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    Optical element having antireflection film
    2.
    发明授权
    Optical element having antireflection film 失效
    具有防反射膜的光学元件

    公开(公告)号：US06919134B2

    公开(公告)日：2005-07-19

    申请号：US10279931

    申请日：2002-10-25

    申请人： Takeshi Mitsuishi ,  Hiroshi Shirakawa ,  Kenichi Shinde

    发明人： Takeshi Mitsuishi ,  Hiroshi Shirakawa ,  Kenichi Shinde

    IPC分类号： G02B1/11 ,  B32B9/04

    CPC分类号： G02B1/111 ,  Y10T428/161 ,  Y10T428/31663

    摘要： The present invention is directed to an optical element having an antireflection film formed on a plastic substrate, wherein the reflectance of the antireflection film is low while the transmittance thereof is high. The impact resistance, the adhesiveness, the heat resistance, the abrasion resistance and the alkali resistance of the antireflection film on the plastic substrate are superior.The optical element having an antireflection film has at least one layer of the antireflection film that is a hybrid layer made of an inorganic substance and an organic substance.

    摘要翻译： 本发明涉及一种具有形成在塑料基板上的抗反射膜的光学元件，其中抗反射膜的反射率低，而其透射率高。 塑料基板上的抗反射膜的耐冲击性，粘合性，耐热性，耐磨性和耐碱性优异。 具有抗反射膜的光学元件具有作为由无机物质和有机物质构成的混合层的至少一层的防反射膜。

    VAPOR DEPOSITION MATERIAL, PROCESS FOR PRODUCING OPTICAL MEMBER OR PLASTIC LENS FOR SPECTACLE WITH USE THEREOF, AND PLASTIC LENS FOR SPECTACLE
    5.
    发明申请
    VAPOR DEPOSITION MATERIAL, PROCESS FOR PRODUCING OPTICAL MEMBER OR PLASTIC LENS FOR SPECTACLE WITH USE THEREOF, AND PLASTIC LENS FOR SPECTACLE 审中-公开
    蒸气沉积材料，用于生产光学部件的光学元件或塑料镜片的工艺，以及用于表面的塑料镜片

    公开(公告)号：US20100040801A1

    公开(公告)日：2010-02-18

    申请号：US12443218

    申请日：2007-09-28

    申请人： Takeshi Mitsuishi ,  Hitoshi Kamura ,  Kenichi Shinde ,  Yukihiro Takahashi

    发明人： Takeshi Mitsuishi ,  Hitoshi Kamura ,  Kenichi Shinde ,  Yukihiro Takahashi

    IPC分类号： B05D5/06 ,  C09D7/12 ,  G02C7/02

    CPC分类号： C08L83/12 ,  B05D1/60 ,  B29D11/00865 ,  C08K5/54 ,  C08L83/08 ,  C09D4/00 ,  C23C14/06 ,  C23C14/30 ,  G02B1/105 ,  G02B1/18 ,  G02B27/0006 ,  C08L83/00 ,  C08G77/00

    摘要： A material for vapor deposition which is obtained by mixing a specific organosilicon compound having an alkyl group substituted with fluorine, a specific silane compound and a specific modified silicone oil, a process for producing an optical member which comprises a step of solidifying the material for vapor deposition described above by heating and a step of vapor depositing the solidified material for vapor deposition on a substrate made of a plastics by heating by a heating means to form a thin film exhibiting a water-repelling property, a process for producing a plastic lens for spectacles which is the above process applied to producing the plastic lens for spectacles, and a plastic lens for spectacles which is produced in accordance with the process. The water-repelling thin film in the optical member and in the plastic lens for spectacles produced in accordance with the above processes exhibits improved slipping property in combination with improved durability and abrasion resistance from those of conventional thin films.

    摘要翻译： 通过混合具有被氟取代的烷基的特定有机硅化合物，特定的硅烷化合物和特定的改性的硅油获得的气相沉积材料，制造光学部件的方法，该方法包括使用于蒸气的材料固化的步骤 通过加热进行上述的沉积和将通过加热装置加热形成气相沉积的固化材料气相沉积在由塑料制成的基板上以形成具有防水性的薄膜的步骤，制造用于 用于生产眼镜用塑料透镜的上述工艺的眼镜以及根据该工艺生产的眼镜用塑料透镜。 根据上述方法制造的光学构件和用于眼镜的塑料透镜中的防水薄膜与常规薄膜的改进的耐久性和耐磨性结合提高了滑动性能。

    Optical element having antireflection film
    7.
    发明授权
    Optical element having antireflection film 失效
    具有防反射膜的光学元件

    公开(公告)号：US06693747B2

    公开(公告)日：2004-02-17

    申请号：US10370091

    申请日：2003-02-21

    申请人： Takeshi Mitsuishi ,  Kenichi Shinde

    发明人： Takeshi Mitsuishi ,  Kenichi Shinde

    IPC分类号： G02B110

    CPC分类号： G02B1/115

    摘要： An optical element having a plastic substrate and an antireflection film provided on the plastic substrate, characterized in that the optical element has a basic layer comprising Nb between the plastic substrate and the antireflection film. The optical element has high adhesiveness between the plastic substrate and the antireflection film and is characterized by excellent resistance to heat, impact, alkali, and abrasion.

    摘要翻译： 一种光学元件，其具有设置在塑料基板上的塑料基板和抗反射膜，其特征在于，所述光学元件在所述塑料基板与所述防反射膜之间具有包含Nb的基本层。 光学元件在塑料基板和抗反射膜之间具有高粘合性，其特征在于耐热，耐冲击，耐碱和耐磨性优异。

    Process for forming a thin film and apparatus therefor
    9.
    发明授权
    Process for forming a thin film and apparatus therefor 有权
    薄膜形成方法及其设备

    公开(公告)号：US07182976B2

    公开(公告)日：2007-02-27

    申请号：US10330131

    申请日：2002-12-30

    申请人： Yukihiro Takahashi ,  Takeshi Mitsuishi ,  Kenichi Shinde

    发明人： Yukihiro Takahashi ,  Takeshi Mitsuishi ,  Kenichi Shinde

    IPC分类号： B05D5/06

    CPC分类号： G02B1/11 ,  C23C14/547 ,  G02B1/10

    摘要： A process for forming a thin film is described that enables automatic formation of thin films having constant optical properties reliably and in large quantities with excellent reproducibility suitable for mass production. An apparatus for performing the process is also described. Generally, a material for vapor deposition is vaporized by an electron gun and an antireflection film forms by vapor deposition on lenses held by a coat dome. The electric power applied to the electron gun is controlled so that the amount of transmitted or reflected light continuously measured by an optical film thickness meter during thin film formation is compared to a reference amount of measured light stored in a means for storing data until the measured and reference amounts of measured light are close to, or the same as, one another.

    摘要翻译： 描述了一种用于形成薄膜的方法，可以自动形成具有可靠且大量具有适合于批量生产的优异再现性的具有恒定光学特性的薄膜。 还描述了用于执行该处理的装置。 通常，用于气相沉积的材料通过电子枪蒸发，并且通过气相沉积在由罩罩保持的透镜上形成抗反射膜。 控制施加到电子枪的电力，使得在薄膜形成期间由光学膜厚度计连续测量的透射或反射光的量与存储在用于存储数据的装置中的测量光的参考量进行比较，直到测量 并且测量光的参考量彼此接近或相同。

    Optical element having antireflection film
    10.
    发明授权
    Optical element having antireflection film 有权

    公开(公告)号：US06606196B2

    公开(公告)日：2003-08-12

    申请号：US09939664

    申请日：2001-08-28

    申请人： Takeshi Mitsuishi ,  Hitoshi Kamura ,  Kenichi Shinde

    发明人： Takeshi Mitsuishi ,  Hitoshi Kamura ,  Kenichi Shinde

    IPC分类号： G02B111

    CPC分类号： G02B1/115

    摘要： An optical element having a plastic substrate and an antireflection film of a &lgr;/4-&lgr;/2-&lgr;/4 or &lgr;/4-&lgr;/4-&lgr;/2-&lgr;/4 type (&lgr;=500 nm) provided in that order on the plastic substrate, wherein the layer of &lgr;/2 is a high-refraction equivalent film containing at least three layers and having a refractive index of from 1.80 to 2.40, and the even-numbered layer(s) of the equivalent film is an SiO2 layer or a layer in which SiO2 is a main component.