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    Thin-film transistor substrate and method of manufacturing the same
    1.
    发明授权
    Thin-film transistor substrate and method of manufacturing the same 失效
    薄膜晶体管基板及其制造方法

    公开(公告)号：US08450850B2

    公开(公告)日：2013-05-28

    申请号：US13193413

    申请日：2011-07-28

    申请人： Hong Long Ning ,  Chang-Oh Jeong ,  Ji-Young Park ,  Sang-Gab Kim ,  Sung-Haeng Cho ,  Yeon-Hong Kim ,  Jin-Su Byun

    发明人： Hong Long Ning ,  Chang-Oh Jeong ,  Ji-Young Park ,  Sang-Gab Kim ,  Sung-Haeng Cho ,  Yeon-Hong Kim ,  Jin-Su Byun

    IPC分类号： H01L23/52

    CPC分类号： H01L29/458 ,  B82Y10/00 ,  B82Y30/00 ,  H01L21/76877 ,  H01L27/124 ,  H01L29/41733 ,  H01L29/78684 ,  H01L51/0048 ,  H01L2221/1094

    摘要： Provided are a thin-film transistor (TFT) substrate and a method of manufacturing the same. The method includes: forming a passivation film by forming an insulating film on a substrate; forming a photoresist pattern by forming a photoresist film on the passivation film, exposing the photoresist film to light, and developing the photoresist film; performing a first dry-etching by dry-etching the passivation film using the photoresist pattern as an etch mask; performing a baking to reduce a size of the photoresist pattern; performing a second dry-etching to form a contact hole by dry-etching the passivation film again using the photoresist pattern as a mask; removing the photoresist pattern; and forming a pixel electrode of a carbon composition that includes carbon nanotubes and/or graphene on a top surface of the passivation film.

    摘要翻译： 提供一种薄膜晶体管（TFT）基板及其制造方法。 该方法包括：通过在基板上形成绝缘膜来形成钝化膜; 通过在钝化膜上形成光致抗蚀剂膜形成光致抗蚀剂图案，将光致抗蚀剂膜曝光并使光致抗蚀剂膜显影; 通过使用光致抗蚀剂图案作为蚀刻掩模来干蚀刻钝化膜来执行第一干蚀刻; 进行烘烤以减小光致抗蚀剂图案的尺寸; 通过使用光致抗蚀剂图案作为掩模再次干蚀刻钝化膜来进行第二次干蚀刻以形成接触孔; 去除光致抗蚀剂图案; 以及在钝化膜的顶表面上形成包括碳纳米管和/或石墨烯的碳组合物的像素电极。

    THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
    2.
    发明申请
    THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME 失效
    薄膜晶体管基板及其制造方法

    公开(公告)号：US20120112346A1

    公开(公告)日：2012-05-10

    申请号：US13193413

    申请日：2011-07-28

    申请人： Hong Long NING ,  Chang-Oh Jeong ,  Ji-Young Park ,  Sang-Gab Kim ,  Sung-Haeng Cho ,  Yeon-Hong Kim ,  Jin-Su Byun

    发明人： Hong Long NING ,  Chang-Oh Jeong ,  Ji-Young Park ,  Sang-Gab Kim ,  Sung-Haeng Cho ,  Yeon-Hong Kim ,  Jin-Su Byun

    IPC分类号： H01L23/532 ,  B82Y40/00 ,  B82Y20/00 ,  H01L21/768

    CPC分类号： H01L29/458 ,  B82Y10/00 ,  B82Y30/00 ,  H01L21/76877 ,  H01L27/124 ,  H01L29/41733 ,  H01L29/78684 ,  H01L51/0048 ,  H01L2221/1094

    摘要： Provided are a thin-film transistor (TFT) substrate and a method of manufacturing the same. The method includes: forming a passivation film by forming an insulating film on a substrate; forming a photoresist pattern by forming a photoresist film on the passivation film, exposing the photoresist film to light, and developing the photoresist film; performing a first dry-etching by dry-etching the passivation film using the photoresist pattern as an etch mask; performing a baking to reduce a size of the photoresist pattern; performing a second dry-etching to form a contact hole by dry-etching the passivation film again using the photoresist pattern as a mask; removing the photoresist pattern; and forming a pixel electrode of a carbon composition that includes carbon nanotubes and/or graphene on a top surface of the passivation film.

    摘要翻译： 提供一种薄膜晶体管（TFT）基板及其制造方法。 该方法包括：通过在基板上形成绝缘膜来形成钝化膜; 通过在钝化膜上形成光致抗蚀剂膜形成光致抗蚀剂图案，将光致抗蚀剂膜曝光并使光致抗蚀剂膜显影; 通过使用光致抗蚀剂图案作为蚀刻掩模来干蚀刻钝化膜来执行第一干蚀刻; 进行烘烤以减小光致抗蚀剂图案的尺寸; 通过使用光致抗蚀剂图案作为掩模再次干蚀刻钝化膜来进行第二次干蚀刻以形成接触孔; 去除光致抗蚀剂图案; 以及在钝化膜的顶表面上形成包括碳纳米管和/或石墨烯的碳组合物的像素电极。

    Thin film transistor array panel and manufacturing method thereof
    8.
    发明授权
    Thin film transistor array panel and manufacturing method thereof 有权
    薄膜晶体管阵列面板及其制造方法

    公开(公告)号：US07172913B2

    公开(公告)日：2007-02-06

    申请号：US11082967

    申请日：2005-03-18

    申请人： Woo-Geun Lee ,  Beom-Seok Cho ,  Je-Hun Lee ,  Chang-Oh Jeong ,  Sang-Gab Kim ,  Min-Seok Oh ,  Young-Wook Lee ,  Hee-Hwan Choe

    发明人： Woo-Geun Lee ,  Beom-Seok Cho ,  Je-Hun Lee ,  Chang-Oh Jeong ,  Sang-Gab Kim ,  Min-Seok Oh ,  Young-Wook Lee ,  Hee-Hwan Choe

    IPC分类号： H01L21/00

    CPC分类号： H01L27/1288 ,  G02F2001/136236 ,  H01L21/31144 ,  H01L21/32139 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/41733

    摘要： A method of manufacturing a thin film transistor array panel including forming a gate line on a substrate, forming a gate insulating layer on the gate line, forming a semiconductor layer on the gate insulating layer, forming a data line and a drain electrode on the semiconductor layer, depositing a passivation layer on the data line and the drain electrode, forming a photoresist including a first portion and a second portion, which is thinner than the first portion, on the passivation layer, etching the passivation layer using the photoresist as a mask to expose a portion of the drain electrode, removing the second portion of the photoresist, depositing a conductive film, and removing the first portion of the photoresist to form a pixel electrode on the exposed portion of the drain electrode.

    摘要翻译： 一种制造薄膜晶体管阵列面板的方法，包括在衬底上形成栅极线，在栅极线上形成栅极绝缘层，在栅极绝缘层上形成半导体层，在半导体上形成数据线和漏电极 在所述数据线和所述漏电极上沉积钝化层，在所述钝化层上形成包含比所述第一部分薄的第一部分和第二部分的光致抗蚀剂，使用所述光致抗蚀剂作为掩模蚀刻所述钝化层 露出漏极的一部分，去除光致抗蚀剂的第二部分，沉积导电膜，以及去除光致抗蚀剂的第一部分，以在漏电极的暴露部分上形成像素电极。

    DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
    9.
    发明申请
    DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME 审中-公开
    显示基板及其制造方法

    公开(公告)号：US20070164330A1

    公开(公告)日：2007-07-19

    申请号：US11566886

    申请日：2006-12-05

    申请人： Chang-Oh Jeong ,  Hong-Sick Park ,  Shi-Yul Kim ,  Sang-Gab Kim

    发明人： Chang-Oh Jeong ,  Hong-Sick Park ,  Shi-Yul Kim ,  Sang-Gab Kim

    IPC分类号： H01L31/113

    CPC分类号： G02F1/136286 ,  G02F2001/133397 ,  G02F2001/13629 ,  G02F2201/501 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/42384

    摘要： A display substrate includes a base substrate, a first metal pattern, a gate insulating layer, a second metal pattern, a channel layer and a pixel electrode. The first metal pattern is formed on the base substrate, and includes a gate line and a gate electrode of a switching element. The gate insulating layer is formed on the base substrate including the first metal pattern. The second metal pattern is formed on the gate insulating layer, and includes a source electrode, a drain electrode and a source line. The channel layer is formed under the second metal pattern, and is patterned to have substantially the same side surface as a side surface of the second metal pattern. The pixel electrode is electrically connected to the drain electrode. Therefore, an afterimage on a display panel, thus improving display quality.

    摘要翻译： 显示基板包括基底基板，第一金属图案，栅极绝缘层，第二金属图案，沟道层和像素电极。 第一金属图案形成在基底基板上，并且包括开关元件的栅极线和栅电极。 栅极绝缘层形成在包括第一金属图案的基底基板上。 第二金属图案形成在栅极绝缘层上，并且包括源电极，漏电极和源极线。 沟道层形成在第二金属图案之下，并且被图案化以具有与第二金属图案的侧表面基本相同的侧表面。 像素电极电连接到漏电极。 因此，在显示面板上留下余像，从而提高显示质量。

    Method of forming a metal pattern and method of manufacturing a display substrate including the metal pattern
    10.
    发明授权
    Method of forming a metal pattern and method of manufacturing a display substrate including the metal pattern 有权
    形成金属图案的方法和制造包括金属图案的显示基板的方法

    公开(公告)号：US08765614B2

    公开(公告)日：2014-07-01

    申请号：US13406388

    申请日：2012-02-27

    申请人： Jong-Hyun Choung ,  Ji-Young Park ,  Seon-Il Kim ,  Sang-Gab Kim ,  In-Bae Kim ,  Jae-Woo Jeong

    发明人： Jong-Hyun Choung ,  Ji-Young Park ,  Seon-Il Kim ,  Sang-Gab Kim ,  In-Bae Kim ,  Jae-Woo Jeong

    IPC分类号： H01L21/302

    CPC分类号： C23F1/18 ,  H01L21/32134 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/458 ,  H01L29/66765

    摘要： A method of forming a metal pattern on a display substrate includes blanket depositing a copper-based layer having a thickness between about 1,500 Å and about 5,500 Å on a base substrate, and forming a patterned photoresist layer on the copper-based layer. The copper-based layer is over-etched by an etching composition containing an oxidizing moderating agent where the over-etch factor is between about 40% and about 200% while using the patterned photoresist layer as an etch stopping layer, and where the etching composition includes ammonium persulfate between about 0.1% by weight and about 50% by weight, includes an azole-based compound between about 0.01% by weight and about 5% by weight and a remainder of water. Thus, reliability of the metal pattern and that of manufacturing a display substrate may be improved.

    摘要翻译： 在显示基板上形成金属图案的方法包括：在基底基板上铺设厚度在约至约为500埃之间的铜基层，并在铜基层上形成图案化的光致抗蚀剂层。 通过含有氧化调节剂的蚀刻组合物对铜基层进行过蚀刻，其中过蚀刻因子在约40％至约200％之间，同时使用图案化的光致抗蚀剂层作为蚀刻停止层，并且其中蚀刻组合物 包括约0.1重量％至约50重量％的过硫酸铵，包括约0.01重量％至约5重量％的唑类化合物和剩余的水。 因此，可以提高金属图案的可靠性和制造显示基板的可靠性。