Process to improve image sensor sensitivity
    1.
    发明申请
    Process to improve image sensor sensitivity 审中-公开
    提高图像传感器灵敏度的过程

    公开(公告)号:US20050001281A1

    公开(公告)日:2005-01-06

    申请号:US10858443

    申请日:2004-06-01

    摘要: A packaged image sensing device of improved sensitivity is formed by providing a mechanism for enhancing the focusing of embedded microlenses on the photosensitive elements of the image sensor. Normally, the bonding material interposed between the packaging layers and the microlenses defocuses the microlenses. In one embodiment of the present invention, the focus is restored by interposing an intermediate optically refractive layer between the bonding material and the lenses. In another embodiment, a bonding material with a lower index of refraction is used. In a final embodiment, the microlenses are formed in a material of a higher index of refraction.

    摘要翻译: 通过提供用于增强嵌入式微透镜在图像传感器的感光元件上的聚焦的机构来形成具有改进的灵敏度的封装图像感测装置。 通常,插入在包装层和微透镜之间的接合材料使微透镜散焦。 在本发明的一个实施例中,通过在接合材料和透镜之间插入中间光学折射层来恢复焦点。 在另一个实施例中,使用具有较低折射率的接合材料。 在最终实施例中,微透镜形成为具有较高折射率的材料。

    Image sensor with improved uniformity of effective incident light
    3.
    发明授权
    Image sensor with improved uniformity of effective incident light 有权
    具有改善有效入射光均匀性的图像传感器

    公开(公告)号:US07126099B2

    公开(公告)日:2006-10-24

    申请号:US10649436

    申请日:2003-08-26

    摘要: An image sensor improving the uniformity of effective incident light. In one example, the size of microlenses disposed in different regions of the image sensor is changed to balance the brightness in different regions, in which the size of each microlens is a function of the distance between the microlens to the chip center In another example, the distance between the center of the microlens and the center of the corresponding sensing area is changed to balance the brightness in different regions and the corresponding color filters are shifted such that the microlens is overlying a corresponding color filter unit without overlying adjacent regions thereof, in which the distance between the center of the microlens and the center of the corresponding sensing area is a function of the distance between the corresponding sensing area to the chip center.

    摘要翻译: 一种改善有效入射光均匀性的图像传感器。 在一个示例中,设置在图像传感器的不同区域中的微透镜的尺寸被改变以平衡不同区域中的亮度,其中每个微透镜的尺寸是微透镜与芯片中心之间的距离的函数。在另一示例中, 改变微透镜的中心与相应感测区域的中心之间的距离,以平衡不同区域中的亮度,并且相应的滤色器被移位,使得微透镜覆盖相应的滤色器单元而不覆盖其相邻区域, 其中微透镜的中心与相应感测区域的中心之间的距离是与芯片中心的相应感测区域之间的距离的函数。

    Image sensor with improved uniformity of effective incident light
    4.
    发明申请
    Image sensor with improved uniformity of effective incident light 有权
    具有改善有效入射光均匀性的图像传感器

    公开(公告)号:US20050045803A1

    公开(公告)日:2005-03-03

    申请号:US10649436

    申请日:2003-08-26

    摘要: An image sensor improving the uniformity of effective incident light. In one example, the size of microlenses disposed in different regions of the image sensor is changed to balance the brightness in different regions, in which the size of each microlens is a function of the distance between the microlens to the chip center In another example, the distance between the center of the microlens and the center of the corresponding sensing area is changed to balance the brightness in different regions and the corresponding color filters are shifted such that the microlens is overlying a corresponding color filter unit without overlying adjacent regions thereof, in which the distance between the center of the microlens and the center of the corresponding sensing area is a function of the distance between the corresponding sensing area to the chip center.

    摘要翻译: 一种改善有效入射光均匀性的图像传感器。 在一个示例中,设置在图像传感器的不同区域中的微透镜的尺寸被改变以平衡不同区域中的亮度,其中每个微透镜的尺寸是微透镜与芯片中心之间的距离的函数。在另一示例中, 改变微透镜的中心与相应感测区域的中心之间的距离,以平衡不同区域中的亮度,并且相应的滤色器被移位,使得微透镜覆盖相应的滤色器单元而不覆盖其相邻区域, 其中微透镜的中心与相应感测区域的中心之间的距离是与芯片中心的相应感测区域之间的距离的函数。

    CMOS image sensor
    7.
    发明申请
    CMOS image sensor 有权
    CMOS图像传感器

    公开(公告)号:US20070087467A1

    公开(公告)日:2007-04-19

    申请号:US11253956

    申请日:2005-10-19

    IPC分类号: H01L21/00 H01L23/02

    摘要: A method for forming an image sensor device. An alignment mark is formed on or in a substrate with distance from the alignment mark to the substrate edge less than about 3 mm. An array of active photosensing pixels is formed on the substrate. At least one dielectric layer is formed covering the substrate and the array. A color filter photoresist is formed on the least one dielectric layer. Subsequent to removal of the color filter photoresist from the alignment mark, the color filter photoresist is exposed with alignment to the alignment mark.

    摘要翻译: 一种用于形成图像传感器装置的方法。 在距离对准标记至基板边缘的距离小于约3mm的基板上或基板上形成对准标记。 在衬底上形成有活性感光像素阵列。 形成覆盖基板和阵列的至少一个电介质层。 在至少一个电介质层上形成滤色器光致抗蚀剂。 在从对准标记移除滤色器光致抗蚀剂之后,将滤色器光致抗蚀剂与对准标记对齐地曝光。