利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

22 条记录 (耗时 0.018 秒)

    Master oscillator/power amplifier excimer laser system with pulse energy and pointing control
    3.
    发明授权
    Master oscillator/power amplifier excimer laser system with pulse energy and pointing control 有权
    具有脉冲能量和指向控制的主振荡器/功率放大器准分子激光系统

    公开(公告)号：US07158553B2

    公开(公告)日：2007-01-02

    申请号：US10776404

    申请日：2004-02-11

    申请人： Sergei V. Govorkov ,  Alexander O. Wiessner ,  Rainer Paetzel ,  Igor Bragin

    发明人： Sergei V. Govorkov ,  Alexander O. Wiessner ,  Rainer Paetzel ,  Igor Bragin

    IPC分类号： H01S3/22

    CPC分类号： H01S3/2366 ,  H01S3/10 ,  H01S3/225 ,  H01S3/2333

    摘要： Pulse parameters of a gas discharge laser system can be optimized and controlled for precision applications such as microlithography. Important laser pulse parameters typically vary in the beginning of a pulse burst, and the directionality of the output beam typically varies throughout the burst. In order to improve the performance of the laser system, the variation at the beginning of a pulse burst can be eliminated by extending the pulse pattern and shuttering the output during periods of significant parameter variation. A fast shutter such as an acousto-optical modulator can be used to prevent output during the burst transition processes. Elements such as acousto-optical cells also can be used in combination with a fast position sensor to steer the direction of the output beam, in order to adjust for variations in the direction of the beam between pulses in a burst.

    摘要翻译： 可以优化和控制气体放电激光系统的脉冲参数，用于精密应用，如微光刻。 重要的激光脉冲参数通常在脉冲脉冲串的开始时变化，并且输出光束的方向性通常在整个脉冲串中变化。 为了提高激光系统的性能，可以通过在显着的参数变化期间延长脉冲模式并对输出进行快门来消除脉冲脉冲串开始时的变化。 诸如声光调制器之类的快门可用于在突发转换过程期间防止输出。 诸如声光单元的元件也可以与快速位置传感器组合使用以控制输出光束的方向，以便调整在脉冲串中的脉冲之间的波束方向上的变化。

    System and method for segmented electrode with temporal voltage shifting
    4.
    发明申请
    System and method for segmented electrode with temporal voltage shifting 审中-公开
    具有时间电压偏移的分段电极的系统和方法

    公开(公告)号：US20050058172A1

    公开(公告)日：2005-03-17

    申请号：US10936084

    申请日：2004-09-08

    申请人： Rainer Paetzel ,  Igor Bragin ,  Andreas Targsdorf ,  Vadim Berger ,  Rustem Osmanow

    发明人： Rainer Paetzel ,  Igor Bragin ,  Andreas Targsdorf ,  Vadim Berger ,  Rustem Osmanow

    IPC分类号： H01S3/00 ,  H01S3/038 ,  H01S3/0971 ,  H01S3/22

    CPC分类号： H01S3/0971 ,  H01S3/038 ,  H01S3/09713

    摘要： The stability of a gas discharge in an excimer or molecular fluorine laser system can be improved by generating multiple discharge pulses in the resonator chamber, instead of a single discharge pulse. Each of these discharges can be optimized in both energy transfer and efficient coupling to the gas. The timing of each discharge can be controlled using, for example, a common pulser component along with appropriate circuitry to provide energy pulses to each of a plurality of segmented main discharge electrodes. Applying the energy to the segmented electrodes rather than to a standard discharge electrode pair allows for an optimization of the temporal shape of the resulting superimposed laser pulse. The optimized shape and higher stability can allow the laser system to operate at higher repetition rates, while minimizing the damage to system and/or downstream optics.

    摘要翻译： 可以通过在谐振器腔中产生多个放电脉冲而不是单个放电脉冲来改善准分子或分子氟激光系统中气体放电的稳定性。 这些放电中的每一个可以在能量传递和与气体的有效耦合的两者中进行优化。 可以使用例如公共脉冲发生器部件以及适当的电路来控制每个放电的定时，以向多个分段的主放电电极中的每一个提供能量脉冲。 将能量施加到分段电极而不是标准放电电极对允许优化所得叠加的激光脉冲的时间形状。 优化的形状和更高的稳定性可以允许激光系统以更高的重复率操作，同时最小化对系统和/或下游光学器件的损害。

    Excimer or molecular fluorine laser system with precision timing
    6.
    发明授权
    Excimer or molecular fluorine laser system with precision timing 有权
    准分子或分子氟激光系统具有精确时序

    公开(公告)号：US07308013B2

    公开(公告)日：2007-12-11

    申请号：US10699763

    申请日：2003-11-03

    申请人： Dirk Basting ,  Sergei Govorkov ,  Rainer Paetzel ,  Igor Bragin ,  Andreas Targsdorf

    发明人： Dirk Basting ,  Sergei Govorkov ,  Rainer Paetzel ,  Igor Bragin ,  Andreas Targsdorf

    IPC分类号： H01S3/22

    CPC分类号： H01S3/225 ,  H01S3/073 ,  H01S3/09702 ,  H01S3/09713 ,  H01S3/2258

    摘要： A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.

    摘要翻译： 主振荡器（MO） - 功率放大器（PA）配置（MOPA）可以有利地用于微光刻应用的准分子激光系统，其中半导体制造商需要40W或更高的功率，以支持先进的吞吐量要求 光刻扫描仪系统。 可以使用公共脉冲发生器来精确地控制MO和PA的放电室中的放电定时以驱动各个室。 放电的时间进一步可以通过室内预电离的定时或通过控制脉冲发生器的最终压缩级中的复位电流来控制。 公共脉冲发生器或单独的脉冲发生器电路也可以使用反馈回路在时间上有效地控制，通过在每个单独的放电室中控制预电离来实现精确定时。 另一个系统提供对腔室中的放电脉冲的时间延迟抖动的实时补偿。

    Master oscillator—power amplifier excimer laser system
    7.
    发明授权
    Master oscillator—power amplifier excimer laser system 有权
    主振荡器 - 功率放大器准分子激光系统

    公开(公告)号：US07227881B2

    公开(公告)日：2007-06-05

    申请号：US11371411

    申请日：2006-03-09

    申请人： Sergei V. Govorkov ,  Rainer Paetzel

    发明人： Sergei V. Govorkov ,  Rainer Paetzel

    IPC分类号： H01S3/22

    CPC分类号： H01S3/2366 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/225 ,  H01S3/2325 ,  H01S3/2333 ,  H01S3/235

    摘要： A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. A MOPA-based laser system can provide both high pulse energies and high spectral purity. A MOPA system can utilize a multi-pass PA, as well as a special beam path capable of reducing the amount of ASE (Amplified Spontaneous Emission) and feedback to the MO. Lithography scanner optics are primarily fused silica, such that the peak pulse power must be kept low to avoid material compaction when a MOPA system is used with lithography applications. This conflict between the demand for high average power and the low peak power requirement of the pulsed excimer laser source can be resolved by using a novel beam path to generate a sufficiently long pulse length.

    摘要翻译： 主振荡器（MO） - 功率放大器（PA）配置（MOPA）可以有利地用于微光刻应用的准分子激光系统，其中半导体制造商需要40W或更高的功率，以支持先进的吞吐量要求 光刻扫描仪系统。 基于MOPA的激光系统可以提供高脉冲能量和高光谱纯度。 MOPA系统可以利用多通道PA，以及能够减少ASE（放大自发发射）量和向MO的反馈的特殊光束路径。 平版印刷扫描仪光学器件主要是熔融石英，使得峰值脉冲功率必须保持较低，以避免当MOPA系统与光刻应用一起使用时的材料压实。 可以通过使用新颖的光束路径来产生足够长的脉冲长度来解决脉冲准分子激光源的高平均功率需求和低峰值功率需求之间的这种冲突。

    Temperature control systems for excimer lasers
    9.
    发明授权
    Temperature control systems for excimer lasers 有权
    准分子激光器的温度控制系统

    公开(公告)号：US07164703B2

    公开(公告)日：2007-01-16

    申请号：US10777434

    申请日：2004-02-12

    申请人： Rainer Paetzel

    发明人： Rainer Paetzel

    IPC分类号： H01S3/04 ,  H01S3/22

    CPC分类号： H01S3/041 ,  H01S3/104 ,  H01S3/225

    摘要： Improved temperature stabilization can be obtained for pulsed gas discharge laser systems, such as excimer laser systems, using information about the energy dissipation of the system. Temperature sensors have a limited response time, which can lead to undesirable instability in gas temperature. By determining the heat energy provided to the discharge chamber over sufficiently small periods of time, a system controller can account for rapid variations in the temperature of the laser gas. The temperature regulation controller can adjust a flow of cooling liquid into the discharge chamber to account for these rapid variations on a scale that is much shorter than the response time of the temperature sensors. For variations over longer periods of time, the temperature regulation controller can utilize an active heater in contact with the laser tube to heat the laser tube body, thereby uniformly heating the gas in the tube.

    摘要翻译： 使用关于系统的能量耗散的信息，可以获得脉冲气体放电激光系统（例如准分子激光系统）的改进的温度稳定性。 温度传感器具有有限的响应时间，这可能导致气体温度的不期望的不稳定性。 通过在足够小的时间周期内确定提供给放电室的热能，系统控制器可以解释激光气体的温度的快速变化。 温度调节控制器可以调节冷却液流入放电室的流量，以便在比温度传感器的响应时间短得多的尺度上进行这些快速变化。 对于较长时间的变化，温度调节控制器可以利用与激光管接触的有源加热器来加热激光管体，从而均匀地加热管中的气体。