CHEMICAL MECHANICAL POLISHER AND POLISHING PAD COMPONENT THEREOF
    2.
    发明申请
    CHEMICAL MECHANICAL POLISHER AND POLISHING PAD COMPONENT THEREOF 有权
    化学机械抛光和抛光垫组件

    公开(公告)号:US20120276825A1

    公开(公告)日:2012-11-01

    申请号:US13240733

    申请日:2011-09-22

    申请人: FENG CHEN

    发明人: FENG CHEN

    IPC分类号: B24D11/00

    摘要: This disclosure is directed to a chemical mechanical polisher and a polishing pad component thereof. The chemical mechanical polisher comprises a polishing platen having a flat surface, and the polishing platen comprises: an electromagnet disposed under the flat surface and configured to fix a polishing pad base on the flat surface; and a switch configured to control the power-on and power-off of the electromagnet. The polishing pad component comprises a polishing pad base, and the polishing pad base is formed of a ferromagnetic material. The chemical mechanical polisher of this disclosure and the polishing pad component thereof can make polishing pad replacement easy, and can also save polishing pads and thus reduce the consumable cost of the chemical mechanical polishing.

    摘要翻译: 本公开涉及一种化学机械抛光机及其抛光垫组件。 所述化学机械抛光机包括具有平坦表面的抛光台板,并且所述抛光台板包括:设置在所述平坦表面下方并且被配置为将抛光垫基座固定在所述平坦表面上的电磁体; 以及被配置为控制电磁体的通电和断电的开关。 抛光垫部件包括抛光垫基座,并且抛光垫基座由铁磁材料形成。 本公开的化学机械抛光机及其抛光垫组件可以使抛光垫更换容易,并且还可以节省抛光垫,从而降低化学机械抛光的消耗成本。

    ELECTRICAL CONNECTOR WITH AN IMPROVED OUTER COVER
    3.
    发明申请
    ELECTRICAL CONNECTOR WITH AN IMPROVED OUTER COVER 审中-公开
    具有改进外盖的电连接器

    公开(公告)号:US20120115365A1

    公开(公告)日:2012-05-10

    申请号:US13290148

    申请日:2011-11-07

    IPC分类号: H01R13/40

    摘要: An electrical connector, comprising: a mating portion, a cable electrically connected to the mating portion, an inner molding molded on a rear end of the mating portion and a front end of the cable, an outer cover assembled on the inner molding and enclosing the front portion of the inner molding and an outer molding enclosing the rear portion of the inner molding and attached to the outer cover. The inner molding defines a front portion located on a front end thereof, a rear portion located on a rear end thereof and a groove between the front portion and the rear portion.

    摘要翻译: 一种电连接器,包括:配合部分,电连接到所述配合部分的电缆,在所述配合部分的后端上模制的内部模制件和所述电缆的前端,外盖,其组装在所述内部模制件上并且包围 内部模制件的前部和封闭内部模制件的后部并且附接到外部盖的外部模制件。 内部模制件限定位于其前端的前部,位于其后端的后部和在前部和后部之间的凹槽。

    STYLUS RETAINING MECHANISM FOR PORTABLE ELECTRONIC DEVICE
    5.
    发明申请
    STYLUS RETAINING MECHANISM FOR PORTABLE ELECTRONIC DEVICE 审中-公开
    便携式电子设备的STYLUS保持机构

    公开(公告)号:US20110169784A1

    公开(公告)日:2011-07-14

    申请号:US12826806

    申请日:2010-06-30

    IPC分类号: G06F3/033

    摘要: A stylus retaining mechanism for portable electronic device includes a main body, a latching portion, and an elastic member. The main body defines an opening and a receiving chamber communicating with the opening. The latching portion is positioned at one side of the receiving chamber spaced from the opening. The elastic member is fixed in the receiving chamber adjacent to the opening. The stylus is received in the receiving chamber. The elastic member prevents the stylus from separating from the main body when the stylus is disengaged from the latching portion.

    摘要翻译: 用于便携式电子设备的触笔保持机构包括主体,闩锁部分和弹性部件。 主体限定了与开口连通的开口和接收室。 闩锁部分位于接收室的与开口间隔开的一侧。 弹性构件固定在邻近开口的容纳室中。 触针被接收在接收室中。 当触针与闩锁部分分离时,弹性构件防止触针与主体分离。

    METHOD FOR REMOVING POLISHING BYPRODUCTS AND POLISHING DEVICE
    7.
    发明申请
    METHOD FOR REMOVING POLISHING BYPRODUCTS AND POLISHING DEVICE 有权
    通过产品和抛光装置去除抛光的方法

    公开(公告)号:US20120309278A1

    公开(公告)日:2012-12-06

    申请号:US13308526

    申请日:2011-11-30

    申请人: FENG CHEN Mingqi Li

    发明人: FENG CHEN Mingqi Li

    IPC分类号: B24B55/00 B08B6/00

    摘要: A method for removing polishing byproducts and a polishing device are provided. The method includes mounting a positive electrode on the center of a polishing platen and a negative electrode on an edge of the polishing platen, applying a voltage between the positive electrode and the negative electrode after a polishing process for metal is finished, and rotating the polishing platen and rinsing a polishing pad with deionized water or a chemical cleaning solution to remove polishing byproducts that are formed in the polishing process. The combination of the centrifugal force and the electromotive force increases the removal rate of the polishing byproducts.

    摘要翻译: 提供了去除抛光副产物的方法和抛光装置。 该方法包括将正极安装在研磨台板的中心和负极上,在研磨台板的边缘上,在金属抛光处理完成之后,在正极和负极之间施加电压,并旋转抛光 压板并用去离子水或化学清洁溶液冲洗抛光垫以除去在抛光过程中形成的抛光副产物。 离心力和电动势的组合增加了抛光副产物的去除率。

    CLEANING DEVICE AND A CLEANING METHOD OF A FIXED ABRASIVES POLISHING PAD
    8.
    发明申请
    CLEANING DEVICE AND A CLEANING METHOD OF A FIXED ABRASIVES POLISHING PAD 有权
    清洁装置和固定抛光抛光垫的清洁方法

    公开(公告)号:US20120167924A1

    公开(公告)日:2012-07-05

    申请号:US13211306

    申请日:2011-08-17

    申请人: FENG CHEN

    发明人: FENG CHEN

    IPC分类号: B08B7/00 B24B55/00

    CPC分类号: B24B53/017 B24B37/245

    摘要: A device for cleaning a fixed abrasive polishing pad includes a main body having a surface facing the polishing pad, an inlet coupled to an end of the main body and configured to supply a cleaning liquid, an inject orifice coupled to the inlet for injecting the cleaning liquid and being provided on the surface of the main body, an outlet coupled to the end of the main body, and a recycle orifice coupled to the outlet, and being provided on the surface of the main body.

    摘要翻译: 用于清洁固定研磨抛光垫的装置包括具有面向抛光垫的表面的主体,连接到主体的端部并被构造成供应清洁液体的入口,连接到入口的注射孔,用于注入清洁 液体并且设置在主体的表面上,连接到主体的端部的出口和联接到出口的再循环孔,并且设置在主体的表面上。