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公开(公告)号：US07643146B2
公开(公告)日：2010-01-05
申请号：US11336388
申请日：2006-01-20
IPC分类号： G01N21/47
CPC分类号： B01L3/50853 , B01L2200/0684 , B01L2300/0654 , B01L2300/0829 , G01N21/0303 , G01N21/49
摘要： Methods and apparatus for performing scatterometry measurements of biological samples as described herein. A substrate having formed therein one or more sample wells is provided. Each sample well is configured to hold a sample solution containing objects that are to be characterized based on their light scattering properties. One or more sample solutions are dispensed into the sample wells. A specular reflection reducing element is applied to at least some of the sample solutions in the sample wells to decrease reflections of light into one or more detectors. A light beam is directed from a light source onto the objects in the sample wells. Light scattered by the objects in the sample wells is collected and transmitted to one or more detectors. The signal from the detectors is analyzed to detect the one or more characteristics of the one or more samples.
摘要翻译： 如本文所述进行生物样品的散射测量的方法和装置。 提供了其中形成有一个或多个样品阱的衬底。 每个样品孔构造成容纳含有根据其光散射性质进行表征的物体的样品溶液。 将一种或多种样品溶液分配到样品孔中。 将镜面反射减少元件应用于样品阱中的至少一些样品溶液以减少光反射到一个或多个检测器中。 将光束从光源引导到样品孔中的物体上。 被样品孔中的物体散射的光被收集并传输到一个或多个检测器。 分析来自检测器的信号以检测一个或多个样品的一个或多个特性。
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公开(公告)号：US20110283941A1
公开(公告)日：2011-11-24
申请号：US12963445
申请日：2010-12-08
CPC分类号： C23C16/4588 , C23C16/24 , C30B29/06 , C30B35/005
摘要： One embodiment of the present invention provides a wafer-carrier system used in a deposition chamber for carrying wafers. The wafer-carrier system includes a base susceptor and a top susceptor nested inside the base susceptor with its wafer-mounting side facing the base susceptor's wafer-mounting side, thereby forming a substantially enclosed narrow channel. The base susceptor provides an upward support to the top susceptor.
摘要翻译： 本发明的一个实施例提供了用于承载晶片的沉积室中使用的晶片载体系统。 晶片载体系统包括嵌入在基座内部的基座和顶部基座，其底部基座的晶片安装侧面向基座的晶片安装侧，从而形成基本封闭的窄通道。 基座为顶部感受器提供向上的支撑。
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公开(公告)号：US09441295B2
公开(公告)日：2016-09-13
申请号：US12952127
申请日：2010-11-22
IPC分类号： C23C16/455 , C30B25/14
CPC分类号： C23C16/45565 , C23C16/45512 , C23C16/45514 , C23C16/45561 , C23C16/45563 , C23C16/45578 , C30B25/14 , Y10T137/8158
摘要： One embodiment of the present invention provides a gas-delivery system for delivering reaction gas to a reactor chamber. The gas-delivery system includes a main gas-inlet port for receiving reaction gases and a gas-delivery plate that includes a plurality of gas channels. A gas channel includes a plurality of gas holes for allowing the reaction gases to enter the reactor chamber from the gas channel. The gas-delivery system further includes a plurality of sub-gas lines coupling together the main gas-inlet port and the gas-delivery plate, and a respective sub-gas line is configured to deliver a portion of the received reaction gases to a corresponding gas channel.
摘要翻译： 本发明的一个实施例提供了一种用于将反应气体输送到反应室的气体输送系统。 气体输送系统包括用于接收反应气体的主气体入口和包括多个气体通道的气体输送板。 气体通道包括用于允许反应气体从气体通道进入反应室的多个气孔。 气体输送系统还包括将主气体入口和气体输送板连接在一起的多个子气体管线，并且相应的副气体管线被配置为将一部分接收的反应气体输送到相应的 气体通道。
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公开(公告)号：US20110277688A1
公开(公告)日：2011-11-17
申请号：US13079623
申请日：2011-04-04
CPC分类号： H01L31/18 , C23C16/44 , C23C16/52 , F16F15/0232 , F16F15/027 , F16F15/0275 , F16M11/046 , F16M11/18
摘要： One embodiment of the present invention provides a support system for providing dynamic support to a deposition reactor. The system includes a coupling mechanism configured to provide coupling between the deposition reactor and the support system, an attachment mechanism configured to attach the support system to an external frame, and at least one gas bellows situated between the coupling mechanism and the attachment mechanism.
摘要翻译： 本发明的一个实施例提供了一种用于向沉积反应器提供动态支持的支撑系统。 该系统包括配置成在沉积反应器和支撑系统之间提供耦合的联接机构，被配置成将支撑系统连接到外部框架的附接机构，以及位于联接机构和附接机构之间的至少一个气体波纹管。
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公开(公告)号：US09240513B2
公开(公告)日：2016-01-19
申请号：US13079623
申请日：2011-04-04
IPC分类号： H01L31/18 , F16F15/027 , C23C16/44 , C23C16/52 , F16F15/023
CPC分类号： H01L31/18 , C23C16/44 , C23C16/52 , F16F15/0232 , F16F15/027 , F16F15/0275 , F16M11/046 , F16M11/18
摘要： One embodiment of the present invention provides a support system for providing dynamic support to a deposition reactor. The system includes a coupling mechanism configured to provide coupling between the deposition reactor and the support system, an attachment mechanism configured to attach the support system to an external frame, and at least one gas bellows situated between the coupling mechanism and the attachment mechanism.
摘要翻译： 本发明的一个实施例提供了一种用于向沉积反应器提供动态支持的支撑系统。 该系统包括配置成在沉积反应器和支撑系统之间提供耦合的联接机构，被配置成将支撑系统连接到外部框架的附接机构，以及位于联接机构和附接机构之间的至少一个气体波纹管。
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公开(公告)号：US08562745B2
公开(公告)日：2013-10-22
申请号：US12963445
申请日：2010-12-08
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： C23C16/4588 , C23C16/24 , C30B29/06 , C30B35/005
摘要： One embodiment of the present invention provides a wafer-carrier system used in a deposition chamber for carrying wafers. The wafer-carrier system includes a base susceptor and a top susceptor nested inside the base susceptor with its wafer-mounting side facing the base susceptor's wafer-mounting side, thereby forming a substantially enclosed narrow channel. The base susceptor provides an upward support to the top susceptor.
摘要翻译： 本发明的一个实施例提供了用于承载晶片的沉积室中使用的晶片载体系统。 晶片载体系统包括嵌入在基座内部的基座和顶部基座，其底部基座的晶片安装侧面向基座的晶片安装侧，从而形成基本封闭的窄通道。 基座为顶部感受器提供向上的支撑。
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公开(公告)号：US20110277690A1
公开(公告)日：2011-11-17
申请号：US12952127
申请日：2010-11-22
IPC分类号： F16K37/00 , C23C16/511
CPC分类号： C23C16/45565 , C23C16/45512 , C23C16/45514 , C23C16/45561 , C23C16/45563 , C23C16/45578 , C30B25/14 , Y10T137/8158
摘要： One embodiment of the present invention provides a gas-delivery system for delivering reaction gas to a reactor chamber. The gas-delivery system includes a main gas-inlet port for receiving reaction gases and a gas-delivery plate that includes a plurality of gas channels. A gas channel includes a plurality of gas holes for allowing the reaction gases to enter the reactor chamber from the gas channel. The gas-delivery system further includes a plurality of sub-gas lines coupling together the main gas-inlet port and the gas-delivery plate, and a respective sub-gas line is configured to deliver a portion of the received reaction gases to a corresponding gas channel.
摘要翻译： 本发明的一个实施例提供了一种用于将反应气体输送到反应室的气体输送系统。 气体输送系统包括用于接收反应气体的主气体入口和包括多个气体通道的气体输送板。 气体通道包括用于允许反应气体从气体通道进入反应室的多个气孔。 气体输送系统还包括将主气体入口和气体输送板连接在一起的多个子气体管线，并且相应的副气体管线被配置为将一部分接收的反应气体输送到相应的 气体通道。
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