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    Positive resist composition, method of forming resist pattern, and polymeric compound
    4.
    发明授权
    Positive resist composition, method of forming resist pattern, and polymeric compound 有权
    正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物

    公开(公告)号：US08088553B2

    公开(公告)日：2012-01-03

    申请号：US12425706

    申请日：2009-04-17

    申请人： Hiroaki Shimizu ,  Tsuyoshi Nakamura ,  Takayoshi Mori ,  Sanae Furuya ,  Daiju Shiono ,  Tomoyuki Hirano ,  Takahiro Dazai

    发明人： Hiroaki Shimizu ,  Tsuyoshi Nakamura ,  Takayoshi Mori ,  Sanae Furuya ,  Daiju Shiono ,  Tomoyuki Hirano ,  Takahiro Dazai

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  C08F220/28

    CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/111

    摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) having a structural unit (a0-1) represented by general formula (a0-1) (wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; R8 represents a divalent linking group; and R7 represents an acid dissociable, dissolution inhibiting group) and a structural unit (a0-2) represented by general formula (a0-2) (wherein R3 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; R4 represents a branched alkyl group of 3 or more carbon atoms; and each of R5 and R6 independently represents an alkyl group, wherein R5 and R6 are mutually bonded to form a ring).

    摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1）具有由通式（a0-1）表示的结构单元（a0-1）（其中R1表示氢原子，低级烷基或卤代低级烷基; R8表示二价连接基团，R7表示 酸解离，溶解抑制基）和由通式（a0-2）表示的结构单元（a0-2）（其中R3表示氢原子，低级烷基或卤代低级烷基; R4表示支链烷基 3个以上的碳原子，R5和R6各自独立地表示烷基，其中R5和R6相互键合形成环）。

    POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND
    6.
    发明申请
    POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND 有权
    正极性组合物，形成耐火模式的方法和聚合物

    公开(公告)号：US20090269694A1

    公开(公告)日：2009-10-29

    申请号：US12425706

    申请日：2009-04-17

    申请人： Hiroaki Shimizu ,  Tsuyoshi Nakamura ,  Takayoshi Mori ,  Sanae Furuya ,  Daiju Shiono ,  Tomoyuki Hirano ,  Takahiro Dazai

    发明人： Hiroaki Shimizu ,  Tsuyoshi Nakamura ,  Takayoshi Mori ,  Sanae Furuya ,  Daiju Shiono ,  Tomoyuki Hirano ,  Takahiro Dazai

    IPC分类号： G03F7/20 ,  G03F7/004 ,  C08F222/10 ,  C08F224/00

    CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/111

    摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) having a structural unit (a0-1) represented by general formula (a0-1) (wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; R8 represents a divalent linking group; and R7 represents an acid dissociable, dissolution inhibiting group) and a structural unit (a0-2) represented by general formula (a0-2) (wherein R3 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; R4 represents a branched alkyl group of 3 or more carbon atoms; and each of R5 and R6 independently represents an alkyl group, wherein R5 and R6 are mutually bonded to form a ring).

    摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1）具有由通式（a0-1）表示的结构单元（a0-1）（其中R1表示氢原子，低级烷基或卤代低级烷基; R8表示二价连接基团，R7表示 酸解离，溶解抑制基）和由通式（a0-2）表示的结构单元（a0-2）（其中R3表示氢原子，低级烷基或卤代低级烷基; R4表示支链烷基 3个以上的碳原子，R5和R6各自独立地表示烷基，其中R5和R6相互键合形成环）。

    Positive resist composition, method of forming resist pattern, and polymeric compound
    8.
    发明授权
    Positive resist composition, method of forming resist pattern, and polymeric compound 有权
    正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物

    公开(公告)号：US08541529B2

    公开(公告)日：2013-09-24

    申请号：US13454399

    申请日：2012-04-24

    申请人： Takahiro Dazai ,  Tomoyuki Hirano ,  Daiju Shiono ,  Tasuku Matsumiya

    发明人： Takahiro Dazai ,  Tomoyuki Hirano ,  Daiju Shiono ,  Tasuku Matsumiya

    IPC分类号： C08F20/38 ,  C08F28/06 ,  G03F7/039

    CPC分类号： G03F7/2041 ,  C08F28/06 ,  C08F220/28 ,  C08F228/06 ,  G03F7/0045 ,  G03F7/0397

    摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.

    摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1），其含有由通式（a0-1）表示的结构单元（a0）（R2表示二价连接基团，R3表示在其环骨架中含有-SO2-的环状基团）和结构单元（a1）得自 来自含有酸解离的溶解抑制基团的丙烯酸酯。

    POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND
    9.
    发明申请
    POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND 有权
    正极性组合物，形成耐火模式的方法和聚合物

    公开(公告)号：US20120202151A1

    公开(公告)日：2012-08-09

    申请号：US13454399

    申请日：2012-04-24

    申请人： Takahiro Dazai ,  Tomoyuki Hirano ,  Daiju Shiono ,  Tasuku Matsumiya

    发明人： Takahiro Dazai ,  Tomoyuki Hirano ,  Daiju Shiono ,  Tasuku Matsumiya

    IPC分类号： G03F7/039 ,  C08F28/06

    CPC分类号： G03F7/2041 ,  C08F28/06 ,  C08F220/28 ,  C08F228/06 ,  G03F7/0045 ,  G03F7/0397

    摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.

    摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1），其含有由通式（a0-1）表示的结构单元（a0）（R2表示二价连接基团，R3表示在其环骨架中含有-SO2-的环状基团）和结构单元（a1）得自 来自含有酸解离的溶解抑制基团的丙烯酸酯。

    POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND
    10.
    发明申请
    POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND 有权
    正极性组合物，形成耐火模式的方法和聚合物

    公开(公告)号：US20100233625A1

    公开(公告)日：2010-09-16

    申请号：US12721240

    申请日：2010-03-10

    申请人： Tomoyuki Hirano ,  Tasuku Matsumiya ,  Daiju Shiono ,  Takahiro Dazai

    发明人： Tomoyuki Hirano ,  Tasuku Matsumiya ,  Daiju Shiono ,  Takahiro Dazai

    IPC分类号： G03F7/004 ,  G03F7/20 ,  C08F28/06

    CPC分类号： G03F7/2041 ,  C08F212/08 ,  C08F212/14 ,  C08F212/32 ,  C08F220/24 ,  C08F220/28 ,  C08F220/30 ,  C08F2220/1891 ,  C08F2220/382 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid, and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) having an aromatic group, a structural unit (a5) represented by general formula (a5-1) shown below, and a structural unit (a1) containing an acid-dissociable, dissolution-inhibiting group. In the formula (a5-1), R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof.

    摘要翻译： 一种正极抗蚀剂组合物，其包含在酸性作用下在碱显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸发生剂组分（B），所述碱成分（A）包含聚合物 含有具有芳香族基团的结构单元（a0）的化合物（A1），下述通式（a5-1）所示的结构单元（a5）和含有酸解离性，溶解抑制性的结构单元（a1） 组。 式（a5-1）中，R 1表示氢原子，碳原子数1〜5的烷基或碳原子数1〜5的卤代烷基，R 2表示二价连接基，R 3表示含有 -SO2-在其环骨架内。