摘要:
A novel phosphor represented by the general formula (Gd1−xCex)3Al5−yGayO12 (wherein x and y are values falling in the ranges of 0.0005≦x≦0.02, and 0
摘要:
A novel phosphor represented by the general formula (Gd1-y-zCeyScz)3Al5-dGadO12 (wherein y, z and d are values falling in the ranges of 0.0005≦y≦0.05, 0
摘要:
A phosphor represented by the general formula (L1-x-y-z-dEuxCezM′d)2O2S (wherein L is at least one element selected from the group consisting of Gd, La and Y, M is at least one element selected from the group consisting of Tb and Pr, M′ is at least one element selected from the group consisting of Ca, Sr and Zn, and x, y, z and d are values falling in the ranges of 0.001≦×≦0.06, 0
摘要:
An oxide phosphor includes an oxide consisting of at least Gd, Ce, Al, Ga, and O, and has the crystal structure of a garnet structure, the atomic ratio (Gd+Ce)/(Al+Ga+Gd+Ce) of which is more than 0.375 and 0.44 or less, and the atomic ratio Ce/(Ce+Gd) of which is 0.0005 or more and 0.02 or less. This oxide phosphor reduces composition misalignment occurring during sintering, being a drawback of a phosphor having (Gd1-xCex)3Al5-yGayO12 composition, and has a property of extremely small afterglow and high luminescence efficiency. By using this oxide phosphor as a scintillator of a radiation detector having a light detector, the radiation detector with low afterglow and high output can be obtained. Further, by applying this radiation detector to an X-ray CT apparatus, a tomogram with high resolution and high quality can be obtained.
摘要翻译:氧化物荧光体包括由至少Gd,Ce,Al,Ga和O组成的氧化物,并且具有石榴石结构的晶体结构,原子比(Gd + Ce)/(Al + Ga + Gd + Ce) 其大于0.375和0.44以下,Ce /(Ce + Gd)的原子比为0.0005以上且0.02以下。 这种氧化物荧光体减少了在烧结过程中发生的组成不对准,这是具有(Gd 1-x Ce 3)3 Al 且具有极少的余辉和高的发光效率的特性。 通过使用该氧化物荧光体作为具有光检测器的放射线检测器的闪烁体,可以获得具有低余辉和高输出的放射线检测器。 此外,通过将该放射线检测器应用于X射线CT装置,可以获得高分辨率,高质量的断层图像。
摘要:
A surface treatment agent is applied onto a metal film of a printed circuit board to form a rust preventive film. The surface treatment agent for metal comprises an aqueous solution comprising an organic acid having a boiling point of 170° C. or higher and one or more compound selected from the group consisting of an imidazole based compound and a benzimidazole based compound.
摘要:
Disclosed is a photosensitive resin composition which can be developed using a dilute aqueous alkaline solution after ultraviolet ray exposure, is excellent in pot life, capable of preventing deposits from being generated in a cured coated film, capable of widening heat control tolerance, and is excellent in sensitivity, in heat resistance, in chemical resistance and in electric insulating properties, thereby rendering the composition suitable for use as a solder resist for producing a printed wiring board. This photosensitive resin composition comprises (A) an active energy ray-curable resin having at least two ethylenic unsaturated linkages per molecule thereof, (B) at least one kind material selected from acid salts of N-substituted melamine compound and acid salts of guanamine compound, (C) a photopolymerization initiator, (D) a diluent, and (E) a thermosetting compound. There is also disclosed a printed wiring board where this photosensitive resin composition is employed.
摘要:
Biarylalkylenecarbamic acid derivative represented by general formula (I): [wherein Q is a phenyl group which may be substituted or the like, X is a halogen atom, a (C1-C6) alkyl group or the like, n is 0 or an integer of from 1 to 4, R1 is a (C1-C6) alkyl group or the like, R2 is a hydrogen atom, a (C1-C6) alkyl group or the like, A is a (C1-C7) alkylene group which may be branched, and G is an oxygen atom, a sulfur atom or a group —NR— (wherein R3 is a hydrogen atom or a (C1-C4) alkyl group)] and agricultural and horticultural fungicides. The agricultural and horticultural fungicides of the present invention are useful as agricultural and horticultural fungicides because they have high preventive effects on cucumber downy mildew, apple scab, wheat powdery mildew, rice blast, cucumber gray mold and rice sheath blight without damaging crops, and are excellent in residual effectiveness and rain-resistance.
摘要:
There is provided an active energy beam curable composition, which is useful for forming a solder resist film for a printed wiring board, which can be developed through an ultraviolet exposure and a dilute alkali aqueous solution, and is excel lent in heat resistance, adhesivity and chemical resistance. There is also proposed a printed wiring board provided with a cured film of such an active energy beam curable composition. This composition is featured in that it comprises not only an active energy beam curable vinyl copolymer modified resin wherein an epoxy compound having an ethylenic unsaturated group is added to a copolymer comprising styrene, (metha)acrylic acid, and, as an optional component, (metha)acrylate; but also an active energy beam curable bisphenol type epoxyacrylate resin.
摘要:
In a servomechanism which includes a motor and performs positioning control and velocity control, based on a response of the motor when a step command is supplied in a condition where a load is applied to the motor, the value of the load is estimated, and the servo-gain of the servomechanism is automatically set in accordance with the estimated load value. Load inertia of the servomechanism is automatically calculated, an optimum gain is automatically set based on the calculation result, and a test operation is performed, so that a time period required for the adjustment can be shortened.
摘要:
Disclosed is a microtron electron accelerator having an accelerating cavity accepting microwave electric power for generating a high-frequency accelerating electric field E disposed within a uniform magnetic field B and adapted such that electrons are accelerated and caused to move in a circular trajectory under action of the magnetic field B and the electric field E, comprising an electron source formed of a cathode and an anode, which has a minute slit allowing an electron beam extracted from the cathode to pass therethrough, disposed on the outer side of the wall of the accelerating cavity, a first electron beam through-hole and a second electron beam through-hole formed in the wall of the accelerating cavity in two positions, with the electron source therebetween, along the decreasing or increasing direction of the strength of the electric field E in the accelerating cavity, and a third electron beam through-hole formed in the wall of the accelerating cavity in a position in confrontation with the first electron beam through-hole across the inner space of the accelerating cavity. By adopting the above described structure, it has been made possible to have the energy gain within the accelerating cavity at each time of acceleration increased and to have contamination of the inner surface of the accelerating cavity by evaporated cathode material decreased, and as a result, it is made possible to obtain a microtron electron accelerator smaller in size and capable of stably providing a high-energy electron beam.