公开(公告)号：US07429210B2

公开(公告)日：2008-09-30

申请号：US11626014

申请日：2007-01-23

申请人： Benjamin A. Bonner ,  Peter McReynolds ,  Gregory E. Menk ,  Anand N. Iyer ,  Gopalakrishna B. Prabhu ,  Erik S. Rondum ,  Robert L. Jackson ,  Garlen Leung

发明人： Benjamin A. Bonner ,  Peter McReynolds ,  Gregory E. Menk ,  Anand N. Iyer ,  Gopalakrishna B. Prabhu ,  Erik S. Rondum ,  Robert L. Jackson ,  Garlen Leung

IPC分类号： B24D11/00

CPC分类号： B24D11/00 ,  B24B7/228 ,  B24D2203/00

摘要： A polishing article and method for manufacturing a polishing article for use in a chemical mechanical polishing process is disclosed. The polishing article has a plurality of polishing material tiles separated by grooves formed in or through a polishing material and may be adhesively bound to a base film. The polishing article may include various polygonal tiles and oval shapes formed in the polishing material which allow enhanced slurry retention and ease in rolling from a polishing material supply roll and onto a take-up roll in a web type platen assembly. The polishing article may also include an upper carrier film adapted to minimize delaminating stress placed in an area of the polishing article that is not adapted for polishing. A method and apparatus for manufacturing the various embodiments of the polishing article and a replacement supply roll are also disclosed.

摘要翻译： 公开了一种用于制造用于化学机械抛光工艺的抛光制品的抛光制品和方法。 抛光制品具有由在抛光材料中或通过抛光材料形成的凹槽分开的多个抛光材料砖，并且可以粘合地结合到基膜上。 抛光制品可以包括在抛光材料中形成的各种多边形瓦片和椭圆形形状，其允许增强的浆料保持性并且容易地从研磨材料供给辊滚动到卷筒纸型压板组件中的卷取辊上。 抛光制品还可以包括适于最小化抛光制品的不适于抛光的区域中的分层应力的上载体薄膜。 还公开了用于制造抛光制品和替换供应辊的各种实施例的方法和装置。

公开(公告)号：US07601050B2

公开(公告)日：2009-10-13

申请号：US11707651

申请日：2007-02-15

申请人： Steven M. Zuniga ,  Peter McReynolds ,  Erik S. Rondum ,  Benjamin A. Bonner ,  Henry H. Au ,  Gregory E. Menk ,  Gopalakrishna B. Prabhu ,  Anand N. Iyer ,  Garlen C. Leung

发明人： Steven M. Zuniga ,  Peter McReynolds ,  Erik S. Rondum ,  Benjamin A. Bonner ,  Henry H. Au ,  Gregory E. Menk ,  Gopalakrishna B. Prabhu ,  Anand N. Iyer ,  Garlen C. Leung

IPC分类号： B24B7/22

CPC分类号： B24B21/06 ,  B24B21/04 ,  B24B21/12 ,  B24B37/12 ,  B24B37/205 ,  B24B37/26 ,  B24D11/001

摘要： A polishing apparatus is described. The polishing apparatus includes a rotatable platen, a drive mechanism to incrementally advance a polishing sheet having a polishing surface in a linear direction across the platen, a subpad on the platen to support the polishing sheet, the subpad having a groove formed therein, and a vacuum source connected to the groove of the subpad and configured to apply a vacuum sufficient to pull portions of the polishing sheet into the groove of the subpad to induce a groove in the polishing surface.

摘要翻译： 描述了抛光装置。 抛光装置包括可旋转压板，驱动机构，用于逐渐推进具有沿着线性方向的研磨表面的抛光片横过压板，压板上的子垫以支撑抛光片，子板具有形成在其中的凹槽，以及 真空源连接到子垫的凹槽，并被配置为施加足以将抛光片的一部分拉入到子垫的凹槽中以在抛光表面中引起凹槽的真空。

公开(公告)号：US07179159B2

公开(公告)日：2007-02-20

申请号：US11119682

申请日：2005-05-02

申请人： Benjamin A. Bonner ,  Peter McReynolds ,  Gregory E. Menk ,  Anand N. Iyer ,  Gopalakrishna B. Prabhu ,  Erik S. Rondum ,  Robert L. Jackson ,  Garlen Leung

发明人： Benjamin A. Bonner ,  Peter McReynolds ,  Gregory E. Menk ,  Anand N. Iyer ,  Gopalakrishna B. Prabhu ,  Erik S. Rondum ,  Robert L. Jackson ,  Garlen Leung

IPC分类号： B24D11/00

CPC分类号： B24D11/00 ,  B24B7/228 ,  B24D2203/00

摘要： A polishing article and method for manufacturing a polishing article for use in a chemical mechanical polishing process is disclosed. The polishing article has a plurality of polishing material tiles separated by grooves formed in or through a polishing material and may be adhesively bound to a base film. The polishing article may include various polygonal tiles and oval shapes formed in the polishing material which allow enhanced slurry retention and ease in rolling from a polishing material supply roll and onto a take-up roll in a web type platen assembly. The polishing article may also include an upper carrier film adapted to minimize delaminating stress placed in an area of the polishing article that is not adapted for polishing. A method and apparatus for manufacturing the various embodiments of the polishing article and a replacement supply roll are also disclosed.

摘要翻译： 公开了一种用于制造用于化学机械抛光工艺的抛光制品的抛光制品和方法。 抛光制品具有由在抛光材料中或通过抛光材料形成的凹槽分开的多个抛光材料砖，并且可以粘合地结合到基膜上。 抛光制品可以包括在抛光材料中形成的各种多边形瓦片和椭圆形形状，其允许增强的浆料保持性并且容易地从研磨材料供给辊滚动到卷筒纸型压板组件中的卷取辊上。 抛光制品还可以包括适于最小化抛光制品的不适于抛光的区域中的分层应力的上载体薄膜。 还公开了用于制造抛光制品和替换供应辊的各种实施例的方法和装置。

公开(公告)号：US20100112919A1

公开(公告)日：2010-05-06

申请号：US12263908

申请日：2008-11-03

申请人： Benjamin A. Bonner ,  Gopalakrishna B. Prabhu ,  Erik S. Rondum ,  Gregory E. Menk ,  Anand N. Iyer ,  Peter McReynolds ,  Garlen C. Leung

发明人： Benjamin A. Bonner ,  Gopalakrishna B. Prabhu ,  Erik S. Rondum ,  Gregory E. Menk ,  Anand N. Iyer ,  Peter McReynolds ,  Garlen C. Leung

IPC分类号： B24D11/00

CPC分类号： B24D11/003 ,  B24B21/004 ,  B24B37/205

摘要： A chemical mechanical polishing article can be a single contiguous layer having a polishing surface, the layer being an elongated substantially rectangular sheet having a width and a length at least four times greater than the width. Forming a polishing article can include depositing a liquid precursor on a moving belt, at least partially curing the liquid precursor while on the moving belt to form a polishing layer, and detaching the polishing layer from the belt.

摘要翻译： 化学机械抛光制品可以是具有抛光表面的单个邻接层，该层是具有宽度和长度至少比宽度大至少四倍的长度的基本上矩形的片材。 形成抛光制品可以包括在移动的带上沉积液体前体，在移动的带上至少部分地固化液体前体以形成抛光层，并且将抛光层与带分离。

公开(公告)号：US20090088051A1

公开(公告)日：2009-04-02

申请号：US12239572

申请日：2008-09-26

申请人： Gregory E. Menk ,  Peter McReynolds ,  Benjamin A. Bonner ,  Erik S. Rondum ,  Gopalakrishna B. Prabhu

发明人： Gregory E. Menk ,  Peter McReynolds ,  Benjamin A. Bonner ,  Erik S. Rondum ,  Gopalakrishna B. Prabhu

IPC分类号： B24B21/00

CPC分类号： B24B37/042 ,  B24B21/004

摘要： A polishing article includes an elongated substantially rectangular central portion and a substantially rectangular edge portion. The central portion includes a polishing layer with a polishing surface. The central portion has a width, a length greater than the width and defining a longitudinal axis, and an edge. The edge portion extends from the edge of the central portion, the edge portion is thinner than the central portion, and the polishing layer does not extend onto the edge portion.

摘要翻译： 抛光制品包括细长的大致矩形的中心部分和大致矩形的边缘部分。 中心部分包​​括具有抛光表面的抛光层。 中心部分具有宽度，长度大于宽度并限定纵向轴线和边缘。 边缘部分从中心部分的边缘延伸，边缘部分比中心部分薄，并且抛光层不延伸到边缘部分上。

公开(公告)号：US07553214B2

公开(公告)日：2009-06-30

申请号：US11707548

申请日：2007-02-15

申请人： Gregory E. Menk ,  Peter McReynolds ,  Erik S. Rondum ,  Anand N. Iyer ,  Gopalakrishna B. Prabhu ,  Garlen C. Leung

发明人： Gregory E. Menk ,  Peter McReynolds ,  Erik S. Rondum ,  Anand N. Iyer ,  Gopalakrishna B. Prabhu ,  Garlen C. Leung

IPC分类号： B24B49/12 ,  B24D11/00

CPC分类号： B24B21/06 ,  B24B21/04 ,  B24B21/12 ,  B24B37/12 ,  B24B37/205 ,  B24B37/26 ,  B24D11/001

摘要： A method is described. The method includes contacting a non-solid material to a non-linear edge of a sheet of polishing material, and causing the non-solid material to solidify to form a window that contacts the non-linear edge of the polishing material.

摘要翻译： 描述了一种方法。 该方法包括使非固体材料与抛光材料片的非线性边缘接触，并使非固体材料固化以形成接触抛光材料的非线性边缘的窗口。

公开(公告)号：US07841925B2

公开(公告)日：2010-11-30

申请号：US12488437

申请日：2009-06-19

申请人： Gregory E. Menk ,  Peter McReynolds ,  Erik S. Rondum ,  Anand N. Iyer ,  Gopalakrishna B. Prabhu ,  Garlen C. Leung

发明人： Gregory E. Menk ,  Peter McReynolds ,  Erik S. Rondum ,  Anand N. Iyer ,  Gopalakrishna B. Prabhu ,  Garlen C. Leung

IPC分类号： B24B49/12

CPC分类号： B24B21/06 ,  B24B21/04 ,  B24B21/12 ,  B24B37/12 ,  B24B37/205 ,  B24B37/26 ,  B24D11/001

摘要： A polishing article includes a polishing layer having a polishing surface and a solid light-transmissive window in the polishing layer, the window having a first non-linear edge that extends along a first axis parallel to the polishing surface, the first non-linear edge including a plurality of projections and a plurality of recesses extending parallel to the polishing surface and disposed in an alternating pattern along the first axis.

摘要翻译： 抛光制品包括在抛光层中具有抛光表面和固体透光窗的抛光层，该窗具有沿平行于研磨表面的第一轴延伸的第一非线性边缘，第一非线性边缘 包括多个突起和与所述抛光表面平行延伸并沿所述第一轴线交替设置的多个凹槽。

公开(公告)号：US20090253358A1

公开(公告)日：2009-10-08

申请号：US12488437

申请日：2009-06-19

申请人： Gregory E. Menk ,  Peter McReynolds ,  Erik S. Rondum ,  Anand N. Iyer ,  Gopalakrishna B. Prabhu ,  Garlen C. Leung

发明人： Gregory E. Menk ,  Peter McReynolds ,  Erik S. Rondum ,  Anand N. Iyer ,  Gopalakrishna B. Prabhu ,  Garlen C. Leung

IPC分类号： B24D11/00

CPC分类号： B24B21/06 ,  B24B21/04 ,  B24B21/12 ,  B24B37/12 ,  B24B37/205 ,  B24B37/26 ,  B24D11/001

摘要： A polishing article includes a polishing layer having a polishing surface and a solid light-transmissive window in the polishing layer, the window having a first non-linear edge that extends along a first axis parallel to the polishing surface, the first non-linear edge including a plurality of projections and a plurality of recesses extending parallel to the polishing surface and disposed in an alternating pattern along the first axis.

摘要翻译： 抛光制品包括在抛光层中具有抛光表面和固体透光窗的抛光层，该窗具有沿平行于研磨表面的第一轴延伸的第一非线性边缘，第一非线性边缘 包括多个突起和与所述抛光表面平行延伸并沿所述第一轴线交替设置的多个凹槽。

公开(公告)号：US20120021671A1

公开(公告)日：2012-01-26

申请号：US12843793

申请日：2010-07-26

申请人： Peter McReynolds ,  Eric S. Rondum ,  Garlen C. Leung ,  Adam H. Zhong ,  Gregory E. Menk ,  Gopalakrishna B. Prabhu ,  Thomas H. Osterheld

发明人： Peter McReynolds ,  Eric S. Rondum ,  Garlen C. Leung ,  Adam H. Zhong ,  Gregory E. Menk ,  Gopalakrishna B. Prabhu ,  Thomas H. Osterheld

IPC分类号： B24B49/12

CPC分类号： B24B37/005 ,  B24B37/042 ,  B24B37/32

摘要： A method and apparatus for monitoring the condition of a surface of a retaining ring disposed on a carrier head in a polishing module is described. In one embodiment, a method for monitoring at least one surface of a retaining ring coupled to a carrier head is provided. The method includes moving the carrier head adjacent a sensor device disposed in a polishing module, transmitting energy from the sensor device toward the retaining ring, receiving energy reflected from the retaining ring, and determining a condition of the retaining ring based on the received energy.

摘要翻译： 描述了一种用于监测设置在抛光模块中的载体头上的保持环的表面状况的方法和装置。 在一个实施例中，提供一种用于监测联接到承载头的保持环的至少一个表面的方法。 该方法包括使载体头靠近设置在抛光模块中的传感器装置移动，将能量从传感器装置传递到保持环，接收从保持环反射的能量，以及基于所接收的能量来确定保持环的状态。

公开(公告)号：US07063597B2

公开(公告)日：2006-06-20

申请号：US10693683

申请日：2003-10-24

申请人： Gopalakrishna B. Prabhu ,  Thomas H. Osterheld ,  Garlen C. Leung ,  Adam H. Zhong ,  Peter McReynolds ,  Yi-Yung Tao ,  Gregory E. Menk ,  Vasanth N. Mohan ,  Christopher Heung-Gyun Lee

发明人： Gopalakrishna B. Prabhu ,  Thomas H. Osterheld ,  Garlen C. Leung ,  Adam H. Zhong ,  Peter McReynolds ,  Yi-Yung Tao ,  Gregory E. Menk ,  Vasanth N. Mohan ,  Christopher Heung-Gyun Lee

IPC分类号： B24B1/00

CPC分类号： H01L21/76229 ,  H01L21/31053

摘要： Methods and compositions are provided for planarizing a substrate surface with reduced or minimal topographical defect formation during a polishing process for dielectric materials. In one aspect a method is provided for polishing a substrate containing two or more dielectric layers, such as silicon oxide, silicon nitride, silicon oxynitride, with at least one processing step using a fixed-abrasive polishing article as a polishing article. The processing steps may be used to remove all, substantially all, or a portion of the one or more dielectric layers, which may include removal of the topography, the bulk dielectric, or residual dielectric material of a dielectric layer in two or more steps.

摘要翻译： 提供的方法和组合物用于在电介质材料的抛光工艺期间使衬底表面平坦化，减少或最小的形貌缺陷形成。 在一个方面，提供一种用于使用固定磨料抛光制品作为抛光制品的至少一个加工步骤来研磨含有两个或更多个介电层的衬底的方法，例如氧化硅，氮化硅，氮氧化硅。 处理步骤可以用于去除一个或多个介电层的全部，基本上全部或一部分，其可以包括以两个或更多个步骤去除介电层的形貌，体电介质或残余电介质材料。