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公开(公告)号：US20170342580A1
公开(公告)日：2017-11-30
申请号：US15674618
申请日：2017-08-11
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Peter Mardilovich , Anthony M. Fuller , Qingqiao Wei
CPC classification number: C25D1/006 , C23C28/00 , C23C28/321 , C23C28/322 , C23C28/3455 , C25D11/045 , C25D11/12 , C25D11/24
Abstract: A method of adhering a cover layer to a substrate includes forming an array of nano-structures on a substrate. A flowable material is applied to the substrate, the flowable material substantially enveloping the nano-structures on the substrate. The flowable material is solidified to form a cover layer on the substrate, the cover layer being anchored to the substrate via the nano-structures.
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公开(公告)号：US20170159194A1
公开(公告)日：2017-06-08
申请号：US15438074
申请日：2017-02-21
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Peter Mardilovich , Qingqiao Wei , Irina Nikolaevna Milonova , Anthony M. Fuller
CPC classification number: C25D1/006 , B81C1/00031 , B81C2201/013 , B81C2201/0197 , C25D11/045 , C25D11/08 , C25D11/10 , C25D11/12 , C25D11/24 , C25D11/26
Abstract: In an example of a method for making a nano-structure, an aluminum layer is partially anodized to form a porous anodic alumina structure. The aluminum layer is positioned on an oxidizable material layer. The porous anodic alumina structure is exposed to partial anisotropic etching to form tracks within the porous anodic alumina structure. A remaining portion of the aluminum layer is further anodized to form paths where the tracks are formed. The oxidizable material layer is anodized to from an oxide, where the oxide grows through the paths formed within the porous anodic alumina structure to form a set of super nano-pillars.
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公开(公告)号：US20150372221A1
公开(公告)日：2015-12-24
申请号：US14759569
申请日：2013-01-28
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Eric Andrew Patterson , David Cann , Peter Mardilovich
IPC: H01L41/187
CPC classification number: H01L41/1878 , B41J2/14233 , B41J2202/03 , C04B35/462 , C04B35/465 , C04B35/4682 , C04B35/475 , C04B35/495 , C04B2235/3201 , C04B2235/3206 , C04B2235/3234 , C04B2235/3251 , C04B2235/3275 , C04B2235/3298 , H01L41/0973 , H01L41/1873
Abstract: A lead-free piezoelectric ceramic material has the general chemical formula xBiCoO3-y(Bi0.5Na0.5)TiO3-z(Bi0.5K0.5)TiO3, xBiCoO3-y(Bi0.5Na0.5)TiO3-zNaN-bO3, xBiCoO3-y(Bi0.5Na0.5)TiO3-zKNbO3, xBiCoO3-yBi(Mg0.5Ti0.5)O3-z(Bi0.5Na0.5)TiO3, xBiCoO3-yBa-TiO3-z(Bi0.5Na0.5)TiO3, or xBiCoO3-yNaNbO3-zKNbO3; wherein x+y+z=1, and x, y, z≠0.
Abstract translation: 无铅压电陶瓷材料具有通用化学式xBiCoO3-y（Bi0.5Na0.5）TiO3-z（Bi0.5K0.5）TiO3，xBiCoO3-y（Bi0.5Na0.5）TiO3-zNaN-bO3， xBiCoO3-y（Bi0.5Na0.5）TiO3-zKNbO3，xBiCoO3-yBi（Mg0.5Ti0.5）O3-z（Bi0.5Na0.5）TiO3，xBiCoO3-yBa-TiO23-z（Bi0.5Na0.5） TiO3或xBiCoO3-yNaNbO3-zKNbO3; 其中x + y + z = 1，x，y，z≠0。
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公开(公告)号：US10465308B2
公开(公告)日：2019-11-05
申请号：US15674618
申请日：2017-08-11
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Peter Mardilovich , Anthony M. Fuller , Qingqiao Wei
Abstract: A method of adhering a cover layer to a substrate includes forming an array of nano-structures on a substrate. A flowable material is applied to the substrate, the flowable material substantially enveloping the nano-structures on the substrate. The flowable material is solidified to form a cover layer on the substrate, the cover layer being anchored to the substrate via the nano-structures.
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公开(公告)号：US20170267520A1
公开(公告)日：2017-09-21
申请号：US15616174
申请日：2017-06-07
Applicant: Hewlett-Packard Development Company, L.P.
Inventor： Peter Mardilovich , Anthony M. Fuller , Qingqiao Wei
IPC: B81C1/00 , B81B3/00 , C25D1/00 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/18 , C25D11/26
CPC classification number: C25D11/045 , B81B2203/0361 , B81C1/00031 , C25D11/022 , C25D11/08 , C25D11/10 , C25D11/12 , C25D11/16 , C25D11/24 , C25D11/26 , Y10S977/856 , Y10S977/888 , Y10T428/24355
Abstract: A method of forming a micro-structure involves forming a multi-layered structure including i) an oxidizable material layer on a substrate and ii) another oxidizable material layer on the oxidizable material layer. The oxidizable material layer is formed of an oxidizable material having an expansion coefficient, during oxidation, that is more than 1. The method further involves forming a template, including a plurality of pores, from the other oxidizable material layer, and growing a nano-pillar inside each pore. The nano-pillar has a predefined length that terminates at an end. A portion of the template is selectively removed to form a substantially even plane that is oriented in a position opposed to the substrate. A material is deposited on at least a portion of the plane to form a film layer thereon, and the remaining portion of the template is selectively removed to expose the nano-pillars.
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Patent Agency Ranking
公开(公告)号：US10927472B2
公开(公告)日：2021-02-23
申请号：US16212435
申请日：2018-12-06
Applicant: Hewlett-Packard Development Company, L.P.
Inventor： Peter Mardilovich , Anthony M. Fuller , Qingqiao Wei
IPC: C25D11/04 , B81C1/00 , C25D11/26 , C25D11/02 , C25D11/08 , C25D11/10 , C25D11/12 , C25D11/16 , C25D11/24
Abstract: A method of forming a micro-structure involves forming a multi-layered structure including i) an oxidizable material layer on a substrate and ii) another oxidizable material layer on the oxidizable material layer. The oxidizable material layer is formed of an oxidizable material having an expansion coefficient, during oxidation, that is more than 1. The method further involves forming a template, including a plurality of pores, from the other oxidizable material layer, and growing a nano-pillar inside each pore. The nano-pillar has a predefined length that terminates at an end. A portion of the template is selectively removed to form a substantially even plane that is oriented in a position opposed to the substrate. A material is deposited on at least a portion of the plane to form a film layer thereon, and the remaining portion of the template is selectively removed to expose the nano-pillars.
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公开(公告)号：US10287697B2
公开(公告)日：2019-05-14
申请号：US15438074
申请日：2017-02-21
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Peter Mardilovich , Qingqiao Wei , Irina Nikolaevna Milonova , Anthony M. Fuller
Abstract: In an example of a method for making a nano-structure, an aluminum layer is partially anodized to form a porous anodic alumina structure. The aluminum layer is positioned on an oxidizable material layer. The porous anodic alumina structure is exposed to partial anisotropic etching to form tracks within the porous anodic alumina structure. A remaining portion of the aluminum layer is further anodized to form paths where the tracks are formed. The oxidizable material layer is anodized to from an oxide, where the oxide grows through the paths formed within the porous anodic alumina structure to form a set of super nano-pillars.
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公开(公告)号：US20160319445A1
公开(公告)日：2016-11-03
申请号：US15203825
申请日：2016-07-07
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Peter Mardilovich , Qingqiao Wei , Anthony M. Fuller
CPC classification number: C25D1/006 , B01D63/088 , B01D67/0065 , B01D69/02 , B01D2325/028 , B01L3/502746 , B01L3/502753 , B81B2203/0361 , B81C1/00031 , C25D11/02
Abstract: A method of forming capped nano-pillars on a substrate includes forming a template on the substrate, the template defining nano-pores having a first width. The nano-pores are partially filled to define nano-pillar stem portions of a first thickness corresponding to the first width. The nano-pores are re-shaped to define re-shaped nano-pore sections having a second width different than the first width. The re-shaped nano-pore sections are at least partially filled to define nano-pillar cap portions of a second thickness corresponding to the second width. The method further includes removing the template.
Abstract translation: 在衬底上形成封盖纳米柱的方法包括在衬底上形成模板，该模板限定具有第一宽度的纳米孔。 纳米孔被部分填充以限定对应于第一宽度的第一厚度的纳米柱茎部分。 重新形成纳米孔以形成具有不同于第一宽度的第二宽度的重新形状的纳米孔部分。 重新形成的纳米孔部分至少部分地被填充以限定对应于第二宽度的第二厚度的纳米柱帽部分。 该方法还包括移除模板。
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公开(公告)号：US10680160B2
公开(公告)日：2020-06-09
申请号：US15026311
申请日：2013-10-30
Applicant: Hewlett-Packard Development Company, L.P. , State of Oregon on behalf of Oregon State Univ.
Inventor： James Elmer Abbott, Jr. , Peter Mardilovich , Brady Gibbons , Bryan Alexander Maack
IPC: H01L41/09 , H01L41/27 , H01L41/332 , H01L41/08 , B41J2/16 , B41J2/14 , H01L41/047 , H01L41/187
Abstract: The present disclosure is drawn to a piezoelectric thin film stack and method of preparing the same. The piezoelectric thin film stack can comprise a substrate with an oxide application surface, a metal oxide adhesive blend layer applied to the oxide application surface, and a piezoelectric film applied directly to the metal oxide adhesive blend layer.
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公开(公告)号：US20190106802A1
公开(公告)日：2019-04-11
申请号：US16212435
申请日：2018-12-06
Applicant: Hewlett-Packard Development Company, L.P.
Inventor： Peter Mardilovich , Anthony M. Fuller , Qingqiao Wei
IPC: C25D11/04 , C25D11/26 , C25D11/02 , C25D11/08 , C25D11/12 , C25D11/24 , B81C1/00 , C25D11/16 , C25D11/10
Abstract: A method of forming a micro-structure involves forming a multi-layered structure including i) an oxidizable material layer on a substrate and ii) another oxidizable material layer on the oxidizable material layer. The oxidizable material layer is formed of an oxidizable material having an expansion coefficient, during oxidation, that is more than 1. The method further involves forming a template, including a plurality of pores, from the other oxidizable material layer, and growing a nano-pillar inside each pore. The nano-pillar has a predefined length that terminates at an end. A portion of the template is selectively removed to form a substantially even plane that is oriented in a position opposed to the substrate. A material is deposited on at least a portion of the plane to form a film layer thereon, and the remaining portion of the template is selectively removed to expose the nano-pillars.
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