摘要:
A projection type display system able to suppress an increase of a outer size of a set, able to improve the contrast, and excellent in silence, having light modulating units 122 (R, G, B) for modulating incident illumination lights based on input image information and emitting the result, an illumination optical system 109 for making illumination lights from a light source 101 strike light modulating units, and a projection optical system 125 for projecting the illumination lights emitted from the light modulating units, wherein a variable opening aperture system 200 is arranged in the vicinity of a pupil position of the projection optical system 125, and the aperture system 200 is arranged so as to match contrast characteristics of the light modulating units and an aperture shape at the time of opening/closing the aperture.
摘要:
The invention includes: powder preparation step of obtaining magnetic core powders by mixing, of magnetic powders with thermosetting resin powders in hot state; powder filling step of filling the obtained magnetic core powders into a die; a compaction step of compacting magnetic core powders; and compact heating step of heating, compacts to the elevated temperature state at which the thermosetting resin hardens after compaction.
摘要:
The lattice mismatching between a Ge layer and a Si layer is as large as about 4%. Thus, when the Ge layer is grown on the Si layer, penetration dislocation is introduced to cause leakage current at the p-i-n junction. Thereby, the photo-detection sensitivity is reduced, and the reliability of the element is also lowered. Further, in the connection with a Si waveguide, there are also problems of the reflection loss due to the difference in refractive index between Si and Ge, and of the absorption loss caused by a metal electrode. In order to solve said problems, according to the present invention, there is provided a vertical type pin-SiGe photodiode having a structure which is embedded in a groove formed in a part of a Si layer, in which a p-type or n-type doped layer is formed in a lower section of the groove, and in which a i-SiGe layer having a rectangular shape or a reverse tapered shape is formed on a layered structure formed by laminating a i-Si layer and a SiGe buffer layer on the lower section and the side wall of the groove. Further, in an optical connection section with a Si waveguide, impedance matching is effected by the layered structure composed of the i-Si layer and the SiGe buffer layer, and an upper metal layer is separated therefrom so that a poly-Si bridge structure is employed to electrically connect the upper metal layer therewith.
摘要:
An electric rice cooker capable of increasing the water content of rice by a simple structure. The electric rice cooker (1) has a pot (10) in which food substances to be cooked including water and rice are contained, heating device (5, 6, 19) for heating the food substances to be cooked in the pot, a lid (11) for closing the opening of the pot, and a controller (9) for performing rice cooking steps including a water absorption step for allowing the rice to absorb the water by controlling the heating devices. The controller (9) raises the internal pressure of the pot (10) to 1.05-1.18 atm in the water absorbing step to allow the rice to absorb the water.
摘要:
In a waveguide path coupling-type photodiode, a semiconductor light absorbing layer and an optical waveguide path core are adjacently arranged. An electrode formed of at least one layer is installed in a boundary part of the semiconductor light absorbing layer and the optical waveguide path core. The electrodes are arranged at an interval of (1/100)λ to λ [λ: wavelength of light transmitted through optical waveguide path core]. At least a part of the electrodes is embedded in the semiconductor light absorbing layer. Embedding depth from a surface of the semiconductor light absorbing layer is a value not more than λ/(2ns) [ns: refractive index of semiconductor light absorbing layer]. At least one layer of the electrode is constituted of a material which can surface plasmon-induced.
摘要:
The present invention discloses a composite soft magnetic powder core and a preparation method therefor, which belong to the technical fields of soft magnetic materials and preparation thereof. An Fe/Fe3O4 shell layer is generated in situ on surfaces of iron powder particles through a controlled oxidation process, to prepare Fe/Fe3O4 composite soft magnetic powder having a uniform structure. The Fe/Fe3O4 composite soft magnetic powder is mixed with suitable amount of silicone resin, and prepared into a high-performance Fe/Fe3O4 composite soft magnetic powder core by using a powder metallurgy compaction process. Such magnetic powder core has a high density, a high magnetic conductivity, a high magnetic flux density, a low loss, and a high breaking strength, and is useful in a large-power and low-loss application scenario. The present invention has the advantages of being rich in raw material resources, simple in process and environmentally friendly, and being suitable for industrial production.
摘要翻译:本发明公开了一种复合软磁粉芯及其制备方法,属于软磁材料及其制备技术领域。 通过控制氧化工艺在铁粉颗粒的表面上原位产生Fe / Fe 3 O 4壳层,制备具有均匀结构的Fe / Fe 3 O 4复合软磁粉末。 将Fe / Fe 3 O 4复合软磁粉与适量的硅树脂混合,通过粉末冶金压实法制备成高性能Fe / Fe3O4复合软磁粉末芯。 这种磁粉芯具有高密度,高导磁率,高磁通密度,低损耗和高断裂强度,并且在大功率和低损耗应用场景中是有用的。 本发明具有原料资源丰富,工艺简单,环保,适用于工业生产的优点。
摘要:
Provided is a high-speed and highly efficient semiconductor light-receiving element with small dependence on an incident light polarization direction. A semiconductor light-receiving element according to one aspect of the present invention includes a semiconductor layer including a light-absorbing layer 4, an MSM electrode 1 that is provided over the semiconductor layer, forms a Schottky junction with the semiconductor layer, and includes a slit-like opening, an anti-reflective film 2 formed over the semiconductor layer and the MSM electrode 1, and a Bragg reflection multilayer film 6 provided to a lower part of the semiconductor layer. The MSM electrode 1 includes a period capable of exciting surface plasmon to incident light of TM polarization, and obtains sufficient transmittance to the incident light of TE polarization.
摘要:
A photodiode includes: an upper spacer layer including a semiconductor transparent to incident light; a metal periodic structure provided on the upper spacer layer and arranged to induce surface plasmon, the metal periodic structure including first and second electrodes including portions arranged alternately on the upper spacer layer; a light absorption layer formed under the upper spacer layer and including a semiconductor having a refractive index higher than that of the upper spacer layer; and a lower spacer layer formed under the light absorption layer and having a refractive index smaller than that of the light absorption layer. Each of the first and second electrodes forms a Schottky barrier junction with the upper spacer layer.
摘要:
This image sensor includes a flexible wiring board connected with an optical sensor, bent around the portion connected with the optical sensor and so formed as to generate urging force oppositely to the bent direction and a support portion having a first support surface supporting the optical sensor. The optical sensor is urged toward the first support surface of the support portion to be fixed thereto due to the urging force of the flexible wiring board arranged in the bent manner.
摘要:
A semiconductor light receiving element comprises: a substrate, a semiconductor layer of a first conductivity type formed on the substrate, a non-doped semiconductor light absorbing layer formed on the semiconductor layer of the first conductivity type, a semiconductor layer of a second conductivity type formed on the non-doped semiconductor light absorbing layer, and an electro-conductive layer formed on the semiconductor layer of the second conductivity type. A plurality of openings, periodically arrayed, are formed in a laminated body composed of the electro-conductive layer, the semiconductor layer of the second conductivity type, and the non-doped semiconductor light absorbing layer. The widths of the openings are less than or equal to the wavelength of incident light, and the openings pass through the electro-conductive layer and the semiconductor layer of the second conductivity type to reach the non-doped semiconductor light absorbing layer.