公开(公告)号：US20060081791A1

公开(公告)日：2006-04-20

申请号：US11294475

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060081790A1

公开(公告)日：2006-04-20

申请号：US11294473

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

公开(公告)号：US20060081792A1

公开(公告)日：2006-04-20

申请号：US11294559

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20050189502A1

公开(公告)日：2005-09-01

申请号：US10665404

申请日：2003-09-22

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Johannes Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Tolsma ,  Hubertus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Johannes Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Tolsma ,  Hubertus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00 ,  G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

公开(公告)号：US20050146699A1

公开(公告)日：2005-07-07

申请号：US11068895

申请日：2005-03-02

申请人： Leon Levasier ,  Arie Den Boef ,  Ingo Dirnstorfer ,  Andre Jeunink ,  Stefan Kruijswijk ,  Henricus Pellemans ,  Irwan Setija ,  Hoite Tolsma

发明人： Leon Levasier ,  Arie Den Boef ,  Ingo Dirnstorfer ,  Andre Jeunink ,  Stefan Kruijswijk ,  Henricus Pellemans ,  Irwan Setija ,  Hoite Tolsma

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F9/7003 ,  G03F9/7049 ,  G03F9/7076

摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.

摘要翻译： 根据本发明的一个实施例的光刻设备包括对准子系统，该对准子系统被配置为相对于图案化结构对准衬底台上的衬底。 对准结构包括非周期性特征，其可以被检测为例如。 在对准子系统中使用参考光栅的捕获位置或检查位置。 非周期性特征可能导致对准子系统的检测信号中的相位效应或幅度效应。

公开(公告)号：US20060061746A1

公开(公告)日：2006-03-23

申请号：US11226468

申请日：2005-09-15

申请人： Haico Kok ,  Hoite Tolsma ,  Gerbrand Zouw ,  Koen Kivits ,  Ron Van De Laak ,  Johannes Kuiper

发明人： Haico Kok ,  Hoite Tolsma ,  Gerbrand Zouw ,  Koen Kivits ,  Ron Van De Laak ,  Johannes Kuiper

IPC分类号： G03B27/42

CPC分类号： G03F7/70666 ,  G03F7/709 ,  G03F9/7096

摘要： The invention provides a method for determining vibration-related information by projecting an aerial image at an image position in a projection plane, mapping an intensity of the aerial image into an image map, the image map arranged for comprising values of coordinates of sampling locations and of the intensity sampled at each sampling location, and measuring intensity of the aerial image received through a slot pattern. The method further includes determining from the image map a detection position of a slope portion of the image map, at the detection position of the slope portion, measuring of a temporal intensity of the aerial image and measuring of relative positions of the slot pattern and the image position, the relative positions of the slot being measured as position-related data of the slot pattern and determining from the temporal intensity of the aerial image vibration-related information for said aerial image.

摘要翻译： 本发明提供了一种用于通过在投影平面中的图像位置处投射空中图像来确定振动相关信息的方法，将空间图像的强度映射到图像映射中，该图像映射被布置为包括采样位置的坐标值， 在每个采样位置采样的强度，以及测量通过槽模式接收的空间图像的强度。 该方法还包括从图像映射确定图像映射的斜率部分的检测位置，在斜率部分的检测位置处，测量空中图像的时间强度，以及测量狭槽图案的相对位置和 图像位置，将被测量的时隙的相对位置作为时隙图案的位置相关数据，并根据所述空间图像的空间图像振动相关信息的时间强度确定。

公开(公告)号：US20050031975A1

公开(公告)日：2005-02-10

申请号：US10844572

申请日：2004-05-13

申请人： Maria Reuhman-Huisken ,  Christianus De Mol ,  Hoite Tolsma

发明人： Maria Reuhman-Huisken ,  Christianus De Mol ,  Hoite Tolsma

IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  G03F7/00

CPC分类号： G03F7/70616 ,  G03F7/70633 ,  G03F9/7003

摘要： A system in which deformation of a substrate wafer is monitored during processing of the wafer is disclosed. In one embodiment, the distortion in the substrate wafer is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a database.

摘要翻译： 公开了在晶片的处理期间监测基板晶片的变形的系统。 在一个实施例中，通过将多个参考标记的位置与数据库中的值进行比较，在每次曝光和处理操作之后测量衬底晶片中的失真。