公开(公告)号：US10090255B2

公开(公告)日：2018-10-02

申请号：US15010868

申请日：2016-01-29

Applicant: GLOBALFOUNDRIES INC.

Inventor： Brittany L. Hedrick ,  Vijay Sukumaran ,  Christopher L. Tessler ,  Richard F. Indyk ,  Sarah H. Knickerbocker

IPC: H05K1/11 ,  H05K1/18 ,  H05K3/00 ,  H01L23/00 ,  H01L21/78 ,  H01L23/498 ,  H01L21/48 ,  H05K1/03 ,  H01L23/15

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to dicing channels used in the singulatation process of interposers and methods of manufacture. The structure includes: one or more redistribution layers; a glass interposer connected to the one or more redistribution layers; a channel formed through the one or more redistribution layers and the glass interposer core, forming a dicing channel; and polymer material conformally filling the channel.

公开(公告)号：US10049909B2

公开(公告)日：2018-08-14

申请号：US15432560

申请日：2017-02-14

Applicant: GLOBALFOUNDRIES INC.

Inventor： John J. Garant ,  Jonathan H. Griffith ,  Brittany L. Hedrick ,  Edmund J. Sprogis

IPC: H01L21/683 ,  B32B37/24 ,  B32B38/10 ,  B81C1/00

Abstract: A wafer handler with a removable bow compensating layer and methods of manufacture is disclosed. The method includes forming at least one layer of stressed material on a front side of a wafer handler. The method further includes forming another stressed material on a backside of the wafer handler which counter balances the at least one layer of stressed material on the front side of the wafer handler, thereby decreasing an overall bow of the wafer handler.

公开(公告)号：US20170221837A1

公开(公告)日：2017-08-03

申请号：US15010868

申请日：2016-01-29

Applicant: GLOBALFOUNDRIES INC.

Inventor： Brittany L. Hedrick ,  Vijay Sukumaran ,  Christopher L. Tessler ,  Richard F. Indyk ,  Sarah H. Knickerbocker

IPC: H01L23/00 ,  H01L23/29 ,  H01L23/498 ,  H05K3/00 ,  H01L21/56 ,  H05K1/03 ,  H05K1/11 ,  H05K1/02 ,  H01L21/78 ,  H01L21/48

CPC classification number: H01L23/562 ,  H01L21/486 ,  H01L21/78 ,  H01L23/15 ,  H01L23/49811 ,  H01L23/49827 ,  H01L2224/11 ,  H01L2224/73204 ,  H05K1/0306 ,  H05K3/0026 ,  H05K3/0052 ,  H05K3/0094 ,  H05K2201/0959 ,  H05K2201/10378

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to dicing channels used in the singulatation process of interposers and methods of manufacture. The structure includes: one or more redistribution layers; a glass interposer connected to the one or more redistribution layers; a channel formed through the one or more redistribution layers and the glass interposer core, forming a dicing channel; and polymer material conformally filling the channel.