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    OVERLAY ERROR MEASURING DEVICE AND COMPUTER PROGRAM FOR CAUSING COMPUTER TO MEASURE PATTERN
    1.
    发明申请
    OVERLAY ERROR MEASURING DEVICE AND COMPUTER PROGRAM FOR CAUSING COMPUTER TO MEASURE PATTERN 审中-公开
    覆盖误差测量装置和计算机程序用于引导计算机测量图案

    公开(公告)号：US20150285627A1

    公开(公告)日：2015-10-08

    申请号：US14413198

    申请日：2013-06-05

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Satoru Yamaguchi ,  Kei Sakai ,  Osamu Inoue ,  Kazuyuki Hirao ,  Osamu Komuro

    IPC: G01B15/00 ,  H01L21/66 ,  G03F7/20 ,  H01J37/26

    CPC classification number: G01B15/00 ,  G03F7/70633 ,  H01J37/26 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2817 ,  H01L22/12

    Abstract: The purpose of the present invention is to provide an overlay error measuring device which measures an overlay error with high accuracy even when a lower layer pattern is disposed under a thin film and a sufficient signal amount cannot be ensured. The present invention proposes an overlay error measuring device provided with an arithmetic processing unit for measuring a pattern formed on a sample on the basis of a signal waveform obtained by a charged particle beam device. The arithmetic processing unit finds a correlation with the signal waveform using a partial waveform obtained on the basis of partial extraction of the signal waveform, forms a correlation profile indicating the correlation, and measures an overlay error using the correlation profile.

    Abstract translation: 本发明的目的是提供一种覆盖误差测量装置，即使在薄膜下方设置较低层图案并且不能确保足够的信号量时，也可以高精度地测量重叠误差。 本发明提出了一种重叠误差测量装置，其具有运算处理单元，用于基于由带电粒子束装置获得的信号波形来测量形成在样本上的图案。 算术处理单元使用基于信号波形的部分提取获得的部分波形来发现与信号波形的相关性，形成指示相关性的相关分布，并使用相关分布来测量重叠误差。

    Image processing apparatus, distortion-corrected map creation apparatus, and semiconductor measurement apparatus
    2.
    发明授权
    Image processing apparatus, distortion-corrected map creation apparatus, and semiconductor measurement apparatus 有权
    图像处理装置，失真校正图生成装置和半导体测量装置

    公开(公告)号：US09514528B2

    公开(公告)日：2016-12-06

    申请号：US14370360

    申请日：2012-10-03

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Junichi Taguchi ,  Mitsuji Ikeda ,  Yuichi Abe ,  Osamu Inoue ,  Takahiro Kawasaki

    IPC: G06T5/00 ,  G06T5/20 ,  G06T7/00 ,  H04N1/387 ,  G06T3/40 ,  G01R31/311

    CPC classification number: G06T7/0004 ,  G01R31/311 ,  G06T3/4007 ,  G06T5/006 ,  G06T5/20 ,  G06T2207/20056 ,  G06T2207/20182 ,  G06T2207/30148 ,  H04N1/387 ,  H04N1/3878

    Abstract: Image processing apparatus includes: interpolation process image acquisition means for acquiring an interpolation process image of prescribed size which includes an interpolation point of an inputted image; Fourier transform means for subjecting the interpolation process image which is acquired with the interpolation process image acquisition means to Fourier transform; phase change means for changing, a phase of each value of the transformed interpolation process image which has been subjected to Fourier transform by the Fourier transform means, such that the interpolation point migrates to a desired nearby integer coordinate position; inverse Fourier transform means for subjecting the interpolation process image whose phase has been changed by the phase change means, to inverse Fourier transform; interpolation value determination means for adopting an interpolation point, a value of a pixel at the integer coordinate position, from the transformed interpolation process image subjected to inverse Fourier transform by the inverse Fourier transform means.

    Abstract translation: 图像处理装置包括：内插处理图像获取装置，用于获取包括输入图像的内插点的规定大小的内插处理图像; 傅立叶变换装置，用于对由内插处理图像获取装置获取的内插处理图像进行傅里叶变换; 相位改变装置，用于改变由傅立叶变换装置进行傅里叶变换的变换后的内插处理图像的每个值的相位，使得插值点迁移到期望的邻近整数坐标位置; 逆傅里叶变换装置，用于对由相变装置改变的相位的内插处理图像进行逆傅里叶变换; 内插值确定装置，用于通过傅里叶逆变换装置进行逆傅里叶变换的变换后的内插处理图像，采用内插点，即整数坐标位置处的像素值。

    CHARGED PARTICLE BEAM DEVICE AND INSPECTION DEVICE
    4.
    发明申请
    CHARGED PARTICLE BEAM DEVICE AND INSPECTION DEVICE 有权
    充电颗粒光束装置和检测装置

    公开(公告)号：US20170040230A1

    公开(公告)日：2017-02-09

    申请号：US15303813

    申请日：2015-03-31

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Atsuko Yamaguchi ,  Osamu Inoue ,  Hiroki Kawada

    IPC: H01L21/66 ,  H01J37/285 ,  H01J37/244 ,  H01L21/033

    CPC classification number: H01L22/12 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2809 ,  H01J2237/2814 ,  H01J2237/2817 ,  H01L21/0332 ,  H01L21/0335 ,  H01L21/0337 ,  H01L21/0338 ,  H01L22/00

    Abstract: Provided is a charged particle beam device which can specify a position of an initial core with high accuracy even when fine line and space patterns are formed by an SADP in plural times. The charged particle beam device includes a detector (810) which detects secondary charged particles discharged from a sample (807) when a charged particle beam is emitted to the sample having a plurality of patterns of line shape, a display unit (817) which displays image data of a surface of the sample on the basis of a signal of the secondary charged particles, a calculation unit (812) which calculates an LER value with respect to the plurality of the patterns of line shape from the image data, and a determination unit (816) which compares the values to determine a position of the initial core.

    Abstract translation: 提供一种带电粒子束装置，即使在多次由SADP形成细线和空间图案时，也能够高精度地指定初始芯的位置。 带电粒子束装置包括：检测器（810），当检测器（810）将带电粒子束发射到具有多个线状图案的样品时，检测从样品（807）排出的二次带电粒子;显示单元（817），其显示 基于所述二次带电粒子的信号的所述样本的表面的图像数据，计算单元（812），其根据所述图像数据计算相对于所述多个线状图案的LER值，以及判定 单元（816），其比较该值以确定初始核心的位置。

    IMAGE PROCESSING APPARATUS, DISTORTION-CORRECTED MAP CREATION APPARATUS, AND SEMICONDUCTOR MEASUREMENT APPARATUS
    7.
    发明申请
    IMAGE PROCESSING APPARATUS, DISTORTION-CORRECTED MAP CREATION APPARATUS, AND SEMICONDUCTOR MEASUREMENT APPARATUS 有权
    图像处理装置，失真校正地图创建装置和半导体测量装置

    公开(公告)号：US20140341461A1

    公开(公告)日：2014-11-20

    申请号：US14370360

    申请日：2012-10-03

    Applicant: Hitachi, High-Technologies Corporation

    Inventor： Junichi Taguchi ,  Mitsuji Ikeda ,  Yuichi Abe ,  Osamu Inoue ,  Takahiro Kawasaki

    IPC: G06T7/00 ,  G06T5/20 ,  G01R31/311 ,  G06T5/00

    CPC classification number: G06T7/0004 ,  G01R31/311 ,  G06T3/4007 ,  G06T5/006 ,  G06T5/20 ,  G06T2207/20056 ,  G06T2207/20182 ,  G06T2207/30148 ,  H04N1/387 ,  H04N1/3878

    Abstract: Image processing apparatus includes: interpolation process image acquisition means for acquiring an interpolation process image of prescribed size which includes an interpolation point of an inputted image; Fourier transform means for subjecting the interpolation process image which is acquired with the interpolation process image acquisition means to Fourier transform; phase change means for changing, a phase of each value of the transformed interpolation process image which has been subjected to Fourier transform by the Fourier transform means, such that the interpolation point migrates to a desired nearby integer coordinate position; inverse Fourier transform means for subjecting the interpolation process image whose phase has been changed by the phase change means, to inverse Fourier transform; interpolation value determination means for adopting an interpolation point, a value of a pixel at the integer coordinate position, from the transformed interpolation process image subjected to inverse Fourier transform by the inverse Fourier transform means.

    Abstract translation: 图像处理装置包括：内插处理图像获取装置，用于获取包括输入图像的内插点的规定大小的内插处理图像; 傅立叶变换装置，用于对由内插处理图像获取装置获取的内插处理图像进行傅里叶变换; 相位改变装置，用于改变由傅立叶变换装置进行傅里叶变换的变换后的内插处理图像的每个值的相位，使得插值点迁移到期望的邻近整数坐标位置; 逆傅里叶变换装置，用于对由相变装置改变的相位的内插处理图像进行逆傅里叶变换; 内插值确定装置，用于通过傅里叶逆变换装置进行逆傅里叶变换的变换后的内插处理图像，采用内插点，即整数坐标位置处的像素值。

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