公开(公告)号：US20100068658A1

公开(公告)日：2010-03-18

申请号：US12233298

申请日：2008-09-18

申请人： Fenghong Zhang ,  Jian Xu ,  Xinyu Zhang ,  Ching-Hwa Chen ,  Leu Mei

发明人： Fenghong Zhang ,  Jian Xu ,  Xinyu Zhang ,  Ching-Hwa Chen ,  Leu Mei

IPC分类号： G03F7/20

CPC分类号： G03F1/00 ,  G03F7/70558

摘要： A pillar array is printed in positive photoresist using an optical mask (108) having an array of features (310) corresponding to the pillars. The pillars' width/length dimensions are below the exposure wavelength. Superior results can be achieved (less peeling off of the pillars and less overexposure at the center of each pillar) if the mask features (310) are downsized relative to the pillars' target sizes, and the exposure energy is reduced. Negative photoresist (with a dark field mask) can be used, and can provide good results (in terms of pillars peeling-off) if the combined area of the features (410) corresponding to the pillars is smaller than the area between the features (410).

摘要翻译： 使用具有对应于柱的特征阵列（310）的光学掩模（108）将柱阵列印刷在正性光致抗蚀剂中。 支柱的宽度/长度尺寸低于曝光波长。 如果掩模特征（310）相对于柱体的目标尺寸减小，并且曝光能量减小，则可以实现优异的结果（较少的柱的剥离和在每个柱的中心处较少的过度曝光）。 如果与柱相对应的特征（410）的组合面积小于特征之间的面积，则可以使用负光致抗蚀剂（具有暗场掩模），并且可以提供良好的结果（在柱子剥离方面） 410）。

公开(公告)号：US20090297956A1

公开(公告)日：2009-12-03

申请号：US12128456

申请日：2008-05-28

申请人： Fenghong Zhang ,  Xinyu Zhang ,  Jian Xu

发明人： Fenghong Zhang ,  Xinyu Zhang ,  Jian Xu

IPC分类号： G03F1/00 ,  G03F7/20

CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F1/50

摘要： In photolithographic exposure, a feature (144) of an optical mask is projected onto a dark area (160). The light intensity inside the dark area is reduced by providing a non-printable clear cutout (410) inside the feature. The optical mask has the same optical pathlength outside the feature (144) adjacent to the entire outer boundary of the feature as at the cutout, the optical pathlength being measured along the optical mask's thickness.

摘要翻译： 在光刻曝光中，将光学掩模的特征（144）投影到暗区（160）上。 通过在特征内部提供不可打印的清晰切口（410）来减少暗区内的光强度。 光掩模在与切口处相同的特征的整个外边界附近的特征（144）之外具有相同的光程，沿着光学掩模的厚度测量光程。

公开(公告)号：US07771903B2

公开(公告)日：2010-08-10

申请号：US12128456

申请日：2008-05-28

申请人： Fenghong Zhang ,  Xinyu Zhang ,  Jian Xu

发明人： Fenghong Zhang ,  Xinyu Zhang ,  Jian Xu

IPC分类号： G03F1/00 ,  G03C5/00

CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F1/50

摘要： In photolithographic exposure, a feature (144) of an optical mask is projected onto a dark area (160). The light intensity inside the dark area is reduced by providing a non-printable clear cutout (410) inside the feature. The optical mask has the same optical pathlength outside the feature (144) adjacent to the entire outer boundary of the feature as at the cutout, the optical pathlength being measured along the optical mask's thickness.

摘要翻译： 在光刻曝光中，将光学掩模的特征（144）投影到暗区（160）上。 通过在特征内部提供不可打印的清晰切口（410）来减少暗区内的光强度。 光掩模在与切口处相同的特征的整个外边界附近的特征（144）之外具有相同的光程，沿着光学掩模的厚度测量光程。

公开(公告)号：USD971347S1

公开(公告)日：2022-11-29

申请号：US29842835

申请日：2022-06-16

申请人： Jian Xu

设计人： Jian Xu

公开(公告)号：USD864225S1

公开(公告)日：2019-10-22

申请号：US29603126

申请日：2017-05-06

申请人： Jian Xu ,  Zurong Fan ,  Mao Bao

设计人： Jian Xu ,  Zurong Fan ,  Mao Bao

公开(公告)号：US09983766B2

公开(公告)日：2018-05-29

申请号：US14631404

申请日：2015-02-25

申请人： Jian Xu

发明人： Jian Xu

IPC分类号： G06F3/048 ,  G06F3/0482 ,  H04M1/725 ,  G06F3/0488 ,  H04L12/58

CPC分类号： G06F3/0482 ,  G06F3/0488 ,  H04L51/22 ,  H04M1/72519 ,  H04M2250/22 ,  H04M2250/60

摘要： Embodiments relate to systems and methods providing a flip-though format for viewing notification of messages and related items on devices, for example personal mobile devices such as smart phones. According to an embodiment, an unread item most recently received is shown in full screen on the mobile device. While the user is viewing this item, the device will automatically retrieve and load into a cache memory, the next most recently received item. When the user is done viewing the item most recently received, the user can swipe a finger across the touch screen to trigger a page flipping animation and display of the next most recently received item. Embodiments avoid the user having to click back and forth between a list of notifications/links and corresponding notification items.

公开(公告)号：US09479921B2

公开(公告)日：2016-10-25

申请号：US14118950

申请日：2012-07-13

申请人： Jian Xu ,  Jin Sook Ryu ,  Kyung Min Park ,  Young Dae Lee ,  Sung Hoon Jung

发明人： Jian Xu ,  Jin Sook Ryu ,  Kyung Min Park ,  Young Dae Lee ,  Sung Hoon Jung

IPC分类号： H04W36/00 ,  H04W4/00 ,  H04W8/18 ,  H04W48/16 ,  H04W36/08 ,  H04W92/12 ,  H04W84/04

CPC分类号： H04W8/186 ,  H04W36/08 ,  H04W48/16 ,  H04W84/045 ,  H04W92/12

摘要： A method and apparatus for grouping home eNodeBs (HeNBs) in a wireless communication system is provided. The method includes grouping a plurality of HeNBs into at least one closed subscriber group (CSG) group, and transmitting an identifier (ID) of a specific CSG group to HeNBs included in the specific CSG group.

摘要翻译： 提供了一种用于在无线通信系统中对归属eNodeB（HeNB）进行分组的方法和装置。 该方法包括将多个HeNB分组成至少一个封闭用户组（CSG）组，并将特定CSG组的标识符（ID）发送到特定CSG组中包括的HeNB。

公开(公告)号：US09454076B2

公开(公告)日：2016-09-27

申请号：US14385238

申请日：2012-05-18

申请人： Guoqiang Yang ,  Jian Xu ,  Li Chen ,  Shuangqing Wang ,  Shayu Li

发明人： Guoqiang Yang ,  Jian Xu ,  Li Chen ,  Shuangqing Wang ,  Shayu Li

IPC分类号： C07C43/205 ,  G03F7/004 ,  C07C69/96 ,  C07C39/16 ,  C07C39/17 ,  C07C43/21 ,  G03F7/00 ,  G03F7/038 ,  G03F7/039 ,  C07C37/16 ,  C07C39/15 ,  C07C41/01 ,  C07C68/06

CPC分类号： G03F7/0045 ,  C07C37/16 ,  C07C39/15 ,  C07C39/16 ,  C07C39/17 ,  C07C41/01 ,  C07C43/205 ,  C07C43/2055 ,  C07C43/21 ,  C07C68/06 ,  C07C69/96 ,  C07C2603/92 ,  G03F7/0002 ,  G03F7/0382 ,  G03F7/0392

摘要： The present invention provides a class of molecular glass photoresist (I and II) comprising bisphenol A as a main structure and their preparation. The molecular glass photoresist is formulated with a photoacid generator, a cross-linking agent, a photoresist solvent, and other additives into a positive or negative photoresist. A photoresist with a uniform thickness is formed on a silicon wafer by spin-coating. The photoresist formulation can be used in modern lithography, such as 248 nm photolithography, 193 nm photolithography, extreme-ultraviolet (EUV) lithography, nanoimprint lithography, electron beam lithography, and particularly in the EUV-lithography technique.

公开(公告)号：US09426700B2

公开(公告)日：2016-08-23

申请号：US14000671

申请日：2012-03-23

申请人： Gene Beck Hahn ,  Kyung Min Park ,  Jian Xu

发明人： Gene Beck Hahn ,  Kyung Min Park ,  Jian Xu

IPC分类号： H04W36/00 ,  H04W84/00

CPC分类号： H04W36/0055 ,  H04W84/005

摘要： A method and apparatus for performing a handover procedure in a wireless communication system including a mobile relay node is provided. A target evolved NodeB (eNB) receives a handover request message containing a list of a plurality of user equipments (UEs) on the mobile relay node or a group handover indication. The target eNB performs an admission control for the plurality of UEs; and transmits a handover request acknowledge message containing a list of admitted UEs for handover among the plurality of UEs.

摘要翻译： 提供了一种用于在包括移动中继节点的无线通信系统中执行切换过程的方法和装置。 目标演进节点B（eNB）接收包含移动中继节点上的多个用户设备（UE）的列表的切换请求消息或组切换指示。 目标eNB对多个UE执行准入控制; 并且在多个UE之间发送包含被允许UE切换的列表的切换请求确认消息。

公开(公告)号：US09001708B2

公开(公告)日：2015-04-07

申请号：US13393198

申请日：2010-08-30

申请人： Dong Guk Lim ,  Young Soo Yuk ,  Jian Xu ,  Han Gyu Cho ,  Jin Young Chun ,  Jin Sam Kwak

发明人： Dong Guk Lim ,  Young Soo Yuk ,  Jian Xu ,  Han Gyu Cho ,  Jin Young Chun ,  Jin Sam Kwak

IPC分类号： H04J3/00 ,  H04B7/26 ,  H04L5/14

CPC分类号： H04B7/2656 ,  H04B7/2606 ,  H04L5/1469

摘要： The mobile station for transceiving signals using a predetermined time division duplex (TDD) frame structure in a wireless communication system includes a receiver for receiving a midamble from a base station (BS), and a relay station (RS). The receiver receives, from the BS, a first midamble through a second subframe of a downlink access zone of the BS and/or through a first subframe of a downlink relay zone that follows the downlink access zone. Alternatively, the receiver receives, from the RS, a second midamble through a second subframe of a downlink access zone of the RS. A transition gap in a downlink region is located in the last subframe of the downlink access zone of the RS, which follows the downlink access zone of the RS, and a transition gap in an uplink region is located in a first subframe of an uplink relay zone of the RS.

摘要翻译： 用于在无线通信系统中使用预定的时分双工（TDD）帧结构收发信号的移动台包括用于从基站（BS）接收中置码的接收机和中继站（RS）。 接收机通过BS的下行接入区的第二子帧和/或经由下行接入区之后的下行中继区的第一子帧从BS接收第一中间码。 或者，接收机通过RS的下行链路接入区的第二子帧从RS接收第二中间码。 下行链路区域中的过渡间隙位于RS的下行接入区的最后一个子帧中，RS的下行接入区跟随RS的下行接入区，上行链路区的第一子帧位于上行链路区 RS区。