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1.发明授权
公开(公告)号：US4937242A
公开(公告)日：1990-06-26
申请号：US165705
申请日：1988-03-08
IPC分类号： A61K31/4427 , A61K31/455 , A61K31/55 , A61P3/00 , A61P9/12 , C07D211/90 , C07D401/12 , C07D405/12
CPC分类号： C07D401/12 , C07D211/90 , C07D405/12
摘要： 1,4-Dihydropyridine derivatives of the general formula: ##STR1## wherein X.sup.1 and X.sup.2 independently represent hydrogen, fluoromethyl, fluoromethoxy, halogen, cyano, or nitro; R.sup.1 represents a lower alkyl; R.sup.2 represents acyl, alkoxycarbonyl, acylalkyl, an N-alkyl-substituted carbamoylalkyl, alkoxyalkyl, alkoxycarbonylalkyl, acyloxyalkyl, nitratoalkyl, cyanoalkyl, heterocycle-alkyl, haloalkyl, alkenyl, or alkynyl; A represents an alkylene comprising a carbon atom to which 2 alkyls are bonded and having in total at least 5 carbon atoms; m represents the integer 1, 2 or 3; acid addition salts thereof; a method of production thereof; and pharmaceutical compositions containing such compound(s).Such compounds have pharmacological activities, in particular potent and long lasting hypotensive activity, coronary vasodilatation, cerebral vasodilatation, peripheral vasodilatation, renal vasodilatation and platelet aggregation inhibitory activity.
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2.发明授权Pharmaceutical preparation containing prostaglandin compound for rectal or vaginal administration 失效含有用于直肠或阴道给药的前列腺素化合物的药物制剂
公开(公告)号：US5491171A
公开(公告)日：1996-02-13
申请号：US232255
申请日：1994-07-27
申请人： Ken-ichi Nishimura , Akihisa Yoshimi , Takayoshi Mori , Nobuharu Kakeya , Masahiro Kikuchi , Nobuo Kondoh , Takeshi Uchida , Koichi Yamanouchi
发明人： Ken-ichi Nishimura , Akihisa Yoshimi , Takayoshi Mori , Nobuharu Kakeya , Masahiro Kikuchi , Nobuo Kondoh , Takeshi Uchida , Koichi Yamanouchi
IPC分类号： A61K9/02 , A61K31/557 , A61K47/12 , A61K31/20 , A61K31/19
CPC分类号： A61K9/02 , A61K31/557 , A61K47/12 , Y10S514/966 , Y10S514/967
摘要： A pharmaceutical preparation for rectal or vaginal administration, comprising a prostaglandin compound and an alkali metal salt of a fatty acid having 8 to 12 carbon atoms, and a method for administering a prostaglandin compound, comprising rectally or vaginally administering same in the presence of an alkali metal salt of a fatty acid.According to the present invention, absorption of prostaglandin from rectum or vagina can be enhanced.The prostaglandin can be stabilized in the preparation.
摘要翻译： PCT No.PCT / JP92 / 01431 Sec。 371日期：1994年7月27日 102（e）日期1994年7月27日PCT提交1992年11月5日PCT公布。 出版物WO93 / 08804 日期：1993年5月13日。一种用于直肠或阴道给药的药物制剂，其包含前列腺素化合物和具有8至12个碳原子的脂肪酸的碱金属盐，以及用于给予前列腺素化合物的方法，包括直肠或阴道给药相同 在存在脂肪酸的碱金属盐的情况下。 根据本发明，可以增强从直肠或阴道吸收前列腺素。 前列腺素可以在制剂中稳定。
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3.发明申请POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN 有权聚合物化合物，阳离子组合物和形成耐蚀图案的方法公开(公告)号：US20090068590A1
公开(公告)日：2009-03-12
申请号：US12204460
申请日：2008-09-04
申请人： Takahiro Dazai , Takayoshi Mori , Hiroaki Shimizu , Kyoko Ohshita
发明人： Takahiro Dazai , Takayoshi Mori , Hiroaki Shimizu , Kyoko Ohshita
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/28 , C08F220/38 , Y10S430/111
摘要： There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R′ each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).
摘要翻译： 提供一种正性抗蚀剂组合物，其包含在酸作用下在碱性显影液中显示增加的溶解性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中树脂组分（A） 包括含有下述通式（a0-1）表示的结构单元（a0）的高分子化合物（A1）和来自具有酸解离性，溶解抑制基团的丙烯酸酯的结构单元（a1）（ 在式（a0-1）中，R表示氢原子，低级烷基或卤代低级烷基; R'两个各自独立地表示氢原子，低级烷基或烷氧基， 5个碳原子; X表示1至5个碳原子的亚烷基，氧原子或硫原子）。
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公开(公告)号：US20050118542A1
公开(公告)日：2005-06-02
申请号：US10969067
申请日：2004-10-21
CPC分类号： G03C1/49818 , G03C1/0051 , G03C1/08 , G03C1/46 , G03C5/17 , G03C2001/0056 , G03C2001/03552 , G03C2001/03558 , G03C2001/03594 , G03C2200/43
摘要： The invention provides a black and white photothermographic material including, on at least one surface of a support, at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder, wherein 50% or more of the total projected area of the photosensitive silver halide grains is occupied by tabular grains having an aspect ratio of 2 or more, and at least one apex portion of each tabular grain has an epitaxial junction. An image forming method is also provided, the method including bringing the photothermographic material into close contact with a fluorescent intensifying screen containing a fluorescent substance, wherein 50% or more of emission light of the fluorescent substance has a wavelength of 350 nm to 420 nm, and applying X-ray exposure. The black and white photothermographic material has high sensitivity and is superior in image storability and raw stock storability.
摘要翻译： 本发明提供一种黑色和白色光热敏成像材料，其在至少一个载体表面上至少包含感光卤化银，非感光性有机银盐，还原剂和粘合剂，其中总计50％以上 感光卤化银颗粒的投影面积占据纵横比为2以上的片状颗粒，并且每个片状颗粒的至少一个顶点部分具有外延结。 还提供了一种图像形成方法，该方法包括使光热敏成像材料与含有荧光物质的荧光增强屏紧密接触，其中荧光物质的发射光的50％以上具有350nm至420nm的波长， 并应用X射线曝光。 黑白光热敏成像材料具有高灵敏度，图像保存性和原始储存性优异。
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5.发明授权公开(公告)号：US06720134B2
公开(公告)日：2004-04-13
申请号：US10043094
申请日：2002-01-14
IPC分类号： G03C1005
CPC分类号： G03C1/0051 , G03C1/04 , G03C1/043 , G03C1/053 , G03C1/14 , G03C1/346 , G03C2001/0055 , G03C2001/0058 , G03C2001/03511 , G03C2001/03535 , G03C2001/03552 , G03C2200/40
摘要： A silver halide photographic emulsion comprising grains, wherein 70% or more of the total projected area of the grains is occupied by silver halide grains each meeting requirements (a) to (d) below (a) the grain is composed of a tabular silver halide host grain having two mutually parallel main planes and aspect ratio of 2 or more, and a silver halide protrusion portion epitaxially junctioned on the surface of the host grain; (b) the silver bromide contents of both the host grain and the protrusion portion are 70 mol % or more; (c) the percentage of the silver amount in the protrusion is 12% or less of the silver amount in the host grain; and (d) the grain has a shallow electron-trapping zone.
摘要翻译： 包含颗粒的卤化银照相乳剂，其中颗粒的总投影面积的70％或更多占卤化银颗粒，其满足以下（a）至（d）（a）的要求（a），颗粒由片状卤化银 具有两个相互平行的主平面和纵横比为2或更大的主晶粒和外延在主晶粒表面上的卤化银突出部分;（b）主晶粒和突起部分的溴化银含量为70 mol％以上;（c）突起物中银量的百分比为主晶粒中银量的12％以下; 和（d）谷物具有浅电子捕获区。
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6.发明授权Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound 有权用于浸渍曝光的抗蚀剂组合物，使用其形成抗蚀剂图案的方法和含氟化合物公开(公告)号：US08642244B2
公开(公告)日：2014-02-04
申请号：US13310625
申请日：2011-12-02
申请人： Daiju Shiono , Takahiro Dazai , Sanae Furuya , Tomoyuki Hirano , Takayoshi Mori
发明人： Daiju Shiono , Takahiro Dazai , Sanae Furuya , Tomoyuki Hirano , Takayoshi Mori
CPC分类号： G03F7/0046 , C07C69/653 , C07C69/67 , C07C69/712 , C07C69/757 , C07C2603/00 , C07C2603/84 , C07C2603/86 , C08F12/20 , C08F12/22 , C08F12/32 , C08F220/22 , C08F220/24 , C08F220/26 , C08F220/28 , C09D125/14 , C09D125/18 , G03F7/0048 , G03F7/0382 , G03F7/0397 , G03F7/2041 , C08F212/14 , C08F2220/1833 , C08F212/32 , C08F2220/185 , C08F2220/283 , C08F220/06
摘要： A resist composition for immersion exposure, including a base component that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component that generates acid upon exposure, and a fluorine-containing compound represented by a general formula (c-1) that is decomposable in an alkali developing solution: wherein R1 represents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the —C(═O)— group in general formula (c-1); and R2 represents an organic group having a fluorine atom.
摘要翻译： 一种用于浸渍曝光的抗蚀剂组合物，包括在酸作用下在碱性显影液中表现出改变的溶解度的基础组分，暴露时产生酸的酸产生剂组分和由通式（c-1）表示的含氟化合物 ），其可以在碱性显影液中分解：其中R1表示可以含有可聚合基团的有机基团，条件是所述可聚合基团具有碳 - 碳多重键，并且形成多重键的碳原子不直接键合 通式（c-1）中的-C（= O） - 基团中的碳原子; R2表示具有氟原子的有机基团。
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7.发明授权Resist composition, method of forming resist pattern, polymeric compound, and compound 有权抗蚀剂组合物，形成抗蚀剂图案的方法，聚合物和化合物公开(公告)号：US08227170B2
公开(公告)日：2012-07-24
申请号：US12685579
申请日：2010-01-11
申请人： Takahiro Dazai , Daiju Shiono , Tomoyuki Hirano , Tasuku Matsumiya , Daichi Takaki , Takayoshi Mori , Junichi Tsuchiya
发明人： Takahiro Dazai , Daiju Shiono , Tomoyuki Hirano , Tasuku Matsumiya , Daichi Takaki , Takayoshi Mori , Junichi Tsuchiya
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , C08F28/06 , C07D327/04
CPC分类号： C07D493/18 , C07D327/04 , C08F20/38 , C08F220/38 , C08F2220/283 , C08F2220/382 , G03F7/0382 , G03F7/0397 , G03F7/2041 , Y10S430/111
摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of an acid, and an acid generator component (B), wherein the base component (A) includes a polymeric compound (A0) containing a structural unit (a0) represented by the general formula (a0-1) shown below: (wherein, R1 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R2 represents a bivalent linking group containing at least one kind of polar groups selected from the group consisting of —O—, —C(═O)—, —C(═O)—O—, a carbonate linkage (—O—C(═O)—O—), —S—, —S(═O)2—, —S(═O)2—O—, —NH—, —NR04— (wherein, R04 represents an alkyl group or an acyl group), and —NH—C(═O)—; and R3 represents a cyclic group containing a sulfonyl group within the ring skeleton).
摘要翻译： 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中显示出改变的溶解度的碱成分（A）和酸产生剂成分（B），其中，所述基础成分（A）含有含有 由下述通式（a0-1）表示的结构单元（a0）：（其中，R1表示氢原子，烷基或卤代烷基; R2表示含有至少一种极性基团的二价连接基团 选自-O - ， - C（= O） - ， - C（= O）-O-，碳酸酯键（-O-C（= O）-O-），-S-， S（= O）2 - ， - S（= O）2 -O - ， - NH - ， - NRO4-（其中，R04表示烷基或酰基）和-NH-C（= R 3表示在环骨架中含有磺酰基的环状基团）。
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8.发明授权Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern 失效含氟化合物，浸渍曝光用抗蚀剂组合物和形成抗蚀剂图案的方法公开(公告)号：US07989138B2
公开(公告)日：2011-08-02
申请号：US12323212
申请日：2008-11-25
CPC分类号： G03F7/0397 , C08F220/10 , C08F220/30 , G03F7/0046 , G03F7/0382 , G03F7/2041 , Y10S430/106 , Y10S430/146
摘要： A fluorine-containing compound represented by a general formula (c-1) shown below: [Chemical Formula 1] RX-AN-(OR2)a (c-1) [wherein, RX represents an organic group, AN represents a naphthalene ring that may have a substituent, R2 represents a base dissociable group, and a represents 1 or 2, provided that at least one among AN and said a R2 groups contains a fluorine atom].
摘要翻译： 由下列通式（c-1）表示的含氟化合物：[化学式1] RX-AN-（OR2）a（c-1）[其中，RX表示有机基团，AN表示萘环 其可以具有取代基，R2表示碱可解离基团，并且a表示1或2，条件是AN和所述R2基团中的至少一个含有氟原子]。
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9.发明授权Polymer compound, positive resist composition, and method of forming resist pattern 有权高分子化合物，正性抗蚀剂组合物和形成抗蚀剂图案的方法公开(公告)号：US07767379B2
公开(公告)日：2010-08-03
申请号：US12204460
申请日：2008-09-04
申请人： Takahiro Dazai , Takayoshi Mori , Hiroaki Shimizu , Kyoko Oshita
发明人： Takahiro Dazai , Takayoshi Mori , Hiroaki Shimizu , Kyoko Oshita
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/28 , C08F220/38 , Y10S430/111
摘要： There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R′ each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).
摘要翻译： 提供一种正性抗蚀剂组合物，其包含在酸作用下在碱性显影液中显示增加的溶解性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中树脂组分（A） 包括含有下述通式（a0-1）表示的结构单元（a0）的高分子化合物（A1）和来自具有酸解离性，溶解抑制基团的丙烯酸酯的结构单元（a1）（ 在式（a0-1）中，R表示氢原子，低级烷基或卤代低级烷基; R'两个各自独立地表示氢原子，低级烷基或烷氧基， 5个碳原子; X表示1至5个碳原子的亚烷基，氧原子或硫原子）。
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10.发明申请RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND 有权耐蚀组合物，形成耐蚀图案的方法，聚合物和化合物公开(公告)号：US20100178609A1
公开(公告)日：2010-07-15
申请号：US12685579
申请日：2010-01-11
申请人： Takahiro Dazai , Daiju Shiono , Tomoyuki Hirano , Tasuku Matsumiya , Daichi Takaki , Takayoshi Mori , Junichi Tsuchiya
发明人： Takahiro Dazai , Daiju Shiono , Tomoyuki Hirano , Tasuku Matsumiya , Daichi Takaki , Takayoshi Mori , Junichi Tsuchiya
IPC分类号： G03F7/20 , G03F7/004 , C08F28/06 , C07D327/04
CPC分类号： C07D493/18 , C07D327/04 , C08F20/38 , C08F220/38 , C08F2220/283 , C08F2220/382 , G03F7/0382 , G03F7/0397 , G03F7/2041 , Y10S430/111
摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of an acid, and an acid generator component (B), wherein the base component (A) includes a polymeric compound (A0) containing a structural unit (a0) represented by the general formula (a0-1) shown below: (wherein, R1 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R2 represents a bivalent linking group containing at least one kind of polar groups selected from the group consisting of —O—, —C(═O)—, —C(═O)—O—, a carbonate linkage (—O—C(═O)—O—), —S—, —S(═O)2—, —S(═O)2—O—, —NH—, —NR04— (wherein, R04 represents an alkyl group or an acyl group), and —NH—C(═O)—; and R3 represents a cyclic group containing a sulfonyl group within the ring skeleton).
摘要翻译： 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中显示出改变的溶解度的碱成分（A）和酸产生剂成分（B），其中，所述基础成分（A）含有含有 由下述通式（a0-1）表示的结构单元（a0）：（其中，R1表示氢原子，烷基或卤代烷基; R2表示含有至少一种极性基团的二价连接基团 选自-O - ， - C（= O） - ， - C（= O）-O-，碳酸酯键（-O-C（= O）-O-），-S-， S（= O）2 - ， - S（= O）2 -O - ， - NH - ， - NRO4-（其中，R04表示烷基或酰基）和-NH-C（= R 3表示在环骨架中含有磺酰基的环状基团）。
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