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    Apparatus for imaging metrology
    1.
    发明申请
    Apparatus for imaging metrology 有权
    成像计量仪器

    公开(公告)号：US20050128490A1

    公开(公告)日：2005-06-16

    申请号：US11048552

    申请日：2005-02-01

    申请人： Fred Stanke ,  Douglas Ruth ,  James Cahill ,  Michael Weber ,  Clinton Carlisle ,  Hung Pham ,  Edric Tong ,  Elliot Burke

    发明人： Fred Stanke ,  Douglas Ruth ,  James Cahill ,  Michael Weber ,  Clinton Carlisle ,  Hung Pham ,  Edric Tong ,  Elliot Burke

    IPC分类号： B24B37/04 ,  B24B49/12 ,  G01B11/06 ,  G01B11/30 ,  G01N21/21 ,  G01N21/95 ,  H01L21/66 ,  H01L21/67 ,  G01B11/24

    CPC分类号： H01L21/67 ,  B24B37/005 ,  B24B49/12 ,  G01B11/0625 ,  G01B11/30 ,  G01N21/211 ,  G01N21/9501 ,  H01L22/12

    摘要： This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

    摘要翻译： 本发明是一种用于成像测量的装置，其在特定实施例中可以与处理器站集成，使得计量站离开处理站而不是耦合到处理站。 计量站设置有具有包含测量区域的第一视野的第一成像照相机。 替代实施例包括具有第二视野的第二成像相机。 优选实施例包括宽带紫外光源，但是其他实施例可以具有宽或窄光带宽的可见光或近红外光源。 包括宽带宽源的实施例通常包括光谱仪或成像光谱仪。 具体实施例可以包括弯曲的，反射光学的或由液体润湿的测量区域。 在典型的实施例中，计量站和测量区域被配置为具有相对于彼此的4个移动自由度。

    Method of measuring meso-scale structures on wafers
    3.
    发明申请
    Method of measuring meso-scale structures on wafers 有权
    测量晶圆上的中尺度结构的方法

    公开(公告)号：US20050057755A1

    公开(公告)日：2005-03-17

    申请号：US10919718

    申请日：2004-08-17

    申请人： Kenneth Johnson ,  Fred Stanke

    发明人： Kenneth Johnson ,  Fred Stanke

    IPC分类号： G01B11/06 ,  G01B11/30 ,  G01N21/21 ,  G01N21/95 ,  H01L21/66 ,  H01L21/67 ,  G01N21/47

    CPC分类号： H01L21/67 ,  G01B11/0625 ,  G01B11/30 ,  G01N21/211 ,  G01N21/9501 ,  H01L22/12

    摘要： A method of measuring at least one parameter associated with a portion of a sample having formed thereon one or more structures with at least two zones each having an associated zone reflectance property. The method includes the steps of illuminating the zones with broadband light, and measuring at least one reflectance property of light reflected from the at least two zones. The measurement includes a substantial portion of non-specularly scattered light, thereby increasing the quality of the measurement. The method further includes the step of fitting a parameterized model to the measured reflectance property. The parameterized model mixes the zone reflectance properties of the zones to account for partially coherent light interactions between the two zones.

    摘要翻译： 测量与其上形成有一个或多个结构的样品的一部分相关联的至少一个参数的方法，其中至少两个区域各自具有相关联的区域反射性质。 该方法包括以下步骤：用宽带光照射区域，并且测量从至少两个区域反射的光的至少一个反射性。 测量包括大部分非镜面散射光，从而提高了测量的质量。 该方法还包括将参数化模型拟合到所测量的反射率特性的步骤。 参数化模型将区域的区域反射特性混合以考虑两个区域之间的部分相干光相互作用。

    Polarimetric scatterometry methods for critical dimension measurements of periodic structures
    4.
    发明申请
    Polarimetric scatterometry methods for critical dimension measurements of periodic structures 有权
    周期性结构关键尺寸测量的极化散射法

    公开(公告)号：US20080037015A1

    公开(公告)日：2008-02-14

    申请号：US11903238

    申请日：2007-09-21

    申请人： Adam Norton ,  Abdurrahman Sezginer ,  Fred Stanke

    发明人： Adam Norton ,  Abdurrahman Sezginer ,  Fred Stanke

    IPC分类号： G01J3/447

    CPC分类号： G01B11/02 ,  G01J3/02 ,  G01J3/0294 ,  G01N21/211 ,  G01N21/25 ,  G01N21/474 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/213

    摘要： An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.

    摘要翻译： 用于评估样品的光学测量系统具有耦合到方位角可旋转测量头的电动机旋转机构，允许光学器件相对于样品旋转。 具有将非正常入射的偏振照明光束引导到样品上的周期性结构上的光学偏振散射仪可以测量周期性结构的光学性质。 照明路径中的E-O调制器可以调制偏振。 头部光学器件收集从周期性结构反射的光并将光馈送到光谱仪进行测量。 收集路径中的分束器可以确保来自样品的S和P极化分别测量。 测量头可以安装成相对于周期性结构使入射平面旋转到不同的方位角方向。 仪器可以集成在晶片工艺工具中，其中可以以任意取向提供晶片。

    Matching optical metrology tools using diffraction signals
    6.
    发明授权
    Matching optical metrology tools using diffraction signals 失效
    使用衍射信号匹配光学测量工具

    公开(公告)号：US07446888B2

    公开(公告)日：2008-11-04

    申请号：US11438806

    申请日：2006-05-22

    申请人： Fred Stanke ,  Holger Tuitje ,  Shigeru Nagano

    发明人： Fred Stanke ,  Holger Tuitje ,  Shigeru Nagano

    IPC分类号： G01B11/14 ,  G01B11/00

    CPC分类号： G01B11/24 ,  G03F7/70525 ,  G03F7/70625

    摘要： Optical metrology tools in a fleet of optical metrology tools can be matched using transforms. In particular, a first set of measured diffraction signals is obtained. The first set of measured diffraction signals was measured using a first optical metrology tool from the fleet of optical metrology tools. A second set of measured diffraction signals is obtained. The second set of diffraction signals was measured using a second optical metrology tool from the fleet of optical metrology tools. A reference diffraction signal is obtained. A first transform is generated based on the first set of measured diffraction signals and the reference diffraction signal. A second transform is generated based on the second set of measured diffraction signals and the reference diffraction signal.

    摘要翻译： 光学计量工具中的光学计量工具可以使用变换进行匹配。 特别地，获得第一组测量的衍射信号。 使用来自光学计量学工具的第一光学计量工具测量第一组测量的衍射信号。 获得第二组测量的衍射信号。 第二组衍射信号使用来自光学计量学工具的第二光学测量工具来测量。 得到参考衍射信号。 基于第一组测量的衍射信号和参考衍射信号产生第一变换。 基于第二组测量的衍射信号和参考衍射信号产生第二变换。

    Matching optical metrology tools using hypothetical profiles
    7.
    发明授权
    Matching optical metrology tools using hypothetical profiles 失效
    使用假设配置文件匹配光学计量工具

    公开(公告)号：US07446887B2

    公开(公告)日：2008-11-04

    申请号：US11438776

    申请日：2006-05-22

    申请人： Fred Stanke ,  Holger Tuitje ,  Shigeru Nagano

    发明人： Fred Stanke ,  Holger Tuitje ,  Shigeru Nagano

    IPC分类号： G01B11/14 ,  G01B11/00

    CPC分类号： G01B11/24 ,  G03F7/70525 ,  G03F7/70625

    摘要： Optical metrology tools in a fleet of optical metrology tools can be matched using transforms. In particular, a first set of hypothetical profiles of one or more structures is obtained. The first set of hypothetical profiles was determined based on a first set of measured diffraction signals measured using a first optical metrology tool from the fleet of optical metrology tools. A second set of hypothetical profiles of the structure is obtained. The second set of hypothetical profiles was determined based on a second set of measured diffraction signals measured using a second optical metrology tool from the fleet of optical metrology tools. A reference profile is obtained. A first transform is generated based on the first set of hypothetical profiles and the reference profile. A second transform is generated based on the second set of hypothetical profiles and the reference profile. A first hypothetical profile is obtained, where the first hypothetical profile was determined using the first optical metrology tool. A second hypothetical profile is obtained, where the second hypothetical profile was determined using the second optical metrology tool. The first hypothetical profile is transformed into a first transformed hypothetical profile using the first transform. The second hypothetical profile is transformed into a second transformed hypothetical profile using the second transform.

    摘要翻译： 光学计量工具中的光学计量工具可以使用变换进行匹配。 特别地，获得一个或多个结构的第一组假设曲线。 基于使用来自光学计量学工具的第一光学测量工具测量的第一组测量的衍射信号来确定第一组假设剖面。 获得了结构的第二组假设剖面。 基于使用来自光学计量学工具的第二光学测量工具测量的第二组测量的衍射信号来确定第二组假设剖面。 获得参考资料。 基于第一组假设曲线和参考轮廓来生成第一变换。 基于第二组假设曲线和参考轮廓来生成第二变换。 获得第一假设曲线，其中使用第一光学测量工具确定第一假设曲线。 获得第二假设曲线，其中使用第二光学测量工具确定第二假设曲线。 使用第一变换将第一假设轮廓变换为第一变换假设轮廓。 使用第二变换将第二假设轮廓变换为第二变换假设轮廓。

    Matching optical metrology tools using diffraction signals
    8.
    发明申请
    Matching optical metrology tools using diffraction signals 失效
    使用衍射信号匹配光学测量工具

    公开(公告)号：US20070268498A1

    公开(公告)日：2007-11-22

    申请号：US11438806

    申请日：2006-05-22

    申请人： Fred Stanke ,  Holger Tuitje ,  Shigeru Nagano

    发明人： Fred Stanke ,  Holger Tuitje ,  Shigeru Nagano

    IPC分类号： G01B11/14

    CPC分类号： G01B11/24 ,  G03F7/70525 ,  G03F7/70625

    摘要： Optical metrology tools in a fleet of optical metrology tools can be matched using transforms. In particular, a first set of measured diffraction signals is obtained. The first set of measured diffraction signals was measured using a first optical metrology tool from the fleet of optical metrology tools. A second set of measured diffraction signals is obtained. The second set of diffraction signals was measured using a second optical metrology tool from the fleet of optical metrology tools. A reference diffraction signal is obtained. A first transform is generated based on the first set of measured diffraction signals and the reference diffraction signal. A second transform is generated based on the second set of measured diffraction signals and the reference diffraction signal.

    摘要翻译： 光学计量工具中的光学计量工具可以使用变换进行匹配。 特别地，获得第一组测量的衍射信号。 使用来自光学计量学工具的第一光学计量工具测量第一组测量的衍射信号。 获得第二组测量的衍射信号。 第二组衍射信号使用来自光学计量学工具的第二光学测量工具来测量。 得到参考衍射信号。 基于第一组测量的衍射信号和参考衍射信号产生第一变换。 基于第二组测量的衍射信号和参考衍射信号产生第二变换。

    Diffraction order sorting filter for optical metrology
    9.
    发明授权
    Diffraction order sorting filter for optical metrology 有权
    用于光学测量的衍射顺序分选滤波器

    公开(公告)号：US08107073B2

    公开(公告)日：2012-01-31

    申请号：US12369905

    申请日：2009-02-12

    申请人： Adam Norton ,  Holger Tuitje ,  Fred Stanke

    发明人： Adam Norton ,  Holger Tuitje ,  Fred Stanke

    IPC分类号： G01J3/28 ,  G02B1/10

    CPC分类号： G01J3/28 ,  G01B2210/56 ,  G01J3/02 ,  G01J3/0229 ,  G01J3/0297 ,  G01J3/18 ,  G02B5/28 ,  G02B2207/117

    摘要： A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.

    摘要翻译： 公开了一种用于半导体测量系统中的光谱仪的分区排序分选过滤器，其中在区域关节处的光散射减小。 订单分选过滤器包括沉积在下面的光学透明层，或者在分级过滤器区域的薄膜过滤器堆叠的顶部，其中调整光学透明层的厚度，使得在光 区域接头在邻近区域接头的区域中基本相等。 还公开了一种用于波长到检测器阵列像素位置校准的光谱仪的方法，其能够精确地表示在订单分选滤波器的区域接头附近的校准曲线的高度局部化的非线性。