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公开(公告)号：US20070026542A1
公开(公告)日：2007-02-01
申请号：US11470829
申请日：2006-09-07
IPC分类号： H01L21/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C03C17/3417 , C03C2217/77 , C03C2218/31 , C03C2218/328
摘要： The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.
摘要翻译： 本发明涉及一种形成导电模板的方法，其包括提供衬底; 在基板上形成台面; 以及在所述台面上形成多个凹陷和突出部，其中所述凹陷的最低点包括导电材料，并且所述突起包括电绝缘材料。 期望台面对于预定波长的辐射例如紫外线辐射基本上是透明的。 结果，期望由允许紫外线辐射传播的材料形成导电材料。 在本发明中，氧化铟锡是形成导电材料的合适材料。
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公开(公告)号：US20050098534A1
公开(公告)日：2005-05-12
申请号：US10706537
申请日：2003-11-12
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C03C17/3417 , C03C2217/77 , C03C2218/31 , C03C2218/328
摘要： The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.
摘要翻译： 本发明涉及一种形成导电模板的方法，其包括提供衬底; 在基板上形成台面; 以及在所述台面上形成多个凹陷和突出部，其中所述凹陷的最低点包括导电材料，并且所述突起包括电绝缘材料。 期望台面对于预定波长的辐射例如紫外线辐射基本上是透明的。 结果，期望由允许紫外线辐射传播的材料形成导电材料。 在本发明中，氧化铟锡是形成导电材料的合适材料。
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公开(公告)号：US20050106321A1
公开(公告)日：2005-05-19
申请号：US10714088
申请日：2003-11-14
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed to a method for dispensing a plurality of spaced-apart droplets of liquid a substrate that features minimizing the distance liquid in the droplets must travel to reach an adjacent droplet to form a contiguous lay of the liquid on the substrate. As a result, when patterning the droplets with a patterned template, the time required to fill the features of the pattern and to cover the substrate is minimized. This increases the throughput of the imprinting process. To that end, the method includes disposing a plurality of spaced-apart droplets on the substrate, each of which has a unit volume associated therewith. A spacing between adjacent droplets of a subset of the plurality of droplets is selected to be a function of a smallest unit volume associated with the subset.
摘要翻译： 本发明涉及一种用于分配液体的多个间隔开的液滴的方法，其特征在于使液滴中的液体必须行进的距离最小化以到达相邻的液滴，以在基底上形成液体的连续层。 结果，当用图案化模板图案化液滴时，填充图案的特征和覆盖基底所需的时间被最小化。 这增加了压印过程的吞吐量。 为此，该方法包括在衬底上设置多个间隔开的液滴，每个液滴具有与其相关的单位体积。 选择多个液滴的子集的相邻液滴之间的间隔是与该子集相关联的最小单位体积的函数。
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公开(公告)号：US20060176466A1
公开(公告)日：2006-08-10
申请号：US11389731
申请日：2006-03-27
申请人： Byung Choi , Ronald Voisin , Sidlgata Sreenivasan , Michael Watts , Daniel Babbs , Mario Meissl , Hillman Bailey , Norman Schumaker
发明人： Byung Choi , Ronald Voisin , Sidlgata Sreenivasan , Michael Watts , Daniel Babbs , Mario Meissl , Hillman Bailey , Norman Schumaker
IPC分类号： G03B27/58
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.
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公开(公告)号：US20060077374A1
公开(公告)日：2006-04-13
申请号：US11127060
申请日：2005-05-11
申请人： Sidlgata Sreenivasan , Michael Watts , Byung Choi , Mario Meissl , Norman Schumaker , Ronald Voisin
发明人： Sidlgata Sreenivasan , Michael Watts , Byung Choi , Mario Meissl , Norman Schumaker , Ronald Voisin
IPC分类号： G03B27/58
CPC分类号： B82Y10/00 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B81C1/0046 , B82Y40/00 , G03F7/0002 , H01L21/0271
摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
摘要翻译： 描述的是通过压印光刻来图案化衬底的系统。 压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。 压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。 该系统包括施加激活光以固化活化光可固化液体的光源。
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公开(公告)号：US20070122942A1
公开(公告)日：2007-05-31
申请号：US11669569
申请日：2007-01-31
申请人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
发明人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
CPC分类号： B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.
摘要翻译： 本发明包括用于图案化液体配置在基板上的一致性模板。 模板包括具有相对的第一和第二表面的主体。 第一表面包括多个凹陷区域，其中图案化区域设置在相邻的凹陷区域之间。 具体地，凹陷区域限定挠曲区域，每个图案化区域围绕该弯曲区域可独立于模板的剩余图案形成区域移动。 在一个实施例中，模板安装到具有入口和通道的流体室。 模板连接到通道，并且入口连接到流体源以便于模板的变形以符合与其相邻的表面的轮廓。
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公开(公告)号：US20060076717A1
公开(公告)日：2006-04-13
申请号：US11127041
申请日：2005-05-11
申请人： Sidlgata Sreenivasan , Byung Choi , Norman Schumaker , Ronald Voisin , Michael Watts , Mario Meissl
发明人： Sidlgata Sreenivasan , Byung Choi , Norman Schumaker , Ronald Voisin , Michael Watts , Mario Meissl
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
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公开(公告)号：US20050051698A1
公开(公告)日：2005-03-10
申请号：US10614716
申请日：2003-07-07
申请人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
发明人： Sidlgata Sreenivasan , Byung Choi , Ronald Voisin
CPC分类号： B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/887
摘要： The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.
摘要翻译： 本发明包括用于图案化液体配置在基板上的一致性模板。 模板包括具有相对的第一和第二表面的主体。 第一表面包括多个凹陷区域，其中图案化区域设置在相邻的凹陷区域之间。 具体地，凹陷区域限定挠曲区域，每个图案化区域围绕该弯曲区域可独立于模板的剩余图案形成区域移动。 在一个实施例中，模板安装到具有入口和通道的流体室。 模板连接到通道，并且入口连接到流体源以便于模板的变形以符合与其相邻的表面的轮廓。
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公开(公告)号：US20060096949A1
公开(公告)日：2006-05-11
申请号：US11298244
申请日：2005-12-09
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： In an embodiment of the present invention, the template is formed by forming a masking layer on a substrate; forming a pattern in the masking layer such that a portion of the substrate is exposed; etching one or more of the exposed portions of the substrate such that a relief image is formed in the substrate; removing the masking layer; coating the relief image with a release agent; depositing a conformal layer upon the substrate such that a portion of the conformal layer is arranged within the relief image formed in the substrate; arranging an elastomer layer on the conformal layer; arranging a substrate such that the elastomer layer is bonded between the conformal layer and the rigid substrate; and removing from the substrate the lithography template, where the lithography template includes the elastomer layer bonded between the rigid substrate and the conformal layer. In an exemplary embodiment, the template is formed by sequentially forming at least one elastomer layer on a substrate; forming an imprinting layer on the elastomer layer; forming a sacrificial layer on the imprinting layer; forming a masking layer on the sacrificial layer such that a portion of the sacrificial layer is exposed through the masking layer; etching one or more of the exposed portions of the sacrificial layer such that a portion of the imprinting layer is exposed through the masking layer; etching one or more of the exposed portions of the imprinting layer such that a relief image is formed; and removing the entire masking and sacrificial layers.
摘要翻译： 在本发明的实施例中，通过在基板上形成掩模层来形成模板; 在所述掩蔽层中形成图案，使得所述基板的一部分露出; 蚀刻衬底的一个或多个暴露部分，使得在衬底中形成浮雕图像; 去除掩蔽层; 用脱模剂涂覆浮雕图像; 在所述基板上沉积共形层，使得所述共形层的一部分布置在形成在所述基板中的所述浮雕图像内; 在保形层上布置弹性体层; 布置基板，使得弹性体层结合在共形层和刚性基板之间; 以及从基板去除光刻模板，其中光刻模板包括结合在刚性基板和保形层之间的弹性体层。 在一个示例性实施例中，模板通过在衬底上顺序地形成至少一个弹性体层而形成; 在弹性体层上形成压印层; 在压印层上形成牺牲层; 在所述牺牲层上形成掩模层，使得所述牺牲层的一部分通过所述掩模层露出; 蚀刻牺牲层的一个或多个暴露部分，使得压印层的一部分通过掩模层曝光; 蚀刻压印层的一个或多个曝光部分，使得形成浮雕图像; 并去除整个掩蔽层和牺牲层。
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公开(公告)号：US20050236360A1
公开(公告)日：2005-10-27
申请号：US10833240
申请日：2004-04-27
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： A compliant UV imprint lithography template, which may also act as a thermal implant template, and methods for manufacturing it. The template essentially comprises a relief image and an elastomer adapted to adjust the relief image. In an embodiment, the relief image is arranged in a compliant imprinting layer where the elastomer is arranged between the imprinting layer and a rigid transparent substrate. In an embodiment, the template is compliant to a wafer surface. In an embodiment, layering an elastomer and an imprinting layer on a substrate and patterning a relief image into the imprinting layer, form the template.
摘要翻译： 还可以充当热植入模板的兼容UV压印光刻模板及其制造方法。 模板基本上包括浮雕图像和适于调整浮雕图像的弹性体。 在一个实施例中，浮雕图像被布置在柔性压印层中，其中弹性体布置在压印层和刚性透明衬底之间。 在一个实施例中，模板符合晶片表面。 在一个实施例中，在基底上层叠弹性体和压印层并将浮雕图案图案化成压印层，形成模板。
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