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    Method of manufacturing wireless suspension blank
    1.
    发明授权
    Method of manufacturing wireless suspension blank 有权
    制造无线悬挂空白的方法

    公开(公告)号：US06942817B2

    公开(公告)日：2005-09-13

    申请号：US09813759

    申请日：2001-03-21

    申请人： Hiroshi Yagi ,  Shigeki Kawano ,  Kazuo Umeda ,  Jiro Takei ,  Yukio Iimura ,  Satoshi Sasaki ,  Katsuya Sakayori ,  Hiroko Amasaki

    发明人： Hiroshi Yagi ,  Shigeki Kawano ,  Kazuo Umeda ,  Jiro Takei ,  Yukio Iimura ,  Satoshi Sasaki ,  Katsuya Sakayori ,  Hiroko Amasaki

    IPC分类号： G11B5/48 ,  H05K1/05 ,  H05K3/00 ,  H05K3/06 ,  H05K3/10 ,  B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  G11B21/16

    CPC分类号： H05K3/0017 ,  G11B5/4833 ,  G11B5/484 ,  G11B5/486 ,  H05K1/056 ,  H05K3/002 ,  H05K3/0041 ,  H05K3/064 ,  H05K3/108 ,  H05K2201/0394 ,  H05K2201/0969 ,  H05K2203/0554

    摘要： A wireless suspension blank is made using a two-layer laminate composed of a metallic layer with the spring property and an electrically insulating layer. The first method includes a first step for working the metallic layer by the photo etching method, a second step for forming a wiring part on the insulating layer by the semi-additive method and a third step for working the insulating layer by the wet-etching method. The second method includes a first step for working the metallic layer by the photo etching method, a second step for forming a wiring part on the insulating layer by the semi-additive method and a third step for working the insulating layer by the plasma etching method. The third method includes a first step for forming a wiring part on the metallic layer by the semi-additive method, a second step for working the metallic layer by the wet-etching method and a third step for working the insulating layer by the dry-etching method or the wet-etching method. The use of a two-layer laminate makes possible a low cost production. Further, the forming of a wiring part by the semi-additive method makes possible to working very accurately a fine wiring part.

    摘要翻译： 使用由具有弹簧性质的金属层和电绝缘层组成的双层层压制造无线悬挂坯料。 第一种方法包括通过光蚀刻方法加工金属层的第一步骤，通过半添加方法在绝缘层上形成布线部分的第二步骤以及通过湿法蚀刻来对绝缘层进行加工的第三步骤 方法。 第二种方法包括通过光蚀刻法工作金属层的第一步骤，通过半添加方法在绝缘层上形成布线部分的第二步骤和通过等离子体蚀刻方法对绝缘层进行加工的第三步骤 。 第三种方法包括通过半添加方法在金属层上形成布线部分的第一步骤，用于通过湿式蚀刻方法加工金属层的第二步骤和通过干式加热方法对绝缘层进行加工的第三步骤， 蚀刻方法或湿式蚀刻方法。 使用双层层压板可以实现低成本生产。 此外，通过半添加方法形成布线部分，可以非常精确地精加工精细的布线部分。

    TRANSFER APPARATUS HAVING GIMBAL MECHANISM AND TRANSFER METHOD USING THE TRANSFER APPARATUS
    2.
    发明申请
    TRANSFER APPARATUS HAVING GIMBAL MECHANISM AND TRANSFER METHOD USING THE TRANSFER APPARATUS 有权
    具有GIMBAL机制的传送装置和使用传送装置的传送方法

    公开(公告)号：US20100086629A1

    公开(公告)日：2010-04-08

    申请号：US12633183

    申请日：2009-12-08

    申请人： Mitsunori Kokubo ,  Yukio Iimura ,  Masakazu Kanemoto ,  Kentaro Ishibashi

    发明人： Mitsunori Kokubo ,  Yukio Iimura ,  Masakazu Kanemoto ,  Kentaro Ishibashi

    IPC分类号： B29C45/80 ,  B29C45/02

    CPC分类号： G11B7/265 ,  H01L21/682

    摘要： A transfer apparatus includes a table on which a molding material is placed, a mold holding body that fixes and holds a mold disposed such as to be opposed to a surface of the table, a gimbal member which holds the mold holding body and which forms a convex spherical surface portion, a gimbal member formed with a concave spherical surface portion which is opposed and in contact with the convex spherical surface portion, a movable body that holds the gimbal member and which can advance and retreat in the vertical direction with respect to the table surface, and an attitude adjusting/holding unit that adjusts and holds attitude of the gimbal member.

    摘要翻译： 转印装置包括：放置有成型材料的工作台;固定并保持设置成与工作台的表面相对的模具的模具保持体;保持模具保持体的万向架构件， 凸形球面部分，形成有与球形球面相对并接触的凹球面部分的万向节构件，可移动体，其保持万向架构件，并且能够相对于垂直方向在垂直方向前进和后退 台面和姿态调节/保持单元，其调节和保持万向节构件的姿态。

    Method for controlling injection of electric injection molding machine
    3.
    发明授权
    Method for controlling injection of electric injection molding machine 有权
    电动注塑机注塑方法

    公开(公告)号：US07008574B2

    公开(公告)日：2006-03-07

    申请号：US10677249

    申请日：2003-10-03

    申请人： Haruyuki Matsubayashi ,  Yukio Iimura ,  Takashi Yamazaki ,  Akira Kanda ,  Takamitsu Yamashita ,  Yutaka Yamaguchi ,  Masamitsu Suzuki

    发明人： Haruyuki Matsubayashi ,  Yukio Iimura ,  Takashi Yamazaki ,  Akira Kanda ,  Takamitsu Yamashita ,  Yutaka Yamaguchi ,  Masamitsu Suzuki

    IPC分类号： B29C45/77

    CPC分类号： B29C45/77 ,  B29C2945/76006 ,  B29C2945/76083 ,  B29C2945/76498 ,  B29C2945/76605 ,  B29C2945/76665 ,  B29C2945/76785 ,  B29C2945/76859 ,  B29C2945/76936

    摘要： An electric injection molding machine capable of maintaining a quality of molded articles and capable of suppressing a variation of weight of articles molded by a mold having a plurality of cavities when transferring molding conditions in a hydraulic injection molding machine as they are to the electric injection molding machine. This electric injection molding machine has an electric injection mechanism for injecting a molding material into a mold by a drive force of an electric motor, an injection control unit and a servo driver for controlling the injection motor so as to follow the injection speed reference, and an reference compensation unit for compensating the injection speed reference based on the characteristics of the hydraulic drive system so that fluctuation characteristics of the injection speed with respect to the injection pressure when controlling the electric injection mechanism approximate the fluctuation characteristics of the injection speed with respect to the injection pressure in the hydraulic injection mechanism performing the injection of the molding material to the mold by the hydraulic drive system.

    摘要翻译： 一种电动注射成型机，其能够保持成型品的质量，并且能够抑制在液压注射成型机中将成型条件转移至电注射成型时将由具有多个空腔的模具成形的制品的重量变化 机。 该电动注射成型机具有电动注射机构，用于通过电动机的驱动力，注射控制单元和伺服驱动器将成型材料注入到模具中，用于控制注射电动机以遵循注射速度参考，以及 参考补偿单元，用于基于液压驱动系统的特性来补偿喷射速度基准，使得当控制电喷射机构时喷射速度相对于喷射压力的波动特性近似于喷射速度的波动特性 液压喷射机构中的注射压力通过液压驱动系统执行模制材料的注入。

    Imprinting apparatus
    7.
    发明申请
    Imprinting apparatus 有权
    印刷装置

    公开(公告)号：US20060193938A1

    公开(公告)日：2006-08-31

    申请号：US11360505

    申请日：2006-02-24

    申请人： Yukio Iimura ,  Masakazu Kanemoto ,  Mitsunori Kokubo

    发明人： Yukio Iimura ,  Masakazu Kanemoto ,  Mitsunori Kokubo

    IPC分类号： B29C59/00

    CPC分类号： B30B15/007 ,  B30B15/068 ,  B44B5/0019 ,  B44B5/0061 ,  B44B5/022

    摘要： According to an aspect of the present invention, an imprinting apparatus is provided with: a mount to support a subject body; a movable body capable of moving away from and close to the mount; a support swingably attached to the movable body; a template being attached to the support and including an imprinting face, the imprinting face being patterned to make an impression on the subject body; and a regulator intervening between the movable body and the support and including at least three actuators, the actuators being independently controllably driven so as to regulate an orientation of the imprinting face.

    摘要翻译： 根据本发明的一个方面，一种压印设备具有：支架，用于支撑被检体; 能够远离并靠近安装座的可移动体; 可移动地附接到可移动体的支撑件; 模板附接到支撑件并且包括压印面，所述压印面被图案化以对被摄体进行印模; 以及调节器，其介于可移动体和支撑件之间，并且包括至少三个致动器，致动器被独立地可控地驱动以便调节压印面的取向。

    Phase shift photomask, phase shift photomask blank, and process for fabricating them
    8.
    发明授权
    Phase shift photomask, phase shift photomask blank, and process for fabricating them 失效
    相移光掩模，相移光掩模坯料及其制造工艺

    公开(公告)号：US5702847A

    公开(公告)日：1997-12-30

    申请号：US453079

    申请日：1995-05-30

    申请人： Norihiro Tarumoto ,  Hiroyuki Miyashita ,  Yukio Iimura ,  Koichi Mikami

    发明人： Norihiro Tarumoto ,  Hiroyuki Miyashita ,  Yukio Iimura ,  Koichi Mikami

    IPC分类号： G03F1/00 ,  G03F9/00

    CPC分类号： G03F1/26 ,  G03F1/29 ,  G03F1/30 ,  G03F1/32

    摘要： The invention relates to a phase shift photomask in which the peripheral region portion of a phase shift layer is removed by a relatively simple procedure and which has no or little defect and is inexpensive, a blank therefor, and a process for fabricating them. The process includes the steps of forming phase shift layer 23 all over the surface of one side of transparent substrate 21, and immersing only the peripheral region of substrate 21 in etching solution 25 to etch away the peripheral region of phase shift layer 23, whereby phase shift layer 27 is confined within an area smaller than that of substrate 21.

    摘要翻译： 本发明涉及一种相移光掩模，其中通过相对简单的程序除去相移层的外围区域部分，并且没有或很少缺陷，并且便宜，其空白和其制造方法。 该方法包括在透明基板21的整个表面的整个表面上形成相移层23，并且仅将基板21的周边区域浸入蚀刻溶液25中以蚀刻掉相移层23的周边区域，由此相位 位移层27被限制在比衬底21的面积小的区域内。

    Compiling apparatus
    9.
    发明授权
    Compiling apparatus 有权
    编译装置

    公开(公告)号：US08392905B2

    公开(公告)日：2013-03-05

    申请号：US12048401

    申请日：2008-03-14

    申请人： Taketo Heishi ,  Shohei Michimoto ,  Yukio Iimura ,  Yasuhiro Yamamoto

    发明人： Taketo Heishi ,  Shohei Michimoto ,  Yukio Iimura ,  Yasuhiro Yamamoto

    IPC分类号： G06F9/44 ,  G06F9/45

    CPC分类号： G06F8/441

    摘要： The present invention effectively utilizes auxiliary registers and provides a compiler system which secures error detectability when the auxiliary registers are shared for plural uses. The instruction definition resource configuring unit configures, as preparation for processing by the register assigning unit, respective resources such as a register to be defined or referred to by for each instruction in an intermediate code. The instruction definition resource configuring unit detects possibility of instructions each of which is to be decomposed into plural instructions. As for an instruction to be possibly decomposed, the instruction definition resource configuring unit configures a corresponding register in the intermediate code, assuming the corresponding register used for the decomposition to be defined and referred. The register assigning unit uses the register as a general register as far as a live range of the register used for the decomposition does not overlap.

    摘要翻译： 本发明有效地利用了辅助寄存器，并且提供了一种编译器系统，其在辅助寄存器被共享多个用途时确保了错误检测能力。 指令定义资源配置单元配置为由寄存器分配单元进行处理的准备，对于中间代码中的每个指令要定义或引用的寄存器等各自的资源。 指令定义资源配置单元检测将要分解成多个指令的指令的可能性。 对于可能分解的指令，指令定义资源配置单元在中间代码中配置相应的寄存器，假定用于分解的相应寄存器被定义和引用。 寄存器分配单元使用寄存器作为通用寄存器，只要用于分解的寄存器的实际范围不重叠。