利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

74 条记录 (耗时 0.035 秒)

    Alignment system
    1.
    发明授权
    Alignment system 失效
    对齐系统

    公开(公告)号：US5112133A

    公开(公告)日：1992-05-12

    申请号：US769495

    申请日：1991-10-01

    申请人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Ryuichi Ebinuma ,  Takao Kariya

    发明人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Ryuichi Ebinuma ,  Takao Kariya

    IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

    CPC分类号： G03F9/70 ,  H01L21/681 ,  H01L21/682 ,  Y10T307/786

    摘要： An alignment system usable in an exposure apparatus for printing a pattern of a mask on a wafer, for aligning the mask and the wafer, is disclosed. The system includes a plurality of position detecting devices; a plurality of driving stages corresponding to the position detecting devices, respectively, each driving stage being adapted to move a corresponding one of the position detecting devices two-dimensionally along a plane which is substantially opposed to the mask; a plurality of contacts corresponding to the position detecting devices, respectively, each contact being provided at an end portion of a corresponding one of the position detecting devices, along the plane and facing the pattern side; a detecting device for detecting mutual approach of the position detecting devices through at least one of the contacts; and a control device for controlling movement of at least one of the driving stages in accordance with the detection by the detecting device.

    Exposure apparatus
    6.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US5161176A

    公开(公告)日：1992-11-03

    申请号：US802705

    申请日：1991-12-06

    申请人： Ryuichi Ebinuma ,  Kunitaka Ozawa ,  Takao Kariya ,  Shunichi Uzawa ,  Noriyuki Nose

    发明人： Ryuichi Ebinuma ,  Kunitaka Ozawa ,  Takao Kariya ,  Shunichi Uzawa ,  Noriyuki Nose

    IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/70066

    摘要： An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.

    摘要翻译： 曝光装置包括用于通过掩模曝光晶片的光源; 遮光装置可移动并且有效地阻挡来自光源的光以限制曝光区域; 用于检测掩模和晶片之间的位置偏差的位置偏差检测系统; 以及驱动控制系统，用于基于来自位置偏差检测系统的检测信号移动遮光装置以执行其位置控制。

    Temperature controlling device for mask and wafer holders
    7.
    发明授权
    Temperature controlling device for mask and wafer holders 失效
    面罩和晶圆座的温度控制装置

    公开(公告)号：US5577552A

    公开(公告)日：1996-11-26

    申请号：US412101

    申请日：1995-03-28

    申请人： Ryuichi Ebinuma ,  Takao Kariya ,  Nobutoshi Mizusawa ,  Koji Uda ,  Eiji Sakamoto ,  Shunichi Uzawa

    发明人： Ryuichi Ebinuma ,  Takao Kariya ,  Nobutoshi Mizusawa ,  Koji Uda ,  Eiji Sakamoto ,  Shunichi Uzawa

    IPC分类号： G03F7/20 ,  G05D23/19 ,  H05K7/20 ,  F28D15/00

    CPC分类号： H05K7/20281 ,  G03F7/707 ,  G03F7/70875 ,  G05D23/1919

    摘要： A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.

    摘要翻译： 可适用于半导体微电路制造曝光装置的温度控制装置将半导体晶片暴露于掩模，以将掩模的图案印刷在晶片上。 该装置包括用于高精度地控制液体的温度的恒温液体介质供给系统，用于将供应的液体介质分配到多个流动通道中的分配系统，以将液体介质供应到多个控制对象，例如 ，掩模台，晶片台等。 该装置还包括多个温度控制装置，每个温度控制装置设置在对应的一个流动通道中，用于校正由相应流动通道中的压力损失能量产生的分配液体介质的温度变化。 因此，能够以简单的结构有效地控制多个控制对象的温度。

    Exposure apparatus
    8.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US5377251A

    公开(公告)日：1994-12-27

    申请号：US203498

    申请日：1994-02-28

    申请人： Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Hiroshi Kurosawa ,  Koji Uda ,  Takao Kariya ,  Shumichi Uzawa

    发明人： Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Hiroshi Kurosawa ,  Koji Uda ,  Takao Kariya ,  Shumichi Uzawa

    IPC分类号： G03F7/20 ,  G21K5/00

    CPC分类号： G03F7/70008 ,  G03F7/702

    摘要： An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.

    摘要翻译： 一种用于制造半导体器件的曝光方法，包括移动具有边缘的快门，使得边缘与预定曝光区域相关; 将曝光光束投影到所述光闸的边缘和所述曝光区域的至少一部分; 确定由曝光光束形成的快门的边缘相对于与可移动卡盘移动有关的预定坐标系的位置; 根据确定调整快门; 将基板放置在卡盘上; 移动卡盘使得基板与曝光区域相关; 以及通过所述快门控制所述基板与曝光光束的曝光。

    Substrate conveying apparatus
    9.
    发明授权
    Substrate conveying apparatus 失效
    基板输送装置

    公开(公告)号：US5277539A

    公开(公告)日：1994-01-11

    申请号：US58791

    申请日：1993-05-10

    申请人： Shin Matsui ,  Takao Kariya ,  Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Shunichi Uzawa

    发明人： Shin Matsui ,  Takao Kariya ,  Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Shunichi Uzawa

    IPC分类号： G03F7/20 ,  H01L21/677 ,  H01L21/68 ,  B65G47/24

    CPC分类号： G03F7/70691 ,  H01L21/67766 ,  H01L21/67778 ,  H01L21/68

    摘要： A substrate conveying apparatus usable with a semiconductor manufacturing apparatus wherein a pattern of a mask is transferred onto a semiconductor wafer by exposing the semiconductor wafer to synchrotron orbital radiation or other exposure energy through a mask. The conveying apparatus transfers the semiconductor wafer to and from a wafer chuck while the surface thereof extends vertically, and/or transfers the wafer to and from a wafer cassette which contains a plurality of wafers horizontally. The apparatus includes a conveying hand having a gimbal mechanism for supporting the semiconductor wafer to assure the semiconductor wafer transfer to and from the wafer chuck while the wafer is vertical. When the semiconductor wafer is transferred to and from a wafer cassette, the apparatus is provided with a correcting mechanism for correcting the attitude of the conveying hand to prevent the semiconductor wafer from contacting the wafer cassette.

    摘要翻译： 一种可用于半导体制造装置的基板输送装置，其中通过将半导体晶片暴露于同步加速器轨道辐射或通过掩模的其他曝光能量将掩模的图案转印到半导体晶片上。 输送装置将晶片卡盘的表面向垂直方向延伸和/或从晶片卡盘传送半导体晶片，和/或将晶片从包含多个晶片的晶片盒水平地传送到晶片盒。 该装置包括具有用于支撑半导体晶片的万向架机构的传送手，以确保半导体晶片在晶片垂直时传送到晶片卡盘。 当将半导体晶片转移到晶片盒或从晶片盒转移时，该装置设置有校正机构，用于校正传送手的姿态以防止半导体晶片接触晶片盒。

    Exposure apparatus
    10.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US5285488A

    公开(公告)日：1994-02-08

    申请号：US974307

    申请日：1992-11-10

    申请人： Yutaka Watanabe ,  Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Shunichi Uzawa ,  Takao Kariya

    发明人： Yutaka Watanabe ,  Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Shunichi Uzawa ,  Takao Kariya

    IPC分类号： G03F7/20 ,  G21K5/00

    CPC分类号： G03F7/702

    摘要： An exposure apparatus includes an exposure beam source for projecting a beam flux for exposure, having a non-uniform intensity distribution, toward a range including an exposure zone, set with respect to a main body of the exposure apparatus; illuminance detectors disposed at least at two points inside the exposure beam flux but outside the exposure zone; and a detecting device for detecting a change in intensity of the exposure beam and a change in relative position of the exposure zone and the exposure beam flux, on the basis of detected illuminances at the two points.

    摘要翻译： 曝光装置包括：曝光束源，用于将曝光用光束投射到具有相对于曝光装置的主体的曝光区域的范围内，具有不均匀的强度分布; 照度检测器至少设置在曝光光束内部的两个点处，但在曝光区域外; 以及检测装置，其基于两点处的检测到的照度，检测曝光光束的强度变化和曝光区域和曝光光束通量的相对位置的变化。