Method of measuring meso-scale structures on wafers
    2.
    发明申请
    Method of measuring meso-scale structures on wafers 有权
    测量晶圆上的中尺度结构的方法

    公开(公告)号:US20050057755A1

    公开(公告)日:2005-03-17

    申请号:US10919718

    申请日:2004-08-17

    摘要: A method of measuring at least one parameter associated with a portion of a sample having formed thereon one or more structures with at least two zones each having an associated zone reflectance property. The method includes the steps of illuminating the zones with broadband light, and measuring at least one reflectance property of light reflected from the at least two zones. The measurement includes a substantial portion of non-specularly scattered light, thereby increasing the quality of the measurement. The method further includes the step of fitting a parameterized model to the measured reflectance property. The parameterized model mixes the zone reflectance properties of the zones to account for partially coherent light interactions between the two zones.

    摘要翻译: 测量与其上形成有一个或多个结构的样品的一部分相关联的至少一个参数的方法,其中至少两个区域各自具有相关联的区域反射性质。 该方法包括以下步骤:用宽带光照射区域,并且测量从至少两个区域反射的光的至少一个反射性。 测量包括大部分非镜面散射光,从而提高了测量的质量。 该方法还包括将参数化模型拟合到所测量的反射率特性的步骤。 参数化模型将区域的区域反射特性混合以考虑两个区域之间的部分相干光相互作用。

    Overlay alignment metrology using diffraction gratings
    5.
    发明申请
    Overlay alignment metrology using diffraction gratings 有权
    使用衍射光栅覆盖对准测量

    公开(公告)号:US20050018190A1

    公开(公告)日:2005-01-27

    申请号:US10917219

    申请日:2004-08-12

    IPC分类号: G03F7/20 H01L23/544 G01B11/00

    摘要: Alignment accuracy between two or more patterned layers is measured using a metrology target comprising substantially overlapping diffraction gratings formed in a test area of the layers being tested. An optical instrument illuminates all or part of the target area and measures the optical response. The instrument can measure transmission, reflectance, and/or ellipsometric parameters as a function of wavelength, polar angle of incidence, azimuthal angle of incidence, and/or polarization of the illumination and detected light. Overlay error or offset between those layers containing the test gratings is determined by a processor programmed to calculate an optical response for a set of parameters that include overlay error, using a model that accounts for diffraction by the gratings and interaction of the gratings with each others' diffracted field. The model parameters might also take account of manufactured asymmetries. The calculation may involve interpolation of pre-computed entries from a database accessible to the processor. The calculated and measured responses are iteratively compared and the model parameters changed to minimize the difference.

    摘要翻译: 使用包括在被测试层的测试区域中形成的基本上重叠的衍射光栅的测量目标来测量两个或更多个图案化层之间的对准精度。 光学仪器照亮目标区域的全部或部分,并测量光学响应。 仪器可以测量作为波长,极角入射角,入射方位角和/或照明和检测光的偏振的函数的透射率,反射率和/或椭偏参数。 包含测试光栅的那些层之间的叠加误差或偏移量被编程为使用考虑光栅衍射的模型和光栅与彼此的相互作用计算包括重叠误差的一组参数的光学响应的​​处理器来确定 '衍射场 模型参数也可能考虑到制造的不对称性。 该计算可以包括从处理器可访问的数据库插入预先计算的条目。 迭代比较计算和测量的响应,改变模型参数以最小化差异。

    Polarimetric scatterometry methods for critical dimension measurements of periodic structures
    6.
    发明申请
    Polarimetric scatterometry methods for critical dimension measurements of periodic structures 有权
    周期性结构关键尺寸测量的极化散射法

    公开(公告)号:US20080037015A1

    公开(公告)日:2008-02-14

    申请号:US11903238

    申请日:2007-09-21

    IPC分类号: G01J3/447

    摘要: An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.

    摘要翻译: 用于评估样品的光学测量系统具有耦合到方位角可旋转测量头的电动机旋转机构,允许光学器件相对于样品旋转。 具有将非正常入射的偏振照明光束引导到样品上的周期性结构上的光学偏振散射仪可以测量周期性结构的光学性质。 照明路径中的E-O调制器可以调制偏振。 头部光学器件收集从周期性结构反射的光并将光馈送到光谱仪进行测量。 收集路径中的分束器可以确保来自样品的S和P极化分别测量。 测量头可以安装成相对于周期性结构使入射平面旋转到不同的方位角方向。 仪器可以集成在晶片工艺工具中,其中可以以任意取向提供晶片。

    Matching optical metrology tools using diffraction signals
    7.
    发明授权
    Matching optical metrology tools using diffraction signals 失效
    使用衍射信号匹配光学测量工具

    公开(公告)号:US07446888B2

    公开(公告)日:2008-11-04

    申请号:US11438806

    申请日:2006-05-22

    IPC分类号: G01B11/14 G01B11/00

    摘要: Optical metrology tools in a fleet of optical metrology tools can be matched using transforms. In particular, a first set of measured diffraction signals is obtained. The first set of measured diffraction signals was measured using a first optical metrology tool from the fleet of optical metrology tools. A second set of measured diffraction signals is obtained. The second set of diffraction signals was measured using a second optical metrology tool from the fleet of optical metrology tools. A reference diffraction signal is obtained. A first transform is generated based on the first set of measured diffraction signals and the reference diffraction signal. A second transform is generated based on the second set of measured diffraction signals and the reference diffraction signal.

    摘要翻译: 光学计量工具中的光学计量工具可以使用变换进行匹配。 特别地,获得第一组测量的衍射信号。 使用来自光学计量学工具的第一光学计量工具测量第一组测量的衍射信号。 获得第二组测量的衍射信号。 第二组衍射信号使用来自光学计量学工具的第二光学测量工具来测量。 得到参考衍射信号。 基于第一组测量的衍射信号和参考衍射信号产生第一变换。 基于第二组测量的衍射信号和参考衍射信号产生第二变换。

    Matching optical metrology tools using hypothetical profiles
    8.
    发明授权
    Matching optical metrology tools using hypothetical profiles 失效
    使用假设配置文件匹配光学计量工具

    公开(公告)号:US07446887B2

    公开(公告)日:2008-11-04

    申请号:US11438776

    申请日:2006-05-22

    IPC分类号: G01B11/14 G01B11/00

    摘要: Optical metrology tools in a fleet of optical metrology tools can be matched using transforms. In particular, a first set of hypothetical profiles of one or more structures is obtained. The first set of hypothetical profiles was determined based on a first set of measured diffraction signals measured using a first optical metrology tool from the fleet of optical metrology tools. A second set of hypothetical profiles of the structure is obtained. The second set of hypothetical profiles was determined based on a second set of measured diffraction signals measured using a second optical metrology tool from the fleet of optical metrology tools. A reference profile is obtained. A first transform is generated based on the first set of hypothetical profiles and the reference profile. A second transform is generated based on the second set of hypothetical profiles and the reference profile. A first hypothetical profile is obtained, where the first hypothetical profile was determined using the first optical metrology tool. A second hypothetical profile is obtained, where the second hypothetical profile was determined using the second optical metrology tool. The first hypothetical profile is transformed into a first transformed hypothetical profile using the first transform. The second hypothetical profile is transformed into a second transformed hypothetical profile using the second transform.

    摘要翻译: 光学计量工具中的光学计量工具可以使用变换进行匹配。 特别地,获得一个或多个结构的第一组假设曲线。 基于使用来自光学计量学工具的第一光学测量工具测量的第一组测量的衍射信号来确定第一组假设剖面。 获得了结构的第二组假设剖面。 基于使用来自光学计量学工具的第二光学测量工具测量的第二组测量的衍射信号来确定第二组假设剖面。 获得参考资料。 基于第一组假设曲线和参考轮廓来生成第一变换。 基于第二组假设曲线和参考轮廓来生成第二变换。 获得第一假设曲线,其中使用第一光学测量工具确定第一假设曲线。 获得第二假设曲线,其中使用第二光学测量工具确定第二假设曲线。 使用第一变换将第一假设轮廓变换为第一变换假设轮廓。 使用第二变换将第二假设轮廓变换为第二变换假设轮廓。

    Matching optical metrology tools using diffraction signals
    9.
    发明申请
    Matching optical metrology tools using diffraction signals 失效
    使用衍射信号匹配光学测量工具

    公开(公告)号:US20070268498A1

    公开(公告)日:2007-11-22

    申请号:US11438806

    申请日:2006-05-22

    IPC分类号: G01B11/14

    摘要: Optical metrology tools in a fleet of optical metrology tools can be matched using transforms. In particular, a first set of measured diffraction signals is obtained. The first set of measured diffraction signals was measured using a first optical metrology tool from the fleet of optical metrology tools. A second set of measured diffraction signals is obtained. The second set of diffraction signals was measured using a second optical metrology tool from the fleet of optical metrology tools. A reference diffraction signal is obtained. A first transform is generated based on the first set of measured diffraction signals and the reference diffraction signal. A second transform is generated based on the second set of measured diffraction signals and the reference diffraction signal.

    摘要翻译: 光学计量工具中的光学计量工具可以使用变换进行匹配。 特别地,获得第一组测量的衍射信号。 使用来自光学计量学工具的第一光学计量工具测量第一组测量的衍射信号。 获得第二组测量的衍射信号。 第二组衍射信号使用来自光学计量学工具的第二光学测量工具来测量。 得到参考衍射信号。 基于第一组测量的衍射信号和参考衍射信号产生第一变换。 基于第二组测量的衍射信号和参考衍射信号产生第二变换。

    Apparatus for imaging metrology
    10.
    发明申请
    Apparatus for imaging metrology 有权
    成像计量仪器

    公开(公告)号:US20050128490A1

    公开(公告)日:2005-06-16

    申请号:US11048552

    申请日:2005-02-01

    摘要: This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

    摘要翻译: 本发明是一种用于成像测量的装置,其在特定实施例中可以与处理器站集成,使得计量站离开处理站而不是耦合到处理站。 计量站设置有具有包含测量区域的第一视野的第一成像照相机。 替代实施例包括具有第二视野的第二成像相机。 优选实施例包括宽带紫外光源,但是其他实施例可以具有宽或窄光带宽的可见光或近红外光源。 包括宽带宽源的实施例通常包括光谱仪或成像光谱仪。 具体实施例可以包括弯曲的,反射光学的或由液体润湿的测量区域。 在典型的实施例中,计量站和测量区域被配置为具有相对于彼此的4个移动自由度。