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    Laser gas replenishment method
    2.
    发明授权
    Laser gas replenishment method 有权
    激光加气方式

    公开(公告)号：US06965624B2

    公开(公告)日：2005-11-15

    申请号：US10338779

    申请日：2003-01-06

    申请人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Juergen Kleinschmidt ,  Thomas Schroeder ,  Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Wolfgang Zschocke ,  Sergei Govorkov

    发明人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Juergen Kleinschmidt ,  Thomas Schroeder ,  Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Wolfgang Zschocke ,  Sergei Govorkov

    IPC分类号： G02B5/18 ,  G03F7/20 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225 ,  H01S3/00 ,  H01S3/09 ,  H01S3/097 ,  H01S3/22

    CPC分类号： G03F7/70025 ,  G02B5/1814 ,  G02B5/1838 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08031 ,  H01S3/08045 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225

    摘要： A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a molecular fluorine component of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is provided at an initial partial pressure and is subject to depletion within the laser discharge chamber. Injections of gas including molecular fluorine are performed each to increase the partial pressure of molecular fluorine by a selected amount in the laser chamber preferably less than 0.2 mbar per injection, or 7% of an amount of F2 already within the laser chamber. A number of successive injections may be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the molecular fluorine in the discharge chamber. The driving voltage is preferably determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.

    摘要翻译： 提供了一种用于通过使用气体供应单元和处理器将激光气体混合物的分子氟成分维持在预定分压来稳定气体放电激光器的输出光束参数的方法和装置。 分子氟以初始分压提供，并在激光放电室内耗尽。 每次喷射包括分子氟的气体，以在激光室中选择的量增加分子氟的分压，优选地每次注射小于0.2毫巴，或者已经在其中的2％的量的7％ 在激光室内。 可以以选定的间隔执行多次连续喷射，以维持构成气体基本处于初始分压，以维持稳定的输出光束参数。 每次注射量和/或注射间隔可以基于驱动电压的测量值和/或放电室中分子氟的计算量而变化。 驱动电压优选地被确定为基于系统的老化而被调整的多个驱动电压范围之一。 在每个范围内，气体注入和气体替换优选基于对放电的总施加电能和/或时间和/或脉冲计数进行。

    Laser gas replenishment method
    5.
    发明授权
    Laser gas replenishment method 有权

    公开(公告)号：US06504861B2

    公开(公告)日：2003-01-07

    申请号：US10114184

    申请日：2002-04-01

    申请人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Thomas Schroeder

    发明人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Thomas Schroeder

    IPC分类号： H01S322

    CPC分类号： G03F7/70025 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225

    摘要： A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber. The driving voltage is determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.

    Laser gas replenishment method
    6.
    发明授权
    Laser gas replenishment method 有权
    激光加气方式

    公开(公告)号：US06493370B2

    公开(公告)日：2002-12-10

    申请号：US10121292

    申请日：2002-04-12

    申请人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Thomas Schroeder

    发明人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Thomas Schroeder

    IPC分类号： H01S322

    CPC分类号： G03F7/70025 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225

    摘要： A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber. The driving voltage is determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.

    摘要翻译： 提供了一种用于通过使用气体供应单元和处理器将激光气体混合物的组成气体维持在预定分压来稳定气体放电激光器的输出光束参数的方法和装置。 激光气体混合物的构成气体以初始分压提供，并且组成气体在激光放电室内耗尽。 各成分气体的注入是为了将放电室中的分压增加一个选定的量，优选每次注射小于0.2毫巴。 以选定的间隔执行多次连续喷射，以维持构成气体基本处于初始分压，以维持稳定的输出光束参数。 每次注射量和/或注射间隔可以基于驱动电压的测量值和/或放电室中组成气体的计算量而变化。 驱动电压被确定为基于系统老化而调整的多个驱动电压范围之一。 在每个范围内，气体注入和气体替换优选地基于对放电的总施加的电能和/或在时间和/或脉冲计数上进行。

    Laser gas replenishment method
    7.
    发明授权
    Laser gas replenishment method 有权

    公开(公告)号：US06490308B2

    公开(公告)日：2002-12-03

    申请号：US10114620

    申请日：2002-04-01

    申请人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Thomas Schroeder

    发明人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Thomas Schroeder

    IPC分类号： H01S322

    CPC分类号： G03F7/70025 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225

    摘要： A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber. The driving voltage is determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.

    Laser gas replenishment method
    8.
    发明授权
    Laser gas replenishment method 有权

    公开(公告)号：US06389052B2

    公开(公告)日：2002-05-14

    申请号：US09734459

    申请日：2000-12-11

    申请人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Thomas Schroeder

    发明人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Thomas Schroeder

    IPC分类号： H01S322

    CPC分类号： G03F7/70025 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225

    摘要： A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber. The driving voltage is determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.