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1.发明授权Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels 有权具有用于两个照明通道的开关装置的舞台装置，光刻装置和装置制造方法公开(公告)号：US07924406B2
公开(公告)日：2011-04-12
申请号：US11445466
申请日：2006-06-02
申请人： Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
发明人： Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
IPC分类号： G03B27/72
CPC分类号： G03F7/70733 , G03F7/70208 , G03F7/70283 , G03F7/70466
摘要： An illuminator for a lithographic apparatus includes a first illuminator channel, a second illuminator channel, a first switch device, an additional illuminator part and a second switch device. Each of the first and the second illuminator channel includes elements which are adjustable to provide a radiation beam with at least one desired property. The first switch device is configured to receive the radiation beam and arranged to direct the radiation beam between the first and second illuminator channels. The second switch device is arranged to receive the radiation beam from the first and second illuminator channels and direct the radiation beam through the additional illuminator part. The additional illuminator part includes elements which apply at least one additional desired property to the radiation beam.
摘要翻译： 用于光刻设备的照明器包括第一照明器通道，第二照明器通道，第一开关器件，附加照明器部件和第二开关器件。 第一和第二照明器通道中的每一个包括可调节的元件，以提供具有至少一个期望特性的辐射束。 第一开关装置被配置为接收辐射束并被布置成将辐射束引导在第一和第二照射器通道之间。 第二开关装置被布置成从第一和第二照明器通道接收辐射束并且引导辐射束通过附加照明器部分。 附加照明器部分包括将至少一个附加期望特性应用于辐射束的元件。
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2.发明授权公开(公告)号：US07671968B2
公开(公告)日：2010-03-02
申请号：US11486378
申请日：2006-07-14
申请人： Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
发明人： Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
IPC分类号： G03B27/72
CPC分类号： G03F7/70733 , G03F7/70208 , G03F7/70283 , G03F7/70466
摘要： A lithographic apparatus includes a masking device that includes a first masking part configured to obscure a first part of a first patterning device before the pattern of the first patterning device is impinged by a radiation beam, a second masking part having an adjustable length, the second masking part configured to obscure a second part of the first patterning device after the pattern of the first patterning device is impinged by the radiation beam and to obscure a first part of a second patterning device before the pattern of the second patterning device is impinged by the radiation beam, and a third masking part configured to obscure a second part of the second patterning device after the pattern of the second patterning device is impinged by the radiation beam.
摘要翻译： 光刻设备包括掩模装置，该掩模装置包括第一掩蔽部分，其被配置为在第一图案形成装置的图案被辐射束撞击之前遮蔽第一图案形成装置的第一部分，第二掩模部分具有可调长度，第二掩模部分 掩模部件被配置为在第一图案形成装置的图案被辐射束撞击之后遮蔽第一图案形成装置的第二部分，并且在第二图案形成装置的图案被第二图案形成装置的图案撞击之前使第二图案形成装置的第一部分模糊 辐射束和第三掩模部分，其被配置为在第二图案形成装置的图案被辐射束撞击之后使第二图案形成装置的第二部分模糊。
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3.发明授权Lithographic apparatus, device manufacturing method and computer program product 有权平版印刷设备，设备制造方法和计算机程序产品公开(公告)号：US07903234B2
公开(公告)日：2011-03-08
申请号：US11984837
申请日：2007-11-21
申请人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
发明人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
CPC分类号： G03F7/70891 , G03F7/70108 , G03F7/70158
摘要： In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.
摘要翻译： 在光刻设备中，使用照射模式来执行校正照射程序，所述照明模式被布置成在生产曝光期间将相对不加热的瞳孔平面附近的投影系统的元件的选定部分加热。 校正辐射程序旨在提高投影系统的光学元件加热的均匀性和/或降低相位梯度。
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4.发明申请Lithographic apparatus, device manufacturing method and computer program product 有权平版印刷设备，设备制造方法和计算机程序产品公开(公告)号：US20080158528A1
公开(公告)日：2008-07-03
申请号：US11984837
申请日：2007-11-21
申请人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
发明人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
CPC分类号： G03F7/70891 , G03F7/70108 , G03F7/70158
摘要： In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.
摘要翻译： 在光刻设备中，使用照射模式来执行校正照射程序，所述照明模式被布置成在生产曝光期间将相对不加热的瞳孔平面附近的投影系统的元件的选定部分加热。 校正辐射程序旨在提高投影系统的光学元件加热的均匀性和/或降低相位梯度。
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5.发明申请RADIATION MODULATOR FOR A LITHOGRAPHY APPARATUS, A LITHOGRAPHY APPARATUS, A METHOD OF MODULATING RADIATION FOR USE IN LITHOGRAPHY, AND A DEVICE MANUFACTURING METHOD 有权用于光刻设备的辐射调制器，光刻设备，用于在地平线中使用的调制辐射的方法和设备制造方法公开(公告)号：US20140211189A1
公开(公告)日：2014-07-31
申请号：US14165334
申请日：2014-01-27
申请人： Dries SMEETS , Arno Jan Bleeker , Chris Lee , Pieter Willem Herman De Jager , Heine Melle Mulder , Rudy Jan Maria Pellens
发明人： Dries SMEETS , Arno Jan Bleeker , Chris Lee , Pieter Willem Herman De Jager , Heine Melle Mulder , Rudy Jan Maria Pellens
CPC分类号： G03F7/70191 , G03F7/70291
摘要： A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.
摘要翻译： 公开了一种用于光刻设备的辐射调制器，光刻设备，调制用于光刻的辐射的方法，以及器件制造方法。 用于光刻设备的辐射调制器可以具有支持波长小于450nm的辐射的多个波导， 以及调制部，被配置为单独地调制在每个波导中传播的辐射，以便提供调制的多个输出光束。
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公开(公告)号：US09563135B2
公开(公告)日：2017-02-07
申请号：US13239034
申请日：2011-09-21
CPC分类号： G03F7/70566 , G03F7/7005 , G03F7/70625
摘要： A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more illumination source points in a pupil plane of the illumination source; changing a polarization state of each pixel group and determining an incremental effect on each of the plurality of critical dimensions resulting from the change of polarization state; calculating a first plurality of sensitivity coefficients for each of the plurality of critical dimensions using the determined incremental effects; selecting an initial illumination source; iteratively calculating a lithographic metric as a result of a change of polarization state using the calculated first plurality of sensitivity coefficients, the change of the polarization state of the pixel group in the initial illumination source creating a modified illumination source; and adjusting the initial illumination source based on the iterative results of calculations.
摘要翻译： 一种用于配置光刻设备的照明源的方法，所述方法包括将照明源分为像素组，每个像素组包括照明源的光瞳平面中的一个或多个照明源点; 改变每个像素组的偏振态，并确定由偏振状态改变导致的多个临界尺度中的每一个的增量效应; 使用所确定的增量效应来计算所述多个关键尺寸中的每一个的第一多个灵敏度系数; 选择初始照明源; 使用所计算的第一多个灵敏度系数来迭代地计算作为偏振态的变化的结果的光刻度量，所述初始照明源中的像素组的偏振状态的改变创建修改的照明源; 并根据迭代计算结果调整初始照明源。
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公开(公告)号：US20130107238A1
公开(公告)日：2013-05-02
申请号：US13663924
申请日：2012-10-30
申请人： Heine Melle Mulder
发明人： Heine Melle Mulder
CPC分类号： G03F7/2008 , G03F7/26 , G03F7/70391 , G03F7/704 , G03F7/70575
摘要： A apparatus having a projection system to project a plurality of radiation beams onto a substrate, wherein the plurality of radiation beams includes a first group of one or more radiation beams formed from radiation within a first wavelength range and a second group of one or more radiation beams formed from radiation within a second wavelength range, different from the first wavelength range. The apparatus also has a dispersion element configured such that one or more radiation beams of the first group are incident on the dispersion element at a different angle from the one or more radiation beams of the second group and such that the one or more radiation beams of the first and second group output from the dispersion element are substantially parallel.
摘要翻译： 一种具有投影系统以将多个辐射束投影到衬底上的投影系统的装置，其中所述多个辐射束包括由第一波长范围内的辐射和第一组一个或多个辐射形成的第一组一个或多个辐射束 在与第一波长范围不同的第二波长范围内的辐射形成的光束。 该装置还具有一个色散元件，其配置成使得第一组的一个或多个辐射束以与第二组的一个或多个辐射束不同的角度入射在分散元件上，并且使得一个或多个辐射束 从分散元件输出的第一和第二组基本上是平行的。
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公开(公告)号：US08052289B2
公开(公告)日：2011-11-08
申请号：US11448152
申请日：2006-06-07
CPC分类号： G03F7/70875 , G03F7/70116 , G03F7/70291 , G03F7/70858
摘要： A mirror array apparatus includes a carrier configured to support a plurality of individually adjustable reflective elements. At least one actuator is associated with each reflective element, the actuator being configured to adjust the orientation or position of the associated reflective element. The apparatus further includes a liquid in contact with at least a portion of the reflective elements.
摘要翻译： 镜阵列装置包括被配置为支撑多个可单独调节的反射元件的载体。 至少一个致动器与每个反射元件相关联，致动器被配置成调节相关联的反射元件的取向或位置。 该装置还包括与至少一部分反射元件接触的液体。
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公开(公告)号：US20090190197A1
公开(公告)日：2009-07-30
申请号：US12318034
申请日：2008-12-19
申请人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
发明人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
IPC分类号： G02B26/08
CPC分类号： G03F7/70291 , G02B26/0841 , G03F7/70508 , G09G3/006 , G09G3/346
摘要： A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.
摘要翻译： 一种控制单独可控元件阵列的元件的方法。 该方法包括改变驱动元件的驱动电压的频率。
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10.发明授权公开(公告)号：US07030958B2
公开(公告)日：2006-04-18
申请号：US10748849
申请日：2003-12-31
申请人： Cornelis Petrus Andreas Marie Luijkx , Vadim Yevgenyevich Banine , Hako Botma , Martinus Van Duijnhoven , Markus Franciscus Antonius Eurlings , Heine Melle Mulder , Johannes Hendrik Everhardus Aldegonda Muijderman , Cornelis Jacobus Van Duijn , Jan Jaap Krikke
发明人： Cornelis Petrus Andreas Marie Luijkx , Vadim Yevgenyevich Banine , Hako Botma , Martinus Van Duijnhoven , Markus Franciscus Antonius Eurlings , Heine Melle Mulder , Johannes Hendrik Everhardus Aldegonda Muijderman , Cornelis Jacobus Van Duijn , Jan Jaap Krikke
IPC分类号： G03B27/52
CPC分类号： G03F7/70191 , G03F7/70066 , G03F7/70116 , G03F7/70558
摘要： An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.
摘要翻译： 光衰减器装置使用至少一个光衰减器元件来操作以去除具有高于平均强度的辐射束的一部分。 该装置具有应用于辐射系统和/或光刻设备，特别是扫描光刻设备中，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。
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