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    Aerostatically Guided Table System for Vacuum Application
    3.
    发明申请
    Aerostatically Guided Table System for Vacuum Application 有权
    用于真空应用的气动引导台系统

    公开(公告)号：US20100122603A1

    公开(公告)日：2010-05-20

    申请号：US12618839

    申请日：2009-11-16

    申请人： Gerhard Schubert ,  Christian Jackel ,  Ulf-Carsten Kirschstein ,  Michael Boehm ,  René Bauer ,  Gerd Harnisch ,  Thomas Peschel ,  Stefan Risse ,  Christoph Schenk

    发明人： Gerhard Schubert ,  Christian Jackel ,  Ulf-Carsten Kirschstein ,  Michael Boehm ,  René Bauer ,  Gerd Harnisch ,  Thomas Peschel ,  Stefan Risse ,  Christoph Schenk

    IPC分类号： G05G11/00

    CPC分类号： H01L21/682 ,  G03F7/70716 ,  Y10T74/20348

    摘要： A table system for vacuum application has a base plate and a moving table guided by aerostatic bearing units. The bearing units (10) are connected to supply lines and suction lines for supplying and extracting the gas required for the operation of the bearing units and are provided in each instance with a sealing system having at least one stage and comprising suction channel and sealing gap for sealing relative to the vacuum. The table system is characterized in that the aerostatic bearing units (10) are constructed at least partially as swivel joints, and a push rod (4) which is actuated by a drive (5) for guiding the moving table laterally is connected to the rotating part (21) of each swivel joint, and in that the push rods (4) are hollow and constitute a component part of the suction lines for extracting the operating gas.

    摘要翻译： 用于真空应用的台式系统具有由空气静力轴承单元引导的基板和移动台。 轴承单元（10）连接到用于供应和提取用于轴承单元的操作所需的气体的供应管线和抽吸管线，并且每个具有至少一个级的密封系统，并且包括吸入通道和密封间隙 用于相对于真空的密封。 台面系统的特征在于，空气静力轴承单元（10）至少部分地构造为旋转接头，并且由用于将移动台横向引导的驱动器（5）致动的推杆（4）连接到旋转 每个旋转接头的部分（21），并且推杆（4）是中空的，并且构成用于抽出操作气体的抽吸管线的组成部分。

    Aerostatically guided table system for vacuum application
    4.
    发明授权
    Aerostatically guided table system for vacuum application 有权
    气动导向台系统用于真空应用

    公开(公告)号：US08496221B2

    公开(公告)日：2013-07-30

    申请号：US12618839

    申请日：2009-11-16

    申请人： Gerhard Schubert ,  Christian Jackel ,  Ulf-Carsten Kirschstein ,  Michael Boehm ,  René Bauer ,  Gerd Harnisch ,  Thomas Peschel ,  Stefan Risse ,  Christoph Schenk

    发明人： Gerhard Schubert ,  Christian Jackel ,  Ulf-Carsten Kirschstein ,  Michael Boehm ,  René Bauer ,  Gerd Harnisch ,  Thomas Peschel ,  Stefan Risse ,  Christoph Schenk

    IPC分类号： F16C32/06

    CPC分类号： H01L21/682 ,  G03F7/70716 ,  Y10T74/20348

    摘要： A table system for vacuum application has a base plate and a moving table guided by aerostatic bearing units. The bearing units (10) are connected to supply lines and suction lines for supplying and extracting the gas required for the operation of the bearing units and are provided in each instance with a sealing system having at least one stage and comprising suction channel and sealing gap for sealing relative to the vacuum. The table system is characterized in that the aerostatic bearing units (10) are constructed at least partially as swivel joints, and a push rod (4) which is actuated by a drive (5) for guiding the moving table laterally is connected to the rotating part (21) of each swivel joint, and in that the push rods (4) are hollow and constitute a component part of the suction lines for extracting the operating gas.

    摘要翻译： 用于真空应用的台式系统具有由空气静力轴承单元引导的基板和移动台。 轴承单元（10）连接到用于供应和提取用于轴承单元的操作所需的气体的供应管线和抽吸管线，并且每个具有至少一个级的密封系统，并且包括吸入通道和密封间隙 用于相对于真空的密封。 台面系统的特征在于，空气静力轴承单元（10）至少部分地构造为旋转接头，并且由用于将移动台横向引导的驱动器（5）致动的推杆（4）连接到旋转 每个旋转接头的部分（21），并且推杆（4）是中空的，并且构成用于抽出操作气体的抽吸管线的组成部分。

    Holding device for a substrate
    7.
    发明授权
    Holding device for a substrate 有权
    用于衬底的保持装置

    公开(公告)号：US06426860B1

    公开(公告)日：2002-07-30

    申请号：US09600630

    申请日：2000-09-19

    申请人： Gerhard Schubert ,  Ulf-Carsten Kirschstein ,  Stefan Risse ,  Gerd Harnisch ,  Gerhard Kalkowski ,  Volker Guyenot

    发明人： Gerhard Schubert ,  Ulf-Carsten Kirschstein ,  Stefan Risse ,  Gerd Harnisch ,  Gerhard Kalkowski ,  Volker Guyenot

    IPC分类号： H01G2300

    CPC分类号： G03F7/707 ,  G03F7/70708 ,  H01L21/6831

    摘要： The present invention provides for a device for holding a substrate in an exposure system. In the exposure system, the substrate is positioned on a table movable in the X and Y coordinates of an X, Y plane, and the exposure system provides a metering assembly between a table surface and the substrate to adjust the distance and to align the substrate in relation to an exposure optics, from where a corpuscular radiation is directed right-angled onto a substrate surface, corresponding to the Z coordinate. The device for holding the substrate includes two mounting plates aligned parallel to the X, Y plane, adjusted upon the table in a direction to the exposure optics and with different distances to the table surface, the first mounting plate of which being directly connected to the table. The second mounting plate is connected with the first mounting plate through at least one holding device, and has a bearing plane for the substrate being designed on that side of the second mounting plate turned to the exposure optics.

    摘要翻译： 本发明提供一种用于在曝光系统中保持基板的装置。 在曝光系统中，基板位于可在X，Y平面的X和Y坐标上移动的工作台上，并且曝光系统在台面和基板之间提供计量组件，以调整距离并对齐基板 相对于曝光光学元件，从其中红色辐射被直接定向到基板表面上，对应于Z坐标。 用于保持基板的装置包括两个平行于X，Y平面排列的安装板，该安装板沿着与曝光光学元件相反的方向在台面上调整，并且与台面的距离不同，其第一安装板直接连接到 表。 第二安装板通过至少一个保持装置与第一安装板连接，并且具有用于基板的支承平面设计在转向曝光光学元件的第二安装板的该侧。

    Electrostatic deflection system for corpuscular radiation
    8.
    发明授权
    Electrostatic deflection system for corpuscular radiation 失效
    静电偏转系统用于红外辐射

    公开(公告)号：US07491946B2

    公开(公告)日：2009-02-17

    申请号：US11346666

    申请日：2006-02-03

    申请人： Stefan Risse ,  Thomas Peschel ,  Christoph Damm ,  Andreas Gebhardt ,  Mathias Rohde ,  Christoph Schenk ,  Thomas Elster ,  Hans-Joachim Doering ,  Gerhard Schubert

    发明人： Stefan Risse ,  Thomas Peschel ,  Christoph Damm ,  Andreas Gebhardt ,  Mathias Rohde ,  Christoph Schenk ,  Thomas Elster ,  Hans-Joachim Doering ,  Gerhard Schubert

    IPC分类号： H01J37/147

    CPC分类号： G21K1/087

    摘要： The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or measuring equipment. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another.

    摘要翻译： 本发明涉及用于微粒束的静电偏转系统，其可以特别用于光刻设备或测量设备中的微结构和纳米结构应用中。 根据本发明的提出的目的，这种偏转系统的各个电极应该永久地保持和保持相对于彼此的精确的轴向对称布置。 在根据本发明的静电偏转系统中，棒状电极被保持在向内空心载体中的轴向对称布置，通过该载体可以引导红细胞束。 载体由彼此连接的至少两个，最多四个载体构件形成。

    System for receiving and retaining a substrate
    10.
    发明授权
    System for receiving and retaining a substrate 失效
    用于接收和保持基板的系统

    公开(公告)号：US06480369B1

    公开(公告)日：2002-11-12

    申请号：US09600478

    申请日：2000-10-04

    申请人： Ulf-Carsten Kirschstein ,  Stefan Risse ,  Christoph Damm ,  Thomas Peschel

    发明人： Ulf-Carsten Kirschstein ,  Stefan Risse ,  Christoph Damm ,  Thomas Peschel

    IPC分类号： H02N1300

    CPC分类号： G03F7/70691 ,  H01L21/6833

    摘要： The invention refers to a receiving and supporting system for a substrate (17) in an exposure system, which is provided with a handling system for the supply of the substrate (17), with an electrostatic chuck arrangement (1) moveable in X, Y coordinates, for the support of the substrate (17) during the exposure, and with an exposure optic, from which a right angled particle radiation, in Z-direction is directed toward the substrate surface. In regard to the respective supporting system, at least a second electrostatic chuck arrangement (6) is provided, which—similar to the first chuck arrangement (1), for the support of the substrate (17) during the exposure, provides a bearing surface for the substrate, whereby the bearing surface of this second chuck arrangement (6) is positioned movable in Z coordinate. In regard to their supporting force, both chuck arrangements (1, 6) are arranged in such a manner, that the substrate (17) is securely positioned when being supported either on the first chuck arrangement (1) or when being supported exclusively on the second chuck arrangement (6).

    摘要翻译： 本发明涉及一种用于曝光系统中的基板（17）的接收和支撑系统，其具有用于供应基板（17）的处理系统，其中静电卡盘装置（1）可在X，Y 坐标，用于在曝光期间对基板（17）的支撑，以及曝光光学元件，Z方向上的直角粒子辐射从该曝光光学元件朝向基板表面。关于相应的支撑系统，至少 提供第二静电卡盘装置（6），其类似于第一卡盘装置（1），用于在曝光期间支撑基板（17），为基板提供支承表面，从而使该基板 第二卡盘装置（6）定位在Z坐标中可移动。 关于它们的支撑力，两个卡盘装置（1,6）以这样的方式布置，使得当被支撑在第一卡盘装置（1）上时或当被支撑在第一卡盘装置 第二卡盘装置（6）。