公开(公告)号：US5622639A

公开(公告)日：1997-04-22

申请号：US280855

申请日：1994-07-26

申请人： Hirofumi Kitayama ,  Toshimitu Shibata ,  Toshiaki Miyaju ,  Katsushin Miyagi

发明人： Hirofumi Kitayama ,  Toshimitu Shibata ,  Toshiaki Miyaju ,  Katsushin Miyagi

IPC分类号： C23C16/46 ,  C30B31/12 ,  F27B5/14

CPC分类号： C30B31/12 ,  C23C16/46

摘要： A heat treating apparatus for mounting objects to be treated on an object-to-be-treated boat (wafer boat) provided on a heat insulating cylinder, and loading the object-to-be-treated boat into a processing vessel for a heat treatment, a temperature detecting sensor is provided in a film depositing area of a relatively large heat capacity, which is a lower part of a gap defined between an inner tube of the processing vessel and an outer tube thereof so as to detect temperatures of those of the objects to be treated located there and control temperatures of the heating unit. Thus heat response is improved, and temperatures of the objects to be treated can be accurately detected.

摘要翻译： 一种用于将被处理物体安装在设置在隔热圆筒上的被处理船舶（晶片舟皿）上并将待处理船舶装载到热处理处理容器中的热处理装置 温度检测传感器设置在比较大的热容量的薄膜沉积区域中，该薄膜沉积区域是在处理容器的内管和外管之间限定的间隙的下部，以便检测其中的温度 要处理的物体位于那里，并控制加热单元的温度。 因此，热响应得到改善，并且可以准确地检测被处理物体的温度。

公开(公告)号：US5540782A

公开(公告)日：1996-07-30

申请号：US135481

申请日：1993-10-13

申请人： Katsushin Miyagi ,  Miyuki Yamahara

发明人： Katsushin Miyagi ,  Miyuki Yamahara

IPC分类号： C23C16/46 ,  C23C16/54 ,  C30B25/10 ,  C30B31/12 ,  H01L21/00 ,  C23C16/00

CPC分类号： H01L21/67115 ,  C23C16/46 ,  C23C16/54 ,  C30B25/10 ,  C30B31/12

摘要： A heat-treating apparatus for heat treating a plurality of objects-to-be-treated (semiconductor wafers) by loading the objects-to-be-treated into a heat treatment vessel having the lower end opened, mounted on a heat-treatment boat vertically spaced from each other, and sealing the opened end includes a heat insulator disposed on the lower end portion of the heat-treatment boat for heat-insulating the interior of the reaction vessel. The heat-insulator includes heat transmission preventing plates of opaque quartz for preventing the transmission of heat rays from a heater, and a support for supporting the heat transmission preventing plates. Thus sufficient heat-insulating effect for a heat-treating operation can be achieved, and stable heat-treatment can be conducted without impairing the function of sealing the heat-insulating unit. Furthermore, particle formation can be prevented, with a result of improved yields of the heat-treatment.

摘要翻译： 一种热处理装置，用于通过将待处理物体加载到具有下端打开的热处理容器中来热处理多个被处理物体（半导体晶片），所述热处理容器安装在热处理舟 并且密封开放端包括设置在热处理舟皿的下端部上的绝热体，用于对反应容器的内部进行绝热。 绝热体包括防止来自加热器的热射线的不透明石英的防热板，以及用于支撑防热板的支撑体。 因此，可以实现热处理操作的充分的绝热效果，并且可以进行稳定的热处理，而不会损害绝热单元的密封功能。 此外，可以防止颗粒形成，结果是热处理的产率提高。

公开(公告)号：US5370371A

公开(公告)日：1994-12-06

申请号：US75119

申请日：1993-06-10

申请人： Katsushin Miyagi ,  Shingo Watanabe ,  Yuuichi Mikata ,  Katsuya Okumura

发明人： Katsushin Miyagi ,  Shingo Watanabe ,  Yuuichi Mikata ,  Katsuya Okumura

IPC分类号： H01L21/205 ,  C23C16/458 ,  C23C16/46 ,  C30B25/10 ,  C30B31/12 ,  H01L21/00 ,  H01L21/22 ,  H01L21/324 ,  C21D1/06

CPC分类号： H01L21/67103 ,  C23C16/4583 ,  C23C16/46 ,  C30B25/10 ,  C30B31/12

摘要： A heat treatment apparatus having a heat treatment boat with a plurality of wafers held thereon, which is to be loaded in a reaction vessel which has one end opened. Once loaded, the boat effects a seal of the reaction vessel, in preparation for subjecting the wafers to heat treatment. The boat also has a heat-insulator disposed on its lower end for heat-insulating the interior of the reaction vessel during the heat-treatment. The heat-insulator includes composite plates having a metal film layer on an upper surface for reflecting heat rays generated during the heat treatment of the reaction vessel, and a cylinder enclosing the composite plates. Thus, sufficient heat-insulating effect for the heat treatment can be obtained, and stable heat-treatment can be conducted with the sufficient heat-insulating effect secured. Furthermore, the generation of particles can be suppressed, and yields of the heat treatment can be improved.

摘要翻译： 一种热处理装置，具有保存在其上的多个晶片的热处理舟，其将被装载在一端开放的反应容器中。 一旦加载，船就会对反应容器进行密封，以准备对晶片进行热处理。 该船还具有设置在其下端的绝热体，用于在热处理期间对反应容器的内部进行绝热。 绝热体包括在上表面具有用于反映在反应容器的热处理期间产生的热射线的金属膜层的复合板和封闭复合板的圆筒。 因此，可以获得用于热处理的充分的绝热效果，并且可以在确保足够的绝热效果的情况下进行稳定的热处理。 此外，可以抑制颗粒的产生，并且可以提高热处理的产率。

公开(公告)号：US5422081A

公开(公告)日：1995-06-06

申请号：US155750

申请日：1993-11-23

申请人： Katsushin Miyagi ,  Osamu Yokokawa ,  Yoshitaka Okada ,  Ichiro Nagasaki ,  Akira Hashimoto

发明人： Katsushin Miyagi ,  Osamu Yokokawa ,  Yoshitaka Okada ,  Ichiro Nagasaki ,  Akira Hashimoto

IPC分类号： B01D8/00 ,  B01D46/12 ,  B01D46/42 ,  C23C16/44 ,  C30B25/14

CPC分类号： C30B25/14 ,  B01D46/406 ,  B01D46/4263 ,  B01D8/00 ,  C23C16/4412

摘要： A double cylinder shaped multilayer structural member comprising ring shaped thin plate small diameter discs and large diameter discs respectively layered via spacers is disposed in the enclosure vessel of a trap device for a vapor phase reaction apparatus. Gas from the intake opening section of the enclosure vessel is introduced into the outer side space of the multilayer structural member of the enclosure vessel, passes through the spaces between the large diameter discs and also passes through the spaces between the small diameter discs, then exits via the inner side space of the multilayer structural member from the outlet opening section of enclosure vessel to the system exterior. As a result of this construction, in comparison to conventional devices, the collection efficiency of reactive components can be increased, the equipment life extended, and maintenance frequency reduced, thereby providing a trap device for a vapor phase reaction apparatus capable of improving productivity.

摘要翻译： 包括环形薄板小直径圆盘和分别通过间隔件层叠的大直径圆盘的双圆筒形多层结构构件设置在用于气相反应装置的捕集装置的封闭容器中。 来自封闭容器的进气开口部分的气体被引入到封闭容器的多层结构构件的外侧空间中，通过大直径盘之间的空间并且还穿过小直径盘之间的空间，然后退出 通过多层结构构件的内侧空间从封闭容器的出口开口部分到系统外部。 作为这种结构的结果，与常规装置相比，可以增加反应性组分的收集效率，延长设备寿命，降低维护频率，从而提供能够提高生产率的气相反应装置的捕集装置。

公开(公告)号：US5611863A

公开(公告)日：1997-03-18

申请号：US517286

申请日：1995-08-21

申请人： Katsushin Miyagi

发明人： Katsushin Miyagi

IPC分类号： H01L21/302 ,  B01J3/02 ,  C23C16/44 ,  C23C16/511 ,  H01J37/32 ,  H01L21/205 ,  H01L21/304 ,  H01L21/3065 ,  C23C16/00

CPC分类号： H01J37/32834 ,  C23C16/4405 ,  C23C16/4412 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32678

摘要： An ECR plasma CVD apparatus includes a plasma generation chamber to which a microwave and a plasma source gas are introduced. An excitation solenoid is arranged around the plasma generation chamber to form an electron cyclotron resonance magnetic field with the microwave in the plasma generation chamber. A plasma reaction chamber to which a reactive gas is introduced is provided in communication with the plasma generation chamber. A substrate holder for holding a silicon wafer is set in the plasma reaction chamber. A leakage-type butterfly valve whose opening degree can be freely controlled is arranged in communication with the plasma reaction chamber. A turbo molecular pump is formed in the outlet of the butterfly valve. A subpump is arranged in the outlet of the turbo molecular pump.

摘要翻译： ECR等离子体CVD装置包括引入微波和等离子体源气体的等离子体产生室。 激发螺线管布置在等离子体产生室的周围，与等离子体发生室中的微波形成电子回旋共振磁场。 与等离子体产生室连通地设置有引入反应性气体的等离子体反应室。 用于保持硅晶片的衬底保持器设置在等离子体反应室中。 打开程度可以自由控制的泄漏式蝶阀与等离子体反应室连通。 在蝶阀的出口形成涡轮分子泵。 在涡轮分子泵的出口处布置有副泵。

公开(公告)号：US5207573A

公开(公告)日：1993-05-04

申请号：US824094

申请日：1992-01-22

申请人： Katsushin Miyagi ,  Tomio Kimishima

发明人： Katsushin Miyagi ,  Tomio Kimishima

IPC分类号： H01L21/205 ,  C21D1/34 ,  F27B11/00 ,  F27B17/00 ,  H01L21/22 ,  H01L21/31

CPC分类号： F27B17/0025 ,  C21D1/34 ,  F27B11/00

摘要： A heat processing apparatus comprises a heating furnace, a process tube located in the heating furnace and having an open bottom, a manifold connected to the open bottom of the process tube, a sealing member sandwiched between the process tube and the manifold to air-tightly seal the process tube, a fixing member for fixing the process tube to the manifold, a heat transmitting member made of metal and sandwiched between the fixing member and the process tube to radiate heat at that area of the process tube, which is opposed to the fixing member, to the fixing member by heat conduction, and a heat exchange conduit arranged in the fixing member and having a passage through which heat exchanging medium flows to cool the fixing member by heat exchange.

摘要翻译： 一种加热装置，包括加热炉，位于加热炉中的开口底部的处理管，连接到处理管的开口底部的歧管，夹在处理管和歧管之间的气密密封件 密封工艺管，用于将处理管固定到歧管的固定构件，由金属制成并夹在固定构件和处理管之间的传热构件，以在处理管的该区域处辐射热量，该区域与 固定构件通过热传导而固定在固定构件上，热交换导管布置在固定构件中，并具有通过热交换介质流过的通道，通过热交换来冷却固定构件。

公开(公告)号：US5445522A

公开(公告)日：1995-08-29

申请号：US51945

申请日：1993-04-26

申请人： Katsushin Miyagi ,  Hiroyuki Mitsuhashi ,  Kazuo Akimoto

发明人： Katsushin Miyagi ,  Hiroyuki Mitsuhashi ,  Kazuo Akimoto

IPC分类号： C30B33/00 ,  F27B14/00

CPC分类号： C30B33/005

摘要： This invention relates to a combustion device for feeding hydrogen gas and oxygen gas into a combustion vessel, while heating the same, to generate water vapor. The combustion device comprises a hydrogen gas injection nozzle for feeding hydrogen gas into the combustion vessel, and an oxygen gas injection nozzles for feeding oxygen gas into the combustion vessel. The oxygen nozzles are projected further upward in the combustion vessel beyond the forward end of the hydrogen gas injection nozzle, and opened at a plurality of positions, whereby to diffuse oxygen widely around. The combustion device of this structure can feed a large amount of hydrogen gas for the combustion, whereby a large amount of water vapor can be generated without enlarging the combustion vessel, and troubles, such as the devitrification of the forward ends of the nozzles, abnormal heating in the combustion vessel.

摘要翻译： 本发明涉及一种用于将氢气和氧气输送到燃烧容器中同时加热的燃烧装置，以产生水蒸气。 燃烧装置包括用于将氢气进入燃烧容器的氢气注入喷嘴和用于将氧气输送到燃烧容器中的氧气喷射喷嘴。 氧气喷嘴在燃烧容器中向上突出超过氢气注入喷嘴的前端，并在多个位置打开，从而将氧气广泛地扩散。 该结构的燃烧装置能够供给大量的氢气用于燃烧，从而可以在不扩大燃烧容器的情况下产生大量的水蒸气，并且诸如喷嘴前端的失透等异常 在燃烧容器中加热。

公开(公告)号：US5433784A

公开(公告)日：1995-07-18

申请号：US179708

申请日：1994-01-11

申请人： Katsushin Miyagi ,  Tetsu Ohsawa

发明人： Katsushin Miyagi ,  Tetsu Ohsawa

IPC分类号： H01L21/205 ,  C23C16/54 ,  C30B25/08 ,  H01L21/22 ,  H01L21/31 ,  H01L21/677 ,  C23C16/00

CPC分类号： C23C16/54 ,  C30B25/08

摘要： The vertical treating apparatus according to this invention comprises as major units a process tube for receiving objects to be treated through an opening in a lower part thereof, a lift mechanism (boat elevator) for mounting a wafer boat holding the wafers to load the wafers into the process tube, and a wafer transfer device for transferring the wafers to the lift mechanism. The lift mechanism flexibly supports a cap for closing the opening of the process tube by way of an urging force provided by coil springs, and mounts the wafer boat for holding the wafers on the upper surface thereof. A cap restricting member is provided for restricting the urging force of the coil springs. The cap is provided at a lowermost position of the lift mechanism. Thus, the cap is restricted by the cap restricting member when the wafers are transferred by the transfer device, whereby the wafer boat, etc. are kept from tilting due to flexure of the coil springs, so that particle sticking to the wafers and wafer damage can be avoided.

摘要翻译： 根据本发明的立式处理装置包括作为主要单元的处理管，用于通过其下部的开口接收待处理物体，用于安装保持晶片以将晶片装载到晶片的晶片舟的升降机构（舟形升降机） 处理管和用于将晶片转移到升降机构的晶片转移装置。 提升机构通过由螺旋弹簧提供的推动力灵活地支撑用于封闭处理管的开口的盖，并且安装用于将晶片保持在其上表面上的晶片舟。 盖限制构件用于限制螺旋弹簧的作用力。 盖设置在升降机构的最低位置。 因此，当晶片被转印装置转印时，盖被盖限制构件限制，由此由于螺旋弹簧的弯曲而使晶片舟等不被倾斜，使得颗粒粘附到晶片和晶片损坏 可以避免。

公开(公告)号：US5421892A

公开(公告)日：1995-06-06

申请号：US170754

申请日：1993-12-21

申请人： Katsushin Miyagi

发明人： Katsushin Miyagi

IPC分类号： H01L21/31 ,  C23C16/46 ,  C23C16/54 ,  H01L21/22 ,  C23C16/00 ,  F16J15/40

CPC分类号： C23C16/46 ,  C23C16/54 ,  Y10S277/907 ,  Y10S277/91 ,  Y10S277/93

摘要： A vertical heat treating apparatus includes a cap body, which is movable up and down, for sealing a treatment vessel that holds objects to be treated. A rotary loading device is provided with a rotary shaft which extends into a through hole provided in the cap body, and a magnetic fluid seal member is provided around the rotary shaft. Heat-exchange media, such as water or ethylene glycol, is circulated within the rotary shaft, preferably to cool the rotary shaft. A temperature sensor may be provided in a housing for the rotary shaft, such that when the temperature exceeds a set temperature, the flow rate of the heat exchange medium is increased. Baffle plates may be provided above an upper surface of the cap body and opposed to the through-hole in the cap body. In one preferred embodiment of the invention, nitrogen gas is circulated through the through-hole in the cap body to prevent corrosive gas from contacting the shaft. Circumferential grooves are defined around the rotary shaft at locations where the heat exchange medium is admitted and discharged from the rotary shaft. Preferably, the heat exchange medium is circulated in the rotary shaft above and below the level of the magnetic seal.

摘要翻译： 立式热处理装置包括可上下移动的盖体，用于密封容纳待处理物体的处理容器。 旋转加载装置设置有旋转轴，该旋转轴延伸到设置在盖体中的通孔中，并且在旋转轴周围设置有磁性流体密封构件。 热交换介质如水或乙二醇在旋转轴内循环，优选冷却旋转轴。 可以在用于旋转轴的壳体中设置温度传感器，使得当温度超过设定温度时，热交换介质的流量增加。 挡板可以设置在帽体的上表面上方并与帽体中的通孔相对。 在本发明的一个优选实施例中，氮气循环通过盖体中的通孔，以防止腐蚀性气体接触轴。 在旋转轴上，在热交换介质从旋转轴进入并排出的位置处围绕旋转轴限定圆周槽。 优选地，热交换介质在旋转轴中在磁性密封的水平面上方和下方循环。