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108 条记录 (耗时 0.024 秒)

    Controlling template surface composition in nano-imprint lithography
    1.
    发明授权
    Controlling template surface composition in nano-imprint lithography 有权
    在纳米压印光刻中控制模板表面组成

    公开(公告)号：US09323143B2

    公开(公告)日：2016-04-26

    申请号：US12364979

    申请日：2009-02-03

    申请人： Frank Y. Xu ,  Weijun Liu

    发明人： Frank Y. Xu ,  Weijun Liu

    IPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10T428/24802

    摘要： A nano-imprint lithography process includes forming a multiplicity of hydroxyl groups on a surface of a substantially inorganic nano-imprint lithography template, heating the template, and reacting a pre-selected percentage of the hydroxyl groups on the surface of the template with a mono-functional, non-fluorinated compound to form a monolayer coating on the surface of the nano-imprint lithography template. The coated template may be contacted with a polymerizable composition disposed on a nano-imprint lithography substrate, and the polymerizable composition solidified to form a patterned layer. The coated template is separated from the patterned layer.

    摘要翻译： 纳米压印光刻工艺包括在基本无机纳米压印光刻模板的表面上形成多个羟基，加热模板，并使模板表面上预选择的羟基百分数与单体 官能的非氟化合物，以在纳米压印光刻模板的表面上形成单层涂层。 涂布的模板可以与设置在纳米压印光刻基材上的可聚合组合物接触，并且可聚合组合物固化以形成图案化层。 将涂覆的模板与图案化层分离。

    Release agent partition control in imprint lithography
    2.
    发明授权
    Release agent partition control in imprint lithography 有权
    印版光刻中的脱模剂分区控制

    公开(公告)号：US08637587B2

    公开(公告)日：2014-01-28

    申请号：US13226635

    申请日：2011-09-07

    申请人： Frank Y. Xu ,  Weijun Liu

    发明人： Frank Y. Xu ,  Weijun Liu

    IPC分类号： C08F2/50

    CPC分类号： C07D237/24 ,  B82Y10/00 ,  B82Y40/00 ,  C07C233/18 ,  G03F7/0002

    摘要： Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template during separation of the template from the solidified resist in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer from the template may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template facilitates the formation of ultra-thin residual layers and dense fine features in nano-imprint lithography.

    摘要翻译： 在纳米压印光刻工艺中将模板与固化的抗蚀剂分离期间，与纳米压印光刻模板表面的亲和性增加的脱模剂与模板相互作用强烈。 表面活性剂和模板表面之间的强相互作用减少了在压印光刻循环中将图案化层与模板分离期间从模板表面上拉出的表面活性剂的量。 在将图案化层与模板分离之后，维持与模板表面相关的更多表面活性剂可以减少液体抗蚀剂中所需的表面活性剂的量，以在压印光刻过程中从模板中实现固化的抗蚀剂的合适释放。 脱模剂与模板表面的强相关有助于在纳米压印光刻中形成超薄的残余层和致密的精细特征。

    Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
    3.
    发明授权
    Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers 有权
    具有增强的含硅层和非含硅层之间的粘附性的纳米压印光刻堆叠

    公开(公告)号：US08415010B2

    公开(公告)日：2013-04-09

    申请号：US12581634

    申请日：2009-10-19

    申请人： Weijun Liu ,  Frank Y. Xu

    发明人： Weijun Liu ,  Frank Y. Xu

    IPC分类号： B32B27/08

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/027 ,  G03F7/0382 ,  G03F7/0757 ,  Y10T428/265 ,  Y10T428/31667

    摘要： A nano-imprint lithography stack includes a nano-imprint lithography substrate, a non-silicon-containing layer solidified from a first polymerizable, non-silicon-containing composition, and a silicon-containing layer solidified from a polymerizable silicon-containing composition adhered to a surface of the non-silicon-containing layer. The non-silicon-containing layer is adhered directly or through one or more intervening layers to the nano-imprint lithography substrate. The silicon-containing layer includes a silsesquioxane with a general formula (R′(4-2z)SiOz)x(HOSiO1.5)y, wherein R′ is a hydrocarbon group or two or more different hydrocarbon groups other than methyl, 1

    摘要翻译： 纳米压印光刻堆叠包括纳米压印光刻基板，从第一可聚合的非含硅组合物固化的非含硅层和从可聚合的含硅组合物固化的含硅层，所述可聚合的含硅组合物粘附到 非含硅层的表面。 非含硅层直接或通过一个或多个中间层粘附到纳米压印光刻基片上。 含硅层包括具有通式（R'（4-2z）SiO z）x（HOSiO 1.5）y的倍半硅氧烷，其中R'是烃基或两个或更多个不同于甲基的不同烃基， z <2，x和y是整数。 压印光刻叠层可以进一步包括第二非含硅层，其从粘附到含硅层的表面的第二可聚合非含硅组合物固化，使得含硅层被夹在非晶硅层之间， 含硅层。

    Solvent-assisted layer formation for imprint lithography
    4.
    发明授权
    Solvent-assisted layer formation for imprint lithography 有权
    用于压印光刻的溶剂辅助层形成

    公开(公告)号：US08142702B2

    公开(公告)日：2012-03-27

    申请号：US12139911

    申请日：2008-06-16

    申请人： Weijun Liu ,  Frank Y. Xu ,  Edward Brian Fletcher

    发明人： Weijun Liu ,  Frank Y. Xu ,  Edward Brian Fletcher

    IPC分类号： B29C59/00 ,  H01L21/027

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： A solid layer is formed by applying a multiplicity of discrete portions of a fluid composition onto a surface of an imprint lithography substrate, and allowing the discrete portions of the composition to spontaneously spread on the surface of the substrate to form a substantially continuous layer. The composition includes a solvent and a solid or a solvent and a polymerizable material. The composition can be a solution or a dispersion. At least some of the solvent is evaporated from the composition, and a solid layer is formed (e.g., polymerized or dried) on the substrate. The solid layer is substantially free of interstitial voids.

    摘要翻译： 通过将多个离散部分的流体组合物施加到压印光刻基板的表面上并使组合物的离散部分自发地扩散在基板的表面上以形成基本上连续的层而形成固体层。 该组合物包括溶剂和固体或溶剂以及可聚合材料。 组合物可以是溶液或分散体。 至少一些溶剂从组合物中蒸发，并在基材上形成固体层（例如聚合或干燥）。 固体层基本上不含间隙。

    RELEASE AGENT PARTITION CONTROL IN IMPRINT LITHOGRAPHY
    5.
    发明申请
    RELEASE AGENT PARTITION CONTROL IN IMPRINT LITHOGRAPHY 审中-公开
    释放代理分割控制在印刷图

    公开(公告)号：US20100109195A1

    公开(公告)日：2010-05-06

    申请号：US12612527

    申请日：2009-11-04

    申请人： Frank Y. Xu ,  Weijun Liu

    发明人： Frank Y. Xu ,  Weijun Liu

    IPC分类号： B29C59/02 ,  C07C233/18 ,  C07D237/08 ,  G03F7/004 ,  C23C8/80

    CPC分类号： C07D237/24 ,  B82Y10/00 ,  B82Y40/00 ,  C07C233/18 ,  G03F7/0002

    摘要： Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template during separation of the template from the solidified resist in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer from the template may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template facilitates the formation of ultra-thin residual layers and dense fine features in nano-imprint lithography.

    摘要翻译： 在纳米压印光刻工艺中将模板与固化的抗蚀剂分离期间，与纳米压印光刻模板表面的亲和性增加的脱模剂与模板相互作用强烈。 表面活性剂和模板表面之间的强相互作用减少了在压印光刻循环中将图案化层与模板分离期间从模板表面上拉出的表面活性剂的量。 在将图案化层与模板分离之后，维持与模板表面相关的更多表面活性剂可以减少液体抗蚀剂中所需的表面活性剂的量，以在压印光刻过程中从模板中实现固化的抗蚀剂的合适释放。 脱模剂与模板表面的强相关有助于在纳米压印光刻中形成超薄的残余层和致密的精细特征。

    Fabrication of High-Throughput Nano-Imprint Lithography Templates
    10.
    发明申请
    Fabrication of High-Throughput Nano-Imprint Lithography Templates 审中-公开
    高通量纳米压印光刻模板的制作

    公开(公告)号：US20140212534A1

    公开(公告)日：2014-07-31

    申请号：US13754015

    申请日：2013-01-30

    申请人： Edward B. Fletcher ,  Frank Y. Xu ,  Weijun Liu ,  Fen Wan ,  Marlon Menezes ,  Kosta S. Selinidis

    发明人： Edward B. Fletcher ,  Frank Y. Xu ,  Weijun Liu ,  Fen Wan ,  Marlon Menezes ,  Kosta S. Selinidis

    IPC分类号： B29C59/02 ,  C23C16/40

    CPC分类号： C23C16/401 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (ρporous/ρfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.

    摘要翻译： 压印光刻模板包括限定平均孔径至少约0.4nm的多个孔的多孔材料。 多孔材料包括硅和氧，并且杨氏模量（E）与多孔材料相对于熔融二氧化硅（“多孔/熔融二氧化硅”）的相对密度之比至少为约10:1。 多孔材料的折射率在约1.4和1.5之间。 多孔材料可以形成压印光刻模板的中间层或盖层。 模板可以包括在多孔层和盖层之间的孔密封层，或者在盖层的顶部上的孔密封层。