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42 条记录 (耗时 0.036 秒)

    Optical measurements of fine line parameters in integrated circuit processes
    1.
    发明授权
    Optical measurements of fine line parameters in integrated circuit processes 失效
    集成电路工艺中细线参数的光学测量

    公开(公告)号：US4408884A

    公开(公告)日：1983-10-11

    申请号：US278448

    申请日：1981-06-29

    申请人： Hans P. Kleinknecht ,  William E. Ham ,  Heinrich Meier

    发明人： Hans P. Kleinknecht ,  William E. Ham ,  Heinrich Meier

    IPC分类号： G01B11/02 ,  G03F7/20

    CPC分类号： G03F7/705 ,  G01B11/02 ,  G03F7/70616 ,  G03F7/70625

    摘要： The image transfer process in integrated circuit (IC) processes such as large scale integrated (LSI) device process manufacturing is monitored by optical measurements on a stage-by-stage basis by measuring a monitor specimen or test sample formed with a diffraction grating of a predetermined pattern having a strip width corresponding to the desired line widths of the wafers or masks being monitored. A beam of monochromatic light is scanned over the test sample to generate diffracted beams of various orders. Line width, line depth, line edge profile process errors can be determined by various combinations of the diffracted beams of the zero, first, second, etc., orders. The test sample is scanned to generate a display for data representing the diffracted beams. The parameter data can be stored for later use for quality control, process monitoring, circuit design parameters, and the like. Moreover, gross process errors are visually discernible on the monitor specimen.

    摘要翻译： 集成电路（IC）工艺中的图像传送过程如大规模集成（LSI）器件工艺制造通过光学测量在逐个基础上通过测量由衍射光栅形成的监视器样本或测试样品 具有对应于所监视的晶片或掩模的期望线宽的条带宽度的预定图案。 在测试样品上扫描一束单色光，以产生各种各样的衍射光束。 线宽，线深度，线边缘轮廓加工误差可以通过零，第一，第二等等的衍射光束的各种组合来确定。 扫描测试样品以产生表示衍射光束的数据的显示。 参数数据可以存储以供以后用于质量控制，过程监控，电路设计参数等。 此外，在显示器样品上，视觉上可辨认出粗加工误差。

    Optical line width measuring apparatus and method
    2.
    发明授权
    Optical line width measuring apparatus and method 失效
    光线宽度测量装置及方法

    公开(公告)号：US4330213A

    公开(公告)日：1982-05-18

    申请号：US121529

    申请日：1980-02-14

    申请人： Hans P. Kleinknecht ,  Heinrich Meier

    发明人： Hans P. Kleinknecht ,  Heinrich Meier

    IPC分类号： G01B11/00 ,  G01B11/02 ,  G01B9/02

    CPC分类号： G01B11/02 ,  Y10T74/18936

    摘要： Optical monitoring of the lateral dimensions of a pattern disposed on a substrate in the form of a wafer or mask is accomplished by testing for the lateral dimensions of a diffraction grating test pattern disposed adjacent the pattern. A beam of monochromatic light such as from a laser is diffracted by the test pattern and detectors determine the intensity of the diffracted beams. The detectors are disposed in a plane orthogonal to the plane of the test pattern and to the direction of the grating lines. The detectors are selectively spaced from each other according to the periodicity d of the grating and the width of the grating lines a is determined from a relationship of the detected intensities of the beams.

    摘要翻译： 以晶片或掩模的形式设置在基板上的图案的横向尺寸的光学监测通过测试邻近图案设置的衍射光栅测试图案的横向尺寸来实现。 来自激光的单色光束被测试图案衍射，检测器确定衍射光束的强度。 检测器设置在与测试图案的平面正交并且与光栅线的方向垂直的平面中。 检测器根据光栅的周期d选择性地间隔开，并且根据检测到的光束强度的关系确定光栅线a的宽度。

    Tetrahydro-Quinolinylurea Derivatives
    3.
    发明申请
    Tetrahydro-Quinolinylurea Derivatives 审中-公开
    四氢喹啉基脲衍生物

    公开(公告)号：US20100137361A1

    公开(公告)日：2010-06-03

    申请号：US12700417

    申请日：2010-02-04

    申请人： Axel BOUCHON ,  Nicole Diedrichs ,  Achim Hermann ,  Klemens Lustig ,  Heinrich Meier ,  Josef Pernerstorfer ,  Elke Reissmüller ,  Muneto Mogi ,  Hiroshi Fujishima ,  Masaomi Tajimi ,  Noriyuki Yamamoto

    发明人： Axel BOUCHON ,  Nicole Diedrichs ,  Achim Hermann ,  Klemens Lustig ,  Heinrich Meier ,  Josef Pernerstorfer ,  Elke Reissmüller ,  Muneto Mogi ,  Hiroshi Fujishima ,  Masaomi Tajimi ,  Noriyuki Yamamoto

    IPC分类号： A61K31/47 ,  A61P11/06 ,  A61P13/02

    CPC分类号： C07D215/38

    摘要： This invention relates to tetrahydro-quinolinylurea derivatives and salts thereof which are useful as active ingredients of pharmaceutical preparations.The tetrahydro-quinolinylurea derivative of the present invention has vanilloid receptor (VR1) antagonistic activity, and can be used for the prophylaxis and treatment of diseases associated with VR1 activity, in particular for the treatment of urological diseases or disorders, such as detrusor overactivity (overactive bladder), urinary incontinence, neurogenic detrusor overactivity (detrusor hyperflexia), idiopathic detrusor overactivity (detrusor instability), benign prostatic hyperplasia, and lower urinary tract symptoms; chronic pain, neuropathic pain, postoperative pain, rheumatoid arthritic pain, neuralgia, neuropathies, algesia, nerve injury, ischaemia, neurodegeneration, stroke, and inflammatory disorders such as asthma and chronic obstructive pulmonary (or airways) disease (COPD).

    摘要翻译： 本发明涉及可用作药物制剂活性成分的四氢 - 喹啉基脲衍生物及其盐。 本发明的四氢 - 喹啉基脲衍生物具有香草素受体（VR1）拮抗活性，可用于预防和治疗与VR1活性有关的疾病，特别是用于治疗泌尿系统疾病或障碍，例如逼尿肌过度活动 膀胱过度活动），尿失禁，神经源性逼尿肌过度活动（逼尿肌hyperflexia），特发性逼尿肌过度活动（逼尿肌不稳定），良性前列腺增生和下尿路症状; 慢性疼痛，神经性疼痛，术后疼痛，类风湿性关节炎疼痛，神经痛，神经病，痛觉，神经损伤，局部缺血，神经变性，中风和炎性疾病如哮喘和慢性阻塞性肺（或气道）疾病（COPD）。