Charged beam exposure method and apparatus as well as aperture stop and
production method thereof
    1.
    发明授权
    Charged beam exposure method and apparatus as well as aperture stop and production method thereof 失效
    充电束曝光方法和装置以及孔径光阑及其制造方法

    公开(公告)号:US5334845A

    公开(公告)日:1994-08-02

    申请号:US613746

    申请日:1990-11-26

    IPC分类号: H01J37/317 H01L21/027

    摘要: In an electron beam exposure method for production very high-integration semiconductor devices and its related apparatus in a conventional method, the exposure is divided into fine divisions and carried out by performing a number of shots. However, by utilizing an aperture stop produced by working a single crystalline silicon thin film finely, exposure of a predetermined range is done by one shot. According to the invention, the exposure can be accomplished by the number of shots which is smaller by about two orders than that of the conventional technique and the throughput can be improved remarkably. Since the shot number does not substantially differ depending on whether patterns are complicated or not, individual steps can be processed within substantially identical time.

    摘要翻译: PCT No.PCT / JP90 / 00388 Sec。 371日期1990年11月26日 102(e)1990年11月26日PCT PCT 1990年3月23日PCT公布。 公开号WO90 / 11619 日期为1990年10月4日。在以往的方法中,为了制造非常高集成度的半导体装置及其相关装置的电子束曝光方法,将曝光分割为细分,并进行多次拍摄。 然而,通过利用通过微细加工单晶硅薄膜产生的孔径光阑,通过一次曝光实现预定范围。 根据本发明,曝光可以通过比常规技术小两个点的拍摄次数来实现,并且可以显着地提高吞吐量。 由于根据图案是否复杂,拍摄次数基本上不同,所以可以在大致相同的时间内处理各个步骤。

    Electron beam lithography system and method

    公开(公告)号:US5424173A

    公开(公告)日:1995-06-13

    申请号:US158820

    申请日:1993-11-26

    摘要: A system and method are provided for compensating for proximity effects between selected adjacent portions of pattern elements on an integrated circuit wafer where it is determined by simulation that undesirable resist patterns will result. The subject lithography system includes projecting an electron beam onto the wafer through an aperture plate of pattern elements to obtain the desired beam pattern. An aperture mask includes a plurality of first portions corresponding to first wafer circuit element portions spaced for avoiding proximity effects on the wafer and a plurality of second portions corresponding to second element portions spaced for obtaining proximity effects between elements on the wafer. The plurality of second portions are sized to have an increased adjacent spacing relative to a resultant adjacent spacing of the corresponding second element portions whereby the resultant adjacent spacing of the second element portions on the wafer is selectively reduced by the proximity effects. Alternatively, or in addition, a wire mesh is provided at the second portions of the aperture plate to reduce the beam intensity for corresponding reduction of the proximity effects.

    Electron beam lithography system and method
    3.
    发明授权
    Electron beam lithography system and method 失效
    电子束光刻系统及方法

    公开(公告)号:US5097138A

    公开(公告)日:1992-03-17

    申请号:US563441

    申请日:1990-08-07

    IPC分类号: H01L21/027 H01J37/317

    摘要: A system and method are provided for compensating for proximity effects between selected adjacent portions of pattern elements on an integrated circuit wafer where it is determined by simulation that undesirable resist patterns will result. The subject lithography system includes projecting an electron beam onto the wafer through an aperture plate of pattern elements to obtain the desired beam pattern. An aperture mask includes a plurality of first portions corresponding to first wafer circuit element portions spaced for avoiding proximity effects on the wafer and a plurality of second portions corresponding to second element portions spaced for obtaining proximity effects between elements on the wafer. The plurality of second portions are sized to have an increased adjacent spacing relative to a resultant adjacent spacing of the corresponding second element portions whereby the resultant adjacent spacing of the second element portions on the wafer is selectively reduced by the proximity effects. Alternatively, or in addition, a wire mesh is provided at the second portions of the aperture plate to reduce the beam intensity for corresponding reduction of the proximity effects.

    摘要翻译: 提供了一种用于补偿集成电路晶片上的图案元件的选定相邻部分之间的接近效应的系统和方法,其中通过模拟确定将导致不期望的抗蚀剂图案。 目标光刻系统包括通过图案元件的孔板将电子束投影到晶片上,以获得期望的光束图案。 孔径掩模包括对应于间隔开的第一晶片电路元件部分的多个第一部分,以避免对晶片的接近效应,以及对应于间隔开的第二元件部分的多个第二部分,以获得晶片上元件之间的接近效应。 多个第二部分的大小相对于相应的第二元件部分的相邻相邻间隔具有增加的相邻间隔,由此通过邻近效应选择性地减小晶片上的第二元件部分的相邻间隔。 或者,或另外,在孔板的第二部分处设置金属丝网以减小光束强度,以便相应地减小邻近效应。

    Insulating resin sheet laminate and multi-layer printed circuit board including insulating resin sheet laminate
    4.
    发明授权
    Insulating resin sheet laminate and multi-layer printed circuit board including insulating resin sheet laminate 失效
    绝缘树脂板层压板和包括绝缘树脂板层压板的多层印刷电路板

    公开(公告)号:US08357859B2

    公开(公告)日:2013-01-22

    申请号:US12523127

    申请日:2008-01-16

    IPC分类号: H05K1/00

    摘要: Disclosed is an insulating resin sheet laminate (an insulating resin sheet with a film or a metal foil) including an insulating resin layer with a uniform thickness that is formed without repulsion or unevenness in a process of forming the insulating resin layer on a film or a metal foil, and a multi-layer printed circuit board that includes the insulating resin sheet laminate and possesses high insulating reliability. The present invention provides an insulating resin sheet laminate (an insulating resin sheet with a film or a metal foil) obtained by forming an insulating resin layer made of a resin composition on a film or a metal foil, and the resin composition includes an acrylic surfactant.

    摘要翻译: 公开了一种绝缘树脂片层叠体(具有膜或金属箔的绝缘树脂片),其包括在膜上形成绝缘树脂层的过程中不产生排斥或不均匀的具有均匀厚度的绝缘树脂层 金属箔和包含绝缘树脂片层叠体并具有高绝缘可靠性的多层印刷电路板。 本发明提供一种通过在膜或金属箔上形成由树脂组合物制成的绝缘树脂层而获得的绝缘树脂片层叠体(具有膜或金属箔的绝缘树脂片),并且该树脂组合物包括丙烯酸类表面活性剂 。

    Substituted benzylaminopiperidine compounds
    5.
    发明授权
    Substituted benzylaminopiperidine compounds 失效
    取代的苄基氨基哌啶化合物

    公开(公告)号:US06506775B1

    公开(公告)日:2003-01-14

    申请号:US09564398

    申请日:2000-05-01

    IPC分类号: C07D21156

    CPC分类号: C07D211/56

    摘要: The invention provides a compound of formula (I): and its pharmaceutically acceptable salts, wherein R is halo C2-C8 alkenyl or halo C2-C8 alkynyl; R1 is hydrogen, halo or C1-C6 alkoxy; or R and R1, together with the two carbon atoms to which they are attached, form a C4-C6 cycloalkyl or a C4-C6 oxacycloalkyl ring wherein said ring may be optionally substituted by one or more substituents selected from the group consisting of halo, C1-C6 alkyl and halo C1-C6 alkyl; X is C1-C6 alkoxy, halo C1-C6 alkoxy, phenoxy or halo; and Ar is phenyl optionally substituted by halo. These compounds are useful in the treatment of a gastrointestinal disorder; a central nervous system (CNS) disorder; an inflammatory disease; emesis; urinary incontinence; pain; migraine; sunburn; diseases, disorders and adverse conditions caused by Heliobacter pylori; or angiogenesis especially CNS disorders in a mammalian subject, especially humans.

    摘要翻译: 本发明提供式(I)化合物及其药学上可接受的盐,其中R为卤代C 2 -C 8烯基或卤代C 2 -C 8炔基; R 1为氢,卤素或C 1 -C 6烷氧基;或R和R 1与 它们连接的两个碳原子形成C 4 -C 6环烷基或C 4 -C 6氧杂环烷基环,其中所述环可任选地被一个或多个选自卤素,C 1 -C 6烷基和卤代C 1 -C 6烷基的取代基取代, C6烷基; X是C1-C6烷氧基,卤代C1-C6烷氧基,苯氧基或卤代; 并且Ar是任选被卤素取代的苯基。这些化合物可用于治疗胃肠道疾病; 中枢神经系统(CNS)障碍; 炎性疾病; 呕吐 尿失禁 疼痛; 偏头痛 晒斑; 由幽门螺杆菌引起的疾病,病症和不良状况; 或血管发生,尤其是哺乳动物受试者尤其是人类的CNS疾病。

    Tissue insertion type ultrasonic probe
    6.
    发明授权
    Tissue insertion type ultrasonic probe 有权
    组织插入式超声波探头

    公开(公告)号:US08679023B2

    公开(公告)日:2014-03-25

    申请号:US13273868

    申请日:2011-10-14

    IPC分类号: A61B8/14

    摘要: There is provided an ultrasonic probe for supporting spine surgery which can execute both inspection by tactile sense and inspection by ultrasound diagnosis. A front-end component provided at a front end of an insertion unit. The front-end component comprises a metal component and a resin component, and the metal component comprises a tactile member and an anchor. The resin component comprises a cap portion and a surrounding portion. An insertion portion in the front-end component is inserted into a front end portion of a pipe. The anchor and the front end portion are in close proximity with a certain distance therebetween, such that insulation is secured and vibration transmitted from a head can be transmitted from the anchor to the pipe in a superior manner.

    摘要翻译: 提供了一种用于支撑脊柱手术的超声波探头,可以通过超声诊断的触觉和检查进行检查。 前端部件设置在插入单元的前端。 前端部件包括金属部件和树脂部件,并且金属部件包括触觉部件和锚固件。 树脂部件包括盖部和周围部。 前端部件的插入部插入管的前端部。 锚固件和前端部分之间的距离非常接近,使得绝缘被确保,并且从头部传递的振动能够以优异的方式从锚传送到管道。

    Ultrasound systems and methods for orthopedic applications
    7.
    发明授权
    Ultrasound systems and methods for orthopedic applications 有权
    用于整形外科应用的超声系统和方法

    公开(公告)号:US08206306B2

    公开(公告)日:2012-06-26

    申请号:US12917721

    申请日:2010-11-02

    IPC分类号: A61B8/14

    摘要: Medical diagnostic instruments/systems are provided that include (i) a proximal handle configured and dimensioned to permit an operator to manually grasp the instrument; (ii) an ultrasound probe including a longitudinal shaft extending distally from the handle and terminating in a distal end, and an ultrasound transducer mounted with respect to the longitudinal shaft, the ultrasound transducer including an array of ultrasonic energy generation elements (iii) a tactile feeler probe mounted with respect to the ultrasound probe; and (iv) at least one hollow receiver member mounted with respect to the longitudinal shaft of the ultrasound probe, the at least one hollow receiver member configured to receive a K-wire to permit the instrument to be slidably mounted thereto for purposes of guiding the ultrasound and tactile feeler probes axially relative to a desired anatomical location. Advantageous methods for use of the disclosed instruments/systems are also provided.

    摘要翻译: 提供医疗诊断仪器/系统,其包括(i)近侧手柄,其构造和尺寸被设计成允许操作者手动地抓住仪器; (ii)超声波探头,其包括从所述手柄向远端延伸并终止于远端的纵向轴和相对于所述纵向轴安装的超声换能器,所述超声换能器包括超声能量产生元件阵列(iii)触觉 相对于超声波探头安装的探针探针; 和(iv)至少一个相对于所述超声波探头的纵向轴安装的中空接收器构件,所述至少一个中空接收器构件被配置为接收K线以允许所述器械可滑动地安装在其上用于引导 超声和触觉探针相对于期望的解剖位置轴向。 还提供了用于所公开的仪器/系统的有利方法。

    CALIPER BRAKE DEVICE FOR VEHICLE
    8.
    发明申请
    CALIPER BRAKE DEVICE FOR VEHICLE 有权
    卡车刹车装置

    公开(公告)号:US20100044167A1

    公开(公告)日:2010-02-25

    申请号:US12450289

    申请日:2008-10-10

    IPC分类号: F16D55/22

    摘要: A brake caliper (10) includes a first caliper arm (12) that opposes a first frictional surface (6a) of a vehicle wheel (5) and a second caliper arm (14) that opposes a second frictional surface (6b) of the same. A movable brake pad (7) is supported by the first caliper arm (12) and applies a braking force to the first frictional surface (6a). A plurality of pistons (55) which drive the movable brake pad (7) in accordance with expansion of a diaphragm (75) provided in the brake caliper (10), and a guide member (65) that guides displacement of the plurality of pistons (55) in a right-angle direction relative to the first frictional surface (6a) are provided, and therefore the movable brake pad (7) applies an even braking force to the vehicle wheel (5) in cooperation with a fixed brake pad (700) fixed to the second caliper arm (14).

    摘要翻译: 制动钳(10)包括与车轮(5)的第一摩擦表面(6a)相对的第一卡钳臂(12)和与其相对的第二摩擦表面(6b)的第二卡钳臂(14) 。 可动制动衬块(7)由第一制动臂(12)支撑,并向第一摩擦面(6a)施加制动力。 多个活塞(55),其根据设置在制动钳(10)中的隔膜(75)的膨胀而驱动可动制动衬块(7);以及引导构件(65),其引导多个活塞 (55)相对于第一摩擦面(6a)的直角方向设置,因此可动制动衬块(7)与固定的制动衬块(6)协作地向车轮(5)施加均匀的制动力 700)固定到第二卡钳臂(14)。