公开(公告)号：US20240023454A1

公开(公告)日：2024-01-18

申请号：US18472168

申请日：2023-09-21

Applicant: FUJIFILM CORPORATION

Inventor： Hiroyuki KOBAYASHI ,  Seigo NAKAMURA ,  Fumihiko MOCHIZUKI ,  Hideaki TANAKA ,  Kenichiro INOUE ,  Yasushi TOYOSHIMA

IPC: H10N30/87 ,  C23C14/08 ,  C23C14/34 ,  H10N30/853 ,  H10N30/06

CPC classification number: H10N30/878 ,  C23C14/08 ,  C23C14/34 ,  H10N30/8554 ,  H10N30/06

Abstract: In a piezoelectric element including, on a substrate in the following order, a lower electrode layer, a piezoelectric film, and an upper electrode layer, the upper electrode layer includes an oxide conductive layer, has an interface layer containing a constituent element of the oxide conductive layer and an OH group, between the piezoelectric film and the oxide conductive layer of the upper electrode layer, where the interface layer has an amorphous structure and has a thickness of 1 nm or more and 5 nm or less, and in a case where a peak intensity of binding energy derived from a 1s orbital of oxygen bonded to a metal is denoted as α, and a peak intensity of binding energy derived from a 1s orbital of oxygen constituting the OH group is denoted as γ, a peak intensity ratio γ/α is 0.35 or more.

公开(公告)号：US20180087010A1

公开(公告)日：2018-03-29

申请号：US15810134

申请日：2017-11-12

Applicant: FUJIFILM Corporation

Inventor： Toshiya TAKAHASHI ,  Yasushi TOYOSHIMA ,  Junya ABE ,  Hidehiro MOCHIZUKI

IPC: C11D7/50 ,  G03F1/78 ,  G03F1/82 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/039 ,  G03F7/038 ,  G03F1/50 ,  C11D7/26 ,  C11D7/34

CPC classification number: C11D7/5022 ,  C11D7/265 ,  C11D7/34 ,  G03F1/50 ,  G03F1/78 ,  G03F1/82 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/16 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2037 ,  G03F7/322 ,  H01L21/027

Abstract: Provided is a pre-rinsing liquid used in a method including forming a resist film including an actinic ray-sensitive or radiation-sensitive composition on a substrate, and irradiating the resist film with actinic rays or radiation to form a pattern on the substrate, and used for subjecting the substrate to a pre-rinsing treatment before applying the actinic ray-sensitive or radiation-sensitive composition onto the substrate. The pre-rinsing liquid satisfies the following conditions (1) and (2): (1) the pre-rinsing liquid includes 80% by mass or more of an organic solvent with respect to the total mass of the pre-rinsing liquid, and (2) the organic solvent is at least one organic solvent selected from the group consisting of alcohols, cyclic ethers, glycol ethers, glycol ether acetates, hydrocarbons, ketones, lactones, and esters.