LASER MODULE AND LASER SYSTEM INCLUDING THE SAME

    公开(公告)号:US20200021075A1

    公开(公告)日:2020-01-16

    申请号:US16509860

    申请日:2019-07-12

    摘要: Provided is a laser module that receives a first laser beam and outputs a second laser beam different from the first laser beam, the laser module including an optical system configured to modulate the first laser beam into the second laser beam and output the second laser beam, a first mirror disposed on an optical path of the first or second laser beam defined in the laser module, the first mirror reflecting the first laser beam to the optical system, a first sensor disposed adjacent to the first mirror and configured to sense the first laser beam incident to the first mirror, a second mirror disposed on the optical path to reflect the second laser beam to an outside of the laser module, and a first driver connected to the second mirror and configured to rotate the second mirror.

    ION GENERATING APPARATUS, AND TREATING APPARATUS AND TREATING METHOD USING THE SAME
    2.
    发明申请
    ION GENERATING APPARATUS, AND TREATING APPARATUS AND TREATING METHOD USING THE SAME 有权
    离子发生装置,以及使用其的处理装置和处理方法

    公开(公告)号:US20160236011A1

    公开(公告)日:2016-08-18

    申请号:US15044986

    申请日:2016-02-16

    IPC分类号: A61N5/10

    摘要: Provided is a treating apparatus including an ion generating apparatus configured to inject ionized elements into a diagnosis subject to remove a tumor in the diagnosis subject, and an image photographing apparatus configured to measure positions of the ionized elements in the diagnosis subject. The ion generating apparatus includes a target including a first element and a first isotope that is a radioactive isotope of the first element, and a laser configured to allow a laser beam to be incident on the target and thus ionize the first element and the first isotope.

    摘要翻译: 本发明提供一种处理装置,其包括:离子发生装置,被配置为将离子化元素注入到诊断对象中以去除诊断对象中的肿瘤;以及图像拍摄装置,被配置为测量诊断对象中的电离元件的位置。 离子产生装置包括:靶,其包括第一元素和作为第一元素的放射性同位素的第一同位素;以及激光,被配置为允许激光束入射到靶上,从而使第一元素和第一同位素 。

    HIGH POWER ULTRA-SHORT LASER DEVICE
    3.
    发明申请
    HIGH POWER ULTRA-SHORT LASER DEVICE 有权
    大功率超短激光器件

    公开(公告)号:US20150288126A1

    公开(公告)日:2015-10-08

    申请号:US14264307

    申请日:2014-04-29

    IPC分类号: H01S3/00 H01S3/102 H01S3/11

    摘要: Disclosed is a high power ultra-short pulsed laser device increasing pulse energy by using resonators. A pulsed laser device may comprise a first resonator making a pump beam resonate primarily and passing the pump beam which resonated through a first output mirror; and a second resonator comprising a first multiple reflection mirror and a second multiple reflection mirror. Also, the first multiple reflection mirror includes at least one first small area mirror, and the second multiple reflection mirror includes at least one second small area mirror, and the second resonator makes the laser beam delivered from the first resonator resonate by reflecting the laser beam repetitively. Therefore, the pulsed laser device may increase pulse energy without using a multi-stage amplifier so that a high power ultra-short pulsed laser beam can be generated.

    摘要翻译: 公开了一种通过使用谐振器增加脉冲能量的大功率超短脉冲激光器件。 脉冲激光装置可以包括使泵浦光束主要谐振并使通过第一输出镜谐振的泵浦光束通过的第一谐振器; 以及包括第一多反射镜和第二多反射镜的第二谐振器。 此外,第一多反射镜包括至少一个第一小面积反射镜,并且第二多反射镜包括至少一个第二小面积反射镜,并且第二谐振器使得从第一谐振器传递的激光束通过反射激光束而谐振 重复。 因此,脉冲激光装置可以在不使用多级放大器的情况下增加脉冲能量,从而可以产生高功率超短脉冲激光束。

    OPTICAL DEVICE WITH HIGH DAMAGE THRESHOLD
    8.
    发明申请
    OPTICAL DEVICE WITH HIGH DAMAGE THRESHOLD 审中-公开
    具有高损耗阈值的光学器件

    公开(公告)号:US20150093072A1

    公开(公告)日:2015-04-02

    申请号:US14480504

    申请日:2014-09-08

    IPC分类号: G02B6/35

    摘要: Provided is an optical device having a high damage threshold, the optical device including a coating layer applied to cover a substrate and an optical switch formed of a carbon material and disposed on one side of the substrate, which may have a greatly increased damage threshold through the coating layer and thus, a characteristic of the optical device may be effectively adjusted.

    摘要翻译: 提供了一种具有高损伤阈值的光学器件,该光学器件包括涂覆在基底上的涂层和由碳材料形成并设置在基底一侧上的光学开关,其可能具有大大增加的损伤阈值 因此可以有效地调整涂层以及光学装置的特性。