SEMICONDUCTOR LASER WITH TENSILE STRAINED InAlAs ELECTRON BLOCKER FOR 1310 NANOMETER HIGH TEMPERATURE OPERATION

    公开(公告)号:US20180366914A1

    公开(公告)日:2018-12-20

    申请号:US15627291

    申请日:2017-06-19

    申请人: Intel Corporation

    发明人: Pierre Doussiere

    IPC分类号: H01S5/343 H01S5/20 H01S5/34

    摘要: Embodiments may relate to a multiple quantum well (MQW) laser for operating at high temperatures, comprising at least one quantum well made of compressively strained InGaAlAs layers that are alternatively stacked with tensile strained InGaAlAs layers, the at least one quantum well surrounded on one side by a n-doped InP cladding and on the other by a p-doped InP cladding so as to form a double hetero-junction. A confinement layer of lattice-matched InAlAs may be provided between the quantum well and the p-doped cladding, having a first surface facing or adjacent to the quantum well and a second surface facing or adjacent to the p-doped cladding. An additional electron containment layer of tensile strained InAlAs may be provided facing or adjacent to one surface of the confinement layer, having a thickness smaller than that of the confinement layer. Other embodiments may be described and/or claimed.

    HIGH-EFFICIENCY SEMICONDUCTOR LASER
    2.
    发明申请

    公开(公告)号:US20180183211A1

    公开(公告)日:2018-06-28

    申请号:US15392875

    申请日:2016-12-28

    申请人: INTEL CORPORATION

    摘要: Embodiments of the present disclosure may relate to a hybrid silicon distributed feed-back (DFB) laser, wherein light is to propagate through the DFB laser along a length of the DFB laser. The DFB laser may include a mesa with a current channel that extends from the first side of the mesa to the second side of the mesa. At a first location along the length of the DFB laser, the current channel may have a first width and/or the mesa may have a second width. At a second location along the length of the DFB laser, the current channel may have a third width and/or the mesa may have a fourth width as measured in a direction perpendicular to the length of the DFB laser. Other embodiments may be described and/or claimed.

    Laser device with a stepped graded index separate confinement heterostructure

    公开(公告)号:US10833481B2

    公开(公告)日:2020-11-10

    申请号:US16235684

    申请日:2018-12-28

    申请人: Intel Corporation

    摘要: Embodiments of the present disclosure are directed towards a laser device with a stepped graded index separate confinement heterostructure (SCH), in accordance with some embodiments. One embodiment includes a substrate area, and an active region adjacent to the substrate area. The active region includes an SCH layer, which comprises a first portion and a second portion adjacent to the first portion. A composition of the first portion is graded to provide a first conduction band energy increase over a distance from multiple quantum wells (MQW) to a p-side of a laser device junction. A composition of the second portion is graded to provide a second conduction band energy increase over the MQW to the p-side distance. The first conduction band energy increase is different than the second conduction band energy increase. Other embodiments may be described and/or claimed.

    High-efficiency semiconductor laser

    公开(公告)号:US10008828B1

    公开(公告)日:2018-06-26

    申请号:US15392875

    申请日:2016-12-28

    申请人: INTEL CORPORATION

    摘要: Embodiments of the present disclosure may relate to a hybrid silicon distributed feed-back (DFB) laser, wherein light is to propagate through the DFB laser along a length of the DFB laser. The DFB laser may include a mesa with a current channel that extends from the first side of the mesa to the second side of the mesa. At a first location along the length of the DFB laser, the current channel may have a first width and/or the mesa may have a second width. At a second location along the length of the DFB laser, the current channel may have a third width and/or the mesa may have a fourth width as measured in a direction perpendicular to the length of the DFB laser. Other embodiments may be described and/or claimed.

    Semiconductor laser with tensile strained InAlAs electron blocker for 1310 nanometer high temperature operation

    公开(公告)号:US10193308B2

    公开(公告)日:2019-01-29

    申请号:US15627291

    申请日:2017-06-19

    申请人: Intel Corporation

    发明人: Pierre Doussiere

    IPC分类号: H01S5/34 H01S5/343 H01S5/20

    摘要: Embodiments may relate to a multiple quantum well (MQW) laser for operating at high temperatures, comprising at least one quantum well made of compressively strained InGaAlAs layers that are alternatively stacked with tensile strained InGaAlAs layers, the at least one quantum well surrounded on one side by a n-doped InP cladding and on the other by a p-doped InP cladding so as to form a double hetero-junction. A confinement layer of lattice-matched InAlAs may be provided between the quantum well and the p-doped cladding, having a first surface facing or adjacent to the quantum well and a second surface facing or adjacent to the p-doped cladding. An additional electron containment layer of tensile strained InAlAs may be provided facing or adjacent to one surface of the confinement layer, having a thickness smaller than that of the confinement layer. Other embodiments may be described and/or claimed.