Abstract:
The monitoring apparatus for uniformity and residual thickness of nano-transfer printing process is installed at a specific location in the surrounding of a transfer printing unit, and, during any stage of the transfer printing process, performs monitoring or measuring the forming rate and forming profile of the forming material inside the transfer printing unit. The monitoring apparatus includes a detection unit, a measuring unit and an analysis unit. The detection unit emits a detection ray to the transfer printing unit. The measuring unit receives a reaction signal of the detection ray passing through the transfer printing unit. The analysis unit analyzes the reaction signal to determine transfer uniformity and the material residual thickness in the transfer print unit.
Abstract:
The monitoring apparatus for nano-transfer printing process is installed at a specific location in the surrounding of a transfer printing unit, and, during any stage of the transfer printing process, performs monitoring or measuring the filling height, filling rate and filling profile of the forming material inside the transfer printing unit. The monitoring apparatus includes a detection unit, a measuring unit and an analysis unit. The detection unit emits a detection ray to the transfer printing unit. The measuring unit receives a reaction signal of the detection ray passing through the transfer printing unit. The analysis unit analyzes the reaction signal to determine the filling height, the filling rate and filling profile of the forming material inside the transfer printing unit.
Abstract:
The present invention relates to a capacitive measurement method and system for a nanoimprint process, which arranges a plurality of electrode plates on both the backside of the master mold and the surface of the supporting base carrying the wafer substrate to form a plurality of capacitive structures. By monitoring the capacitance variation signal caused by the continuous variations in the thickness and the material properties of the resist during the imprint process, the status of the resist can be monitored and recorded, which is used as the references for determining the timing to demold in the nanoimprint process and for maintaining the flatness of the resist. Accordingly, the nanoimprint process can be automated easier and the quality and the throughput of of the nanometer scaled imprint product can be improved.
Abstract:
A detecting platform for holding a tiny insect includes a main body forming a containing space, which passes through the main body and is surrounded by side walls of the main body. A first side wall and a second side wall of the side walls are opposite to each other, and the area of the second side wall is smaller than that of the first side wall. The main body forms a first opening and a second opening passing through the first side wall and the second side wall respectively for the tiny insects entering and leaving the containing space. A bottom plate covers a first through surface of the containing space to form a bottom surface and a detecting area is configured thereon to holding the tiny insects. Accordingly, the tiny insects can stay on the detecting area so as to detect the characteristics of the tiny insects expediently.
Abstract:
An image method for classifying insects includes the following steps: obtaining detecting images of the insects in a detecting area; obtaining a first foreground image related to the insects by background subtraction; extracting the saturation from the first foreground image and eliminating the non-characteristic objects therein to obtain a second foreground image; extracting the characteristics related to the insects from the second foreground image according to a threshold; and, determining the classifications or the sexes of the insects according to the characteristics. Accordingly, the image method for classifying insects can be used for automatically classifying the insects so as to save the manpower and time.
Abstract:
A method for detecting the endpoint of a chemical mechanical polishing (CMP) process uses the slope variation of temperature difference of polishing pad. The method combines temperature measurement at polishing pad and atmosphere, and numerical analysis to figure out the curve of temperature difference variation versus polishing time. The endpoint of CMP is determined by the change of the slope of the curve. The method allows endpoint to be detected in-situ at the polishing apparatus, without stopping polishing process.
Abstract:
An image method for classifying insects includes the following steps: obtaining detecting images of the insects in a detecting area; obtaining a first foreground image related to the insects by background subtraction; extracting the saturation from the first foreground image and eliminating the non-characteristic objects therein to obtain a second foreground image; extracting the characteristics related to the insects from the second foreground image according to a threshold; and, determining the classifications or the sexes of the insects according to the characteristics. Accordingly, the image method for classifying insects can be used for automatically classifying the insects so as to save the manpower and time.
Abstract:
A detecting platform for holding a tiny insect includes a main body forming a containing space, which passes through the main body and is surrounded by side walls of the main body. A first side wall and a second side wall of the side walls are opposite to each other, and the area of the second side wall is smaller than that of the first side wall. The main body forms a first opening and a second opening passing through the first side wall and the second side wall respectively for the tiny insects entering and leaving the containing space. A bottom plate covers a first through surface of the containing space to form a bottom surface and a detecting area is configured thereon to holding the tiny insects. Accordingly, the tiny insects can stay on the detecting area so as to detect the characteristics of the tiny insects expediently.
Abstract:
A system for nano-imprint with mold deformation detector is disclosed for real-time monitoring of the deformation of the mold. An electrostatic plate capacitor is embedded in the mold, serving as the deformation detector. The capacitor includes two opposite metal film electrodes formed by silicon micromachining technique on opposite surfaces of the mold and connected by a metal lead. During imprinting, the mold is acted upon by an external force and deformation occurs, which induces change of distance between the metal film electrodes and thus variation of the capacitance of the capacitor. The amount of deformation of the mold can then be assessed by comparing the capacitance with a reference. Thus, real-time detection and monitoring of the deformation of the nano-imprint mold is realized. Also disclosed is a method for carrying out the real-time monitoring of the deformation of the mold.
Abstract:
The present invention provides a drilling apparatus and a method thereof capable of providing an adjustable active backup force to a composite workpiece to effectively reduce the delamination of the workpiece during drilling such that the application of the active backup force in terms of its force magnitude and its application location on the workpiece can adjustably counter the drill thrust force to retard the onset of delamination growth and reduce delamination damage at the drill exit in the workpiece, in particular in situation where large feed rate with short cycle time is desired for drilling of composite materials. A critical drill thrust force of the drilling apparatus and the method of the present invention is advantageously obtained in relation to said active backup force and the application of the active backup force to reduce the crack propagation of the delamination occurred in the composite workpiece.