公开(公告)号：US20090111358A1

公开(公告)日：2009-04-30

申请号：US12289507

申请日：2008-10-29

申请人： Hidetaka Nakao ,  Eisaku Hayashi ,  Kunio Oishi ,  Isao Hayakawa ,  Yoshiaki Miyake ,  Yoshikuni Tateyama ,  Takeshi Ashihara

发明人： Hidetaka Nakao ,  Eisaku Hayashi ,  Kunio Oishi ,  Isao Hayakawa ,  Yoshiaki Miyake ,  Yoshikuni Tateyama ,  Takeshi Ashihara

IPC分类号： B24B49/00 ,  B24B49/16 ,  B24B7/20

CPC分类号： B24B37/013 ,  B24B49/16

摘要： The present invention provides a apparatus for polishing an object material such as a film on a substrate. This apparatus includes a polishing table for holding a polishing pad having a polishing surface, a motor configured to drive the polishing table, a holding mechanism configured to hold a substrate having an object material to be polished and to press the substrate against the polishing surface, a dresser configured to dress the polishing surface, and a monitoring unit configured to monitor a removal amount of the object material. The monitoring unit is operable to calculate the removal amount of the object material using a model equation containing a variable representing an integrated value of a torque current of the motor when polishing the object material and a variable representing a cumulative operating time of the dresser.

摘要翻译： 本发明提供一种用于在基板上研磨诸如膜的物体材料的装置。 该设备包括：用于保持具有抛光表面的抛光垫的抛光台，构造成驱动抛光台的电机;保持机构，其构造成保持具有待抛光物体的基板，并将基板压靠在抛光表面上; 修整器，其被配置为修整抛光表面;以及监视单元，被配置为监视对象材料的移除量。 监视单元可操作以使用包含表示电机的转矩电流的积分值的变量的模型方程来计算物体材料的去除量，以及表示修整器的累积操作时间的变量。

公开(公告)号：US08078306B2

公开(公告)日：2011-12-13

申请号：US12289507

申请日：2008-10-29

申请人： Hidetaka Nakao ,  Eisaku Hayashi ,  Kunio Oishi ,  Isao Hayakawa ,  Yoshiaki Miyake ,  Yoshikuni Tateyama ,  Takeshi Ashihara

发明人： Hidetaka Nakao ,  Eisaku Hayashi ,  Kunio Oishi ,  Isao Hayakawa ,  Yoshiaki Miyake ,  Yoshikuni Tateyama ,  Takeshi Ashihara

IPC分类号： G06F19/00

CPC分类号： B24B37/013 ,  B24B49/16

摘要： An apparatus polishes an object material such as a film on a substrate. This apparatus includes a polishing table for holding a polishing pad having a polishing surface, a motor configured to drive the polishing table, a holding mechanism configured to hold a substrate having an object material to be polished and to press the substrate against the polishing surface, a dresser configured to dress the polishing surface, and a monitoring unit configured to monitor a removal amount of the object material. The monitoring unit is operable to calculate the removal amount of the object material using a model equation containing a variable representing an integrated value of a torque current of the motor when polishing the object material and a variable representing a cumulative operating time of the dresser.

摘要翻译： 一种装置在基板上抛光诸如膜之类的物体材料。 该设备包括：用于保持具有抛光表面的抛光垫的抛光台，构造成驱动抛光台的电机;保持机构，其构造成保持具有待抛光物体的基板，并将基板压靠在抛光表面上; 修整器，其被配置为修整抛光表面;以及监视单元，被配置为监视对象材料的移除量。 监视单元可操作以使用包含表示电机的转矩电流的积分值的变量的模型方程来计算物体材料的去除量，以及表示修整器的累积操作时间的变量。

公开(公告)号：US06345083B1

公开(公告)日：2002-02-05

申请号：US09373213

申请日：1999-08-12

申请人： Kunio Enomoto ,  Katsuhiko Hirano ,  Eisaku Hayashi ,  Ren Morinaka ,  Sadato Shimizu ,  Satoshi Kanno ,  Shigeru Tanaka ,  Tetsuya Ishikawa

发明人： Kunio Enomoto ,  Katsuhiko Hirano ,  Eisaku Hayashi ,  Ren Morinaka ,  Sadato Shimizu ,  Satoshi Kanno ,  Shigeru Tanaka ,  Tetsuya Ishikawa

IPC分类号： G21C1900

CPC分类号： C21D7/06 ,  G21C19/00 ,  G21C19/207 ,  G21Y2002/103 ,  G21Y2002/104 ,  G21Y2002/201 ,  G21Y2002/304 ,  G21Y2002/401 ,  G21Y2004/20 ,  G21Y2004/30 ,  G21Y2004/40 ,  G21Y2004/501 ,  G21Y2004/504

摘要： A preventive maintenance method and apparatus for a structural member in a reactor pressure vessel according to the present invention reduce a tensile residual stress on a surface of the structural member by impinging a water jet from a nozzle onto a plane surface of a deflector to thereby change direction of flow of the water jet, and impinging the water jet after being deflected onto the surface of the structural member. This method and apparatus are applicable to a narrow space portion, and can improve a residual stress on the surface of the structural member and can also prevent damage such as stress corrosion cracking.

公开(公告)号：US06240155B1

公开(公告)日：2001-05-29

申请号：US09366720

申请日：1999-08-04

申请人： Koichi Kurosawa ,  Eisaku Hayashi ,  Sadato Shimizu ,  Minoru Ootaka ,  Fujio Yoshikubo ,  Ren Morinaka ,  Masayuki Nishino ,  Noboru Chiba ,  Kunio Enomoto ,  Kazunori Sato

发明人： Koichi Kurosawa ,  Eisaku Hayashi ,  Sadato Shimizu ,  Minoru Ootaka ,  Fujio Yoshikubo ,  Ren Morinaka ,  Masayuki Nishino ,  Noboru Chiba ,  Kunio Enomoto ,  Kazunori Sato

IPC分类号： G21C1700

CPC分类号： G21C19/00 ,  G21C19/207 ,  G21Y2002/203 ,  G21Y2002/40 ,  G21Y2004/501 ,  G21Y2004/504

摘要： A method of performing maintenance on a structural member inside a reactor pressure vessel includes lowering an annular guide rail having a second lug until the guide rail rests on an upper flange of a core shroud provided inside the reactor pressure vessel, detachably mounting the second lug of the guide rail to a first lug mounted on the core shroud, positioning a discharging nozzle at a position at which compressive remaining stress is added to a surface of the core shroud by moving the discharging nozzle in a radial direction and an axial direction of the core shroud by a discharging nozzle moving apparatus mounted on a turnable revolving on the guide rail and discharging water to add compressive remaining stress to a surface of the core shroud from the discharging nozzle.

摘要翻译： 对反应堆压力容器内部的结构构件进行维护的方法包括降低具有第二凸耳的环形导轨，直到导轨靠在设置在反应堆压力容器内部的芯护罩的上凸缘上，可拆卸地安装第二凸耳 所述导轨连接到安装在所述芯护罩上的第一凸耳，通过沿所述芯的径向和轴向方向移动所述排出喷嘴，将排出喷嘴定位在所述芯护罩的表面处的压缩剩余应力的位置处 通过安装在导轨上可转动的排放喷嘴移动装置进行护罩，并排出水以从排出喷嘴向芯护罩的表面增加压缩剩余应力。

公开(公告)号：US06341151B1

公开(公告)日：2002-01-22

申请号：US09649988

申请日：2000-08-29

申请人： Kunio Enomoto ,  Katsuhiko Hirano ,  Eisaku Hayashi ,  Ren Morinaka ,  Sadato Shimizu ,  Satoshi Kanno ,  Shigeru Tanaka ,  Tetsuya Ishikawa

发明人： Kunio Enomoto ,  Katsuhiko Hirano ,  Eisaku Hayashi ,  Ren Morinaka ,  Sadato Shimizu ,  Satoshi Kanno ,  Shigeru Tanaka ,  Tetsuya Ishikawa

IPC分类号： G21C1700

CPC分类号： C21D7/06 ,  G21C19/00 ,  G21C19/207 ,  G21Y2002/103 ,  G21Y2002/104 ,  G21Y2002/201 ,  G21Y2002/304 ,  G21Y2002/401 ,  G21Y2004/20 ,  G21Y2004/30 ,  G21Y2004/40 ,  G21Y2004/501 ,  G21Y2004/504

摘要： A preventive maintenance method and apparatus for a structural member in a reactor pressure vessel according to the present invention reduce a tensile residual stress on a surface of the structural member by impinging a water jet from a nozzle onto a plane surface of a deflector to thereby change direction of flow of the water jet, and impinging the water jet after being deflected onto the surface of the structural member. This method and apparatus are applicable to a narrow space portion, and can improve a residual stress on the surface of the structural member and can also prevent damage such as stress corrosion cracking.

摘要翻译： 根据本发明的用于反应堆压力容器中的结构构件的预防性维护方法和装置通过将来自喷嘴的水射流冲击到偏转器的平面上来降低结构构件的表面上的拉伸残余应力，从而改变 水射流的流动方向，以及在偏转到结构构件表面之后撞击水射流。 该方法和装置可应用于狭窄的空间部分，并且可以改善结构构件表面上的残余应力，并且还可以防止诸如应力腐蚀开裂的损伤。

公开(公告)号：US5516247A

公开(公告)日：1996-05-14

申请号：US292282

申请日：1994-08-18

申请人： Yuji Hosoda ,  Eisaku Hayashi ,  Masanori Suzuki

发明人： Yuji Hosoda ,  Eisaku Hayashi ,  Masanori Suzuki

IPC分类号： F16B39/10 ,  G21D1/02 ,  F16B39/00 ,  F16B39/28

CPC分类号： G21D1/02 ,  G21Y2002/206 ,  G21Y2004/301 ,  G21Y2004/303 ,  Y02E30/40

摘要： The invention is a fastening device for fastening a plurality of structures using a bolt and a nut. At least two bolts are provided each having a screw portion at one end. At least one nut is provided for each of the bolts. The nut has a flange having a diameter greater than a distance between axes of the bolts with relative rotation of the nuts being restricted by fixing mutually overlapping portions of the flanges of the nuts threaded on the bolts to each other.

摘要翻译： 本发明是用于使用螺栓和螺母紧固多个结构的紧固装置。 至少提供两个螺栓，每个螺栓在一端具有螺钉部分。 为每个螺栓提供至少一个螺母。 螺母具有直径大于螺栓轴线之间的距离的凸缘，螺母的相对旋转通过将螺栓螺纹连接的螺母的凸缘的相互重叠的部分彼此固定而受到限制。

公开(公告)号：US4182878A

公开(公告)日：1980-01-08

申请号：US893527

申请日：1978-04-04

申请人： Eisaku Hayashi ,  Takeo Higashino ,  Shin-ichi Suzuki

发明人： Eisaku Hayashi ,  Takeo Higashino ,  Shin-ichi Suzuki

IPC分类号： A61K31/505 ,  A61P35/00 ,  C07D487/04 ,  A61K31/415

CPC分类号： C07D487/04

摘要： Novel derivatives of 1-phenyl-1H-pyrazolo[3,4-d]pyrimidine substituted at the 4-position of the pyrimidine ring are provided. A typical example is 1-phenyl-1H-pyrazolo[3,4-d]pyrimidine-4-carbonitrile. The compounds exhibit excellent anti-carcinogenic activities as evidenced by the animal test with mice.

摘要翻译： 提供了在嘧啶环的4-位取代的1-苯基-1H-吡唑并[3,4-d]嘧啶的新衍生物。 典型的实例是1-苯基-1H-吡唑并[3,4-d]嘧啶-4-甲腈。 该化合物表现出优异的抗致癌活性，如通过小鼠的动物试验证实的。

公开(公告)号：US07960188B2

公开(公告)日：2011-06-14

申请号：US12465024

申请日：2009-05-13

申请人： Shinrou Ohta ,  Mitsuo Tada ,  Noburu Shimizu ,  Yoichi Kobayashi ,  Taro Takahashi ,  Eisaku Hayashi ,  Hiromitsu Watanabe ,  Tatsuya Kohama ,  Itsuki Kobata

发明人： Shinrou Ohta ,  Mitsuo Tada ,  Noburu Shimizu ,  Yoichi Kobayashi ,  Taro Takahashi ,  Eisaku Hayashi ,  Hiromitsu Watanabe ,  Tatsuya Kohama ,  Itsuki Kobata

IPC分类号： H01L21/00 ,  H01L21/302 ,  G01R31/26

CPC分类号： H01L22/26 ,  H01L21/3212 ,  H01L21/67219 ,  H01L22/14

摘要： A method for polishing a substrate having a metal film thereon is described. The substrate has metal interconnects formed from part of the metal film. The polishing method includes performing a first polishing process of removing the metal film, after the first polishing process, performing a second polishing process of removing the barrier film, after the second polishing process, performing a third polishing process of polishing the insulating film. During the second polishing process and the third polishing process, a polishing state of the substrate is monitored with an eddy current sensor, and the third polishing process is terminated when an output signal of the eddy current sensor reaches a predetermined threshold.

摘要翻译： 描述了在其上抛光具有金属膜的基板的方法。 基板具有由金属膜的一部分形成的金属互连。 抛光方法包括进行第一抛光处理，在第一抛光处理之后，在第二抛光处理之后进行去除阻挡膜的第二抛光工艺，进行抛光绝缘膜的第三抛光工艺。 在第二抛光工艺和第三抛光工艺期间，用涡流传感器监测衬底的抛光状态，并且当涡流传感器的输出信号达到预定阈值时，第三抛光处理结束。

公开(公告)号：US20090286332A1

公开(公告)日：2009-11-19

申请号：US12465024

申请日：2009-05-13

申请人： Shinrou OHTA ,  Mitsuo Tada ,  Noburu Shimizu ,  Yoichi Kobayashi ,  Taro Takahashi ,  Eisaku Hayashi ,  Hiromitsu Watanabe ,  Tatsuya Kohama ,  Itsuki Kobata

发明人： Shinrou OHTA ,  Mitsuo Tada ,  Noburu Shimizu ,  Yoichi Kobayashi ,  Taro Takahashi ,  Eisaku Hayashi ,  Hiromitsu Watanabe ,  Tatsuya Kohama ,  Itsuki Kobata

IPC分类号： H01L21/66

CPC分类号： H01L22/26 ,  H01L21/3212 ,  H01L21/67219 ,  H01L22/14

摘要： A method for polishing a substrate having a metal film thereon is described. The substrate has metal interconnects formed from part of the metal film. The polishing method includes performing a first polishing process of removing the metal film, after the first polishing process, performing a second polishing process of removing the barrier film, after the second polishing process, performing a third polishing process of polishing the insulating film, during the second polishing process and the third polishing process, monitoring a polishing state of the substrate with an eddy current sensor, and terminating the third polishing process when an output signal of the eddy current sensor reaches a predetermined threshold.

摘要翻译： 描述了在其上抛光具有金属膜的基板的方法。 基板具有由金属膜的一部分形成的金属互连。 抛光方法包括：进行第一抛光处理后的第一抛光处理，在第一抛光处理之后，在第二抛光处理之后执行去除阻挡膜的第二抛光工艺，进行抛光绝缘膜的第三抛光处理 第二抛光工艺和第三抛光工艺，用涡流传感器监测衬底的抛光状态，并且当涡流传感器的输出信号达到预定阈值时终止第三抛光处理。

公开(公告)号：US5977515A

公开(公告)日：1999-11-02

申请号：US539074

申请日：1995-10-04

申请人： Keiichi Uraki ,  Toshitaka Satsuta ,  Akira Onuma ,  Mitsuo Nakamura ,  Tsutomu Onuma ,  Toshimi Matsumoto ,  Yasumasa Tamai ,  Hiroshi Yamauchi ,  Eisaku Hayashi ,  Ren Morinaka

发明人： Keiichi Uraki ,  Toshitaka Satsuta ,  Akira Onuma ,  Mitsuo Nakamura ,  Tsutomu Onuma ,  Toshimi Matsumoto ,  Yasumasa Tamai ,  Hiroshi Yamauchi ,  Eisaku Hayashi ,  Ren Morinaka

IPC分类号： G21C19/02 ,  B23K9/00 ,  B23K26/00 ,  B23K26/02 ,  B23K26/03 ,  B23K26/06 ,  B23K26/067 ,  B23K26/08 ,  B23K26/12 ,  B23K26/14 ,  B23K37/00 ,  C21D1/09 ,  C21D9/00 ,  C22C38/00 ,  C22C38/50 ,  G21F9/30

CPC分类号： B23K26/067 ,  B23K26/122 ,  B23K26/1423 ,  B23K26/1429 ,  B23K26/146 ,  B23K26/1476

摘要： An underwater laser processing system has a laser torch; a laser torch driving mechanism for changing a laser emission position of the laser torch; and a chamber with one end opened to an external environment, which contains the laser torch; wherein a partitioning wall for preventing permeation of water is provided between a free end of the chamber and the laser torch. The system is used for detecting a sensitized portion and repairing it at one time using a sensitization detecting arrangement. Moreover, it is used for forming an alloying layer by melting a sprayed coating film, and for forming a new surface layer by emitting a laser beam through a solution containing a metal component.

摘要翻译： 水下激光加工系统具有激光焊枪; 用于改变激光束的激光发射位置的激光焊枪驱动机构; 以及具有一端开放到包含激光手电筒的外部环境的室; 其特征在于，在所述室的自由端与所述激光焊枪之间设置有用于防止水渗透的分隔壁。 该系统用于检测敏化部分并使用敏化检测装置一次修复。 此外，其用于通过熔化喷涂的涂膜来形成合金层，并且通过通过包含金属成分的溶液发射激光束来形成新的表面层。