公开(公告)号：US20060081791A1

公开(公告)日：2006-04-20

申请号：US11294475

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060081790A1

公开(公告)日：2006-04-20

申请号：US11294473

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

公开(公告)号：US20070176128A1

公开(公告)日：2007-08-02

申请号：US11643772

申请日：2006-12-22

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060086910A1

公开(公告)日：2006-04-27

申请号：US11294367

申请日：2005-12-06

申请人： Franciscus Maria Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y. Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

发明人： Franciscus Maria Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y. Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060012763A1

公开(公告)日：2006-01-19

申请号：US10889211

申请日：2004-07-13

申请人： Paul Hinnen ,  Richard Franciscus Van Haren ,  Hubertus Gertrudus Simons

发明人： Paul Hinnen ,  Richard Franciscus Van Haren ,  Hubertus Gertrudus Simons

IPC分类号： G03B27/42

CPC分类号： G03F7/70683 ,  G03F7/70283 ,  G03F7/70733

摘要： A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology target patterning device. The product patterning device imparts a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed. The metrology target patterning device imparts the radiation beam with a metrology target pattern in its cross-section representing at least one metrology target. The product patterning device is separate from the metrology target patterning device. A substrate table holds a substrate. A projection system project the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of the substrate. A metrology target patterning device controller adjusts the metrology target pattern independently of the product pattern.

公开(公告)号：US20060012779A1

公开(公告)日：2006-01-19

申请号：US11050457

申请日：2005-02-04

申请人： Paul Hinnen ,  Richard Franciscus Van Haren ,  Hubertus Gertrudus Simons

发明人： Paul Hinnen ,  Richard Franciscus Van Haren ,  Hubertus Gertrudus Simons

IPC分类号： G01N21/00

CPC分类号： G03F7/70283 ,  G03F7/70683 ,  G03F7/70733

摘要： A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology target patterning device. The product patterning device imparts a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed. The metrology target patterning device imparts the radiation beam with a metrology target pattern in its cross-section representing at least one metrology target. The product patterning device is separate from the metrology target patterning device. A substrate table holds a substrate. A projection system project the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of the substrate. A metrology target patterning device controller adjusts the metrology target pattern independently of the product pattern.

公开(公告)号：US20070021860A1

公开(公告)日：2007-01-25

申请号：US11484849

申请日：2006-07-12

申请人： Hubertus Gertrudus Simons ,  Henricus Lambertus Megens ,  Everhardus Mos ,  Leonardus Marie Verstappen ,  Roy Werkman ,  Henricus Maria Verhoeven

发明人： Hubertus Gertrudus Simons ,  Henricus Lambertus Megens ,  Everhardus Mos ,  Leonardus Marie Verstappen ,  Roy Werkman ,  Henricus Maria Verhoeven

IPC分类号： G06F19/00

CPC分类号： G03F9/7003 ,  G03F7/70516 ,  G03F7/70616 ,  G03F7/70633 ,  G03F9/7011 ,  G03F9/7019

摘要： A method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus is disclosed. First a set of grid models is provided. Subsequently, alignment data are obtained by performing an alignment measurement on a plurality of alignment marks on a number of substrates. For each grid model it is checked whether the alignment data is suitable to solve the grid model. If so, the grid model is added to a subset of grid models. The grid model with lowest residuals is selected. In addition to alignment data, metrology data may be obtained by performing an overlay measurement on a plurality of overlay marks on the number of substrates. For each grid model of the subset simulated metrology data may then be determined that is used to determine overlay performance indicators. The grid model is then selected using the overlay performance indicators.

摘要翻译： 公开了一种选择用于校正光刻设备中的网格变形的处理配方的网格模型的方法。 首先提供一组网格模型。 随后，通过对多个基板上的多个对准标记进行取向测量来获得对准数据。 对于每个网格模型，检查对齐数据是否适合解决网格模型。 如果是，则将网格模型添加到网格模型的子集中。 选择具有最低残差的网格模型。 除了对准数据之外，可以通过对基板数量上的多个覆盖标记执行覆盖测量来获得度量数据。 对于子集的每个网格模型，可以确定用于确定覆盖性能指标的模拟计量数据。 然后使用覆盖性能指标选择网格模型。