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    Method to Pattern Substrates
    1.
    发明申请
    Method to Pattern Substrates 有权
    图案基板的方法

    公开(公告)号：US20150155179A1

    公开(公告)日：2015-06-04

    申请号：US14560202

    申请日：2014-12-04

    Applicant: IMEC VZW

    Inventor： Karolien Jans ,  Alexandra Dusa ,  Tim Stakenborg

    IPC: H01L21/308 ,  H01L29/06

    CPC classification number: H01L21/3085 ,  B81B2207/056 ,  B81C1/00206 ,  B82Y40/00 ,  G01N33/487 ,  H01L21/3086 ,  H01L21/32 ,  H01L21/32051 ,  H01L29/06

    Abstract: A method for creating a pattern on a substrate (101) is presented, the method comprises: providing a substrate (101) comprising silicon; creating a sacrificial layer (102) on the substrate (101), wherein the sacrificial layer is formed on a first surface area (101a) of the substrate thereby leaving a second surface area (101b) exposed; depositing a first functional layer (103) at least on the second surface area (101b) of the substrate (101); removing the sacrificial layer (102); wherein: removing the sacrificial layer (102) is performed by etching the sacrificial layer (102) with an acidic aqueous solution that does not adversely affect the first functional layer (103) and the substrate (101).

    Abstract translation: 提出了一种用于在衬底（101）上形成图案的方法，所述方法包括：提供包括硅的衬底（101）; 在所述基板（101）上形成牺牲层（102），其中所述牺牲层形成在所述基板的第一表面区域（101a）上，从而使第二表面区域（101b）露出; 至少在基板（101）的第二表面区域（101b）上沉积第一功能层（103）; 去除牺牲层（102）; 其中：通过用对第一功能层（103）和衬底（101）不产生不利影响的酸性水溶液蚀刻牺牲层（102）来进行去除牺牲层（102）。

    METHOD OF STORING DATA IN POLYMER
    2.
    发明申请
    METHOD OF STORING DATA IN POLYMER 审中-公开

    公开(公告)号：US20190291106A1

    公开(公告)日：2019-09-26

    申请号：US16363926

    申请日：2019-03-25

    Applicant: IMEC vzw

    Inventor： Karolien Jans ,  Tim Stakenborg ,  Frank Holsteyns

    IPC: B01L3/00 ,  G11C13/00

    Abstract: The disclosed technology generally relates to storing data, and more particularly relates to a method of storing data in a polymer, where the data comprises a sequence of bits. In one aspect, the method comprises receiving a sequence of bits to be stored and providing a group of different homo-bifunctional monomers. Each homo-bifunctional monomer comprises a core structure having identical functional groups attached at two different positions of the core structure. The group of different homo-bifunctional monomers comprises homo-bifunctional monomers having at least two different core structures. The method further comprises linking the different homo-bifunctional monomers together to form the polymer having a sequence of monomer core structures representing the sequence of bits to be stored. The different homo-bifunctional monomers are linked together using a click chemistry reaction between the functional groups of the different homo-bifunctional monomers. The present disclosure further relates to a synthesis system for performing the method.

    Assay with digital readout
    5.
    发明授权
    Assay with digital readout 有权

    公开(公告)号：US11371959B2

    公开(公告)日：2022-06-28

    申请号：US16715541

    申请日：2019-12-16

    Applicant: IMEC VZW

    Inventor： Kris Covens ,  Karolien Jans ,  Koen Martens

    IPC: G01N27/414 ,  G01N27/413 ,  G01N27/416

    Abstract: A device and a method for performing an assay is provided. The assay device, which may be used for determining the concentration of an analyte in a sample, includes a plurality of microchambers and a Field-effect transistor (FET) arranged at the bottom of each of the plurality of microchambers. Capture probe molecules for the analyte can be arranged within the plurality of microchambers such that each microchamber contains at most one capture probe molecule. The FET can be arranged in said microchamber to give a readable output signal based on binding of the analyte, or competitor to the analyte, with the capture probe molecule.

    Method and Device for Detecting Analytes
    6.
    发明申请
    Method and Device for Detecting Analytes 有权
    检测分析物的方法和装置

    公开(公告)号：US20140234219A1

    公开(公告)日：2014-08-21

    申请号：US14180100

    申请日：2014-02-13

    Applicant: Panasonic Corporation ,  IMEC VZW

    Inventor： Hilde Jans ,  Masahiko Shioi ,  Karolien Jans ,  Liesbet Lagae

    IPC: G01N21/65

    CPC classification number: G01N21/658 ,  A61K49/0004 ,  G01N21/648

    Abstract: A method (200) for determining a concentration of an analyte in a fluid or fluid sample, comprises: providing (201) a SERS substrate comprising receptor molecules (107) capable of binding competitor molecules (106); contacting (202) the SERS substrate (102) with a fluid (sample) comprising analyte (108) and such competitor molecules (106); radiating (203) the SERS substrate (102) with a light source while measuring a SERS signal; and determining (205) a concentration of the analyte (108) based on the measured signal level.A corresponding device and system are also provided.

    Abstract translation: 一种用于确定流体或流体样品中的分析物浓度的方法（200），包括：提供（201）包含能够结合竞争分子（106）的受体分子（107）的SERS底物; 使所述SERS衬底（102）与包含分析物（108）和所述竞争分子（106）的流体（样品）接触（202）; 在测量SERS信号的同时用光源辐射（203）所述SERS衬底（102）; 以及基于测量的信号水平确定（205）所述分析物（108）的浓度。 还提供了相应的设备和系统。

    Surface immobilization of an analyte-recognizing molecule
    7.
    发明授权
    Surface immobilization of an analyte-recognizing molecule 有权

    公开(公告)号：US10746731B2

    公开(公告)日：2020-08-18

    申请号：US15577311

    申请日：2016-06-28

    Applicant: IMEC VZW

    Inventor： Rita Vos ,  Karolien Jans ,  Tim Stakenborg

    IPC: G01N33/543 ,  G01N33/531

    Abstract: A method for immobilizing an analyte-recognizing molecule (1) on a surface (2′) functionalized with chemical groups Y1 suitable for reacting with a chemical group X2 of a coupling molecule (7) to form a reaction product comprising a chemical group Y2 suitable for reacting with the analyte-recognizing molecule (1), the method comprising the steps of: a) Providing the functionalized surface (2′), b) Contacting the functionalized surface (2′) with a solution (6) comprising simultaneously: i) The coupling molecule (7), and ii) The analyte-recognizing molecule (1).

    Method for Sequencing a Polynucleotide
    8.
    发明申请
    Method for Sequencing a Polynucleotide 审中-公开

    公开(公告)号：US20200216890A1

    公开(公告)日：2020-07-09

    申请号：US16723315

    申请日：2019-12-20

    Applicant: IMEC VZW

    Inventor： Koen Martens ,  Pol Van Dorpe ,  Karolien Jans ,  Gabrielle Woronoff

    IPC: C12Q1/6869

    Abstract: A method for sequencing a template polynucleotide, comprising the steps of: a) Providing a sensor comprising: an active region comprising a source region, a drain region, and a channel region, a dielectric region on the channel region, a polymerase coupled to the dielectric region, the polymerase having an active site, the polymerase being separated from the dielectric region by a gap, one or more sensitizing means, a fluidic gate region to which the polymerase is exposed, a template polynucleotide bound to a primer, the template polynucleotide being bound to the polymerase; b) Exposing the polymerase to one or more nucleotide polyphosphates; and c) Electrically monitoring changes in the channel region electrical properties.

    Method to pattern substrates
    9.
    发明授权
    Method to pattern substrates 有权
    衬底图案方法

    公开(公告)号：US09373519B2

    公开(公告)日：2016-06-21

    申请号：US14560202

    申请日：2014-12-04

    Applicant: IMEC VZW

    Inventor： Karolien Jans ,  Alexandra Dusa ,  Tim Stakenborg

    IPC: H01L21/306 ,  H01L21/308 ,  H01L29/06 ,  H01L21/3205 ,  H01L21/32 ,  G01N33/487 ,  B82Y40/00

    CPC classification number: H01L21/3085 ,  B81B2207/056 ,  B81C1/00206 ,  B82Y40/00 ,  G01N33/487 ,  H01L21/3086 ,  H01L21/32 ,  H01L21/32051 ,  H01L29/06

    Abstract: A method for creating a pattern on a substrate (101) is presented, the method comprises: providing a substrate (101) comprising silicon; creating a sacrificial layer (102) on the substrate (101), wherein the sacrificial layer is formed on a first surface area (101a) of the substrate thereby leaving a second surface area (101b) exposed; depositing a first functional layer (103) at least on the second surface area (101b) of the substrate (101); removing the sacrificial layer (102); wherein: removing the sacrificial layer (102) is performed by etching the sacrificial layer (102) with an acidic aqueous solution that does not adversely affect the first functional layer (103) and the substrate (101).

    Abstract translation: 提出了一种用于在衬底（101）上形成图案的方法，所述方法包括：提供包括硅的衬底（101）; 在所述基板（101）上形成牺牲层（102），其中所述牺牲层形成在所述基板的第一表面区域（101a）上，从而使第二表面区域（101b）露出; 至少在基板（101）的第二表面区域（101b）上沉积第一功能层（103）; 去除牺牲层（102）; 其中：通过用对第一功能层（103）和衬底（101）不产生不利影响的酸性水溶液蚀刻牺牲层（102）来进行去除牺牲层（102）。

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