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公开(公告)号：US11742172B2
公开(公告)日：2023-08-29
申请号：US17421147
申请日：2019-01-11
Applicant: Hitachi High-Tech Corporation
Inventor： Takashi Dobashi , Hirokazu Tamaki , Hiromi Mise
CPC classification number: H01J37/20 , G01N23/04 , G01N23/06 , G06T7/74 , H01J37/222 , H01J37/26 , G01N2223/04 , G01N2223/10 , G01N2223/3306 , G01N2223/418 , G06T2207/10061 , H01J2237/20207
Abstract: A charged particle beam device includes: a movement mechanism configured to hold and move a sample; a charged particle source configured to emit charged particles with which the sample is irradiated to obtain an image of the sample; and a control unit configured to control the movement mechanism to move the sample and to obtain the image of the sample. The control unit obtains a reference image of the sample in a reference arrangement state by the charged particles, generates a goal image of the sample in a target arrangement state different from the reference arrangement state by calculation from the reference image, moves the sample to each of different arrangement states by the movement mechanism, obtains a candidate image of the sample in each of the different arrangement states by the charged particles, and generates a comparison result between respective candidate images and the goal image.
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公开(公告)号：US12222690B2
公开(公告)日：2025-02-11
申请号：US17370131
申请日：2021-07-08
Applicant: Hitachi High-Tech Corporation
Inventor： Takashi Dobashi , Hiroyuki Kobayashi , Takeshi Ohmori
Abstract: To facilitate evaluation of a predicted process shape in process recipe development using machine learning, a process recipe search apparatus that searches for an etching recipe that is a parameter of a plasma processing apparatus set so as to etch a sample into a desired shape displays, on a display device, the predicted process shape of the sample by a candidate etching recipe predicted by using a machine leaning model, by highlighting a difference between the predicted process shape and a target shape.
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公开(公告)号：US20210005417A1
公开(公告)日：2021-01-07
申请号：US16979952
申请日：2018-03-30
Applicant: Hitachi High-Tech Corporation
Inventor： Yasuhiro Shirasaki , Takashi Dobashi , Momoyo Enyama , Akira Ikegami , Yuta Kawamoto
IPC: H01J37/147 , H01J37/28 , H01J37/244
Abstract: A charged particle beam application apparatus includes a beam separator. The beam separator includes a first magnetic pole, a second magnetic pole facing the first magnetic pole, a first electrode and a second electrode that extend along an optical axis of a primary beam and are arranged in a first direction perpendicular to the optical axis, on a first surface of the first magnetic pole which faces the second magnetic pole, and a third electrode and a fourth electrode that extend along the optical axis and face the first electrode and the second electrode, respectively, on a second surface of the second magnetic pole which faces the first magnetic pole.
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公开(公告)号：US20220059313A1
公开(公告)日：2022-02-24
申请号：US17421147
申请日：2019-01-11
Applicant: Hitachi High-Tech Corporation
Inventor： Takashi Dobashi , Hirokazu Tamaki , Hiromi Mise
Abstract: A charged particle beam device includes: a movement mechanism configured to hold and move a sample; a charged particle source configured to emit charged particles with which the sample is irradiated to obtain an image of the sample; and a control unit configured to control the movement mechanism to move the sample and to obtain the image of the sample. The control unit obtains a reference image of the sample in a reference arrangement state by the charged particles, generates a goal image of the sample in a target arrangement state different from the reference arrangement state by calculation from the reference image, moves the sample to each of different arrangement states by the movement mechanism, obtains a candidate image of the sample in each of the different arrangement states by the charged particles, and generates a comparison result between respective candidate images and the goal image.
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Patent Agency Ranking
公开(公告)号：US20250005701A1
公开(公告)日：2025-01-02
申请号：US18215350
申请日：2023-06-28
Applicant: HITACHI HIGH-TECH CORPORATION
Inventor： Isaac O'Bryant , Kohei Matsuda , Takashi Dobashi , Jake D. O'Gorman , Stephen Black
IPC: G06F16/532 , G06F16/583 , G06T7/60
Abstract: To provide a technique for evaluating a shape that appears in a cross-sectional image, one of the typical evaluation methods of the present invention evaluates a difference between a target shape and a cross-sectional shape of an electron microscopic image, and includes: a first step of measuring a characteristic dimension of the cross-sectional shape; after the first step, a second step of creating a template of the target shape in the cross-sectional shape obtained from the dimension; and a third step of comparing a difference between the template and the cross-sectional shape using a normalized metric.
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6.发明授权公开(公告)号：US11791131B2
公开(公告)日：2023-10-17
申请号：US17608651
申请日：2019-05-23
Applicant: Hitachi High-Tech Corporation
Inventor： Takashi Dobashi , Hirokazu Tamaki , Hiromi Mise , Shuntaro Ito
CPC classification number: H01J37/02 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/265 , H01J2237/2802 , H01J2237/2817
Abstract: A charged particle beam apparatus includes a movement mechanism, a particle source, an optical element, a detector, and a control mechanism configured to control, based on an observation condition, the movement mechanism, the particle source, the optical element, and the detector. The control mechanism is configured to acquire a diffraction pattern image including a plurality of Kikuchi lines as a comparison image after inclining the movement mechanism by a first angle, evaluate an error between an inclination angle of the sample and a target inclination angle using a reference image of a reference diffraction pattern and the comparison image, and control inclination of the movement mechanism based on an evaluation result.
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7.发明授权公开(公告)号：US11756764B2
公开(公告)日：2023-09-12
申请号：US17603440
申请日：2019-04-23
Applicant: HITACHI HIGH-TECH CORPORATION
Inventor： Takashi Dobashi , Hirokazu Tamaki , Kuniyasu Nakamura , Hiromi Mise
IPC: H01J37/28 , H01J37/20 , H01J37/244 , H01J37/26
CPC classification number: H01J37/28 , H01J37/20 , H01J37/244 , H01J37/265 , H01J2237/2802
Abstract: A charged particle beam apparatus includes: a movement mechanism; a particle source; an optical element; a detector; and a control mechanism, in which the control mechanism acquires a diffraction pattern including a plurality of Kikuchi lines, calculates a crystal zone axis of the sample by performing analysis based on a plurality of intersections at which two Kikuchi lines included in the diffraction pattern intersect with each other, calculates an inclination angle of the sample based on the crystal zone axis and an irradiation direction of the charged particle beam, and controls the moving mechanism based on the inclination angle.
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公开(公告)号：US20230012173A1
公开(公告)日：2023-01-12
申请号：US17370131
申请日：2021-07-08
Applicant: Hitachi High-Tech Corporation
Inventor： Takashi Dobashi , Hiroyuki Kobayashi , Takeshi Ohmori
Abstract: To facilitate evaluation of a predicted process shape in process recipe development using machine learning, a process recipe search apparatus that searches for an etching recipe that is a parameter of a plasma processing apparatus set so as to etch a sample into a desired shape displays, on a display device, the predicted process shape of the sample by a candidate etching recipe predicted by using a machine leaning model, by highlighting a difference between the predicted process shape and a target shape.
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公开(公告)号：US11177108B2
公开(公告)日：2021-11-16
申请号：US16979952
申请日：2018-03-30
Applicant: Hitachi High-Tech Corporation
Inventor： Yasuhiro Shirasaki , Takashi Dobashi , Momoyo Enyama , Akira Ikegami , Yuta Kawamoto
IPC: H01J37/147 , H01J37/244 , H01J37/28
Abstract: A charged particle beam application apparatus includes a beam separator. The beam separator includes a first magnetic pole, a second magnetic pole facing the first magnetic pole, a first electrode and a second electrode that extend along an optical axis of a primary beam and are arranged in a first direction perpendicular to the optical axis, on a first surface of the first magnetic pole which faces the second magnetic pole, and a third electrode and a fourth electrode that extend along the optical axis and face the first electrode and the second electrode, respectively, on a second surface of the second magnetic pole which faces the first magnetic pole.
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