841385B2

公开(公告)日：2017-12-12

申请号：US12857906

申请日：2010-08-17

申请人： Hiromu Inoue ,  Hiroyuki Ikeda ,  Eiji Sawa

发明人： Hiromu Inoue ,  Hiroyuki Ikeda ,  Eiji Sawa

IPC分类号： G03F1/84 ,  G01N21/956 ,  G03F7/20

CPC分类号： G01N21/956 ,  G03F1/84 ,  G03F7/70525 ,  G03F7/70625 ,  G03F7/7065

摘要： According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.

公开(公告)号：US20110058729A1

公开(公告)日：2011-03-10

申请号：US12857906

申请日：2010-08-17

申请人： Hiromu Inoue ,  Hiroyuki Ikeda ,  Eiji Sawa

发明人： Hiromu Inoue ,  Hiroyuki Ikeda ,  Eiji Sawa

IPC分类号： G06K9/00

CPC分类号： G01N21/956 ,  G03F1/84 ,  G03F7/70525 ,  G03F7/70625 ,  G03F7/7065

摘要： According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.

摘要翻译： 根据一个实施例，用于光掩模的图案特性检测装置包括检测数据创建部分，参考数据创建部分，提取部分，第一区域设置部分，检测部分和收集部分。 检测数据创建部分被配置为基于形成在光掩模上的图案的光学图像来创建检测数据。 参考数据创建部分被配置为创建该图案的参考数据。 提取部分被提取用于图案特征检测的图案和提取的图案的位置信息。 第一区域设定部被配置为设定要检测图案特性的区域，并且被配置为提取目标图案。 检测部被配置为检测该区域内的目标图案的图案特性。 此外，收集部分被配置为收集检测到的图案特征。

公开(公告)号：US06965687B2

公开(公告)日：2005-11-15

申请号：US09883945

申请日：2001-06-20

申请人： Eiji Sawa ,  Hiromu Inoue

发明人： Eiji Sawa ,  Hiromu Inoue

IPC分类号： G01B11/02 ,  G01B11/24 ,  G06T5/00 ,  G06T7/00 ,  G06T7/60 ,  G06K9/00

CPC分类号： G01B11/028 ,  G01B11/2433 ,  G06T7/0006 ,  G06T7/12 ,  G06T7/168 ,  G06T7/62 ,  G06T2207/30148

摘要： A pair of edges that are located at ends as viewed in the widthwise direction of a design pattern are recognized. On the basis of the edge direction in which the paired edges are recognized, edge points on the design pattern are detected as sub-pixels. The widthwise dimension of the design pattern is calculated on the basis of the edge points. In addition, the widthwise dimension of a circuit pattern is calculated at the same position as the widthwise dimension of the design pattern. On the basis of the calculated widthwise dimensions, the semiconductor wafer circuit pattern is checked.

摘要翻译： 识别位于设计图案的宽度方向上观察的端部处的一对边缘。 基于识别成对边缘的边缘方向，设计图案上的边缘点被检测为子像素。 基于边缘点计算设计图案的宽度尺寸。 此外，在与设计图案的宽度尺寸相同的位置处计算电路图案的宽度尺寸。 基于计算出的宽度方向尺寸，检查半导体晶片电路图案。

公开(公告)号：US09036896B2

公开(公告)日：2015-05-19

申请号：US13083157

申请日：2011-04-08

申请人： Takanao Touya ,  Shuichi Tamamushi ,  Hidenori Sato ,  Hiroyuki Tanizaki ,  Takeshi Fujiwara ,  Eiji Sawa ,  Kentaro Okuda ,  Hiroyuki Ikeda ,  Hiromu Inoue ,  Hiroshi Tsukada

发明人： Takanao Touya ,  Shuichi Tamamushi ,  Hidenori Sato ,  Hiroyuki Tanizaki ,  Takeshi Fujiwara ,  Eiji Sawa ,  Kentaro Okuda ,  Hiroyuki Ikeda ,  Hiromu Inoue ,  Hiroshi Tsukada

IPC分类号： G06K9/00 ,  G06T7/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/9503 ,  G01N21/956 ,  G06T7/0004 ,  G06T7/0006 ,  G06T7/70 ,  G06T7/74 ,  G06T2207/10004 ,  G06T2207/30141 ,  G06T2207/30148

摘要： A method and system for imaging an object to be inspected and obtaining an optical image; creating a reference image from design pattern data; preparing an inspection recipe including one or more templates and parameter settings necessary for the inspection; checking the pattern and the template against each other, and selecting the reference image which corresponds to the template; detecting first and second edges in the selected reference image in accordance with the parameter setting using determined coordinates as a reference; detecting first and second edges in the optical image, this optical image corresponds to the selected reference image; and determining an inspection value by acquiring the difference between the line width of the optical image and the reference image using the first edge and second edge of the reference image and the first edge and second edges of the optical image.

摘要翻译： 一种用于对待检查对象进行成像并获得光学图像的方法和系统; 从设计模式数据创建参考图像; 准备包括一个或多个模板和检查所需的参数设置的检查配方; 检查图案和模板，并选择与模板对应的参考图像; 根据使用确定的坐标作为参考的参数设置来检测所选参考图像中的第一和第二边缘; 检测光学图像中的第一和第二边缘，该光学图像对应于所选择的参考图像; 以及通过使用参考图像的第一边缘和第二边缘以及光学图像的第一边缘和第二边缘获取光学图像的线宽和参考图像之间的差来确定检查值。

公开(公告)号：US20110255770A1

公开(公告)日：2011-10-20

申请号：US13083157

申请日：2011-04-08

申请人： Takanao Touya ,  Shuichi Tamamushi ,  Hidenori Sato ,  Hiroyuki Tanizaki ,  Takeshi Fujiwara ,  Eiji Sawa ,  Kentaro Okuda ,  Hiroyuki Ikeda ,  Hiromu Inoue ,  Hiroshi Tsukada

发明人： Takanao Touya ,  Shuichi Tamamushi ,  Hidenori Sato ,  Hiroyuki Tanizaki ,  Takeshi Fujiwara ,  Eiji Sawa ,  Kentaro Okuda ,  Hiroyuki Ikeda ,  Hiromu Inoue ,  Hiroshi Tsukada

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/9503 ,  G01N21/956 ,  G06T7/0004 ,  G06T7/0006 ,  G06T7/70 ,  G06T7/74 ,  G06T2207/10004 ,  G06T2207/30141 ,  G06T2207/30148

摘要： A method and system for imaging an object to be inspected and obtaining an optical image; creating a reference image from design pattern data; preparing an inspection recipe including one or more templates and parameter settings necessary for the inspection; checking the pattern and the template against each other, and selecting the reference image which corresponds to the template; detecting first and second edges in the selected reference image in accordance with the parameter setting using determined coordinates as a reference; detecting first and second edges in the optical image, this optical image corresponds to the selected reference image; and determining an inspection value by acquiring the difference between the line width of the optical image and the reference image using the first edge and second edge of the reference image and the first edge and second edges of the optical image.

摘要翻译： 一种用于对待检查对象进行成像并获得光学图像的方法和系统; 从设计模式数据创建参考图像; 准备包括一个或多个模板和检查所需的参数设置的检查配方; 检查图案和模板，并选择与模板对应的参考图像; 根据使用确定的坐标作为参考的参数设置来检测所选参考图像中的第一和第二边缘; 检测光学图像中的第一和第二边缘，该光学图像对应于所选择的参考图像; 以及通过使用参考图像的第一边缘和第二边缘以及光学图像的第一边缘和第二边缘获取光学图像的线宽和参考图像之间的差来确定检查值。

公开(公告)号：US20050265595A1

公开(公告)日：2005-12-01

申请号：US11197501

申请日：2005-08-05

申请人： Eiji Sawa ,  Hiromu Inoue

发明人： Eiji Sawa ,  Hiromu Inoue

IPC分类号： G01B11/02 ,  G01B11/24 ,  G01B21/02 ,  G03F1/84 ,  G06K9/00 ,  G06K9/36 ,  G06K9/46 ,  G06T7/00 ,  H01L21/027

CPC分类号： G06T7/0006 ,  G01B11/028 ,  G01B11/2433 ,  G06K9/4638 ,  G06T2207/30148

摘要： A pair of edges that are located at ends as viewed in the widthwise direction of a design pattern are recognized. On the basis of the edge direction in which the paired edges are recognized, edge points on the design pattern are detected as sub-pixels. The widthwise dimension of the design pattern is calculated on the basis of the edge points. In addition, the widthwise dimension of a circuit pattern is calculated at the same position as the widthwise dimension of the design pattern. On the basis of the calculated widthwise dimensions, the semiconductor wafer circuit pattern is checked.

公开(公告)号：US06888958B1

公开(公告)日：2005-05-03

申请号：US09538398

申请日：2000-03-29

申请人： Eiji Sawa ,  Hiromu Inoue ,  Satoshi Imi

发明人： Eiji Sawa ,  Hiromu Inoue ,  Satoshi Imi

IPC分类号： G06K9/00 ,  G06K9/36 ,  G06K9/62 ,  G06T7/00

CPC分类号： G06T7/001 ,  G06T7/32

摘要： The difference data between the real patter data Sij, and a 5×5 window with a noticed pixel in the center and the design pattern data Rij obtained by the design pattern data of the window being shifted in a plurality of directions with respect to the design pattern data Rij is found by a shift direction operation section, and the design pattern data in the direction in which the total of the pixels is minimum is selected from the difference data by a selection section, the difference between the central pixels Sij, Qij of the selected design pattern data and the central pixels Sij, Qij of the windows of the real pattern data is found by a difference operation section, and the difference and a threshold are compared in a defect judgement section, and thereby the pattern inspection of the object is carried out.

摘要翻译： 实际图形数据Sij和中心处的注意像素的5×5窗口与通过相对于设计图案数据在多个方向上偏移的窗口的设计图案数据获得的设计图案数据Rij之间的差分数据 通过移位方向操作部分找到Rij，并且通过选择部分从差分数据中选择像素总数最小的方向上的设计图案数据，所选择的中心像素Sij，Qij之间的差异 设计图案数据和实际图案数据的窗口的中心像素Sij，Qij由差异运算部分找到，并且在缺陷判断部分比较差异和阈值，从而携带对象的图案检查 出来

公开(公告)号：US20090257789A1

公开(公告)日：2009-10-15

申请号：US12422888

申请日：2009-04-13

申请人： John JANSEN ,  Tsuyoshi Tokiwa ,  Eiji Sawa

发明人： John JANSEN ,  Tsuyoshi Tokiwa ,  Eiji Sawa

IPC分类号： G03G15/08 ,  B05D5/06

CPC分类号： G03G15/0818 ,  B65H27/00 ,  B65H2401/11 ,  C08L33/06 ,  C09D5/24 ,  C09D175/06 ,  G03G15/0233 ,  G03G15/1685 ,  G03G2215/0861 ,  C08L2666/04

摘要： Developing roller comprising a conductive mandrel with at least an elastic conductive base layer and a charge providing layer. The base layer is located closer to the mandrel than the charge providing layer. The base layer is roughened before the charge providing layer is applied to the base layer.

摘要翻译： 显影辊包括具有至少弹性导电基底层和电荷提供层的导电芯棒。 基底层比电荷提供层更靠近心轴。 在将电荷提供层施加到基底层之前，将基底层粗糙化。

公开(公告)号：US06875884B1

公开(公告)日：2005-04-05

申请号：US10019652

申请日：2000-07-28

申请人： Janak Padia ,  Michael Hocker ,  Tsuyoshi Nishitoba ,  Hirohi Ohashi ,  Eiji Sawa

发明人： Janak Padia ,  Michael Hocker ,  Tsuyoshi Nishitoba ,  Hirohi Ohashi ,  Eiji Sawa

IPC分类号： C07C275/28 ,  C07C275/30 ,  C07C275/38 ,  C07C275/42 ,  C07C323/25 ,  C07C335/16 ,  C07D207/09 ,  C07D209/16 ,  C07D213/38 ,  C07D213/75 ,  C07D215/12 ,  C07D233/54 ,  C07D233/61 ,  C07D257/04 ,  C07D277/66 ,  C07D307/52 ,  C07D307/68 ,  C07D317/58 ,  C07D333/20 ,  C07C205/00 ,  C07C229/00 ,  C07C327/00 ,  C07D215/38

CPC分类号： C07C323/25 ,  C07C275/28 ,  C07C275/30 ,  C07C275/38 ,  C07C275/42 ,  C07C335/16 ,  C07C2601/02 ,  C07C2601/04 ,  C07C2601/14 ,  C07C2602/08 ,  C07C2602/10 ,  C07D207/09 ,  C07D209/16 ,  C07D213/38 ,  C07D213/75 ,  C07D215/12 ,  C07D233/54 ,  C07D257/04 ,  C07D277/66 ,  C07D307/52 ,  C07D307/68 ,  C07D317/58 ,  C07D333/20

摘要： Urea and thiourea derivatives inhibit cell function of the chemokine receptor CCR-3. These compounds offer an effective means for treating a range of diseases thought to be mediated by the CCR-3 receptor. A variety of useful urea and thiourea derivatives can be synthesized using liquid and solid phase synthesis protocols.

摘要翻译： 尿素和硫脲衍生物抑制趋化因子受体CCR-3的细胞功能。 这些化合物提供了治疗被认为是由CCR-3受体介导的一系列疾病的有效手段。 可以使用液相和固相合成方案合成各种有用的脲和硫脲衍生物。