Ex-situ cleaning assembly
    1.
    发明授权
    Ex-situ cleaning assembly 有权
    异地清洗组件

    公开(公告)号:US08974606B2

    公开(公告)日:2015-03-10

    申请号:US13103965

    申请日:2011-05-09

    摘要: A cleaning assembly is provided. The cleaning assembly includes a plate having a front surface and a back surface and a manifold affixed to an edge of the plate. The manifold has a plurality of outlets extending therefrom. The plate further includes a plurality of cups extending through the plate. The plurality of cups have an upper body with an outlet extending from the back surface and the plurality of cups have a sealing portion coupled to the upper body and extending from the front surface of the plate. Each outlet of the upper body is coupled to one of the corresponding plurality of outlets of the manifold. The plate also includes a plurality of alignment pins extending from the front surface of the plate. The plurality of alignment pins are configured to support an edge of a substrate, wherein one of the plurality of alignment pins is slidably mounted to the plate. A plurality of guide pins extends the same distance from the back surface.

    摘要翻译: 提供清洁组件。 清洁组件包括具有前表面和后表面的板,以及固定到板的边缘的歧管。 歧管具有从其延伸的多个出口。 板还包括延伸穿过板的多个杯。 多个杯具有具有从后表面延伸的出口的上体,并且多个杯具有联接到上身并且从板的前表面延伸的密封部。 上身的每个出口连接到歧管的相应多个出口之一。 该板还包括从板的前表面延伸的多个对准销。 多个对准销被配置为支撑基板的边缘,其中多个对准销中的一个可滑动地安装到板上。 多个导销从后表面延伸相同的距离。

    EX-SITU CLEANING ASSEMBLY
    2.
    发明申请
    EX-SITU CLEANING ASSEMBLY 有权
    EX-SITU清洁装置

    公开(公告)号:US20120285493A1

    公开(公告)日:2012-11-15

    申请号:US13103965

    申请日:2011-05-09

    IPC分类号: B08B3/00

    摘要: A cleaning assembly is provided. The cleaning assembly includes a plate having a front surface and a back surface and a manifold affixed to an edge of the plate. The manifold has a plurality of outlets extending therefrom. The plate further includes a plurality of cups extending through the plate. The plurality of cups have an upper body with an outlet extending from the back surface and the plurality of cups have a sealing portion coupled to the upper body and extending from the front surface of the plate. Each outlet of the upper body is coupled to one of the corresponding plurality of outlets of the manifold. The plate also includes a plurality of alignment pins extending from the front surface of the plate. The plurality of alignment pins are configured to support an edge of a substrate, wherein one of the plurality of alignment pins is slidably mounted to the plate. A plurality of guide pins extends the same distance from the back surface.

    摘要翻译: 提供清洁组件。 清洁组件包括具有前表面和后表面的板,以及固定到板的边缘的歧管。 歧管具有从其延伸的多个出口。 板还包括延伸穿过板的多个杯。 多个杯具有具有从后表面延伸的出口的上体,并且多个杯具有联接到上主体并且从板的前表面延伸的密封部。 上身的每个出口连接到歧管的相应多个出口之一。 该板还包括从板的前表面延伸的多个对准销。 多个对准销被配置为支撑基板的边缘,其中多个对准销中的一个可滑动地安装到板上。 多个导销从后表面延伸相同的距离。

    In-situ cleaning assembly
    3.
    发明授权
    In-situ cleaning assembly 失效
    原位清洗组件

    公开(公告)号:US08627835B2

    公开(公告)日:2014-01-14

    申请号:US13086327

    申请日:2011-04-13

    IPC分类号: B08B3/00

    摘要: A cleaning chamber is provided. The cleaning chamber includes a base portion housing a chuck and a lid affixed to the base portion. A support assembly is linked to the lid and the support assembly includes a top plate spaced apart from a bottom plate, the top plate has a plurality of openings defined therethrough and the bottom plate has a plurality of openings defined therethrough. The cleaning chamber includes a plurality of cups extending through corresponding pairs of the plurality of openings of the top plate and the bottom plate. The plurality of cups is configured to seal against a surface of a substrate, wherein each cup of the plurality of cups is independently supported by the bottom plate.

    摘要翻译: 提供清洁室。 清洁室包括容纳卡盘的基座部分和固定到基部的盖子。 支撑组件连接到盖,并且支撑组件包括与底板间隔开的顶板,顶板具有限定穿过其中的多个开口,并且底板具有穿过其中限定的多个开口。 清洁室包括延伸穿过顶板和底板的多个开口的相应对的多个杯。 多个杯被配置为密封衬底的表面,其中多个杯的每个杯独立地由底板支撑。

    IN-SITU CLEANING ASSEMBLY
    4.
    发明申请
    IN-SITU CLEANING ASSEMBLY 失效
    现场清洁装置

    公开(公告)号:US20120260953A1

    公开(公告)日:2012-10-18

    申请号:US13086327

    申请日:2011-04-13

    IPC分类号: B08B3/00

    摘要: A cleaning chamber is provided. The cleaning chamber includes a base portion housing a chuck and a lid affixed to the base portion. A support assembly is linked to the lid and the support assembly includes a top plate spaced apart from a bottom plate, the top plate has a plurality of openings defined therethrough and the bottom plate has a plurality of openings defined therethrough. The cleaning chamber includes a plurality of cups extending through corresponding pairs of the plurality of openings of the top plate and the bottom plate. The plurality of cups is configured to seal against a surface of a substrate, wherein each cup of the plurality of cups is independently supported by the bottom plate.

    摘要翻译: 提供清洁室。 清洁室包括容纳卡盘的基座部分和固定到基部的盖子。 支撑组件连接到盖,并且支撑组件包括与底板间隔开的顶板,顶板具有限定穿过其中的多个开口,并且底板具有穿过其中限定的多个开口。 清洁室包括延伸穿过顶板和底板的多个开口的相应对的多个杯。 多个杯被配置为密封衬底的表面,其中多个杯的每个杯独立地由底板支撑。

    METHOD AND APPARATUS FOR MAGNETIC STIRRING
    5.
    发明申请
    METHOD AND APPARATUS FOR MAGNETIC STIRRING 审中-公开
    用于磁性搅拌的方法和装置

    公开(公告)号:US20130157897A1

    公开(公告)日:2013-06-20

    申请号:US13327352

    申请日:2011-12-15

    IPC分类号: C40B40/00

    摘要: A system for combinatorially processing a substrate is provided. The system includes a reactor or chemical library having a plurality of chambers defined within the reactor or library, the chambers operable to mix fluids disposed therein. A drive system is disposed below a bottom surface of the reactor. The drive system is operable to rotate a plurality of support plates below the surface of the substrate. The plurality of support plates has a non-circular shape. The non-circular shape of adjacent support plates includes extensions configured to traverse overlapping regions of rotation during rotation of adjacent support plates. Each of the extensions has a magnet disposed thereon.

    摘要翻译: 提供了一种用于组合处理衬底的系统。 该系统包括具有限定在反应器或库内的多个室的反应器或化学库,所述室可操作以混合设置在其中的流体。 驱动系统设置在反应器底面的下方。 驱动系统可操作以将多个支撑板旋转到基板的表面下方。 多个支撑板具有非圆形形状。 相邻支撑板的非圆形形状包括构造成在相邻的支撑板的旋转期间横过重叠的旋转区域的延伸部。 每个延伸部具有设置在其上的磁体。

    Full wafer processing by multiple passes through a combinatorial reactor
    6.
    发明授权
    Full wafer processing by multiple passes through a combinatorial reactor 有权
    通过多次通过组合反应器的全晶片处理

    公开(公告)号:US08883607B2

    公开(公告)日:2014-11-11

    申请号:US13337425

    申请日:2011-12-27

    IPC分类号: H01L21/76

    摘要: Overlapping combinatorial processing can offer more processed regions, better particle performance and simpler process equipment. In overlapping combinatorial processing, one or more regions are processed in series with some degrees of overlapping between regions. In some embodiments, overlapping combinatorial processing can be used in conjunction with non-overlapping combinatorial processing and non-combinatorial processing to develop and investigate materials and processes for device processing and manufacturing.

    摘要翻译: 重叠组合处理可以提供更多的处理区域,更好的粒子性能和更简单的工艺设备。 在重叠组合处理中,一个或多个区域与区域之间的一些重叠程度串联处理。 在一些实施例中,重叠的组合处理可以结合非重叠的组合处理和非组合处理来使用,以开发和研究用于设备处理和制造的材料和过程。

    FULL WAFER PROCESSING BY MULTIPLE PASSES THROUGH A COMBINATORIAL REACTOR
    7.
    发明申请
    FULL WAFER PROCESSING BY MULTIPLE PASSES THROUGH A COMBINATORIAL REACTOR 有权
    通过多个通过组合反应器进行全面加工

    公开(公告)号:US20130164906A1

    公开(公告)日:2013-06-27

    申请号:US13337425

    申请日:2011-12-27

    IPC分类号: H01L21/76

    摘要: Overlapping combinatorial processing can offer more processed regions, better particle performance and simpler process equipment. In overlapping combinatorial processing, one or more regions are processed in series with some degrees of overlapping between regions. In some embodiments, overlapping combinatorial processing can be used in conjunction with non-overlapping combinatorial processing and non-combinatorial processing to develop and investigate materials and processes for device processing and manufacturing.

    摘要翻译: 重叠组合处理可以提供更多的处理区域,更好的粒子性能和更简单的工艺设备。 在重叠组合处理中,一个或多个区域与区域之间的一些重叠程度串联处理。 在一些实施例中,重叠的组合处理可以结合非重叠的组合处理和非组合处理来使用,以开发和研究用于设备处理和制造的材料和过程。

    Touchless site isolation using gas bearing
    8.
    发明授权
    Touchless site isolation using gas bearing 有权
    使用气体轴承进行无触点隔离

    公开(公告)号:US08945407B2

    公开(公告)日:2015-02-03

    申请号:US13337374

    申请日:2011-12-27

    申请人: Aaron Francis

    发明人: Aaron Francis

    IPC分类号: H01L21/302 B08B3/04

    摘要: A gas bearing seal using porous materials for distribution of gas flow can provide site isolation during wet processing. In some embodiments, a flow cell comprises a porous media gas bearing surrounding a periphery of the flow cell, isolating the liquid inside the flow cell from the ambient air outside the flow cell. In some embodiments, a protective chuck comprises a porous media gas bearing disposed in a middle of the protective chuck, isolating the liquid outside the protective chuck with the gaseous ambient generated by the porous media gas bearing.

    摘要翻译: 使用多孔材料进行气流分配的气体轴承密封可以在湿法加工过程中提供现场隔离。 在一些实施例中,流动池包括围绕流动池的周边的多孔介质气体轴承,将流动池内的液体与流动池外部的环境空气隔离。 在一些实施例中,保护卡盘包括设置在保护卡盘中间的多孔介质气体轴承,将保护卡盘外部的液体与由多孔介质气体轴承产生的气体环境隔离。

    No-Contact Wet Processing Tool with Fluid Barrier
    9.
    发明申请
    No-Contact Wet Processing Tool with Fluid Barrier 审中-公开
    无接触湿式加工工具,具有流体屏障

    公开(公告)号:US20130025688A1

    公开(公告)日:2013-01-31

    申请号:US13192677

    申请日:2011-07-28

    IPC分类号: B01D47/00

    摘要: Embodiments of the present invention describe substrate processing tools and methods. The substrate processing tool includes a housing defining a chamber and a substrate support coupled to the housing and configured to support a substrate within the chamber. The substrate has an upper surface with a first portion and a second portion surrounding the first portion. An isolation unit including a body is coupled to the housing and positioned within the chamber above and spaced apart from the first portion of the upper surface of the substrate. The body includes at least one outlet on a lower surface thereof, which is in fluid communication with at least one fluid pump. The at least one fluid pump is configured to drive fluid through the at least one of outlet to form a barrier around the first portion of the upper surface of the substrate.

    摘要翻译: 本发明的实施例描述了基板处理工具和方法。 衬底处理工具包括限定室的壳体和联接到壳体并被配置为支撑腔室内的衬底的衬底支撑件。 衬底具有上表面,其具有第一部分和围绕第一部分的第二部分。 包括主体的隔离单元联接到壳体并且定位在腔室的上方并与衬底的上表面的第一部分间隔开的腔室内。 主体在其下表面上包括至少一个与至少一个流体泵流体连通的出口。 至少一个流体泵构造成驱动流体通过出口中的至少一个,以在基底的上表面的第一部分周围形成屏障。

    SYSTEMS AND METHODS FOR SEALING IN SITE-ISOLATED REACTORS
    10.
    发明申请
    SYSTEMS AND METHODS FOR SEALING IN SITE-ISOLATED REACTORS 失效
    用于在现场隔离反应器中密封的系统和方法

    公开(公告)号:US20110179999A1

    公开(公告)日:2011-07-28

    申请号:US13080441

    申请日:2011-04-05

    IPC分类号: C23C16/00

    CPC分类号: H01L21/67126

    摘要: Substrate processing systems and methods are described for site-isolated processing of substrates. The processing systems include numerous site-isolated reactors (SIRs). The processing systems include a reactor block having a cell array that includes numerous SIRs. A sleeve is coupled to an interior of each of the SIRs. The sleeve includes a compliance device configured to dynamically control a vertical position of the sleeve in the SIR. A sealing system is configured to provide a seal between a region of a substrate and the interior of each of the SIRs. The processing system can include numerous modules that comprise one or more site-isolated reactors (SIRs) configured for one or more of molecular self-assembly and combinatorial processing of substrates.

    摘要翻译: 基板处理系统和方法被描述用于基板的场隔离处理。 处理系统包括许多场地隔离反应器(SIR)。 处理系统包括具有包括大量SIR的单元阵列的反应器块。 套筒连接到每个SIR的内部。 套筒包括配置成在SIR中动态地控制套筒的垂直位置的顺应装置。 密封系统被配置为在衬底的区域和每个SIR的内部之间提供密封。 处理系统可以包括多个模块,其包括被配置用于衬底的分子自组装和组合处理中的一个或多个的一个或多个位置隔离反应器(SIR)。